摘要:
A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.
摘要:
According to an embodiment of the present invention, a manufacturing method of a display device includes forming a plurality of gate wires comprising a gate electrode on an insulating substrate, forming an electrode layer comprising a source electrode and a drain electrode spaced apart from each other to define a channel region on the gate electrode interposed therebetween, forming a first barrier wall having a first opening for exposing the channel region, a portion of the source electrode, and a portion of the drain electrode on the electrode layer where the first barrier wall has a surface, forming a shielding film to cover the channel region inside the first opening, treating the surface of the first barrier wall, removing the shielding film, and forming an organic semiconductor layer inside the first opening.
摘要:
A method of manufacturing a display device in which a film deposited on a substrate through openings in a covering layer is easily removed from the covering layer. A master layer having a predetermined pattern of openings is formed on a base substrate exposing portions of the base substrate. A light shielding material is sprayed on the master layer to penetrate inside the openings after the surface of the base substrate exposed through the opening of the master layer has been treated to increase the difference of interface tensions between the master layer and the light shielding material; fabricating a mold provided with the light shielding film by forming a moldable material layer on the base substrate and the master layer and then curing the moldable material layer and the light shielding material; arranging, pressurizing and exposing the mold on an insulation substrate having a photosensitive film formed thereon after separating the mold from the master layer; and developing the photosensitive film after separating the mold from the insulation substrate.
摘要:
A method for manufacturing a display device, comprises; providing an insulating substrate; forming a passivation layer on the insulating substrate; arranging a mold including a supporting layer, a pattern forming layer provided on a first surface of the supporting layer and having concaves-convexes formed thereon and a buffer layer formed on the other surface of the supporting layer so that the pattern forming layer faces the passivation layer; and pressurizing the mold to form a concave-convex pattern corresponding to the concaves-convexes on the passivation layer. Thus, the present invention provides a method for manufacturing a display device being capable of enhancing the reproducibility and yield of the concave-convex pattern.
摘要:
A video signal processor, a display device, and a method of driving the same, that consumes relatively low power and requires relatively small storage capacity, are provided. In one embodiment, a video signal processor comprises an interface to receive an external video signal; a signal converter including an RGBW logic to convert the video signal into an RGBW video signal, a rendering logic to render the converted RGBW video signal; a buffer to store the RGBW video signal; and a system controller to control the buffer and to output the buffered RGBW video signal.
摘要:
The present invention relates to a thin film transistor substrate comprising: an insulating substrate; a source electrode and a drain electrode which are formed on the insulating substrate and separated from each other and have a channel area therebetween; a wall exposing at least portions of the source electrode and the drain electrode, respectively, encompassing the channel area, and formed of fluoropolymer; and an organic semiconductor layer formed inside the wall. Thus, the present invention provides a TFT substrate where an organic semiconductor layer is planarized. Further, the present invention also provides a method of making a TFT substrate of which an organic semiconductor layer is planarized.
摘要:
A thin film transistor substrate includes an insulating substrate, a gate electrode formed on the insulating substrate, a first gate insulating film formed on the gate electrode and having an opening for exposing at least part of the gate electrode, a second gate insulating film covering the gate electrode exposed by the opening and having a larger dielectric constant than the first gate insulating film, a source electrode and a drain electrode disposed apart from each other in a central area of the second gate insulating film and defining a channel region there between, and an organic semiconductor layer formed in the channel region. A method for forming the TFT substrate is also provided. Thus, the present invention provides a TFT substrate in which a characteristic of a TFT is improved.
摘要:
A method for fabricating a flat panel display, comprising preparing an insulating substrate; forming separated source and drain electrodes on the insulating substrate to define a channel region; forming a first passivation layer on the source and drain electrodes; forming a metal layer having an opening corresponding to the channel region on the first passivation layer; forming a deposition opening in the passivation layer by using the metal layer as a mask to expose the channel region; forming an organic semiconductor layer and a second passivation layer, in turn, in the deposition opening and on the metal layer; and removing the metal layer, the organic semiconductor layer and the second passivation layer while allowing the layers formed in the deposition opening to remain.
摘要:
An aluminum gate for a thin film transistor is fabricating by implanting ions into the exposed surface of the aluminum gate. The ions are preferably selected from the group consisting of nitrogen, carbon, oxygen and boron ions. A composite layer of aluminum and the implanted ions thereby formed at the exposed surface of the aluminum layer. Gates for thin film transistors, including an aluminum layer and a composite layer of aluminum and another element at the surface thereof can suppress hillocks in the aluminum gate which may be caused by compressive stresses during subsequent fabrication steps. The composite layer can have a low resistance and can allow a direct contact with an indium tin oxide conductive layer.