Numerical control device, and numerical control method
    31.
    发明申请
    Numerical control device, and numerical control method 有权
    数控装置及数控方法

    公开(公告)号:US20050107000A1

    公开(公告)日:2005-05-19

    申请号:US10776248

    申请日:2004-02-12

    IPC分类号: G05B19/404 B24B49/00

    CPC分类号: G05B19/404 G05B2219/50297

    摘要: A machine has a tool head which rotates on a C-axis (about the Z-axis) and an A-axis (about the X-axis). A tool length vector is multiplied by a matrix whereby a misalignment component δs-H and the incline error (αs-H, βs-H, γs-H) of a spindle are corrected so that the tool length vector due to the misalignment of the spindle is obtained. The vector thus obtained is further multiplied by a transformation matrix that includes a rotation instruction α for the A-axis and misalignments of the A-axis εa-H (αa-H, βa-H, γa-H) to correct the misalignment of the A-axis so that the tool length vector as found when the A-axis has rotated by an equivalent of instruction α is determined. The vector thus determined is further multiplied by a transformation matrix that includes a rotation instruction c for the C-axis and misalignments of the C-axis δac-H (αc-H, βc-H, γc-H) to correct the misalignment of the C-axis, so that a tool length vector as found when the C-axis has rotated by an equivalent of instruction c is determined. The tool length vector thus determined is added to the vector of positional instruction values (x, y, z) and a workpiece origin offset vector Mwo-H, so that the machine position Vm-H′ is obtained.

    摘要翻译: 机器具有在C轴(绕Z轴)和A轴(绕X轴)旋转的工具头。 刀具长度向量乘以一个矩阵,由此不对齐分量增加Δ-H和斜率误差(αα-H, 对主轴进行校正,从而获得由于主轴的未对准导致的刀具长度矢量。 如此获得的矢量进一步乘以一个变换矩阵,该变换矩阵包括A轴的旋转指令α和A轴epsilona-α(α-H) ,βa-H',γa-H +)以校正A轴的未对准,使得当A轴已经旋转了当量时发现的刀具长度向量 的指令确定。 如此确定的向量进一步乘以一个变换矩阵,该变换矩阵包括C轴的旋转指令c和C轴deltaac-H的未对准(alphac-H) ,betac--H ,gammac )以校正C轴的不对准,使得当C轴旋转一个时,发现的刀具长度向量 确定等效于指令c。 将如此确定的刀具长度矢量加到位置指令值(x,y,z)和工件原点偏移矢量Mwo-H 的向量中,使得机器位置Vm

    Stereoscopic modeling apparatus and stereoscopic modeling method

    公开(公告)号:US10442141B2

    公开(公告)日:2019-10-15

    申请号:US14995258

    申请日:2016-01-14

    摘要: A stereoscopic modeling apparatus is provided. The stereoscopic modeling apparatus includes a modeling tank, a liquid discharger, and a powder supplier. In the modeling tank, a powder layer including a powder is formed and a modeling layer in which the powder in the powder layer is bonded into a required shape is laminated. The liquid discharger discharges a modeling liquid to the powder in the modeling tank. The powder supplier supplies the powder to the modeling tank. The powder supplier supplies the powder to the powder layer while at least a part of the modeling liquid discharged from the liquid discharger and adhered to a surface of the powder layer remains existing on an outermost surface of the powder layer.

    THREE-DIMENSIONAL PRINTING APPARATUS, THREE-DIMENSIONAL OBJECT FORMING METHOD, AND THREE-DIMENSIONAL OBJECT
    34.
    发明申请
    THREE-DIMENSIONAL PRINTING APPARATUS, THREE-DIMENSIONAL OBJECT FORMING METHOD, AND THREE-DIMENSIONAL OBJECT 有权
    三维打印设备,三维对象形成方法和三维对象

    公开(公告)号:US20160075085A1

    公开(公告)日:2016-03-17

    申请号:US14849861

    申请日:2015-09-10

    申请人: Takafumi Sasaki

    发明人: Takafumi Sasaki

    摘要: A three-dimensional printing apparatus for forming a three-dimensional object is provided. The three-dimensional printing apparatus includes a forming unit to supply a powder to form a powder layer and a head to eject liquid droplets of a forming liquid onto the powder layer to bond particles of the powder layer to form a forming layer. The forming unit and the head form laminated forming layers by sequentially repeating forming the powder layer and ejecting the forming liquid to form a between-layers vacant space formed between the two successive forming layers sequentially laminated in the laminating direction.

    摘要翻译: 提供一种用于形成三维物体的三维打印装置。 三维印刷装置包括:成形单元,其供给粉末以形成粉末层和头部,以将成形液体的液滴喷射到粉末层上,以粘合粉末层的颗粒以形成成形层。 成形单元和头部通过顺序地重复形成粉末层并喷射成形液体形成层压形成层,以形成在层叠方向上顺序层压的两个连续成形层之间形成的层间空隙。

    Substrate processing apparatus, method for manufacturing substrate, and method for manufacturing semiconductor device
    35.
    发明授权
    Substrate processing apparatus, method for manufacturing substrate, and method for manufacturing semiconductor device 有权
    基板处理装置,基板的制造方法以及半导体装置的制造方法

    公开(公告)号:US09082694B2

    公开(公告)日:2015-07-14

    申请号:US14001510

    申请日:2012-02-22

    摘要: A substrate processing apparatus includes: a processing chamber that accommodates a substrate; a heating portion that is provided so as to surround a accommodating region of the substrate within the processing chamber; a gas nozzle that is provided inside the heating portion and that supplies a processing gas to the accommodating region of the substrate; and a gas heating mechanism that is provided inside the heating portion and that supplies the processing gas from an upstream side of the gas nozzle into the gas nozzle. A ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas heating mechanism is larger than a ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas nozzle.

    摘要翻译: 基板处理装置包括:容纳基板的处理室; 加热部,其设置成围绕处理室内的基板的容纳区域; 气体喷嘴,其设置在所述加热部内,并将处理气体供给到所述基板的容纳区域; 以及气体加热机构,其设置在加热部内部,并且将处理气体从气体喷嘴的上游侧供给到气体喷嘴中。 气体加热机构的气体流路中的流路周向长度与流路截面积的比率大于气体流路中的流路周向长度与流路截面积的比 的气体喷嘴。

    Numerical controller having workpiece mounting error compensation unit for three-axis machine tool
    36.
    发明授权
    Numerical controller having workpiece mounting error compensation unit for three-axis machine tool 有权
    数控机床具有三轴机床工件安装误差补偿单元

    公开(公告)号:US09063536B2

    公开(公告)日:2015-06-23

    申请号:US13243466

    申请日:2011-09-23

    IPC分类号: G05B19/25 G05B19/408

    CPC分类号: G05B19/4086

    摘要: A numerical controller controls a three-axis machine tool that machines a workpiece, mounted on a table, with at least three linear axes. The numerical controller includes a workpiece mounting error compensation unit that compensates a mounting error caused when the workpiece is mounted. The workpiece mounting error compensation unit performs an error compensation with respect to an instructed linear-axis position with amounting error which is set beforehand, in order to keep a position with respect to the workpiece at a tool center point position, based on the instructed linear-axis position of the three linear axes to obtain a compensated linear-axis position. The three linear axes are driven based on the obtained compensated linear-axis position.

    摘要翻译: 一个数字控制器控制一个三轴机床,用于安装在工作台上的工件至少具有三个直线轴。 数值控制器包括工件安装误差补偿单元,用于补偿安装工件时引起的安装误差。 工件安装误差补偿单元相对于预先设定的量误差的指示的线性轴位置执行误差补偿,以便基于所指示的线性来保持相对于工件在刀具中心点位置的位置 三轴线的轴位置,以获得补偿的直线轴位置。 基于获得的补偿线性轴位置驱动三个直线轴。

    DROPLET DISCHARGE HEAD, AND IMAGE-FORMING APPARATUS
    37.
    发明申请
    DROPLET DISCHARGE HEAD, AND IMAGE-FORMING APPARATUS 有权
    DROPLET卸载头和图像形成装置

    公开(公告)号:US20150062255A1

    公开(公告)日:2015-03-05

    申请号:US14468599

    申请日:2014-08-26

    申请人: Takafumi Sasaki

    发明人: Takafumi Sasaki

    IPC分类号: B41J2/14

    摘要: A droplet discharge head includes a plurality of pressure chambers which communicate with a plurality of nozzles which discharge droplets, respectively; at least one common supply passage which supplies liquid to the pressure chambers; at least one common return passage which communicates with the pressure chambers and to which a part of the liquid in the pressure chambers is returned; and a plurality of energy-generating elements which generate pressure in the pressure chambers, wherein the droplet discharge head circulates liquid supplied from the common supply passage to the pressure chambers to the common return passage and discharges droplets from the nozzles when pressure is generated in the pressure chambers by the energy-generating elements, and the common supply passage and the common return passage are arranged on the same side with respect to the pressure chambers.

    摘要翻译: 液滴喷射头包括分别与多个排出液滴的喷嘴连通的多个压力室; 至少一个向压力室供应液体的公共供应通道; 至少一个公共返回通道,其与压力室连通并且压力室中的一部分液体返回到该通道; 以及多个在压力室中产生压力的能量产生元件,其中,液滴喷射头将从公共供应通道供应的液体循环到压力室到共用返回通道,并且在压力产生压力时从喷嘴排出液滴 能量产生元件的压力室和公共供给通道和公共返回通道相对于压力室布置在同一侧。

    LIQUID-JET HEAD, LIQUID-JET DEVICE, AND IMAGE FORMING APPARATUS
    38.
    发明申请
    LIQUID-JET HEAD, LIQUID-JET DEVICE, AND IMAGE FORMING APPARATUS 有权
    液体喷射头,液体喷射装置和图像形成装置

    公开(公告)号:US20140036007A1

    公开(公告)日:2014-02-06

    申请号:US13956587

    申请日:2013-08-01

    申请人: Takafumi Sasaki

    发明人: Takafumi Sasaki

    IPC分类号: B41J2/175

    CPC分类号: B41J2/175 B41J2/17513

    摘要: A liquid-jet head includes nozzles disposed in a predetermined direction and configured to discharge a recording liquid, individual liquid chambers connected to the respective nozzles and configured to supply the recording liquid to the respective nozzles, a common liquid chamber connected to the individual liquid chambers and configured to supply the recording liquid to the individual liquid chambers, an air reservoir space disposed adjacent to the common liquid chamber and configured to retain air, a flexible division wall separating the common liquid chamber from the air reservoir space, a tube unit connected outside the liquid-jet head, a recording liquid supply tube passing through the air reservoir space to divide the air reservoir space into a plurality of spaces and configured to supply the recording liquid to the common chamber, and a connecting unit configured to connect the divided spaces to one another.

    摘要翻译: 液体喷射头包括沿预定方向设置并被配置为排出记录液体的喷嘴,连接到各个喷嘴的单独的液体室,并配置成将记录液体供应到各个喷嘴;公共液体室,连接到各个液体室 并且构造成将记录液体供应到各个液体室,设置在公共液体室附近并被构造成保持空气的空气储存空间,将公共液体室与储气空间分离的柔性分隔壁,连接在外部的管单元 液体喷射头,通过储气空间的记录液体供应管,将储气空间分隔成多个空间,并配置成将记录液体供应到共用室;连接单元,其构造成将分隔空间 彼此。

    SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
    39.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD FOR MANUFACTURING SUBSTRATE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE 有权
    基板加工装置,制造基板的方法和制造半导体装置的方法

    公开(公告)号:US20130330930A1

    公开(公告)日:2013-12-12

    申请号:US14001510

    申请日:2012-02-22

    IPC分类号: H01L21/205

    摘要: A substrate processing apparatus includes: a processing chamber that accommodates a substrate; a heating portion that is provided so as to surround a accommodating region of the substrate within the processing chamber; a gas nozzle that is provided inside the heating portion and that supplies a processing gas to the accommodating region of the substrate; and a gas heating mechanism that is provided inside the heating portion and that supplies the processing gas from an upstream side of the gas nozzle into the gas nozzle. A ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas heating mechanism is larger than a ratio of a flow channel circumferential length to a flow channel cross-sectional area in a gas flow channel of the gas nozzle.

    摘要翻译: 基板处理装置包括:容纳基板的处理室; 加热部,其设置成围绕处理室内的基板的容纳区域; 气体喷嘴,其设置在所述加热部内,并将处理气体供给到所述基板的容纳区域; 以及气体加热机构,其设置在加热部内部,并且将处理气体从气体喷嘴的上游侧供给到气体喷嘴中。 气体加热机构的气体流路中的流路周向长度与流路截面积的比率大于气体流路中的流路周向长度与流路截面积的比 的气体喷嘴。