摘要:
Methods and apparatuses for nanoenabled memory devices and anisotropic charge carrying arrays are described. In an aspect, a memory device includes a substrate, a source region of the substrate, and a drain region of the substrate. A population of nanoelements is deposited on the substrate above a channel region, the population of nanolements in one embodiment including metal quantum dots. A tunnel dielectric layer is formed on the substrate overlying the channel region, and a metal migration barrier layer is deposited over the dielectric layer. A gate contact is formed over the thin film of nanoelements. The nanoelements allow for reduced lateral charge transfer. The memory device may be a single or multistate memory device. In a multistate memory device which comprises one or more quantum dots or molecules having a plurality of discrete energy levels, a method is disclosed for charging and/or discharging the device which comprises filling each of the plurality of discrete energy levels of each dot or molecule with one or more electrons, and subsequently removing individual electrons at a time from each discrete energy level of the one or more dots or molecules.
摘要:
Methods and apparatuses for nanoenabled memory devices and anisotropic charge carrying arrays are described. In an aspect, a memory device includes a substrate, a source region of the substrate, and a drain region of the substrate. A thin film of nanoelements is formed on the substrate above a channel region. A gate contact is formed on the thin film of nanoelements. The nanoelements allow for reduced lateral charge transfer. The memory device may be a single or multistate memory device. In a multistate memory device, nanoelements are present having a plurality of charge injection voltages, to provide multiple states. In another aspect, a printing device includes a charge diffusion layer that includes a matrix containing a plurality of nanoelements configured to be anisotropically electrically conductive through the charge diffusion layer to transfer charge to areas of the first surface with reduced lateral charge spread.
摘要:
Methods and apparatuses for nanoenabled memory devices and anisotropic charge carrying arrays are described. In an aspect, a memory device includes a substrate, a source region of the substrate, and a drain region of the substrate. A population of nanoelements is deposited on the substrate above a channel region, the population of nanolements in one embodiment including metal quantum dots. A tunnel dielectric layer is formed on the substrate overlying the channel region, and a metal migration barrier layer is deposited over the dielectric layer. A gate contact is formed over the thin film of nanoelements. The nanoelements allow for reduced lateral charge transfer. The memory device may be a single or multistate memory device. In a multistate memory device which comprises one or more quantum dots or molecules having a plurality of discrete energy levels, a method is disclosed for charging and/or discharging the device which comprises filling each of the plurality of discrete energy levels of each dot or molecule with one or more electrons, and subsequently removing individual electrons at a time from each discrete energy level of the one or more dots or molecules.
摘要:
A nanowire capacitor and methods of making the same are disclosed. The nanowire capacitor includes a subrate and a semiconductor nanowire that is supported by the substrate. An insulator is formed on a portion of the surface of the nanowire. Additionally, an outer coaxial conductor is formed on a portion insulator and a contact coupled to the nanowire.
摘要:
A nanowire varactor diode and methods of making the same are disclosed. The structure comprises a coaxial capacitor running the length of the semiconductor nanowire. In one embodiment, a semiconductor nanowire of a first conductivity type is deposited on a substrate. An insulator is formed on at least a portion of the nanowire's surface. A region of the nanowire is doped with a second conductivity type material. A first electrical contact is formed on at least part of the insulator and the doped region. A second electrical contact is formed on a non-doped potion of the nanowire. During operation, the conductivity type at the surface of the nanowire inverts and a depletion region is formed upon application of a voltage to the first and second electrical contacts. The varactor diode thereby exhibits variable capacitance as a function of the applied voltage.
摘要:
A common deflection signal is provided, simultaneously, to individual yokes in an electron beam (e-beam) deflection apparatus of an electron beam projection lithography system. A single digital-to-analog converter (DAC) generates the common deflection signal. The common deflection signal is provided to individual programmable attenuators to adjust the signal for each individual yoke. The adjusted individual signal is amplified and passed to one of the individual yokes. The yokes are controlled to provide a curvilinear variable axis lens (CVAL) deflection that is adjusted to attenuate most of the noise from the common deflection signal that would have been present in a typical CVAL e-beam system.
摘要:
A nanowire capacitor and methods of making the same are disclosed. The nanowire capacitor includes a substrate and a semiconductor nanowire that is supported by the substrate. An insulator is formed on a portion of the surface of the nanowire. Additionally, an outer coaxial conductor is formed on a portion of the insulator and a contact coupled to the nanowire.
摘要:
Embodiments of the present invention are provided for improved contact doping and annealing systems and processes. In embodiments, a plasma ion immersion implantation (PIII) process is used for contact doping of nanowires and other nanoelement based thin film devices. According to further embodiments of the present invention, pulsed laser annealing using laser energy at relatively low laser fluences below about 100 mJ/cm2 (e.g., less than about 50 mJ/cm2, e.g., between about 2 and 18 mJ/cm2) is used to anneal nanowire and other nanoelement-based devices on substrates, such as low temperature flexible substrates, e.g., plastic substrates.
摘要翻译:提供本发明的实施例用于改进的接触掺杂和退火系统和工艺。 在实施例中,等离子体离子浸没注入(PIII)工艺用于纳米线和其它基于纳米元件的薄膜器件的接触掺杂。 根据本发明的另外的实施例,使用在低于约100mJ / cm 2(例如小于约50mJ / cm 2)的较低激光能量密度的激光能量进行脉冲激光退火, SUP>,例如约2和18mJ / cm 2之间)用于退火衬底上的纳米线和其它基于纳米元件的器件,例如低温柔性衬底,例如塑料衬底。
摘要:
A nanowire varactor diode and methods of making the same are disclosed. The structure comprises a coaxial capacitor running the length of the semiconductor nanowire. In one embodiment, a semiconductor nanowire of a first conductivity type is deposited on a substrate. An insulator is formed on at least a portion of the nanowire's surface. A region of the nanowire is doped with a second conductivity type material. A first electrical contact is formed on at least part of the insulator and the doped region. A second electrical contact is formed on a non-doped potion of the nanowire. During operation, the conductivity type at the surface of the nanowire inverts and a depletion region is formed upon application of a voltage to the first and second electrical contacts. The varactor diode thereby exhibits variable capacitance as a function of the applied voltage.
摘要:
An interferometer measuring system comprising two moveable members and a reference member that may have significantly less movement, the group having a number of attached measurement mirrors, interferometers for measuring position and two optical support blocks for the interferometers. The interferometers are used to determine the measured optical path lengths to each of the moveable members and reference member and these positions are used to calculate the misalignment, or error in the relative positions of the moveable members with respect to the reference member. This calculated error is then used to correct the misalignment by moving the appropriate members in the manner directed by the calculation.