PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS
    31.
    发明申请
    PATTERN FORMING METHOD AND PATTERN FORMING APPARATUS 有权
    图案形成方法和图案形成装置

    公开(公告)号:US20120242008A1

    公开(公告)日:2012-09-27

    申请号:US13349291

    申请日:2012-01-12

    IPC分类号: B29C35/08

    CPC分类号: H01L31/022433 Y02E10/50

    摘要: A nozzle N which moves in a scan direction Ds along a surface Wf of a substrate W discharges an application liquid which contains a photo-curing material, and a light emitter E moving as if to follow the nozzle N irradiates light (UV light for instance) upon the application liquid. Arriving at an application end position, the nozzle N stops discharging the application liquid and retracts in a direction away from the substrate surface Wf. Meanwhile, the light emitter E keeps moving in the scan direction Ds, thereby irradiating even the terminating end of the application liquid with the light without fail.

    摘要翻译: 沿着基板W的表面Wf沿扫描方向Ds移动的喷嘴N排出包含光固化材料的涂布液,并且如同遵循喷嘴N一样移动的发光体E照射光(例如UV光 )对应用液体。 到达应用结束位置时,喷嘴N停止排出涂敷液体,并沿远离基板表面Wf的方向缩回。 同时,光发射体E在扫描方向Ds上保持移动,从而甚至用光照射施加液的终止端。

    SUBSTRATE PROCESSING APPARATUS WITH MULTI-SPEED DRYING
    32.
    发明申请
    SUBSTRATE PROCESSING APPARATUS WITH MULTI-SPEED DRYING 有权
    具有多速干燥的基板加工装置

    公开(公告)号:US20090073394A1

    公开(公告)日:2009-03-19

    申请号:US12208925

    申请日:2008-09-11

    IPC分类号: G03B27/32 B08B13/00

    摘要: After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above a peripheral portion of the substrate, the rotational speed of the substrate is reduced. The movement speed of the liquid supply nozzle is maintained as it is. Thereafter, the discharge of the rinse liquid is stopped while the liquid supply nozzle moves outward from the substrate. Thus, the drying region spreads over the whole substrate so that the substrate is dried.

    摘要翻译: 在清洁基板之后,液体供应喷嘴从衬底的中心向外移动,同时在衬底旋转的同时排出冲洗液体。 在这种情况下,不存在冲洗液的干燥区域在基板上膨胀。 当液体供给喷嘴移动到基板的周边部分上方时,基板的旋转速度降低。 液体供应喷嘴的运动速度保持原样。 此后,在液体供给喷嘴从基板向外移动的同时停止冲洗液的排出。 因此,干燥区域遍及整个基板,使得基板被干燥。

    PROCESSING METHOD OF SUBSTRATE AND PROCESSING APPARATUS OF SUBSTRATE
    33.
    发明申请
    PROCESSING METHOD OF SUBSTRATE AND PROCESSING APPARATUS OF SUBSTRATE 审中-公开
    基板的加工方法和基板的加工装置

    公开(公告)号:US20070059640A1

    公开(公告)日:2007-03-15

    申请号:US11531538

    申请日:2006-09-13

    申请人: Masakazu Sanada

    发明人: Masakazu Sanada

    IPC分类号: G03C1/00

    CPC分类号: G03F7/32 G03F7/322

    摘要: A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate collection of waste liquid. Before a developer is fed from a developer discharge nozzle 30 onto a resist film having been exposed that is formed on the surface of a substrate W to make processing of the resist film, a solution containing a surface-active agent is fed from a solution discharge nozzle 34 onto the resist film, and subsequently pure water is fed onto the resist film on which the solution containing a surface-active agent has been fed to make prewetting.

    摘要翻译: 基板的加工方法能够改善相对于显影剂的抗蚀剂膜表面的润湿性,而不会对抗蚀剂图案的加工尺寸产生不利影响,也不会对抗蚀剂膜造成损伤。 在处理方法中,也不需要分开收集废液。 在显影剂从显影剂排出喷嘴30供给到形成在基板W的表面上的已曝光的抗蚀剂膜上以进行抗蚀剂膜的处理之前,从溶液放电中供给含有表面活性剂的溶液 喷嘴34到抗蚀剂膜上,然后将纯水进料到其上已经供给含有表面活性剂的溶液的抗蚀剂膜上以进行预润湿。

    Developing apparatus and developing method
    34.
    发明授权
    Developing apparatus and developing method 失效
    开发设备和开发方法

    公开(公告)号:US06869234B2

    公开(公告)日:2005-03-22

    申请号:US10637774

    申请日:2003-08-07

    IPC分类号: G03D5/00

    CPC分类号: G03D5/00

    摘要: A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.

    摘要翻译: 基板(SW)通过晶片保持旋转机构(810)可旋转地保持在大致水平的位置。 冲洗液供给喷嘴(840)的一端由冲洗液供给喷嘴旋转支撑机构(850)可旋转地支撑,从而越过基板(SW)。 响应于冲洗液体供给喷嘴(840)的旋转,冲洗液体供给喷嘴(840)的旋转轴线在更靠近或远离基板(SW)的旋转轴线的方向上移动,由此投影量 的清洗液供给喷嘴(840)的顶端部分减少。

    Apparatus for developing substrate
    35.
    发明授权
    Apparatus for developing substrate 失效
    用于显影衬底的装置

    公开(公告)号:US06749351B2

    公开(公告)日:2004-06-15

    申请号:US10330883

    申请日:2002-12-26

    IPC分类号: G03D500

    摘要: A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.

    摘要翻译: 显影剂供应喷嘴从用于将显影剂供应到基板的整个主表面的基板的第一端移向第二端。 在经过所需的显影时间之后,冲洗排出喷嘴从基板的第一端向第二端移动,以向基板的整个主表面提供冲洗。 提供隔板,用于防止从冲洗排放喷嘴的狭缝排出口排出到基板上的冲洗物沿着冲洗排放喷嘴的运动方向向前流动或者将前面提供的显影剂洗掉。

    Lithium ion secondary battery and preparation process of same
    37.
    发明授权
    Lithium ion secondary battery and preparation process of same 有权
    锂离子二次电池及其制备方法相同

    公开(公告)号:US09142837B2

    公开(公告)日:2015-09-22

    申请号:US13590717

    申请日:2012-08-21

    申请人: Masakazu Sanada

    发明人: Masakazu Sanada

    IPC分类号: H01M4/02 H01M4/64 H01M10/04

    摘要: A separator-type lithium ion secondary battery having large capacity and charge-discharge performance not destroying the separator, even with an active material layer having concavo-convex structure of high aspect ratio. The battery comprises a first electrode comprising a first current collector, and a first active material layer formed by plural convex first active material parts provided on the first current collector, a second electrode comprising a second current collector, and a second active material layer formed by plural convex second active material parts provided on the second current collector, and a separator provided between the first electrode and the second electrode, wherein the first electrode and the second electrode are integrated so that the convex first active material part is faced between the adjacent convex second active material parts, and the convex first active material part does not enter between the convex second active material parts.

    摘要翻译: 即使具有高纵横比的凹凸结构的活性物质层,也具有不破坏隔膜的大容量和充放电性能的分离型锂离子二次电池。 该电池包括第一电极,该第一电极包括第一集电器和由设置在第一集电器上的多个凸起的第一活性材料部分形成的第一活性材料层,包括第二集电器的第二电极和由第二集电体形成的第二活性材料层, 设置在第二集电体上的多个凸起的第二活性物质部分和设置在第一电极和第二电极之间的隔板,其中第一电极和第二电极被一体化,使得凸起的第一活性材料部分面对相邻的凸起 第二活性物质部分,并且凸状第一活性物质部分不进入凸状第二活性物质部分之间。

    Electrode forming apparatus
    39.
    发明授权
    Electrode forming apparatus 有权
    电极成型装置

    公开(公告)号:US08826518B2

    公开(公告)日:2014-09-09

    申请号:US13011245

    申请日:2011-01-21

    申请人: Masakazu Sanada

    发明人: Masakazu Sanada

    摘要: The invention aims at reducing unevenness at the intersections of mutually crossing electrodes with a method of and an apparatus for forming electrodes on a substrate. After forming a number of finger electrodes on a substrate, wide bus electrodes intersecting them are formed by application of an application liquid. Upon applying the application liquid which contains an electrode material and a photo-curing resin to the substrate, the application liquid is irradiated with UV light after a predetermined time and the application liquid is thus made to harden. A time difference since applying until light irradiation is set based on the result of measurement on changes of the height of the application liquid experimentally applied.

    摘要翻译: 本发明旨在通过在基板上形成电极的方法和装置来减少交叉电极交叉点的不均匀性。 在基板上形成多个指状电极之后,通过涂布液形成与其相交的宽的总线电极。 在将含有电极材料和光固化树脂的涂布液施加到基板上时,在规定时间后用UV光照射涂布液,使涂布液硬化。 基于对实验施加的涂布液的高度的变化的测量结果来设定施加到光照射之前的时间差。

    Preparation process of all-solid battery
    40.
    发明授权
    Preparation process of all-solid battery 有权
    全固态电池的制备工艺

    公开(公告)号:US08486568B2

    公开(公告)日:2013-07-16

    申请号:US13572255

    申请日:2012-08-10

    IPC分类号: H01M6/24

    摘要: Preparation process of an all-solid battery, comprising forming a linear active material part by relatively moving a first nozzle which discharges active material linearly with respect to a current collector to form a plurality of linear active material parts on the current collector, forming a first electrolyte layer by relatively moving a second nozzle which discharges first electrolyte material with respect to the current collector to apply first electrolyte material to each of the plurality of linear active material parts to form linear electrolyte parts thereon to thereby prepare linear active material-electrolyte parts, photo-curing by irradiating light to the linear electrolyte parts to cure them, and forming a second electrolyte layer by applying second electrolyte material to the whole of the linear active material-electrolyte parts and spaces on the current collector between the linear active material-electrolyte parts to prepare the second electrolyte layer.

    摘要翻译: 一种全固体电池的制备方法,包括通过相对移动第一喷嘴形成线性活性物质部分,所述第一喷嘴相对于集电器线性排放活性物质,以在集电器上形成多个线性活性物质部分,形成第一 电解质层,通过相对移动相对于集电体排出第一电解质材料的第二喷嘴,以将第一电解质材料施加到多个线性活性材料部件中的每一个上,以在其上形成线性电解质部分,从而制备线性活性材料 - 电解质部件, 通过对线性电解质部分照射光使其固化而进行光固化,并且通过将第二电解质材料施加到线状活性物质 - 电解质之间的整个线性活性物质 - 电解质部分和集电器上的空间来形成第二电解质层 部分以制备第二电解质层。