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31.发明授权Discrete nano-textured structures in biomolecular arrays, and method of use 有权生物分子阵列中的离散纳米纹理结构及其使用方法公开(公告)号：US06962822B2
公开(公告)日：2005-11-08
申请号：US10214951
申请日：2002-08-07
CPC分类号： B01L3/5085 , B01J2219/00619 , B01J2219/00621 , B01J2219/00644 , B01L2200/12 , B01L2300/0609 , B01L2300/069 , B01L2300/0829 , B01L2300/0851 , B01L2300/165 , B01L2300/168 , C40B60/08
摘要： A biomolecular array includes a substrate across which is distributed an array of discrete regions of a porous substance. The porous substance is designed to bind chemical targets useful in biotechnology applications, such as gene expression, protein, antibody, and antigen experiments. The regions are preferably optically isolated from each other and may be shaped to enhance detection of optical radiation emanating from the porous substance, e.g., as a result of irradiation of the regions with ultraviolet light. The discrete regions may be configured as microscopic wells within the substrate, or they may reside on top of the substrate in the form of microscopic mesas.
摘要翻译： 生物分子阵列包括分布有多孔物质的离散区域的阵列的基底。 多孔物质被设计用于结合可用于生物技术应用的化学靶，例如基因表达，蛋白质，抗体和抗原实验。 这些区域优选地彼此光学隔离，并且可以被成形为增强从多孔物质发出的光辐射的检测，例如，作为由紫外线照射该区域的结果。 离散区域可以被配置为衬底内的微观阱，或者它们可以以微观台面的形式驻留在衬底的顶部上。
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32.发明授权Substituted norbornene fluoroacrylate copolymers and use thereof in lithographic photoresist compositions 有权取代的降冰片烯氟代丙烯酸酯共聚物及其在平版光刻胶组合物中的用途公开(公告)号：US06548219B2
公开(公告)日：2003-04-15
申请号：US09771262
申请日：2001-01-26
IPC分类号： G03F7039
CPC分类号： G03F7/0395 , C08F232/08 , G03F7/0382 , Y10S430/108 , Y10S430/111
摘要： Copolymers prepared by radical polymerization of a substituted norbornene monomer and a fluoromethacrylic acid, fluoromethacrylonitrile, or fluoromethacrylate comonomer are provided. The polymers are useful in lithographic phtoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译： 提供了通过取代的降冰片烯单体和氟代甲基丙烯酸，氟甲基丙烯腈或氟代甲基丙烯酸酯共聚单体的自由基聚合制备的共聚物。 聚合物可用于光刻抗蚀剂组合物，特别是化学增强抗蚀剂。 在优选的实施方案中，聚合物对深紫外（DUV）辐射基本上是透明的，即波长小于250nm的辐射，包括157nm，193nm和248nm辐射，因此可用于DUV平版光刻胶组合物。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。
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公开(公告)号：US08298751B2
公开(公告)日：2012-10-30
申请号：US12611043
申请日：2009-11-02
IPC分类号： G03F7/26
CPC分类号： H01L21/31144 , H01L21/28123 , H01L29/517
摘要： Lithographic patterning methods involve the formation of a (one or more) metal oxide capping layer, which is rinsed with an aqueous alkaline solution as part of the method. The rinse solution does not damage the capping layer, but rather allows for lithographic processing without thinning the capping layer or introducing defects into it. Ammoniated water is a preferred rinse solution, which advantageously leaves behind no nonvolatile residue.
摘要翻译： 平版印刷图案化方法涉及形成（一种或多种）金属氧化物覆盖层，其作为该方法的一部分用碱性水溶液冲洗。 冲洗溶液不会损坏盖层，而是允许光刻处理，而不会使封盖层变薄或引入缺陷。 氨水是优选的漂洗溶液，其有利地不留下非挥发性残余物。
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公开(公告)号：US07807340B2
公开(公告)日：2010-10-05
申请号：US12050589
申请日：2008-03-18
IPC分类号： G03F7/26
CPC分类号： G03F7/0392 , G03F7/001 , G03F7/031 , G03F7/2004 , Y10S430/115 , Y10S430/127
摘要： A method of creating patterned objects using a class of lithographic photoresist combinations is disclosed which is suitable for use with visible light and does not require a post-exposure bake step. The disclosed photoresists are preferably chemical amplification photoresists and contain a photosensitizer having the structure of formula (I): where Ar1 and Ar2 are independently selected from monocyclic aryl and monocyclic heteroaryl, R1 and R2 may be the same or different, and have the structure —X—R3 where X is O or S and R3 is C1-C6 hydrocarbyl or heteroatom-containing C1-C6 hydrocarbyl, and R4 and R5 are independently selected from the group consisting of hydrogen and —X—R3, or, if ortho to each other, may be taken together to form a five- or six-membered aromatic ring, with the proviso that any heteroatom contained within Ar1, Ar2, or R3 is O or S. The use of the disclosed photoresists, particularly for the manufacture of holographic diffraction gratings, is also disclosed.
摘要翻译： 公开了一种使用一类光刻胶组合物形成图形物体的方法，其适用于可见光并且不需要曝光后烘烤步骤。 所公开的光致抗蚀剂优选是化学放大光致抗蚀剂，并含有具有式（I）结构的光敏剂：其中Ar 1和Ar 2独立地选自单环芳基和单环杂芳基，R 1和R 2可以相同或不同， X-R3，其中X是O或S，R3是C1-C6烃基或含杂原子的C1-C6烃基，R4和R5独立地选自氢和-X-R3，或者如果每个 另一些可以一起形成五元或六元芳香环，条件是Ar1，Ar2或R3中含有的任何杂原子都是O或S.使用所公开的光致抗蚀剂，特别是用于制造全息 衍射光栅，也被公开。
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35.发明授权Discrete nano-textured structures in biomolecular arrays, and method of use 有权生物分子阵列中的离散纳米纹理结构及其使用方法公开(公告)号：US07354777B2
公开(公告)日：2008-04-08
申请号：US11184702
申请日：2005-07-19
IPC分类号： H01L21/00
CPC分类号： B01L3/5085 , B01J2219/00619 , B01J2219/00621 , B01J2219/00644 , B01L2200/12 , B01L2300/0609 , B01L2300/069 , B01L2300/0829 , B01L2300/0851 , B01L2300/165 , B01L2300/168 , C40B60/08
摘要： A biomolecular array includes a substrate across which is distributed an array of discrete regions of a porous substance formed from a porogen-containing organosilicate material. The porous substance is designed to bind chemical targets useful in biotechnology applications, such as gene expression, protein, antibody, and antigen experiments. The regions are preferably optically isolated from each other and may be shaped to enhance detection of optical radiation emanating from the porous substance, e.g., as a result of irradiation of the regions with ultraviolet light. The discrete regions may be configured as microscopic wells within the substrate, or they may reside on top of the substrate in the form of microscopic mesas.
摘要翻译： 生物分子阵列包括基底，其上分布有由含致孔剂的有机硅酸盐材料形成的多孔物质的离散区域的阵列。 多孔物质被设计用于结合可用于生物技术应用的化学靶，例如基因表达，蛋白质，抗体和抗原实验。 这些区域优选地彼此光学隔离，并且可以被成形为增强从多孔物质发出的光辐射的检测，例如，作为由紫外线照射该区域的结果。 离散区域可以被配置为衬底内的微观阱，或者它们可以以微观台面的形式驻留在衬底的顶部上。
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36.发明授权Method for employing vertical acid transport for lithographic imaging applications 失效用于平版印刷成像应用的垂直酸运输方法公开(公告)号：US07160665B2
公开(公告)日：2007-01-09
申请号：US10334219
申请日：2002-12-30
CPC分类号： G03F7/095 , G03F7/0382 , G03F7/0392 , G03F7/094
摘要： The present invention provides methods for forming images in positive- or negative-tone chemically amplified photoresists. The methods of the present invention rely on the vertical up-diffusion of photoacid generated by patternwise imaging of an underlayer disposed on a substrate and overcoated with a polymer containing acid labile functionality. In accordance with the present invention, the vertical up-diffusion can be the sole mechanism for imaging formation or the methods of the present invention can be used in conjunction with conventional imaging processes.
摘要翻译： 本发明提供了在正或负色调化学放大的光致抗蚀剂中形成图像的方法。 本发明的方法依赖于通过对设置在基底上的底层的图案成像产生的光酸的垂直向上扩散，并且用含有酸不稳定性功能的聚合物涂覆。 根据本发明，垂直向上扩散可以是用于成像成像的唯一机构，或者本发明的方法可以与传统的成像过程结合使用。
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公开(公告)号：US06627111B2
公开(公告)日：2003-09-30
申请号：US09798894
申请日：2001-03-06
IPC分类号： C09K1106
CPC分类号： C09K11/06 , C07D265/34 , C07D309/32 , C07D311/16 , C07D405/04 , C07D417/04 , H01L51/0061 , H01L51/0065 , H01L51/0069 , H01L51/0071 , H01L51/5012 , Y10S428/917
摘要： An organic light emitting display is provided which comprises as an emitting layer a fluorescent dye having at least one amine moiety substituted with two aryl groups. Also provided are new fluorescent compounds having N-aryl substituents which exhibit reduced pH sensitivity and enhanced stability to protonation.
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38.发明授权公开(公告)号：US06509134B2
公开(公告)日：2003-01-21
申请号：US09771149
申请日：2001-01-26
IPC分类号： G03F7039
CPC分类号： G03F7/0382 , G03F7/0046 , G03F7/0395 , G03F7/0758 , Y10S430/108 , Y10S430/111
摘要： Novel norbornene fluoroacrylate copolymers are provided. The polymers are useful in lithographic photoresist compositions, particularly chemical amplification resists. In a preferred embodiment, the polymers are substantially transparent to deep ultraviolet (DUV) radiation, i.e., radiation of a wavelength less than 250 nm, including 157 nm, 193 nm and 248 nm radiation, and are thus useful in DUV lithographic photoresist compositions. A process for using the composition to generate resist images on a substrate is also provided, i.e., in the manufacture of integrated circuits or the like.
摘要翻译： 提供了新的降冰片烯氟代丙烯酸酯共聚物。 聚合物可用于平版印刷光刻胶组合物，特别是化学增强抗蚀剂。 在优选的实施方案中，聚合物对深紫外（DUV）辐射基本上是透明的，即波长小于250nm的辐射，包括157nm，193nm和248nm辐射，因此可用于DUV平版光刻胶组合物。 还提供了使用该组合物在衬底上产生抗蚀剂图像的方法，即在集成电路等的制造中。
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