公开(公告)号：US5576148A

公开(公告)日：1996-11-19

申请号：US382155

申请日：1995-02-01

申请人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

发明人： Genji Imai ,  Yukari Takeda ,  Hideo Kogure ,  Naozumi Iwasawa

IPC分类号： H05K3/42 ,  H05K3/00 ,  H05K3/06 ,  H05K3/46 ,  G03F7/00

CPC分类号： H05K3/0094 ,  H05K2201/09581 ,  H05K2203/0582 ,  H05K2203/107 ,  H05K2203/135 ,  H05K3/0082 ,  H05K3/064

摘要： The present invention provides a process for producing a high-density printed wiring board with plated throughholes, at high productivity and reliability by a direct drawing method. The process comprises making throughholes in a substrate having an electro-conductive layer on each side; conducting plating on at least the walls of the substrate throughholes; forming a photosensitive resist film on each side of the substrate; applying an actinic radiation onto the resist film by a direct drawing method in the shape of a pattern to be obtained when the resist film is a negative type, or in the shape of a pattern reverse to a pattern to be obtained when the resist film is a positive type; forming, on the uncoated portion inside the throughholes by electrodeposition, an electrodeposition film which is insoluble in a developing solution used later and an etching solution used later but is removable with a peeling solution used later; conducting development with an appropriate developing solution to remove the resist film; removing the exposed plating layer portion and the electro-conductive layer portion present therebeneath, by etching; and then peeling the remaining resist film and the electrodeposition film inside the throughholes, with an appropriate peeling solution.

摘要翻译： 本发明提供一种通过直接拉伸法以高生产率和可靠性制造具有电镀通孔的高密度印刷线路板的方法。 该方法包括在每个侧面上具有导电层的基板中形成通孔; 至少在基板通孔的壁上进行电镀; 在基板的每一侧上形成光敏抗蚀剂膜; 通过直接拉伸法将光化辐射施加到抗蚀剂膜为负型时获得的图案的形状，或者与抗蚀剂膜为 积极的类型 通过电沉积在通孔内的未涂覆部分上形成不溶于稍后使用的显影液的电沉积膜和稍后使用的可用随后使用的剥离溶液除去的蚀刻溶液; 用合适的显影液进行显影以除去抗蚀剂膜; 通过蚀刻去除暴露的镀层部分和存在于其中的导电层部分; 然后用适当的剥离溶液将剩余的抗蚀剂膜和电沉积膜剥离到通孔内。

公开(公告)号：US5624781A

公开(公告)日：1997-04-29

申请号：US250623

申请日：1994-05-27

申请人： Keisuke Naruse ,  Yukari Takeda ,  Naozumi Iwasawa ,  Hideo Kogure

发明人： Keisuke Naruse ,  Yukari Takeda ,  Naozumi Iwasawa ,  Hideo Kogure

IPC分类号： C09D5/44 ,  G03F7/023 ,  G03F7/16 ,  C25D13/00 ,  G03F7/38 ,  G03F7/40

CPC分类号： C09D5/4484 ,  G03F7/0233 ,  G03F7/164

摘要： A positive type anionic electrodeposition photoresist composition comprising, as a main component, a dispersion obtained by neutralizing, with a base, a mixture comprising:(A) an acrylic resin containing carboxyl group(s) and hydroxyl group(s),(B) a vinylphenol resin containing a hydroxystyrene unit in an amount of at least 25% by weight based on the resin, and(C) an ester between a polyhydroxybenzophenone and 1,2-naphthoquinone diazide sulfonic acid or benzoquinone diazide sulfonic acid, and dispersing the resulting neutralization product in water.This composition is superior in running stability during electrodeposition and is useful for formation of highly reliable resist pattern or conductor pattern.

摘要翻译： 一种正型阴离子电沉积光致抗蚀剂组合物，其包含作为主要成分的通过用碱中和混合物获得的分散体，所述混合物包含：（A）含有羧基和羟基的丙烯酸树脂，（B） 含有基于树脂的至少25重量％的羟基苯乙烯单元的乙烯基酚树脂和（C）多羟基二苯甲酮与1,2-萘醌二叠氮化物磺酸或苯醌二叠氮磺酸之间的酯，并将所得 中和产品在水中。 该组合物在电沉积中的运行稳定性优异，并且可用于形成高度可靠的抗蚀剂图案或导体图案。

公开(公告)号：US5281449A

公开(公告)日：1994-01-25

申请号：US742232

申请日：1991-08-08

申请人： Naozumi Iwasawa ,  Hideo Kogure ,  Heihachi Murase

发明人： Naozumi Iwasawa ,  Hideo Kogure ,  Heihachi Murase

IPC分类号： G03F7/027 ,  G03F7/028 ,  G03F7/031 ,  G03F7/038 ,  G03F7/075 ,  H01L21/027 ,  H05K3/00 ,  B05D3/06 ,  G03C1/705

CPC分类号： G03F7/038 ,  H05K3/0076

摘要： The invention provides a method for forming a pattern coating, the method including the steps of:applying to a substrate a radiation curable composition containing a resin (a) which contains, per kilogram of said resin (a) about 1.5 to about 4.5 moles of a polyermizable unsaturated group, about 0.4 to about 2.5 moles of a carboxyl group and 0.2 to about 3.5 moles of a thioether group, the resin having a number average molecular weight of about 500 to about 50,000; selectively irradiating a portion of the applied coating with actinic rays; and subjecting the coating to development with an alkali aqueous solution.

摘要翻译： 本发明提供一种形成图案涂层的方法，该方法包括以下步骤：向基材施加含有树脂（a）的可辐射固化组合物，该树脂（a）每千克所述树脂（a）含有约1.5至约4.5摩尔 约0.4至约2.5摩尔的羧基和0.2至约3.5摩尔的硫醚基团，所述树脂的数均分子量为约500至约50,000; 用光化射线选择性地照射所涂敷的涂层的一部分; 并用碱性水溶液对涂层进行显影。

公开(公告)号：US5455116A

公开(公告)日：1995-10-03

申请号：US140556

申请日：1993-10-25

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Tetsu Maki ,  Naozumi Iwasawa

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Tetsu Maki ,  Naozumi Iwasawa

IPC分类号： G21F1/12 ,  H05K9/00 ,  B32B9/00

CPC分类号： H05K9/0086 ,  G21F1/125 ,  G21Y2002/301 ,  G21Y2004/10 ,  G21Y2004/30 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic wave reflecting material layer, if needed, (B) a supporting layer, (C) a resin layer, if needed, (D) a supporting layer, and (E) a metallic pattern layer prepared by arranging at least one of a pattern unit comprising a geometrical pattern formed by use of a continuous metallic band, or comprising a multi-figured structure formed by combining a plurality of band-shaped metallic figures so as not to contact with each other; and an electromagnetic wave reflection-preventing method by use of the electromagnetic wave reflection-preventing material.

摘要翻译： 一种电磁波反射防止材料，具有如下需要，依次层叠（A）电磁波反射材料层，（B）支撑层，（C）树脂层，（D）支撑层 和（E）通过布置包括通过使用连续金属带形成的几何图案的图案单元中的至少一个而制备的金属图案层，或者包括通过组合多个带状金属图形而形成的多构造结构 以免彼此接触; 以及使用电磁波防反射材料的电磁波反射防止方法。

公开(公告)号：US5455117A

公开(公告)日：1995-10-03

申请号：US140564

申请日：1993-10-25

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： G21F1/12 ,  H05K9/00 ,  B32B9/00

CPC分类号： G21F1/125 ,  H05K9/0088 ,  G21Y2002/301 ,  G21Y2004/10 ,  G21Y2004/30 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by successively laminating (A) an electromagnetic have reflecting metallic material layer, if needed, (B) a substrate layer, (C) a resin layer containing a powder of at least one selected from ferrite, carbon, metal powder and an electrically conductive metallic oxide, and, if needed, a good dielectric material, if needed, (D) a supporting film layer, and (E) a pattern coating layer prepared in the form of a geometrical pattern, containing a metal powder and having a volume resistivity of 10.sup.-3 to 10.sup.10 .OMEGA..multidot.cm, preferably further laminating (F) a clear or colored coating layer; and an electromagnetic wave reflection-preventing material which is obtained by substituting (G) a molded sheet layer formed by coating a coating composition prepared by dispersing the above powder into a binder onto a substrate having void, and molding under pressure for (C) a resin layer; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying a laminate obtained by removing the electromagnetic wave reflecting metallic material layer (A) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 具有通过依次层叠（A）电磁体形成的结构的电磁波反射防止材料具有反射金属材料层，如果需要，（B）基底层，（C）含有选自以下的至少一种的粉末的树脂层 铁素体，碳，金属粉末和导电金属氧化物，如果需要，如果需要，可以使用良好的介电材料（D）支撑膜层，和（E）以几何图案形式制备的图案涂层 ，含有金属粉末，体积电阻率为10-3至1010欧米加×厘米，优选进一步层压（F）透明或有色涂层; 和（G）通过将（G）通过将通过将上述粉末分散在粘合剂中而制备的涂料组合物形成的模塑片层而获得的模塑片层而获得，并且在压力下成型（C） 树脂层; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括将从电磁波反射防止材料除去电磁波反射金属材料层（A）获得的层压体施加到 具有金属表面的电磁波反射结构。

公开(公告)号：US5453328A

公开(公告)日：1995-09-26

申请号：US183763

申请日：1994-01-21

申请人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

发明人： Toshiaki Nagano ,  Hideo Kogure ,  Naozumi Iwasawa ,  Tetsu Maki

IPC分类号： H05K9/00 ,  B32B9/00

CPC分类号： H05K9/0086 ,  Y10T428/12007 ,  Y10T428/12014 ,  Y10T428/12035

摘要： An electromagnetic wave reflection-preventing material having a structure formed by a process which comprises successively laminating (A) a pattern layer formed in the form of a geometrical pattern having a volume resistivity of 10.sup.3 .OMEGA. . cm or less, if needed, (B) a supporting layer, (C) a resin layer, and, if needed, (D) a supporting layer, to form a laminate unit, laminating a pluralitry of the laminate unit so that the layer (A) may face on the layer (C) or (D) to form a multiple laminate unit structure, and laminating the multiple laminate unit structure onto (E) an electromagnetic wave reflecting material layer so that the layer (C) or (D) of the multiple laminate unit structure may face on the layer (E), preferably further laminating a clear or colored coating layer onto the uppermost metallic pattern layer of the electromagnetic wave, reflection-preventing material; and an electromagnetic wave reflection-preventing method which comprises applying the electromagnetic wave reflection-preventing material onto a structure, or which comprises applying the multiple laminate unit structure obtained by removing the electromagnetic wave reflecting material layer (E) from the electromagnetic wave reflection-preventing material onto an electromagnetic wave reflecting structure having a metallic surface.

摘要翻译： 一种电磁波反射防止材料，其具有通过以下工序形成的结构形成的工艺：连续地层叠（A）形成为体积电阻率为103欧姆时的几何图案形式的图案层。 cm以下，如果需要，（B）支撑层，（C）树脂层，如果需要，（D）支撑层，形成层叠单元，层叠多层叠单元，使层 （A）可以在层（C）或（D）上面对以形成多层压单元结构，并将多层压单元结构层压到（E）电磁波反射材料层上，使得层（C）或（D 多层压单元结构可以在层（E）上面对，优选将透明或着色的涂层进一步层叠到电磁波的最上层的金属图案层上，防反射材料; 以及电磁波反射防止方法，其包括将电磁波反射防止材料施加到结构上，或者包括施加通过从电磁波反射防止中除去电磁波反射材料层（E）而获得的多层叠单元结构 材料到具有金属表面的电磁波反射结构。

公开(公告)号：US5196487A

公开(公告)日：1993-03-23

申请号：US712279

申请日：1991-06-10

申请人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

发明人： Hideo Kogure ,  Heihachi Murase ,  Naozumi Iwasawa

IPC分类号： C07F7/18 ,  C08F2/46 ,  C08F299/00 ,  C09D5/08 ,  C09D183/07 ,  C09D183/08

CPC分类号： C07F7/1836 ,  C08F299/00 ,  C09D183/08 ,  C09D5/08

摘要： A corrosion preventive resin having in the molecule at least one chelate forming group selected from among groups represented by the formula ##STR1## wherein R.sup.1 and R.sup.2 are the same or different and are each a hydrogen atom or alkyl having 1 to 8 carbon atoms, and groups represented by teh general formula ##STR2## wherein R.sup.3, R.sup.4, R.sup.5 and R.sup.6 are the same or different and are each a hydrogen atom, alkyl having 1 to 8 carbon atoms or a group forming a bivalent o-phenylene group along with two carbon atoms attached thereto. A photopolymerizable composition which includes (a) a resin having in the molecule at least one mole of polymerizable double bond per 1000 g of the resin and having per molecule at least one chelate forming group selected from among the groups represented by formula (II) and formula (III), and (b) a photopolymerization initiator is also disclosed.

摘要翻译： 一种防腐树脂，其在分子中具有至少一种螯合形成基团，其选自由式（I）表示的基团，其中R 1和R 2相同或不同，各自为氢原子或具有1至8个碳原子的烷基 原子和由通式（II）表示的基团，其中R 3，R 4，R 5和R 6相同或不同，各自为氢原子，具有1至8个碳原子的烷基或形成二价o- 亚苯基以及与其连接的两个碳原子。 一种可光聚合组合物，其包含（a）分子中每1000克所述树脂具有至少1摩尔可聚合双键并且每分子具有选自式（II）表示的基团中的至少一种螯合形成基团和 式（III）和（b）光聚合引发剂也被公开。

公开(公告)号：US6140025A

公开(公告)日：2000-10-31

申请号：US154047

申请日：1998-09-16

申请人： Genji Imai ,  Hideo Kogure

发明人： Genji Imai ,  Hideo Kogure

IPC分类号： G03F7/028 ,  C08L63/00 ,  C08L101/00 ,  C09D201/00 ,  G03F7/038 ,  G03F7/20 ,  H05K3/00 ,  H05K3/06 ,  G03F7/30

CPC分类号： G03F7/20 ,  G03F7/038

摘要： A negative type photosensitive resin composition is herein disclosed which is used under the irradiation circumstance of a safelight having a maximum wavelength within the range of 500 to 620 nm and a large spectral luminous efficiency; the composition being a liquid or a solid resin composition containing a photocurable resin, a photoreaction initiator and if necessary, a photosensitizing dye; an absorbancy of an unexposed film formed from this composition being 0.5 or less within the range of the maximum wavelength .+-.30 nm selected from the range of the maximum wavelength of the safelight. By the use of this negative type photosensitive resin composition, it is possible to form a resist pattern which is excellent in safe operativity, operational efficiency, the quality stability of products, and the like.

摘要翻译： 本发明公开了一种负极型感光性树脂组合物，其在最大波长在500〜620nm范围内的安全灯的照射环境下使用，光谱发光效率高; 所述组合物是含有光固化树脂，光反应引发剂和必要时的光敏染料的液体或固体树脂组合物; 从该组合物形成的未曝光膜在从安全灯的最大波长范围选择的最大波长+/- 30nm的范围内为0.5以下的吸光度。 通过使用这种负型感光性树脂组合物，可以形成安全操作性，操作效率，产品质量稳定性等优异的抗蚀剂图案。

公开(公告)号：US06331376B1

公开(公告)日：2001-12-18

申请号：US09582846

申请日：2000-07-05

申请人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

发明人： Daisuke Kojima ,  Genji Imai ,  Jun Akui ,  Hideo Kogure ,  Osamu Isozaki

IPC分类号： G03F7029

CPC分类号： G03F7/027 ,  C08F290/067 ,  C08G18/672 ,  C08G18/7642 ,  G03F7/0388 ,  C08G18/48 ,  C08G18/0823

摘要： An organic solvent based photocurable resist composition containing a photopolymerizable polyurethane compound having a repeating unit represented by the following formula: B—[X]n[Y]m—B, where X is represented by the formula: and Y is represented by the formula: —OOCHN—A—NHCOO(R2)—, A is a structural unit derived from a polyisocyanate compound, B is same or different and a structural unit derived from a hydroxy compound having at least one photopolymerizable unsaturated group at molecular terminals respectively and optionally containing an ether linkage, R1 is a structural unit derived from a carboxyl group-containing polyol compound, R2 is a structural unit derived from a polyol compound, n is an integer of 1 to 10, m is an integer of 1 to 10, provided that one X and one Y are bonded to each other, or three or more of X and/or Y are bonded to each other.

摘要翻译： 含有具有下式表示的重复单元的光聚合性聚氨酯化合物的有机溶剂型光固化抗蚀剂组合物：B- [X] n [Y] mB，其中X由下式表示：Y由下式表示： - OOCHN-A-NHCOO（R2） - ，A是衍生自多异氰酸酯化合物的结构单元，B相同或不同，并且衍生自在分子末端具有至少一个光聚合性不饱和基团的羟基化合物的结构单元，并且任选地含有 醚键，R1是衍生自含羧基的多元醇化合物的结构单元，R2是衍生自多元醇化合物的结构单元，n是1〜10的整数，m是1〜10的整数，条件是一个 X和一个Y彼此键合，或者X和/或Y中的三个或更多个彼此键合。

公开(公告)号：US06664029B1

公开(公告)日：2003-12-16

申请号：US09582557

申请日：2000-08-30

申请人： Genji Imai ,  Kengo Ohnishi ,  Hiroyuki Honma ,  Hideo Kogure

发明人： Genji Imai ,  Kengo Ohnishi ,  Hiroyuki Honma ,  Hideo Kogure

IPC分类号： G03F700

CPC分类号： H01J11/44 ,  G03F7/0007 ,  G03F7/094 ,  G03F7/30 ,  H05K1/0306 ,  H05K3/28 ,  H05K2203/0585

摘要： A pattern-forming method which comprises the following steps: (1) laminating an actinic ray-curable coating film layer onto the surface of an insulating film-forming resin layer. (2) irradiating directly or through a photomask an actinic ray or host wave thereonto so as to obtain a predetermined pattern. (3) subjecting the actinic ray-curable coating film layer to a developing treatment to form a resist pattern coating film consisting of the actinic ray-curable coating film layer, (4) and subjecting the insulating film-forming resin layer to a developing treatment, followed by removing.

摘要翻译： 一种图案形成方法，包括以下步骤：（1）将光化学射线固化涂膜层层压到绝缘膜形成树脂层的表面上;（2）直接或通过光掩模照射光化射线或主波 （3）使光化学射线固化性涂膜进行显影处理，形成由光化固化性涂膜层构成的抗蚀剂图案涂膜，（4），对绝缘体 成膜树脂层进行显影处理，然后除去。