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公开(公告)号：US20060132741A1
公开(公告)日：2006-06-22
申请号：US11354471
申请日：2006-02-14
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
IPC分类号： G03B27/42
CPC分类号： G03F7/70341
摘要： Disclosed is an exposure apparatus which includes a projection optical system for projecting a pattern of a reticle onto a substrate, wherein the substrate is exposed through a liquid medium kept at least in a portion between the substrate and an optical element of the projection optical system which optical element is nearest to the substrate, a supplying system for supplying a liquid medium, a collecting system for collecting a liquid medium, and an exhausting system for removing a bubble in the liquid medium through a bubble removing material having such property that it passes a gas but it does not pass a liquid.
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公开(公告)号：US20050269035A1
公开(公告)日：2005-12-08
申请号：US11147562
申请日：2005-06-07
CPC分类号： G03F7/2049 , G01Q10/06 , G01Q70/06 , G01Q80/00
摘要： Disclosed is a fine pattern forming apparatus and a fine pattern inspecting apparatus. In one preferred form, the fine pattern forming apparatus includes a surface irregularity information reading device for detecting a shape signal corresponding to a surface irregularity of a surface of an original, while scanning the surface by use of a first probe, and a surface irregularity information writing device for processing a substrate to be processed, while scanning a surface of the substrate by use of a second probe, wherein an applied electric voltage to the second probe is changed in accordance with the shape signal while a distance between the second probe and the substrate is kept substantially constant, or the distance between the second probe and the substrate is changed in accordance with the shape signal while the applied electric voltage to the second probe is kept substantially constant, such that the substrate is processed in accordance with the surface irregularity of the original.
摘要翻译： 公开了一种精细图案形成装置和精细图案检查装置。 在一种优选形式中，精细图案形成装置包括：表面不规则信息读取装置，用于在利用第一探针扫描表面时检测与原件的表面的表面不规则相对应的形状信号，以及表面不规则信息 用于处理待处理的基板的写入装置，同时通过使用第二探针扫描基板的表面，其中根据形状信号改变施加到第二探针的电压，同时第二探针和第二探针之间的距离 基板保持基本恒定，或者第二探针和基板之间的距离根据形状信号而改变，同时施加到第二探针的电压保持基本上恒定，使得基板根据表面不规则性被加工 的原来。
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公开(公告)号：US5959304A
公开(公告)日：1999-09-28
申请号：US80397
申请日：1998-05-18
申请人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
发明人： Toshinobu Tokita , Yuji Chiba , Yutaka Tanaka
IPC分类号： G03F7/20 , G03F9/00 , H01L21/027 , G21K5/00
CPC分类号： G03F7/70691 , G03F7/7035 , G03F9/70
摘要： An exposure apparatus for transferring a pattern, formed on a membrane of a mask, to an exposure region of a wafer disposed opposed to the mask with a small spacing kept therebetween. The apparatus includes an exposure system for transferring, by exposure, the pattern of the mask to different exposure regions of the wafer sequentially, a measuring system for producing deformation information related to at least one portion of the mask membrane, and an attitude controlling system for controlling attitude of at least one of the mask and the wafer, on the basis of the deformation information produced by the measuring system.
摘要翻译： 一种曝光装置，用于将形成在掩模的膜上的图案转印到与所述掩模相对设置的晶片的曝光区域，所述曝光区域间隔保持很小。 该装置包括曝光系统，用于通过曝光将掩模的图案顺序地转印到晶片的不同曝光区域，用于产生与面膜的至少一部分相关的变形信息的测量系统和用于 基于由测量系统产生的变形信息来控制掩模和晶片中的至少一个的控制姿态。
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公开(公告)号：US09271695B2
公开(公告)日：2016-03-01
申请号：US13512662
申请日：2011-01-26
申请人： Toshinobu Tokita , Yasuhiro Someda
发明人： Toshinobu Tokita , Yasuhiro Someda
CPC分类号： A61B8/0825 , A61B5/0095 , A61B8/4281
摘要： The present invention employs a measuring apparatus having: a holding plate for holding a subject; an acoustic matching member provided between the subject and the holding plate; and a probe for receiving an acoustic wave propagating through the subject via the acoustic matching member and the holding plate, wherein the acoustic matching member includes a first portion that contacts the subject and a second portion that contacts the holding plate, and the second portion has greater rigidity than the first portion.
摘要翻译： 本发明采用一种测量装置，其具有：用于保持被检体的保持板; 设置在所述被检体和所述保持板之间的声匹配部件; 以及用于经由所述声匹配部件和所述保持板接收通过所述被检体传播的声波的探针，其中所述声匹配部件包括接触被检体的第一部分和与所述保持板接触的第二部分，并且所述第二部分具有 比第一部分具有更大的刚度。
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公开(公告)号：US20130167648A1
公开(公告)日：2013-07-04
申请号：US13820564
申请日：2011-09-06
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
IPC分类号： G01N29/24
CPC分类号： G01N29/24 , A61B5/0095 , A61B8/0825 , A61B8/40 , A61B8/4209 , A61B8/429 , A61B8/485 , A61B8/5269 , G01N29/07 , G01N2291/02475 , G01N2291/02827 , G01S15/8945
摘要： An object information acquiring apparatus has: a holding unit which holds an object; a probe which receives an acoustic wave generated in the object via the holding unit and converts the acoustic wave to an electrical signal; a force measuring unit which measures a force applied to the object when the object is held by the holding unit; a sound speed acquiring unit which determines a sound speed in the object by using the force measured by the measuring unit and a contact area between the object and the holding unit; and a generating unit which generates object information data from the information about the sound speed determined by the sound speed acquiring unit and the electrical signal.
摘要翻译： 对象信息获取装置具有：保持对象的保持单元; 探测器，其经由所述保持单元接收在所述物体中产生的声波，并将所述声波转换为电信号; 力测量单元，其测量当所述物体被所述保持单元保持时施加到所述物体的力; 音速获取单元，其通过使用由测量单元测量的力和物体与保持单元之间的接触面积来确定物体中的声速; 以及生成单元，其从关于由声速获取单元确定的声速的信息和电信号生成对象信息数据。
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公开(公告)号：US20110014086A1
公开(公告)日：2011-01-20
申请号：US12677042
申请日：2008-09-10
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
CPC分类号： B81C1/00071 , B01J19/0093 , B01J2219/00783 , B01J2219/00826 , B01J2219/00831 , B01J2219/00833 , B01L3/502707 , B01L2200/0689 , B01L2300/0816 , B01L2300/0887 , B81B2201/058
摘要： There is provided a method of producing a microfluidic device including a substrate having a depressed portion and a cover member, whereby to reduce the dispersion of a geometric individual difference and the possibility that a non-joint area can occur in a joint portion between the substrate and the cover member. At the time of producing the microfluidic device, the depressed portion serving as a channel, a chamber and a reservoir is formed in advance in the substrate and a liquid-state energy ray curable resin is applied to the surface of the substrate in which the depressed portion is formed. The energy ray curable resin is cured by an energy ray irradiation unit and caused to serve as the cover on the depressed portion of the substrate, thereby to form the channel, chamber and reservoir.
摘要翻译： 提供了一种制造微流体装置的方法，该微流体装置包括具有凹陷部分和覆盖部件的基板，从而减小几何个体差异的分散，以及在基板之间的接合部分中可能发生非接合区域的可能性 和盖构件。 在制造微流体装置时，预先在基板中形成用作通道的凹陷部分，腔室和储存器，并且将液态能量射线固化树脂施加到基板的表面，其中凹陷 形成部分。 能量射线固化树脂通过能量射线照射单元固化，并用作衬底的凹陷部分上的盖，从而形成通道，室和储存器。
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公开(公告)号：US07846346B1
公开(公告)日：2010-12-07
申请号：US11531856
申请日：2006-09-14
IPC分类号： B44C1/22
CPC分类号： G03F7/0002 , B29C43/021 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： A processing method for transferring a relief pattern of a mold to a resist includes the steps of compressing the mold having the relief pattern against the resist on a substrate, irradiating an exposure light onto the resist through the mold, vibrating the mold and the substrate relative to each other during the irradiating step, and releasing the mold from the resist.
摘要翻译： 用于将模具的浮雕图案转印到抗蚀剂的处理方法包括以下步骤：将具有凹凸图案的模具压靠在基板上的抗蚀剂上，通过模具将曝光光照射到抗蚀剂上，使模具和基板相对振动 在照射步骤期间彼此相对，并且从抗蚀剂中释放模具。
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公开(公告)号：US07807065B2
公开(公告)日：2010-10-05
申请号：US11608009
申请日：2006-12-07
申请人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
发明人： Toshinobu Tokita , Hirohisa Ota , Eigo Kawakami , Kazuyuki Kasumi
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing method for forming a first pattern on a substrate to which a resist is applied includes the steps of pressing an original having a second pattern that has a relief reverse to that of the first pattern, against the resist on the substrate, and irradiating light onto the resist via the original, wherein a size of a concave of the second pattern is greater than a size of a convex of the first pattern corresponding to the concave of the second pattern, and a size of a convex of the second pattern is smaller than a size of a concave of the first pattern corresponding to the convex of the second pattern.
摘要翻译： 在施加抗蚀剂的基板上形成第一图案的处理方法包括将具有与第一图案相反的第二图案的原稿压在基板上的抗蚀剂上的步骤，以及照射光 经由原稿到抗蚀剂上，其中第二图案的凹部的尺寸大于与第二图案的凹部对应的第一图案的凸起的尺寸，并且第二图案的凸起的尺寸较小 比第一图案的凹部的尺寸对应于第二图案的凸起。
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公开(公告)号：US07789647B2
公开(公告)日：2010-09-07
申请号：US11149046
申请日：2005-06-08
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00
摘要： A processing apparatus for transferring a relief pattern on a mold to a resist on a substrate through a compression of the mold against the resist, and an irradiation of light for exposing the resist onto the resist includes a mold chuck for holding the mold and for compressing the mold against the resist, and a deformation reducing part for reducing a deformation of the mold when the mold chuck applies a compression force to the mold.
摘要翻译： 一种处理装置，用于通过将模具压靠在抗蚀剂上将模具上的浮雕图案转印到基板上的抗蚀剂上，以及用于将抗蚀剂暴露于抗蚀剂上的光的照射包括用于保持模具并压缩的模具卡盘 抵抗抗蚀剂的模具，以及用于当模具卡盘向模具施加压缩力时减小模具的变形的变形减小部件。
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公开(公告)号：US07528930B2
公开(公告)日：2009-05-05
申请号：US11029674
申请日：2005-01-04
申请人： Toshinobu Tokita
发明人： Toshinobu Tokita
CPC分类号： G03F7/70341 , G03B27/52 , G03F7/70891
摘要： An exposure apparatus includes a projection optical system for projecting a pattern on a reticle onto a substrate, the projection optical system including an optical element closest to the substrate, an illumination optical system for illuminating the reticle using light from a light source, and a temperature controller for controlling a temperature of the optical element and thereby a temperature of a fluid that is filled in a space between the optical element in the projection optical system and the substrate, the exposure apparatus exposing the substrate via said projection optical system and the fluid.
摘要翻译： 曝光装置包括用于将掩模版上的图案投影到基板上的投影光学系统，所述投影光学系统包括最靠近所述基板的光学元件，使用来自光源的光照射所述掩模版的照明光学系统，以及温度 控制器，用于控制光学元件的温度，从而填充在投影光学系统中的光学元件与基板之间的空间中的流体的温度，曝光装置经由所述投影光学系统和流体曝光基板。
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