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公开(公告)号：US5598002A
公开(公告)日：1997-01-28
申请号：US632664
申请日：1996-03-28
申请人： Hideo Todokoro , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
发明人： Hideo Todokoro , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
IPC分类号： H01J37/141 , H01J37/20 , H01J37/21 , H01L21/027 , G02B21/18
CPC分类号： H01J37/21 , H01J2237/216 , H01J2237/2482
摘要： An electron beam apparatus focusses an electron beam onto a specimen by means of an objective magnetic lens. In order to detect changes in the height of the specimen, a laser light beam from a laser source is incident on the specimen and the reflected laser beam is detected by a light detector. Any change in the height of the specimen changes the path of the laser beam to the detector. Therefore, by monitoring the detector, the focussing of the electron beam on the specimen can be controlled by varying the current to an excitation coil of the objective magnetic lens or by moving the specimen via a mounting stage. At least one of the pole pieces of the objective lens is on the opposite side of the path of the laser beam to the source of the electron beam, so that the objective magnetic lens may be close to the specimen, permitting a short focal length. Thus, the laser beam may pass between the pole pieces. An optical microscope may also be provided to permit the specimen to be viewed. The viewing path of the optical microscope extends through an opening in one or both of the pole pieces of the objective magnetic lens.
摘要翻译： 电子束装置通过物镜磁性透镜将电子束聚焦在样本上。 为了检测样品的高度变化，来自激光源的激光束入射到样品上，并且通过光检测器检测反射的激光束。 样品高度的任何变化会改变激光束到检测器的路径。 因此，通过监视检测器，可以通过改变到物镜磁性透镜的激励线圈的电流或通过安装级移动样本来控制电子束在样本上的聚焦。 物镜的极片中的至少一个位于激光束到电子束源的路径的相对侧，使得物镜磁性透镜可能靠近样本，允许短焦距。 因此，激光束可以在极片之间通过。 还可以提供光学显微镜以允许观察样品。 光学显微镜的观察路径延伸穿过物镜磁性透镜的一个或两个极片中的开口。
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公开(公告)号：US5614713A
公开(公告)日：1997-03-25
申请号：US617030
申请日：1996-03-18
申请人： Atsushi Kobaru , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
发明人： Atsushi Kobaru , Tadashi Otaka , Tatsuya Maeda , Katsuhiro Sasada
IPC分类号： H01J37/20 , H01J37/21 , H01J37/22 , H01J37/244 , H01J37/26
CPC分类号： H01J37/22 , H01J2237/216 , H01J2237/2482
摘要： An electron beam is focused on a specimen by a focusing lens. A light beam is incident on the position of irradiation of the specimen with the electron beam and the reflected light beam is detected by a linear light detector. The output of the detector is used to measure the height of the specimen at the position of irradiation of the electron beam. The specimen is moved in a plane perpendicular to an optical axis of the focusing lens. A specimen height measuring device carries out the height measurement of the specimen at a position to be observed on the specimen and at positions thereon which are in the vicinity of the position to be observed, when those positions are located at the position of irradiation of the electron beam. The specimen height measuring device averages the measured values so as to produce a focusing correction signal on the basis thereof and controls the focusing lens on the basis of the focusing correction signal.
摘要翻译： 电子束通过聚焦透镜聚焦在样本上。 光束入射到具有电子束的样本的照射位置，并且通过线性光检测器检测反射光束。 检测器的输出用于测量样品在电子束照射位置的高度。 样本在垂直于聚焦透镜的光轴的平面内移动。 样本高度测量装置在样本上观察的位置和在待观察位置附近的位置上执行样本的高度测量，当这些位置位于待观察位置的位置时 电子束。 样本高度测量装置对测量值进行平均，以便基于此产生聚焦校正信号，并且基于聚焦校正信号控制聚焦透镜。
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3.发明申请Scanning Electron Microscope Alignment Method and Scanning Electron Microscope 有权扫描电子显微镜对准方法和扫描电子显微镜公开(公告)号：US20090032693A1
公开(公告)日：2009-02-05
申请号：US12182704
申请日：2008-07-30
CPC分类号： G01N23/225 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/1501 , H01J2237/1532
摘要： The present invention aims to provide an axis alignment method, astigmatism correction method and SEM for implementing these methods, which can prevent an alignment or correction error attributable to conditions of a specimen. A first aspect is to obtain the difference between the optimal values acquired from an automatic axis alignment result on a standard sample and from each of automatic axis alignment results on a observation target sample, and to correct an optimal value adjusted using the standard sample by use of the difference thus obtained. A second aspect is to acquire an optimal stigmator value (astigmatism correction signal) by using the standard sample, to store the optimal stigmator value as a default value, to add the optimal stigmator value and the default value depending on the height of an observation target sample pattern, and to perform an astigmatism correction on the basis of the resultant stigmator value.
摘要翻译： 本发明旨在提供一种用于实现这些方法的轴对准方法，像散校正方法和SEM，其可以防止由于样品的条件引起的对准或校正误差。 第一方面是获得从标准样品的自动轴对准结果获取的最佳值与观察目标样品上的自动轴对准结果中的每一种之间的差异，并且通过使用校正使用标准样品调整的最佳值 的差异。 第二方面是通过使用标准样本来获取最佳标称值（像散校正信号），以将最佳标称值作为默认值来存储，以根据观察目标的高度添加最优标示符值和默认值 样本图案，并且基于得到的标记值进行散光校正。
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4.发明授权Scanning electron microscope alignment method and scanning electron microscope 有权扫描电子显微镜对准方法和扫描电子显微镜公开(公告)号：US08188427B2
公开(公告)日：2012-05-29
申请号：US12182704
申请日：2008-07-30
CPC分类号： G01N23/225 , H01J37/1471 , H01J37/153 , H01J37/28 , H01J2237/1501 , H01J2237/1532
摘要： A method and apparatus for alignment and astigmatism correction for a scanning electron microscope can prevent an alignment or correction error attributable to the conditions of a particular specimen. First, a difference is determined between optimal values acquired from an automatic axis alignment result on a standard sample, and those obtained from each of a plurality automatic axis alignment results on a observation target sample. An optimal value is then adjusted using the standard sample, by use of the difference thus obtained. Correspondingly, an optimal stigmator value (astigmatism correction signal) is acquired by using the standard sample, and storing the optimal stigmator value as a default value. The optimal stigmator value and the default value depending on the height of an observation target sample pattern are added, and an astigmatism correction is performed on the basis of the resultant stigmator value.
摘要翻译： 用于扫描电子显微镜的对准和像散校正的方法和装置可以防止由特定样品的条件引起的对准或校正误差。 首先，在从标准样品的自动轴对准结果获得的最佳值与从观察对象样本的多个自动轴对准结果中得到的最佳值之间确定差异。 然后使用标准样品通过使用由此获得的差异来调整最佳值。 相应地，通过使用标准样品获取最佳标称值（像散校正信号），并将最佳标定值存储为默认值。 添加根据观察目标样本图案的高度的最佳标称值和默认值，并根据得到的标示符值进行像散校正。
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公开(公告)号：US09671223B2
公开(公告)日：2017-06-06
申请号：US13807281
申请日：2011-05-20
申请人： Chie Shishido , Maki Tanaka , Katsuhiro Sasada
发明人： Chie Shishido , Maki Tanaka , Katsuhiro Sasada
CPC分类号： G01B15/04 , G01Q40/00 , H01J37/263 , H01J37/28 , H01J2237/22 , H01J2237/24514 , H01J2237/24578 , H01J2237/2823 , H01J2237/2826
摘要： Beforehand, the device characteristic patterns of each critical dimension SEM are measured, a sectional shape of an object to undergo dimension measurement is presumed by a model base library (MBL) matching system, dimension measurements are carried out by generating signal waveforms through SEM simulation by inputting the presumed sectional shapes and the device characteristic parameters, and differences in the dimension measurement results are registered as machine differences. In actual measurements, from the dimension measurement results in each critical dimension SEM, machine differences are corrected by subtracting the registered machine differences. Furthermore, changes in critical dimension SEM's over time are monitored by periodically measuring the above-mentioned device characteristic parameters and predicting the above-mentioned dimension measurement results. According to the present invention, actual measurements of machine differences, which require considerable time and effort, are unnecessary. In addition, the influence of changes in samples over time, which is problematic in monitoring changes in devices over time, can be eliminated.
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公开(公告)号：US20100258739A1
公开(公告)日：2010-10-14
申请号：US11802452
申请日：2007-05-23
申请人： Hiroaki Mito , Katsuhiro Sasada , Kazuo Kato , Tomohiro Kudo , Tomonori Saeki
发明人： Hiroaki Mito , Katsuhiro Sasada , Kazuo Kato , Tomohiro Kudo , Tomonori Saeki
CPC分类号： H01J37/185 , H01J37/20 , H01J2237/18 , H01J2237/2001 , H01J2237/204 , H01J2237/2817 , H01L21/67028 , H01L21/67213 , H01L21/67248
摘要： A sample measuring method and a charged particle beam apparatus are provided which remove contaminants, that have adhered to a sample in a sample chamber of an electron microscope, to eliminate adverse effects on the subsequent manufacturing processes. To achieve this objective, after the sample measurement or inspection is made by using a charged particle beam, contaminants on the sample are removed before the next semiconductor manufacturing process. This allows the contaminants adhering to the sample in the sample chamber to be removed and therefore failures or defects that may occur in a semiconductor fabrication process following the measurement and inspection can be minimized.
摘要翻译： 提供了样品测量方法和带电粒子束装置，其去除了附着在电子显微镜的样品室中的样品的污染物，以消除对后续制造工艺的不利影响。 为了达到这个目标，在通过使用带电粒子束进行样品测量或检查之后，在下一个半导体制造过程之前去除样品上的污染物。 这允许去除样品室中附着在样品上的污染物，因此可以使在测量和检查之后的半导体制造过程中可能发生的故障或缺陷被最小化。
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7.发明授权Electrostatic charge measurement method, focus adjustment method, and scanning electron microscope 有权静电电荷测量方法，焦点调整方法和扫描电子显微镜公开(公告)号：US07745782B2
公开(公告)日：2010-06-29
申请号：US12038641
申请日：2008-02-27
CPC分类号： G01N23/225 , H01J2237/004 , H01J2237/216 , H01J2237/24564 , H01J2237/28
摘要： A method and a device are disclosed for suppressing error in electrostatic charge amount or defocus on the basis of electrostatic charge storage due to electron beam scanning when measuring the electrostatic charge amount of the sample or a focus adjustment amount by scanning the electron beam. An electrostatic charge measurement method, a focus adjustment method, or a scanning electron microscope for measuring an electrostatic charge amount or controlling an application voltage to the sample changes the application voltage to the energy filter while moving the scanning location of the electron beam on the sample.
摘要翻译： 公开了一种方法和装置，用于当通过扫描电子束测量样品的静电电荷量或通过扫描电子束时，基于电子束扫描，基于静电电荷存储来抑制静电电荷量或散焦的误差。 静电电荷测量方法，焦点调节方法或用于测量静电电荷量或控制对样品的施加电压的扫描电子显微镜，在将电子束的扫描位置移动到样品上的同时，将能量过滤器的施加电压改变 。
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8.发明授权公开(公告)号：US07435958B2
公开(公告)日：2008-10-14
申请号：US11356438
申请日：2006-02-17
申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
发明人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
IPC分类号： H01J37/10
CPC分类号： H01J37/09 , H01J37/16 , H01J2237/1405 , H01J2237/16 , H01J2237/2614 , H01J2237/2617 , H01J2237/28
摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
摘要翻译： 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。
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9.发明授权公开(公告)号：US07205550B2
公开(公告)日：2007-04-17
申请号：US11450382
申请日：2006-06-12
申请人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
发明人： Tsuyoshi Inanobe , Sho Takami , Yoichi Ose , Katsuhiro Sasada
IPC分类号： H03M1/22
CPC分类号： H01J37/09 , H01J37/16 , H01J2237/1405 , H01J2237/16 , H01J2237/2614 , H01J2237/2617 , H01J2237/28
摘要： A structure of an electron beam apparatus having shielding properties for shielding against an environmental magnetic field is provided. The electron beam apparatus comprises a mirror barrel for housing a magnetic lens for converging an electron beam onto a specimen and a specimen chamber for housing the specimen, wherein a non-magnetic material having conductivity is used as a material for at least one of the mirror barrel and a main body of the specimen chamber. The material for the mirror barrel or the main body of the specimen chamber is an aluminum alloy and a thickness of a sidewall of the mirror barrel or the main body of the specimen chamber is 10 mm or more. A magnetic plate having a thickness smaller than that of the sidewall of the mirror barrel or the main body of the specimen chamber is provided on an inner sidewall of the mirror barrel or the main body of the specimen chamber.
摘要翻译： 提供了具有屏蔽性能以防止环境磁场的电子束装置的结构。 电子束装置包括用于容纳用于将电子束会聚在试样上的磁性透镜的反射镜筒和用于容纳样本的试样室，其中具有导电性的非磁性材料用作至少一个反射镜的材料 桶和样品室的主体。 用于镜筒的材料或试样室的主体是铝合金，镜筒的侧壁或试样室的主体的厚度为10mm以上。 厚度小于镜筒侧壁或试样室主体的磁性板设置在镜筒的内侧壁或试样室的主体上。
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10.发明授权
公开(公告)号：US5692061A
公开(公告)日：1997-11-25
申请号：US391006
申请日：1995-02-21
CPC分类号： G06T7/0046 , G06K9/00201 , G06T7/0051
摘要： A method for recognizing a three-dimensional objective in which a two-dimensional image is obtained from the same viewing point as a distance image obtained by picking up the objective in a three-dimensional space and the two-dimensional image is utilized to previously limit an existence zone of the objective under detection for the distance image and to perform objective detecting operation over the partial distance image in the limited zone, thereby realizing a sufficiently high speed detection of, in particular, the three-dimensional objective.
摘要翻译： 一种用于识别三维物镜的方法，其中从与通过拾取三维空间中的物镜获得的距离图像相同的视点获得二维图像，并且二维图像被用于预先限定 对距离图像进行检测的目标的存在区域，并且在受限区域中对部分距离图像执行目标检测操作，从而实现特别是三维目标的足够高的速度检测。
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