Abstract:
An inspection method and an inspection system of a terminal metal fitting which can securely judge the good or bad of the fastening condition of an electric wire by a crimping piece of the terminal metal fitting is provided. The inspection system 1 of the terminal metal fitting has an illuminating lamp 4, a CCD camera 5, a dark box 6, and a control unit 7. The CCD camera 5 is arranged at a position of the light thrown from the illuminating lamp 4 and reflected by crimping pieces 212a,212b of a pressure welding terminal 200 not entering the CCD camera 5. The dark box 6 covers the illuminating lamp 4, an object side 5a of the CCD camera 5, and the pressure welding terminal 200. The control unit 7 makes a binary processing on an image of a wire connecting portion 204 taken by the CCD camera 5. The control unit 7 is provided on each of the crimping pieces 212a,212b and judges the good or bad of the crimping condition on the basis of an area in black in an inspection area in the binary image of at least some part of the crimping piece.
Abstract:
An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.
Abstract:
Connector housings having plural kinds of terminals (plated with different materials, e.g.) are mounted at predetermined locations, positioned and secured by a drive means. A sensor probe which receives a light, of a color detection device, is transferred successively to the locations opposite to the terminals. A color sensor senses a level of a specific color component of the light received by the sensor probe. The sensed level is compared with a predetermined reference level and it can be determined based upon whether the sensed level is higher than the reference level, the kind of the terminals in the connector housings.
Abstract:
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
Abstract:
A loudspeaker diaphragm having a small overall height dimension, in which a dome portion has a sufficient rigidity and which is capable of realizing a stable loudspeaker operation, wherein the loudspeaker diaphragm can realize a desirable sound reproduction without noise, or the like, with a frequency response that is flat over a wide range. In the loudspeaker diaphragm of the present invention, the dome portion includes a concave dome portion formed at a center thereof, a convex dome portion along an outer periphery of the concave dome portion, a plurality of depressed ribs each extending in a radial direction across a boundary between the concave dome portion and the convex dome portion, a voice coil attachment portion along an outer periphery of the convex dome portion, and a plurality of protruding ribs extending in the radial direction across a boundary between the convex dome portion and the voice coil attachment portion, wherein each protruding rib is spaced apart in a circumferential direction from two adjacent depressed ribs.
Abstract:
A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.
Abstract:
A system for controlling a tool-to-tool matching between a plurality of scanning electron microscopes for pattern dimension measurement includes a measuring unit for, at regular intervals, measuring a tool-to-tool disparity between canning electron microscopes based on secondary electron image data, and measuring indicators indicating states of the microscopes, a tool-to-tool-disparity causing factor analyzing unit for analyzing a relationship between the tool-to-tool disparity and the values of the indicators measured by the measuring unit to estimate a factor that has caused said tool-to-tool disparity, and an output unit for displaying and outputting the tool-to-tool disparity causing factor estimated by the tool-to-tool-disparity causing factor analyzing unit.
Abstract:
It is facilitated in a scanning electron microscope to save the labor of executing the reproduction test, conduct basic analysis on a problem caused in execution of the automatic observation process, and confirm details resulting in the error. Upon detecting an error from an abnormality, the scanning electron microscope extracts a sample image Im(t2) obtained by retroceding from a sample image Im(te) stored so as to be associated with time te of error occurrence by a predetermined video quantity (for example, total recording time period t2) previously set and registered by an input-output device, from sample images stored in a recording device while being overwritten, and stores a resultant sample image in another recording device.
Abstract:
An object of the present invention is to provide a scanning electron microscope for reducing a process concerning inspection positioning or an input operation, thereby functioning with high precision at high speed. To accomplish the above object, the present invention provides a scanning electron microscope having a function for identifying a desired position on the basis of a pattern registered beforehand, which includes a means for setting information concerning the pattern kind, the interval between a plurality of parts constituting the pattern, and the size of parts constituting the pattern and a means for forming a pattern image composed of a plurality of parts on the basis of the information obtained by the concerned means.
Abstract:
The present invention is relates to a method for measuring average line width of line and space patterns in a simplified manner and at high speed without measuring at many positions. An average line width, an average space width, and an average pitch width are calculated from peak intervals of auto-correlation values of a differentiated image of the line and space patterns or peak patterns corresponding to line edges on projection data of the differentiated image.