公开(公告)号：US20080143019A1

公开(公告)日：2008-06-19

申请号：US11932924

申请日：2007-10-31

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： G03F7/00 ,  B29C59/02

CPC分类号： B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: RELEASE-M(X)n−1- RELEASE-M(X)n−m−1 Qm, Or RELEASE-M(OR)n−1-, whereinRELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties;M is a metal atom, semiconductor atom, or semimetal atom;X is a halogen or cyano, especially Cl, F, or Br;Q is hydrogen or alkyl group;M is the number Q representsR is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; andN is the valence −1 of M,and n−m−1 is at least 1provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patters in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent process, reproduced in the substrate or in another material which is added onto the substrate.

公开(公告)号：US20080122138A1

公开(公告)日：2008-05-29

申请号：US11945407

申请日：2007-11-27

申请人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

发明人： Wei Zhang ,  Hua Tan ,  Lin Hu ,  Stephen Y. Chou

IPC分类号： B29C59/02 ,  B41F1/18

CPC分类号： B29C59/022 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10S977/887

摘要： In accordance with the invention, step-and-repeat imprint lithography is effected by applying balanced pressing forces from both sides of a substrate. The pressing forces are substantially equal in amplitude and opposite in direction. With the pressing forces thus balanced, the fixture that steps and holds the substrate does not bear the load of imprinting. The balance allows use of a high resolution aligning stage to carry the substrate and to maintain high accuracy of positioning without being shifted by change of load. With this method, sufficient imprint pressure can be used to obtain high quality patterning, a thin and uniform residual layer, and a high fidelity pattern.

摘要翻译： 根据本发明，通过从衬底的两侧施加平衡的压力来实现步进重复压印光刻。 按压力在幅度上基本相等并且在方向上相反。 由于如此平衡的按压力，步进并保持基板的夹具不承受压印的载荷。 平衡允许使用高分辨率对准台承载基板并且保持高精度的定位而不会因负载变化而偏移。 通过这种方法，可以使用足够的压印压力来获得高质量图案，薄而均匀的残留层和高保真图案。

公开(公告)号：US07282456B2

公开(公告)日：2007-10-16

申请号：US11442900

申请日：2006-05-29

申请人： Stephen Y. Chou ,  Qiangfei Xia

发明人： Stephen Y. Chou ,  Qiangfei Xia

IPC分类号： H01L21/477

CPC分类号： B81C1/00111 ,  B81C1/00634 ,  B81C2201/0149 ,  B82Y30/00 ,  H01L21/76892 ,  H01L21/76894 ,  Y10S977/888 ,  Y10S977/90

摘要： In accordance with the invention, the structure of a patterned nanoscale or near nanoscale device (“nanostructure”) is repaired and/or enhanced by liquifying the patterned device in the presence of appropriate guiding conditions for a period of time and then permitting the device to solidify. Advantageous guiding conditions include adjacent spaced apart or contacting surfaces to control surface structure and preserve vertically. Unconstrained boundaries to permit smoothing of edge roughness. In an advantageous embodiment, a flat planar surface is disposed overlying a patterned nanostructure surface and the surface is liquified by a high intensity light source to repair or enhance the nanoscale features.

公开(公告)号：US06999156B2

公开(公告)日：2006-02-14

申请号：US10674608

申请日：2003-09-30

申请人： Stephen Y. Chou ,  Allan S. P. Chang ,  Hua Tan ,  Jim Jiam Wong ,  Wei Wu ,  Rich Zhaoning Yu

发明人： Stephen Y. Chou ,  Allan S. P. Chang ,  Hua Tan ,  Jim Jiam Wong ,  Wei Wu ,  Rich Zhaoning Yu

IPC分类号： G02F1/13

CPC分类号： G02F1/133553 ,  G02F1/1326 ,  G02F1/1393 ,  G02F2201/307 ,  G02F2203/055

摘要： In accordance with the invention, a tunable subwavelength resonant grating filter comprises a liquid crystal cell having a pair of major surface walls. One wall of the cell is a coated subwavelength grating of a SRGF. The coating comprises a polymer layer to fill the grating trenches and a surfactant layer to facilitate uniform alignment of the liquid crystal material. The refractive index of the LCD material in the cell can then be electrically or thermally adjusted to tune the resonant wavelength.

摘要翻译： 根据本发明，可调谐亚波长谐振光栅滤波器包括具有一对主表面壁的液晶单元。 电池的一个壁是SRGF的涂覆的亚波长光栅。 涂层包括填充光栅沟槽的聚合物层和表面活性剂层以促进液晶材料的均匀取向。 然后可以对电池中的LCD材料的折射率进行电或热调节以调谐谐振波长。

公开(公告)号：US06809356B2

公开(公告)日：2004-10-26

申请号：US10301476

申请日：2002-11-21

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： H01L27148

CPC分类号： B29C33/60 ,  B29C43/021 ,  B29C43/222 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/023 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7053 ,  G11B5/855 ,  Y10S977/887

摘要： A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in2 topographical bit density nano-CD with nearly three orders of magnitude higher than commercial CDS has been fabricated using nanoimprint lithography. The reading and wearing of such Nano-CDS have been studied using scanning proximal probe methods. Using a tapping mode, a Nano-CD was read 1000 times without any detectable degradation of the disk or the silicon probe tip. In accelerated wear tests with a contact mode, the damage threshold was found to be 19 &mgr;N. This indicates that in a tapping mode, both the Nano-CD and silicon probe tip should have a lifetime that is at least four orders of magnitude longer than that at the damage threshold.

摘要翻译： 提供了一种用于高密度纳米结构的方法和装置。 该方法和装置包括纳米紧凑型光盘，例如纳米光盘（Nano-CDS）。 在一个实施例中，已经使用纳米压印光刻制造了比商业CDS高近三个数量级的400Gbit / in 2的地形比特密度纳米CD。 使用扫描近端探针方法研究了这种纳米CDS的阅读和佩戴。 使用敲击模式，Nano-CD读取1000次，没有任何可检测到的光盘劣化或硅探针尖端。 在接触模式的加速磨损试验中，发现损伤阈值为19μN。 这表明在攻丝模式下，纳米CD和硅探针尖端都应该具有比破坏阈值长至少四个数量级的寿命。

公开(公告)号：US06713238B1

公开(公告)日：2004-03-30

申请号：US09807266

申请日：2001-06-11

申请人： Stephen Y. Chou ,  Lei Zhuang

发明人： Stephen Y. Chou ,  Lei Zhuang

IPC分类号： G03F700

CPC分类号： B82Y10/00 ,  B82Y30/00 ,  B82Y40/00 ,  G03F7/0002 ,  Y10T156/1002 ,  Y10T428/1157 ,  Y10T428/268

摘要： The formation of self-assembled patterns in a substrate through deformation induce by a mask placed above the substrate are disclosed. Methods of the present invention may be used to form arrays of nanometer sized pillars as well as mesas from a thin deformable layer of the substrate or a thin film of material deposited on the substrate.

摘要翻译： 公开了通过由放置在衬底上方的掩模引起的变形而在衬底中形成自组装图案。 本发明的方法可以用于形成纳米尺寸的柱的阵列以及来自基底的薄的可变形层的台面或沉积在基底上的材料的薄膜。

公开(公告)号：US06518189B1

公开(公告)日：2003-02-11

申请号：US09430602

申请日：1999-10-29

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： H01L21302

CPC分类号： B29C33/60 ,  B29C43/021 ,  B29C43/222 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/023 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F9/7053 ,  G11B5/855 ,  Y10S977/887

摘要： A method and apparatus for high density nanostructures is provided. The method and apparatus include Nano-compact optical disks, such as nano-compact disks (Nano-CDS). In one embodiment a 400 Gbit/in2 topographical bit density nano-CD with nearly three orders of magnitude higher than commercial CDS has been fabricated using nanoimprint lithography. The reading and wearing of such Nano-CDS have been studied using scanning proximal probe methods. Using a tapping mode, a Nano-CD was read 1000 times without any detectable degradation of the disk or the silicon probe tip. In accelerated wear tests with a contact mode, the damage threshold was found to be 19 &mgr;N. This indicates that in a tapping mode, both the Nano-CD and silicon probe tip should have a lifetime that is at least four orders of magnitude longer than that at the damage threshold.

摘要翻译： 提供了一种用于高密度纳米结构的方法和装置。 该方法和装置包括纳米紧凑型光盘，例如纳米光盘（Nano-CDS）。 在一个实施例中，使用纳米压印光刻技术制造了比商业CDS高近三个数量级的400Gbit / in2地形比特密度纳米CD。 使用扫描近端探针方法研究了这种纳米CDS的阅读和佩戴。 使用敲击模式，Nano-CD读取1000次，没有任何可检测到的光盘劣化或硅探针尖端。 在接触模式的加速磨损试验中，发现损伤阈值为19μN。 这表明在攻丝模式下，纳米CD和硅探针尖端都应该具有比破坏阈值长至少四个数量级的寿命。

公开(公告)号：US06309580B1

公开(公告)日：2001-10-30

申请号：US09107006

申请日：1998-06-30

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： H01L1304

CPC分类号： B29C33/60 ,  B29C33/62 ,  B29C43/003 ,  B29C43/021 ,  B29C43/222 ,  B29C43/52 ,  B29C59/022 ,  B29C59/026 ,  B29C2043/023 ,  B29C2043/025 ,  B29C2043/3211 ,  B29C2043/568 ,  B29C2059/023 ,  G03F7/0002 ,  G03F9/7053 ,  Y10S977/887

摘要： The addition of thin coatings (less than and approaching monomolecular coatings) of persistent release materials comprising preferred compounds of the formula: RELEASE-M(X)n−1— RELEASE-M(X)n−m−1 Qm, or RELEASE-M(OR)n−1—, wherein RELEASE is a molecular chain of from 4 to 20 atoms in length, preferably from 6 to 16 atoms in length, which molecule has either polar or non-polar properties; M is a metal atom, semiconductor atom, or semimetal atom; X is halogen or cyano, especially Cl, F, or Br; Q is hydrogen or alkyl group; m is the number of Q groups; R is hydrogen, alkyl or phenyl, preferably hydrogen or alkyl of 1 to 4 carbon atoms; and; n is the valence −1 of M, and n−m−1 is at least 1 provides good release properties. The coated substrates are particularly good for a lithographic method and apparatus for creating ultra-fine (sub-25 nm) patterns in a thin film coated on a substrate is provided, in which a mold having at least one protruding feature is pressed into a thin film carried on a substrate. The protruding feature in the mold creates a recess of the thin film. The mold is removed from the film. The thin film then is processed such that the thin film in the recess is removed exposing the underlying substrate. Thus, the patterns in the mold is replaced in the thin film, completing the lithography. The patterns in the thin film will be, in subsequent processes, reproduced in the substrate or in another material which is added onto the substrate.

摘要翻译： 持续释放材料的薄涂层（小于和接近单分子涂层）的添加包括优选的下式化合物：或RELEASE是长度为4至20个原子，优选6至16个原子长度的分子链，该分子具有 极性或非极性; M是金属原子，半导体原子或半金属原子; X是卤素或氰基，特别是Cl，F或Br; Q是氢或烷基; m是Q基团的数目; R是氢，烷基或苯基，优选氢或1至4个碳原子的烷基; 和n是M的化合价-1，n-m-1至少为1提供了良好的脱模性能。 涂布的基材特别适用于光刻方法，并且提供了在涂布在基材上的薄膜中产生超细（次25nm）图案的设备，其中具有至少一个突出特征的模具被压入薄 薄膜承载在基板上。 模具中的突出特征产生薄膜的凹部。 模具从薄膜中取出。 然后对薄膜进行处理，使得去除暴露下面的基底的凹槽中的薄膜。 因此，在薄膜中更换模具中的图案，完成光刻。 在随后的工艺中，薄膜中的图案将在衬底中或在添加到衬底上的另一种材料中再现。

公开(公告)号：US4638669A

公开(公告)日：1987-01-27

申请号：US731715

申请日：1985-05-07

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： G01P15/08

CPC分类号： G01P15/0894

摘要： A highly sensitive accelerometer is disclosed in which the current is measured across a pair of electrodes resulting from voltage pulses from a pulse generator. The electrodes are located within a vacuum chamber. One of the electrodes is cantilevered and has its free end suspended over the other fixed electrode. The amount of current through the vacuum gap between the electrodes is determinative of acceleration since the current is an exponential function of the distance between the electrodes and the distance between the electrodes changes linearly with acceleration.

摘要翻译： 公开了一种高灵敏度的加速度计，其中由脉冲发生器的电压脉冲产生的一对电极上测量电流。 电极位于真空室内。 其中一个电极是悬臂的，其自由端悬挂在另一个固定电极上。 通过电极之间的真空间隙的电流量是加速度的决定因素，因为电流是电极之间的距离的指数函数，并且电极之间的距离随加速度而线性变化。

公开(公告)号：US08728380B2

公开(公告)日：2014-05-20

申请号：US11932924

申请日：2007-10-31

申请人： Stephen Y. Chou

发明人： Stephen Y. Chou

IPC分类号： B29C59/02

CPC分类号： B29C59/022 ,  B29C59/026 ,  B29C2035/0827 ,  B29C2059/023 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： A lithographic method for forming a pattern within a surface on a substrate includes providing a substrate with a degradable material, molding the material to imprint a pattern thereon, depositing a layer of a second material over the imprinted pattern, removing portions of the layer of the second material to expose portions of the imprinted pattern of degradable material and removing portions of the exposed degradable material to leave an open pattern in the layer of second material.

摘要翻译： 用于在衬底表面内形成图案的光刻方法包括：提供具有可降解材料的衬底，模制该材料以在其上印刷图案，在该压印图案上沉积一层第二材料， 第二材料暴露可压缩材料的压印图案的部分并去除暴露的可降解材料的部分以在第二材料层中留下开放图案。