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114 条记录 (耗时 0.033 秒)

    Chemical sensor
    32.
    发明授权
    Chemical sensor 失效
    化学传感器

    公开(公告)号：US07399445B2

    公开(公告)日：2008-07-15

    申请号：US10340152

    申请日：2003-01-10

    申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    IPC分类号： C12Q1/68 ,  G01N1/02

    CPC分类号： G01N21/648 ,  G01N21/554 ,  Y10T436/11

    摘要： A sensor device is formed from a metal film having a plurality of openings, a sensor material positioned within each of the openings, a light source that emits light having a first wavelength, and a light detector that detects light emitted from the light source and transmitted through or reflected from the openings. The plurality of openings are arranged periodically in a first direction in the metal film, and both a size of each of the plurality of openings and an interval thereof in the first direction are equal to or less than the wavelength of the light.

    摘要翻译： 传感器装置由具有多个开口的金属膜形成，位于每个开口内的传感器材料，发射具有第一波长的光的光源和检测从光源发出的光并发射的光检测器 从开口穿过或反射。 多个开口在金属膜中沿第一方向周期性地布置，并且多个开口中的每一个的尺寸和第一方向上的间隔都等于或小于光的波长。

    Near-field photomask and near-field exposure apparatus including the photomask
    33.
    发明授权
    Near-field photomask and near-field exposure apparatus including the photomask 失效
    包括光掩模的近场光掩模和近场曝光装置

    公开(公告)号：US07262828B2

    公开(公告)日：2007-08-28

    申请号：US10648317

    申请日：2003-08-27

    申请人： Ryo Kuroda ,  Natsuhiko Mizutani

    发明人： Ryo Kuroda ,  Natsuhiko Mizutani

    IPC分类号： G03B27/54 ,  G03B27/64 ,  G03B27/16 ,  G03F1/08 ,  G03F7/20

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

    摘要： A near-field photomask includes a light shield film having openings to constitute a light shield portion. The photomask can be used to expose an exposure target with near-field light generated through the openings. The openings formed in the light shield film include two or more parallel rows of first slit openings each having a width smaller than 100 nm, and two or more parallel rows of second slit openings each having a width smaller than 100 nm, which extend perpendicularly to the rows of first slit openings while interlinking at least two of the rows of first slit openings. A near-field exposure apparatus includes the near-field photomask with a positioning unit and a source for illuminating polarized light parallel to the first slit openings for forming a latent-dot-image on an exposure target only where a second slit opening crosses the light shield portion on the near-field photomak.

    摘要翻译： 近场光掩模包括具有用于构成遮光部的开口的遮光膜。 光掩模可以用于通过开口产生的近场光来曝光曝光目标。 形成在遮光膜中的开口包括宽度小于100nm的两个或更多个平行的第一狭缝开口行，以及两个或更多个平行的第二狭缝开口，其宽度小于100nm，垂直于 第一狭缝开口的行，同时连接至少两排第一狭缝开口。 近场曝光装置包括具有定位单元的近场光掩模和用于照射与第一狭缝开口平行的偏振光的源，用于仅在第二狭缝开口穿过光的情况下在曝光目标上形成潜像图像 屏蔽部分在近场光掩模上。

    Near-field exposure method
    34.
    发明授权
    Near-field exposure method 失效
    近场曝光法

    公开(公告)号：US07144682B2

    公开(公告)日：2006-12-05

    申请号：US10654913

    申请日：2003-09-05

    申请人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

    发明人： Yasuhisa Inao ,  Ryo Kuroda ,  Natsuhiko Mizutani

    IPC分类号： G03F7/20

    CPC分类号： G03F7/7035 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014 ,  G03F7/70325 ,  G03F7/70566

    摘要： A method for exposing a workpiece on the basis of near-field light escaping from an exposure mask having a light blocking film with a plurality of rectangular openings. The method includes protecting non-polarized near-field exposure light from a light source through the openings of the exposure mask to perform exposure of a pattern on the workpiece. The widths of the rectangular openings are smaller than that at a cross-point between a first curve on a coordinate of widths of the openings versus a near-field light intensity for an incident-light electric-field direction perpendicular to a lengthwise direction of a small-opening pattern and a second curve on the same coordinate for an incident-light electric-field direction parallel to the lengthwise direction of the small-opening pattern.

    摘要翻译： 基于从具有多个矩形开口的具有遮光膜的曝光掩模逃逸的近场光来曝光工件的方法。 该方法包括通过曝光掩模的开口保护来自光源的非偏振近场曝光光，以进行图案在工件上的曝光。 矩形开口的宽度小于开口宽度坐标上的第一曲线与垂直于纵向方向的入射光电场方向的近场光强度之间的交叉点处的宽度 小开口图案和平行于小开口图案的长度方向的入射光电场方向的相同坐标上的第二曲线。

    Exposure method and apparatus, exposure mask, and device manufacturing method
    35.
    发明申请
    Exposure method and apparatus, exposure mask, and device manufacturing method 审中-公开
    曝光方法和装置，曝光掩模和装置制造方法

    公开(公告)号：US20060110693A1

    公开(公告)日：2006-05-25

    申请号：US10529907

    申请日：2004-06-24

    申请人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Tomohiro Yamada

    发明人： Ryo Kuroda ,  Natsuhiko Mizutani ,  Tomohiro Yamada

    IPC分类号： G03C5/00 ,  G03B27/42 ,  G03F1/00

    CPC分类号： G03F7/70325 ,  B82Y10/00 ,  G03F1/50 ,  G03F7/2014

    摘要： Disclosed is an exposure method and apparatus, an exposure mask and a device manufacturing method, wherein a first surface of a light blocking member having a plurality of openings formed in a mutually adjoining relation is placed at an exposure object side, and light is projected to the light blocking member from its second surface side so that exposure of the exposure object is carried out on the basis of near field light leaking from the openings. For exposure, interference is caused between surface plasmon polariton waves passing respectively through adjacent openings and going around to the first surface side, and, on the basis of it, a portion having a decreased light intensity is produced in the exposure object so that the exposure is carried out by use of the decreased light intensity portion.

    摘要翻译： 公开了一种曝光方法和装置，曝光掩模和装置制造方法，其中具有相互邻接关系形成的多个开口的遮光构件的第一表面被放置在曝光物体侧，并且将光投射到 遮光构件从其第二表面侧使得曝光对象的曝光是基于从开口泄漏的近场光进行的。 对于曝光，分别通过相邻的开口并绕到第一表面侧的表面等离子体激元波之间产生干涉，并且在其基础上，在曝光对象中产生具有降低的光强度的部分，使得曝光 通过使用减小的光强度部分进行。

    Probe with hollow waveguide and method for producing the same
    36.
    发明申请
    Probe with hollow waveguide and method for producing the same 失效
    中空波导探头及其制造方法

    公开(公告)号：US20060081776A1

    公开(公告)日：2006-04-20

    申请号：US11254638

    申请日：2005-10-21

    申请人： Yasuhiro Shimada ,  Ryo Kuroda

    发明人： Yasuhiro Shimada ,  Ryo Kuroda

    IPC分类号： G01N23/00 ,  G21K7/00

    CPC分类号： G01Q60/22 ,  G02B6/10 ,  G02B6/122 ,  G02B6/241

    摘要： A probe for detecting light or irradiating light comprises a cantilever supported at an end thereof by a substrate, a hollow tip formed at a free end of the cantilever, a microaperture formed at the end of the tip, and a hollow waveguide formed inside the cantilever. A method for producing a probe for light detection or light irradiation which comprises the steps of working a substrate to form a groove therein, forming a flat plate-shaped cover portion on the groove to form a hollow waveguide having an opening in a part thereof, forming a hollow tip having a microaperture on the opening, and removing a part of the substrate by etching, to form a cantilever.

    摘要翻译： 用于检测光或照射光的探针包括在其一端由基底支撑的悬臂，形成在悬臂的自由端的中空尖端，在尖端的端部形成的微孔，以及形成在悬臂内的中空波导 。 一种用于光检测或光照射的探针的制造方法，包括以下步骤：在基板上加工形成槽，在所述槽上形成平板状的盖部，形成在其一部分具有开口部的中空波导管， 在开口上形成具有微孔的中空尖端，并通过蚀刻去除衬底的一部分，以形成悬臂。

    Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe
    37.
    发明授权
    Near field light probe, near field optical microscope, near field light lithography apparatus, and near field light storage apparatus that have the near field light probe 失效
    近场光探针，近场光学显微镜，近场光刻设备以及具有近场光探针的近场光存储装置

    公开(公告)号：US06785445B2

    公开(公告)日：2004-08-31

    申请号：US10107447

    申请日：2002-03-28

    申请人： Ryo Kuroda ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    发明人： Ryo Kuroda ,  Takako Yamaguchi ,  Yasuhisa Inao ,  Tomohiro Yamada

    IPC分类号： G02B626

    CPC分类号： G01Q60/22 ,  G02B6/262

    摘要： A near field light probe is capable of emanating a near field light having a sufficient intensity while allowing reduction of aperture size to improve resolution. The near field light probe can be incorporated in a near-field optical microscope, a near field light lithography apparatus, and a near field light storage apparatus. A near field light probe has a configuration in which a light-blocking film is formed with an aperture having slits surrounding the major opening. Light emitted from a light source is coupled into the probe from one side of the light-blocking film, the light being polarized in a predetermined direction with respect to the slits so that a near field light emanates from the major opening.

    摘要翻译： 近场光探测器能够发出具有足够强度的近场光，同时允许减小光圈​​尺寸以提高分辨率。 近场光探测器可以结合在近场光学显微镜，近场光刻设备和近场光存储设备中。 近场光探测器具有其中形成有具有围绕主开口的狭缝的孔的遮光膜的构造。 从光源发射的光从遮光膜的一侧耦合到探针中，光被相对于狭缝沿预定方向极化，使得近场光从主开口发出。

    Optical probe for detecting or irradiating light and near-field optical microscope having such probe and manufacturing method of such probe
    39.
    发明授权
    Optical probe for detecting or irradiating light and near-field optical microscope having such probe and manufacturing method of such probe 失效
    用于检测或照射光的光学探针和具有这种探针的近场光学显微镜及其制造方法

    公开(公告)号：US06215114B1

    公开(公告)日：2001-04-10

    申请号：US09158494

    申请日：1998-09-23

    申请人： Takayuki Yagi ,  Tsutomu Ikeda ,  Ryo Kuroda ,  Yasuhiro Shimada

    发明人： Takayuki Yagi ,  Tsutomu Ikeda ,  Ryo Kuroda ,  Yasuhiro Shimada

    IPC分类号： H01L2100

    CPC分类号： G01Q60/22 ,  Y10S977/862

    摘要： An optical prove for detecting or irradiating evanescent light is manufactured by forming a film having a regulated film thickness on a substrate, then forming a recess from the rear surface of the substrate, and forming a through hole in the film from the side of the recess by etching. The obtained optical probe has a micro-aperture at the tip of the through hole and usually, a plurality of optical probes each having a micro-aperture of uniform profile are formed on a single substrate. In the recess, light-receiving or light-irradiating means may be provided.

    摘要翻译： 用于检测或照射ev逝光的光学证明是通过在基片上形成具有调节膜厚的膜，然后从基片的后表面形成一个凹槽，并从该凹部的一侧形成一个通孔 通过蚀刻。 获得的光学探针在通孔的尖端处具有微孔，并且通常在单个衬底上形成各自具有均匀轮廓的微孔的多个光学探针。 在凹部中，可以设置光接收或光照射装置。