摘要:
A nozzle N which moves in a scan direction Ds along a surface Wf of a substrate W discharges an application liquid which contains a photo-curing material, and a light emitter E moving as if to follow the nozzle N irradiates light (UV light for instance) upon the application liquid. Arriving at an application end position, the nozzle N stops discharging the application liquid and retracts in a direction away from the substrate surface Wf. Meanwhile, the light emitter E keeps moving in the scan direction Ds, thereby irradiating even the terminating end of the application liquid with the light without fail.
摘要:
After a substrate is cleaned, a liquid supply nozzle moves outward from above the center of the substrate while discharging a rinse liquid with the substrate rotated. In this case, a drying region where no rinse liquid exists expands on the substrate. When the liquid supply nozzle moves to above a peripheral portion of the substrate, the rotational speed of the substrate is reduced. The movement speed of the liquid supply nozzle is maintained as it is. Thereafter, the discharge of the rinse liquid is stopped while the liquid supply nozzle moves outward from the substrate. Thus, the drying region spreads over the whole substrate so that the substrate is dried.
摘要:
A processing method of a substrate is capable of improving wettability on a surface of a resist film with respect to a developer without adverse effect on processing size of resist pattern, or without damage on the resist film. In the processing method it is also unnecessary to make separate collection of waste liquid. Before a developer is fed from a developer discharge nozzle 30 onto a resist film having been exposed that is formed on the surface of a substrate W to make processing of the resist film, a solution containing a surface-active agent is fed from a solution discharge nozzle 34 onto the resist film, and subsequently pure water is fed onto the resist film on which the solution containing a surface-active agent has been fed to make prewetting.
摘要:
A substrate (SW) is rotatably held in an approximately horizontal position by a wafer holding and rotation mechanism (810). One end of a rinsing liquid supply nozzle (840) is rotatably supported by a rinsing liquid supply nozzle rotation supporting mechanism (850) to pass over the substrate (SW). In response to rotation of the rinsing liquid supply nozzle (840), the rotation axis of the rinsing liquid supply nozzle (840) moves in a direction closer to or away from the rotation axis of the substrate (SW), whereby the amount of projection of a tip portion of the rinsing liquid supply nozzle (840) is reduced.
摘要:
A developer supply nozzle moves from a first end toward a second end of a substrate for supplying a developer to the overall main surface of the substrate. After a lapse of a required developing time, a rinse discharge nozzle moves from the first end toward the second end of the substrate for supplying a rinse to the overall main surface of the substrate. A partition plate is provided for preventing the rinse discharged from a slit discharge port of the rinse discharge nozzle onto the substrate from flowing frontward in the direction of movement of the rinse discharge nozzle or washing away the developer supplied onto the substrate frontward.
摘要:
A substrate processing apparatus includes a coating section, a developing section, a heat-treating section and a transport mechanism. The coating section has first processing units each for performing a coverage process to supply a photoresist solution to a substrate and cover a surface of the substrate with the photoresist solution, a second processing unit for spinning the substrate, after the coverage process, at high speed to make the photoresist solution into a film, dry the photoresist film, and clean the substrate. All substrates are processed with the same coating conditions to suppress differences in quality among the substrates. The first and second processing units perform the respective processes concurrently to improve the throughput of substrate processing.
摘要:
A separator-type lithium ion secondary battery having large capacity and charge-discharge performance not destroying the separator, even with an active material layer having concavo-convex structure of high aspect ratio. The battery comprises a first electrode comprising a first current collector, and a first active material layer formed by plural convex first active material parts provided on the first current collector, a second electrode comprising a second current collector, and a second active material layer formed by plural convex second active material parts provided on the second current collector, and a separator provided between the first electrode and the second electrode, wherein the first electrode and the second electrode are integrated so that the convex first active material part is faced between the adjacent convex second active material parts, and the convex first active material part does not enter between the convex second active material parts.
摘要:
A negative-electrode active material layer 12 contains Li4Ti5O12 as a negative-electrode active material, and a positive-electrode active material layer 14 contains LiCoO2 as a positive-electrode active material. A solid electrolyte layer 13 contains polyethylene oxide and polystyrene as an electrolyte material. Gradients of surfaces of stripe-shaped pattern elements 121 forming the negative-electrode active material layer 12 are smaller than 90° when viewed from a surface of the negative-electrode current collector 11. By such a construction, it is possible to construct a battery having a high capacity in relation to the used amount of the active materials and good charge and discharge characteristics.
摘要翻译:负极活性物质层12含有Li 4 Ti 5 O 12作为负极活性物质,正极活性物质层14含有作为正极活性物质的LiCoO 2。 固体电解质层13含有作为电解质材料的聚环氧乙烷和聚苯乙烯。 形成负极活性物质层12的条状图案元件121的表面的梯度从负极集电体11的表面观察时小于90°。通过这样的结构,可以构成电池 相对于活性物质的使用量具有高容量和良好的充放电特性。
摘要:
The invention aims at reducing unevenness at the intersections of mutually crossing electrodes with a method of and an apparatus for forming electrodes on a substrate. After forming a number of finger electrodes on a substrate, wide bus electrodes intersecting them are formed by application of an application liquid. Upon applying the application liquid which contains an electrode material and a photo-curing resin to the substrate, the application liquid is irradiated with UV light after a predetermined time and the application liquid is thus made to harden. A time difference since applying until light irradiation is set based on the result of measurement on changes of the height of the application liquid experimentally applied.
摘要:
Preparation process of an all-solid battery, comprising forming a linear active material part by relatively moving a first nozzle which discharges active material linearly with respect to a current collector to form a plurality of linear active material parts on the current collector, forming a first electrolyte layer by relatively moving a second nozzle which discharges first electrolyte material with respect to the current collector to apply first electrolyte material to each of the plurality of linear active material parts to form linear electrolyte parts thereon to thereby prepare linear active material-electrolyte parts, photo-curing by irradiating light to the linear electrolyte parts to cure them, and forming a second electrolyte layer by applying second electrolyte material to the whole of the linear active material-electrolyte parts and spaces on the current collector between the linear active material-electrolyte parts to prepare the second electrolyte layer.