Method of manufacturing semiconductor device, method of processing substrate and non-transitory computer readable recording medium
    1.
    发明授权
    Method of manufacturing semiconductor device, method of processing substrate and non-transitory computer readable recording medium 有权
    半导体装置的制造方法,基板的处理方法以及非暂时的计算机可读记录介质

    公开(公告)号:US09190264B2

    公开(公告)日:2015-11-17

    申请号:US13618338

    申请日:2012-09-14

    Abstract: A semiconductor manufacturing method includes forming an oxide film on a substrate by performing a first cycle a predetermined number of times, including supplying a first source gas, an oxidizing gas and a reducing gas to the substrate heated to a first temperature in a process container under a sub-atmospheric pressure; forming a seed layer on a surface of the oxide film by supplying a nitriding gas to the substrate in the process container, the substrate being heated to a temperature equal to or higher than the first temperature and equal to or lower than a second temperature; and forming a nitride film on the seed layer formed on the surface of the oxide film by performing a second cycle a predetermined number of times, including supplying a second source gas and the nitriding gas to the substrate heated to the second temperature in the process container.

    Abstract translation: 半导体制造方法包括在基板上形成规定次数的第一循环的氧化膜,该第一循环包括向处理容器内加热到第一温度的基板供给第一源气体,氧化气体和还原气体, 低于大气压; 通过向所述处理容器中的所述基板供给氮化气体,在所述氧化物膜的表面上形成种子层,将所述基板加热至所述第一温度以上且第二温度以下的温度; 并且通过进行预定次数的第二循环,在形成在氧化物膜的表面上的种子层上形成氮化物膜,包括将第二源气体和氮化气体供给到处理容器中加热到第二温度的衬底 。

    SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
    2.
    发明申请
    SUBSTRATE PROCESSING APPARATUS, METHOD OF PROCESSING SUBSTRATE AND METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE 有权
    基板加工装置,基板的加工方法及制造半导体装置的方法

    公开(公告)号:US20130157474A1

    公开(公告)日:2013-06-20

    申请号:US13813493

    申请日:2011-08-02

    Abstract: An oxygen-containing gas and a hydrogen-containing gas are supplied into a pre-reaction chamber heated to a second temperature and having the pressure set to less than an atmospheric pressure, and a reaction is induced between both gases in the pre-reaction chamber to generate reactive species, and the reactive species are supplied into the process chamber and exhausted therefrom, in which a substrate heated to the first temperature is housed and the pressure is set to less than the atmospheric pressure, and processing is applied to the substrate by the reactive species, with the second temperature set to be not less than the first temperature at this time.

    Abstract translation: 将含氧气体和含氢气体供给到加热至第二温度并且压力设定为小于大气压的预反应室中,并且在预反应室内的两种气体之间产生反应 产生反应性物质,并且将反应性物质供应到处理室中并从其中排出,其中容纳加热到第一温度的基底并将压力设定为小于大气压,并且通过 此时的第二温度设定为不小于第一温度的反应物种。

    Producing method of semiconductor device and substrate processing apparatus
    4.
    发明授权
    Producing method of semiconductor device and substrate processing apparatus 有权
    半导体器件和衬底处理设备的生产方法

    公开(公告)号:US07871938B2

    公开(公告)日:2011-01-18

    申请号:US12403974

    申请日:2009-03-13

    Abstract: Disclosed is a producing method of a semiconductor device produced by transferring a plurality of substrates into a processing chamber, supplying oxygen-containing gas and hydrogen-containing gas into the processing chamber which is in a heated state to process the plurality of substrates by oxidation, and transferring the plurality of the oxidation-processed substrates out from the processing chamber, wherein the hydrogen-containing gas is supplied from a plurality of locations of a region corresponding to a substrate arrangement region in which the plurality of substrates are arranged in the processing chamber.

    Abstract translation: 本发明公开了一种半导体器件的制造方法,该半导体器件通过将多个衬底转移到处理室中,将含氧气体和含氢气体供给到处于加热状态的处理室中,以通过氧化处理多个衬底, 并且将多个氧化处理的基板从处理室转移出来,其中,从对应于多个基板布置在处理室中的基板布置区域的区域的多个位置供给含氢气体 。

    Manufacturing method of a semiconductor device, and substrate processing apparatus

    公开(公告)号:US20100192855A1

    公开(公告)日:2010-08-05

    申请号:US12656566

    申请日:2010-02-03

    Abstract: An object of this invention is to make it possible to suppress early-stage oxidation of a substrate surface prior to oxidation processing, and to remove a natural oxidation film. For this reason, a method is provided comprising the steps of loading a substrate into a processing chamber, supplying a hydrogen-containing gas and an oxygen-containing gas into the processing chamber, and subjecting a surface of the substrate to oxidation processing, and unloading the substrate subjected to oxidation processing from the processing chamber. In the oxidation processing step, the hydrogen-containing gas is introduced in advance into the processing chamber, with the pressure inside the processing chamber set at a pressure that is less than atmospheric pressure, and the oxygen-containing gas is then introduced in the state in which the introduction of the hydrogen-containing gas is continued.

    Producing method of semiconductor device and substrate processing apparatus
    6.
    发明授权
    Producing method of semiconductor device and substrate processing apparatus 有权
    半导体器件和衬底处理设备的生产方法

    公开(公告)号:US07534730B2

    公开(公告)日:2009-05-19

    申请号:US10549938

    申请日:2004-08-25

    Abstract: Disclosed is a method for manufacturing a semiconductor device which comprises a step for carrying a plurality of substrates (1) in a process chamber (4), a step for supplying an oxygen-containing gas from the upstream side of the substrates (1) carried in the process chamber (4), a step for supplying a hydrogen-containing gas from at least one location corresponding to a position within the region where substrates (1) are placed in the process chamber (4), a step for oxidizing the substrates (1) by reacting the oxygen-containing gas with the hydrogen-containing gas in the process chamber (4), and a step for carrying the thus-processed substrates (1) out of the process chamber (4).

    Abstract translation: 公开了一种半导体器件的制造方法,其包括在处理室(4)中承载多个基板(1)的步骤,从承载的基板(1)的上游侧供给含氧气体的步骤 在处理室(4)中,从对应于在基板(1)被放置在处理室(4)的区域内的位置的至少一个位置供给含氢气体的步骤,用于氧化基板 (1)通过使含氧气体与处理室(4)中的含氢气体反应,以及将处理过的基板(1)从处理室(4)运出的步骤。

    Electrophotographic recording apparatus configured to switch a bias
voltage in a developing unit
    7.
    发明授权
    Electrophotographic recording apparatus configured to switch a bias voltage in a developing unit 失效
    配置成切换显影单元中的偏置电压的电子照相记录装置

    公开(公告)号:US5897243A

    公开(公告)日:1999-04-27

    申请号:US638696

    申请日:1996-04-26

    CPC classification number: G03G15/0808

    Abstract: In an electrophotographic image recording apparatus of the type using a single-ingredient type developer, i.e., toner, a latent image is electrostatically formed on a photoconductive drum or similar image carrier. A developing unit has a developing roller for conveying the toner deposited thereon, and an intermediate roller for conveying the toner transferred thereto from the developing roller and depositing it on the latent image to thereby produce a corresponding toner image. An image transfer unit transfers the toner image to a cut sheet. During the development of an area of the image carrier other than a latent image area, at least one of biases assigned to the developing roller and intermediate roller, respectively, is switched over to thereby form an electric field different in direction from an electric field assigned to the formation of the toner image between the two rollers. As a result, the toner existing on the intermediate roller is collected by the developing roller. This successfully prevents the toner from depositing on the intermediate roller except when required, and frees the image transfer unit from the deposition of the toner.

    Abstract translation: 在使用单一成分型显影剂即调色剂的电子照相图像记录装置中,在感光鼓或类似图像载体上静电地形成潜像。 显影单元具有用于输送沉积在其上的调色剂的显影辊和用于输送从显影辊转印到其上的调色剂并将其沉积在潜像上从而产生相应调色剂图像的中间辊。 图像转印单元将调色剂图像转印到切割片。 在除了潜像区域之外的图像载体的区域的显影期间,分别分配给显影辊和中间辊的偏压中的至少一个被切换,从而形成与指定的电场不同的方向的电场 以形成两个辊之间的调色剂图像。 结果,存在于中间辊上的调色剂由显影辊收集。 这成功地防止了调色剂沉积在中间辊上,除非需要,并且使图像转印单元免于调色剂的沉积。

    Image recording apparatus having a toner supply tank and a toner
recovery tank configured into a unitary, disposable magazine
    9.
    再颁专利
    Image recording apparatus having a toner supply tank and a toner recovery tank configured into a unitary, disposable magazine 失效
    具有调色剂供给箱和调色剂回收罐的图像记录装置,该调色剂回收罐被配置成一体的一次性盒

    公开(公告)号:USRE35528E

    公开(公告)日:1997-06-10

    申请号:US269452

    申请日:1994-06-30

    Abstract: A xerographic image recording apparatus includes a photosensitive body moved along a circuitous path, an electric discharging unit for eliminating electric charges from the photosensitive body, a precharging unit for charging the photosensitive body electrically, an image writing unit for writing an image on the photosensitive body, an image developing unit for coating the photosensitive body by the toner to form a toner image on the photosensitive body; a recording sheet feeding unit for feeding a recording sheet along a sheet path, an image transfer unit for transferring the toner image onto a recording sheet, a cleaning unit for removing the toner remaining on the photosensitive body after the transfer of image on the recording sheet is completed, a toner supply tank for supplying the toner to the image developing unit, and a toner recovery tank for collecting the toner removed by the cleaning unit from the photosensitive body, wherein the toner supply tank and the toner recovery tank are assembled into a unitary body to form a detachable magazine.

    Abstract translation: 静电摄影图像记录装置包括沿着迂回路径移动的感光体,用于消除来自感光体的电荷的放电单元,用于对感光体电气充电的预充电单元,用于在感光体上写入图像的图像写入单元 图像显影单元,用于通过调色剂涂覆感光体以在感光体上形成调色剂图像; 用于沿着片材路径馈送记录片材的记录片材馈送单元,用于将调色剂图像转印到记录片材上的图像转印单元,用于在记录片材上转印图像之后去除残留在感光体上的调色剂的清洁单元 完成了将调色剂供给到图像显影单元的调色剂供应箱和用于将由清洁单元移除的调色剂从感光体收集的调色剂回收罐,其中调色剂供应箱和调色剂回收罐被组装成 整体形成一个可拆卸的杂志。

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