公开(公告)号：US20190204150A1

公开(公告)日：2019-07-04

申请号：US16303209

申请日：2017-05-01

申请人： HAMAMATSU PHOTONICS K.K.

发明人： Takashi KASAHARA ,  Katsumi SHIBAYAMA ,  Masaki HIROSE ,  Toshimitsu KAWAI ,  Hiroki OYAMA ,  Yumi KURAMOTO

IPC分类号： G01J3/26 ,  G02B26/00 ,  G02B5/28 ,  G01J3/02 ,  B23K26/06 ,  B23K26/53

CPC分类号： G02B26/001 ,  B23K26/0006 ,  B23K26/064 ,  B23K26/0643 ,  B23K26/53 ,  B23K2101/40 ,  B23K2103/56 ,  B81B3/0072 ,  B81C1/00539 ,  B81C1/00634 ,  G01J3/0243 ,  G01J3/26 ,  G02B5/284

摘要： The Fabry-Perot interference filter includes: a substrate having a first surface, a first laminate having a first mirror portion disposed on the first surface, a second laminate having a second mirror portion facing the first mirror portion with an air gap interposed therebetween, and an intermediate layer defining the air gap between the first and second laminate. The substrate has an outer edge portion positioned outside an outer edge of the intermediate layer when viewed from a direction perpendicular to the first surface. The second laminate further includes a covering portion covering the intermediate layer and a peripheral edge portion positioned on the first surface in the outer edge portion. The second mirror portion, the covering portion, and the peripheral edge portion are integrally formed so as to be continuous with each other. The peripheral edge portion is thinned along an outer edge of the outer edge portion.

公开(公告)号：US09881792B2

公开(公告)日：2018-01-30

申请号：US15447734

申请日：2017-03-02

申请人： Purdue Research Foundation

发明人： Gary J. Cheng

IPC分类号： B82Y30/00 ,  H01L21/02 ,  H01L21/268 ,  B82B3/00

CPC分类号： H01L21/02664 ,  B81C1/00634 ,  B82B3/008 ,  H01L21/0243 ,  H01L21/02527 ,  H01L21/02532 ,  H01L21/02568 ,  H01L21/02603 ,  H01L21/02653 ,  H01L21/268

摘要： Processes for shaping one- and two-dimensional nanomaterials, and thereby inducing local strains therein preferably to control one or more of their material properties. The processes include providing a substrate comprising a three-dimensional surface feature thereon, locating a nanomaterial on the substrate and over the surface feature, and directing a laser beam toward the nanomaterial such that the nanomaterial experiences laser shock pressure sufficient to deform the nanomaterial to conform at least partially to the shape of the surface feature and adhere to the surface feature either directly or via an intermediate layer therebetween.

公开(公告)号：US09511990B2

公开(公告)日：2016-12-06

申请号：US13983682

申请日：2012-01-05

申请人： Pierre Cusin ,  David Richard ,  Philippe Dubois

发明人： Pierre Cusin ,  David Richard ,  Philippe Dubois

IPC分类号： B22C7/00 ,  B22D19/00 ,  B81B1/00 ,  B81C99/00 ,  B81C1/00

CPC分类号： B81B1/006 ,  B81B2201/035 ,  B81C1/00634 ,  B81C99/0085 ,  Y10T74/19949

摘要： A method of fabricating a micromechanical part in a single-piece made of a synthetic carbon-allotrope includes forming a substrate which includes the negative cavity for the micromechanical part to be fabricated, coating the negative cavity of the substrate with a layer of the synthetic carbon allotrope in a thickness of between 0.2 μm and 20 μm, the thickness being less than the depth of the negative cavity, removing from the substrate a larger thickness than the thickness of the deposited layer, so as to leave a limited thickness of the layer of material in the negative cavity, and removing the substrate so as to release the single-piece micromechanical part formed in the negative cavity comprising an external surface of comparable roughness to that of the substrate.

摘要翻译： 制造由合成碳 - 同素异形体制成的单件中的微机械部件的方法包括形成衬底，其包括用于要制造的微机械部件的负空腔，用合成碳层涂覆衬底的负空腔 同素异形体的厚度在0.2μm和20μm之间，其厚度小于负空腔的深度，从衬底移除比沉积层的厚度更大的厚度，以便留下有限厚度的层 在空腔中的材料，并且去除衬底以便释放形成在负空腔中的单件微机械部件，其包括与衬底相当的粗糙度的外表面。

公开(公告)号：US20150338644A1

公开(公告)日：2015-11-26

申请号：US14697211

申请日：2015-04-27

申请人： STANLEY ELECTRIC CO., LTD.

发明人： Yoshiaki YASUDA

IPC分类号： G02B26/08 ,  G02B7/182 ,  B81C1/00

CPC分类号： G02B26/0858 ,  B81C1/00357 ,  B81C1/00634 ,  G02B7/182 ,  G02B26/101

摘要： A two-dimensional optical deflector includes a first SOI structure and a second SOI structure. A height of a monocrystalline silicon support layer of the first SOI structure is smaller than a height of a monocrystalline silicon support layer of the second SOI structure. A mirror includes a monocrystalline silicon active layer of the first SOI structure. An inner frame, an inner piezoelectric actuator and an outer frame include a monocrystalline silicon active layer of the first SOI structure and the monocrystalline silicon active layer of the second SOI structure. An outer piezoelectric actuator includes the monocrystalline silicon active layer of the first SOI structure.

摘要翻译： 二维光偏转器包括第一SOI结构和第二SOI结构。 第一SOI结构的单晶硅支撑层的高度小于第二SOI结构的单晶硅支撑层的高度。 镜子包括第一SOI结构的单晶硅有源层。 内框架，内压电致动器和外框架包括第一SOI结构的单晶硅有源层和第二SOI结构的单晶硅有源层。 外部压电致动器包括第一SOI结构的单晶硅有源层。

公开(公告)号：US09073258B2

公开(公告)日：2015-07-07

申请号：US13779263

申请日：2013-02-27

申请人： THE AEROSPACE CORPORATION

发明人： Henry Helvajian ,  William W. Hansen ,  Lee F. Steffeney

IPC分类号： H04R31/00 ,  B29C67/00 ,  B01J19/00 ,  B41J2/00 ,  B81C1/00 ,  C03C23/00 ,  G03F7/00 ,  B01L3/00

CPC分类号： B29C67/0048 ,  B01J19/00 ,  B01L3/502707 ,  B41J2/00 ,  B81B2203/0338 ,  B81C1/00 ,  B81C1/00634 ,  C03C23/00 ,  G03F7/00 ,  Y10T29/42

摘要： A photostructurable ceramic is processed using photostructuring process steps for embedding devices within a photostructurable ceramic volume, the devices may include one or more of chemical, mechanical, electronic, electromagnetic, optical, and acoustic devices, all made in part by creating device material within the ceramic or by disposing a device material through surface ports of the ceramic volume, with the devices being interconnected using internal connections and surface interfaces.

摘要翻译： 使用用于将器件嵌入可光可陶瓷陶瓷体积内的光学结构化工艺步骤来处理可光电陶瓷，该器件可以包括化学，机械，电子，电磁，光学和声学设备中的一种或多种，​​所有这些都部分地通过在 陶瓷或通过陶瓷体的表面端口设置器件材料，使用内部连接和表面接口互连这些器件。

公开(公告)号：US08758590B2

公开(公告)日：2014-06-24

申请号：US12295321

申请日：2007-04-20

申请人： Hans-Joachim Quenzer ,  Gerfried Zwicker

发明人： Hans-Joachim Quenzer ,  Gerfried Zwicker

IPC分类号： C25D17/00 ,  C25D5/02 ,  B23H3/00

CPC分类号： B23H3/00 ,  B81C1/00634 ,  B81C2201/0146 ,  C25F3/14

摘要： Disclosed is a method of treating the surface of an electrically conducting substrate surface wherein a tool comprising an ion-conducting solid material is brought into contact at least in some areas with the substrate surface. The tool conducts the metal ions of the substrate and an electric potential is applied so that an electrical potential gradient is applied between the substrate surface and the tool in such a manner that metal ions are drawn from the substrate surface or deposited onto the substrate surface by means of the tool.

摘要翻译： 公开了一种处理导电衬底表面的方法，其中包括离子导电固体材料的工具至少在一些区域与衬底表面接触。 该工具传导衬底的金属离子并且施加电位，使得电位梯度以这样的方式施加在衬底表面和工具之间，使得金属离子从衬底表面被拉出或沉积到衬底表面上 手段的工具。

公开(公告)号：US20140033848A1

公开(公告)日：2014-02-06

申请号：US13983682

申请日：2012-01-05

申请人： Pierre Cusin ,  David Richard ,  Philippe Dubois

发明人： Pierre Cusin ,  David Richard ,  Philippe Dubois

IPC分类号： B81B1/00 ,  B81C1/00

CPC分类号： B81B1/006 ,  B81B2201/035 ,  B81C1/00634 ,  B81C99/0085 ,  Y10T74/19949

摘要： The invention relates to a micromechanical part (11, 21, 31, 41, 51, 61) made of a single-piece material. According to the invention, the part has an elementary section formed of at least two secant and non-aligned segments so that one of the at least two segments forms the height (e3) of the micromechanical part (11, 21, 31, 41, 51, 61), the height being greater than the thickness (e1) of each segment.The invention also concerns the method of fabricating the part.

摘要翻译： 本发明涉及由单片材料制成的微机械部件（11,21,31,41,51,61）。 根据本发明，该部件具有由至少两个正割线段和非对准部分形成的基本部分，使得至少两个部分中的一个部分形成微机械部件（11,21,31,41,44）的高度（e3） 51,61），高度大于每个段的厚度（e1）。 本发明还涉及制造该部件的方法。

公开(公告)号：US20130323840A1

公开(公告)日：2013-12-05

申请号：US13996961

申请日：2011-12-19

申请人： Sang Hoon Lee ,  Edward Kang

发明人： Sang Hoon Lee ,  Edward Kang

IPC分类号： B81B1/00 ,  C12N5/079 ,  B81C1/00

CPC分类号： B81B1/002 ,  B01L3/502707 ,  B01L3/502746 ,  B01L2300/0816 ,  B01L2300/0858 ,  B01L2300/0887 ,  B01L2400/086 ,  B81B2201/058 ,  B81B2203/0338 ,  B81C1/00103 ,  B81C1/00634 ,  B81C99/0085 ,  B81C2201/019 ,  B81C2201/034 ,  C12N5/0618 ,  C12N2535/00 ,  Y10T428/13

摘要： The present disclosure relates to a cylinder channel having a sawtooth-shaped cross section, a method for manufacturing same, a coaxial channel including same and a method for manufacturing a microfiber or a microparticle having a sawtooth-shaped cross section using same.

摘要翻译： 本发明涉及具有锯齿形横截面的气缸通道，其制造方法，包括其的同轴通道，以及使用其具有锯齿状截面的微细纤维或微粒的制造方法。

公开(公告)号：US08557689B2

公开(公告)日：2013-10-15

申请号：US12952124

申请日：2010-11-22

申请人： David K Fork ,  Thomas S. Zimmermann

发明人： David K Fork ,  Thomas S. Zimmermann

IPC分类号： H01L21/00 ,  B29C47/88

CPC分类号： B81C1/00634 ,  B29C47/0019 ,  B29C47/0023 ,  B29C47/003 ,  B29C47/0052 ,  B29C47/062 ,  B29C47/065 ,  B29C47/884 ,  B29C49/061 ,  B81B2203/0376 ,  B81C99/0015

摘要： An extrusion head is disposed over a substrate, and material is extruded through an oblique (e.g., semi-circular or tapered) outlet orifice of the extrusion head to form an associated extruded structure having an equilibrium shape that resists settling after being deposited on the substrate. The extrusion head includes fluidic channels having a flat surface formed by a flat first (e.g., metal) sheet, and an oblique (e.g., substantially semi-cylindrical) surface formed by elongated oblique trenches that are etched or otherwise formed in a second sheet. The fluidic channel communicates with the outlet orifice, which has a flat edge formed by the first sheet, and an oblique edge formed by an end of the oblique trench. The material is extruded through the outlet orifice such that its flat lower surface contacts the substrate, and its oblique upper surface faces away from the substrate. Two materials are co-extruded to form high aspect-ratio gridlines.

摘要翻译： 挤出头设置在基材上方，并且材料通过挤出头的倾斜（例如，半圆形或锥形）出口孔挤出以形成相关联的挤出结构，其具有在沉积在基底上之后抵抗沉降的平衡形状 。 挤出头包括具有由平坦的第一（例如金属）片材形成的平坦表面的流体通道和由蚀刻或以其它方式形成在第二片材中的细长的倾斜沟槽形成的倾斜（例如，基本上为半圆柱形的）表面。 流体通道与具有由第一片形成的平坦边缘的出口孔和由倾斜沟槽的端部形成的倾斜边缘连通。 该材料通过出口孔挤出，使得其平坦的下表面接触基底，并且其斜上表面背离基底。 两种材料共挤出形成高纵横比网格线。

公开(公告)号：US20110189446A1

公开(公告)日：2011-08-04

申请号：US13003484

申请日：2009-07-03

申请人： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

发明人： Graham L. W. Cross ,  Warren McKenzie ,  John B. Pethica

IPC分类号： B32B3/00 ,  C23F1/00 ,  C23F1/08 ,  B82Y30/00 ,  B82Y40/00 ,  B82Y5/00

CPC分类号： G03F7/11 ,  B81C1/00634 ,  B81C2201/0143 ,  B81C2201/0159 ,  B81C2201/036 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0337

摘要： The invention provides a system and process of patterning structures on a carbon based surface comprising exposing part of the surface to an ion flux, such that material properties of the exposed surface are modified to provide a hard mask effect on the surface. A further step of etching unexposed parts of the surface forms the structures on the surface. The inventors have discovered that by controlling the ion exposure, alteration of the surface structure at the top surface provides a mask pattern, without substantially removing any material from the exposed surface. The mask allows for subsequent ion etching of unexposed areas of the surface leaving the exposed areas raised relative to the unexposed areas thus manufacturing patterns onto the surface. For example, a Ga+ focussed ion beam exposes a pattern onto a diamond surface which produces such a pattern after its exposure to a plasma etch. The invention is particularly suitable for patterning of clear well-defined structures down to nano-scale dimensions.

摘要翻译： 本发明提供了一种在碳基表面上构图结构的系统和工艺，包括将表面的一部分暴露于离子通量，使得暴露表面的材料特性被修饰以在表面上提供硬掩模效应。 蚀刻表面的未曝光部分的另一步骤形成表面上的结构。 发明人已经发现，通过控制离子暴露，顶表面上的表面结构的改变提供掩模图案，而基本上不从暴露表面移除任何材料。 该掩模允许对表面的未曝光区域的后续离子蚀刻，离开暴露区域相对于未曝光区域升高，从而将图案制造到表面上。 例如，Ga +聚焦离子束将图案暴露在金刚石表面上，其在暴露于等离子体蚀刻之后产生这种图案。 本发明特别适用于直到纳米级尺寸的清晰明确定义的结构的图案化。