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47 条记录 (耗时 0.027 秒)

    Silicon-containing step ladder polymer and a process for producing the same
    31.
    发明授权
    Silicon-containing step ladder polymer and a process for producing the same 失效
    含硅阶梯聚合物及其制造方法

    公开(公告)号：US4585834A

    公开(公告)日：1986-04-29

    申请号：US758367

    申请日：1985-07-24

    申请人： Shiro Konotsune ,  Hiromi Higashi ,  Masami Wada ,  Hiroshi Maehara ,  Kazuyuki Tsuji

    发明人： Shiro Konotsune ,  Hiromi Higashi ,  Masami Wada ,  Hiroshi Maehara ,  Kazuyuki Tsuji

    IPC分类号： C08F8/42 ,  C08F8/40

    CPC分类号： C08F8/42

    摘要： A silicon-containing step ladder polymer comprising a unit represented by the following general formula (I): ##STR1## a unit represented by the following general formula (II): ##STR2## and a unit represented by the following general formula (III): ##STR3## where R.sup.1 represents a hydrocarbon or fluorine-substituted hydrocarbon group, R.sup.2 represents hydrogen or a trialkyl siloxy group, and R.sup.3 and R.sup.4 which may be identical or different with each other represent individually hydrocarbon or fluorine-substituted hydrocarbon groups, the molar ratio of the unit (I) to the unit (II) is between 5:1-100:1 and the molar ratio of the unit (III) to the total amount of the unit (I)+unit (II) is between 1:5-1:100, as well as a process for producing such polymer.

    摘要翻译： 一种含硅梯形聚合物，其包含由以下通式（I）表示的单元：（I）由以下通式（II）表示的单元：由下式（I）表示的单元： （III）：其中R 1表示烃或氟取代的烃基，R 2表示氢或三烷基甲硅烷氧基，R 3和R 4可以相同或不同，表示单独的烃 或氟取代的烃基，单元（I）与单元（II）的摩尔比为5:1-1:1:1，单元（III）与单元（I）的总量的摩尔比 ）+单元（II）在1：5-1：100之间，以及制备这种聚合物的方法。

    Apparatus for handling minute object
    35.
    发明申请
    Apparatus for handling minute object 失效
    用于处理分钟物体的装置

    公开(公告)号：US20060092517A1

    公开(公告)日：2006-05-04

    申请号：US10537413

    申请日：2004-04-19

    申请人： Hiroshi Maehara

    发明人： Hiroshi Maehara

    IPC分类号： G02B27/00

    CPC分类号： G03H1/0005 ,  G03H1/0244 ,  G03H1/2205 ,  G03H2001/0077 ,  G03H2001/0478 ,  G03H2001/085 ,  G03H2001/221 ,  G03H2210/55

    摘要： An apparatus for handling a minute object such as a cell by using a holographic optical tweezers that comprises a laser light source 1, holographic plate 3 having a specified pattern to form a hologram with light emitted from the light source, and a transparent plate that holds a liquid including a minute object, wherein the holographic plate 3 is irradiated with laser light emitted from the laser light source 1, and the laser light passed through the holographic plate 3 is focused in a sample solution 7 held on the transparent plate 6 to form a hologram having a pattern according to the pattern of the holographic plate 3 in the sample solution 7.

    摘要翻译： 一种用于通过使用全息光学镊子来处理诸如单元的微小物体的装置，其包括激光光源1，具有指定图案的全息板3，以从光源发射的光形成全息图;以及透明板，其保持 包含微小物体的液体，其中，从激光光源1发射的激光照射全息板3，并且穿过全息板3的激光聚焦在保持在透明板6上的样品溶液7中，以形成 具有根据样品溶液7中的全息板3的图案的图案的全息图。

    Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device
    37.
    发明授权
    Photosensitive resin composition, resist composition, fabricating method for patterned substrate, and device 失效
    光敏树脂组合物，抗蚀剂组合物，图案化基板的制造方法和装置

    公开(公告)号：US06866973B2

    公开(公告)日：2005-03-15

    申请号：US09998228

    申请日：2001-12-03

    申请人： Hiroshi Maehara

    发明人： Hiroshi Maehara

    IPC分类号： C08K5/00 ,  C08L1/28 ,  C08L101/02 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03F7/30

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

    摘要： There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.

    摘要翻译： 提供了至少含有具有糖结构的聚合物化合物的感光性树脂组合物，其具有在酸存在下可分离的官能团中的至少两种，通过电磁波的放射产生酸的光酸反应器，或 带电粒子束，另外还有抗蚀剂组合物，制造用于制造半导体器件的图案化衬底的方法等，以及诸如高度集成的半导体等的器件。

    Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device
    38.
    发明申请
    Photosensitive resin composition, resist composition, fabrication method for patterned substrate, and device 失效
    光敏树脂组合物，抗蚀剂组合物，图案化基板的制造方法和装置

    公开(公告)号：US20050031992A1

    公开(公告)日：2005-02-10

    申请号：US10942890

    申请日：2004-09-17

    申请人： Hiroshi Maehara

    发明人： Hiroshi Maehara

    IPC分类号： C08K5/00 ,  C08L1/28 ,  C08L101/02 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027 ,  G03C1/76

    CPC分类号： G03F7/039 ,  G03F7/0045 ,  Y10S430/143 ,  Y10S430/167 ,  Y10S430/168

    摘要： There are provided a photosensitive resin composition containing at least a polymer compound having a sugar structure, which has at least two species of functional groups cleavable in the presence of an acid, and a photo acid generator generating an acid by radiation of an electromagnetic wave or a beam of an electrically charged particle, and in addition, a resist composition, a method for fabricating a patterned substrate for fabricating a semiconductor device and the like, and a device such as a highly integrated semiconductor and the like.

    摘要翻译： 提供了至少含有具有糖结构的聚合物化合物的感光性树脂组合物，其具有在酸存在下可分离的官能团中的至少两种，通过电磁波的放射产生酸的光酸反应器，或 带电粒子束，另外还有抗蚀剂组合物，制造用于制造半导体器件的图案化衬底的方法等，以及诸如高度集成的半导体等的器件。

    Illuminator, exposure apparatus, and method for fabricating device using the same
    39.
    发明授权
    Illuminator, exposure apparatus, and method for fabricating device using the same 失效
    照明器，曝光装置及使用其的装置的制造方法

    公开(公告)号：US06795166B2

    公开(公告)日：2004-09-21

    申请号：US09159775

    申请日：1998-09-24

    申请人： Hideo Kato ,  Hiroshi Maehara

    发明人： Hideo Kato ,  Hiroshi Maehara

    IPC分类号： G03B2754

    CPC分类号： G03F7/70958 ,  G03F7/70158 ,  G03F7/70316 ,  G03F7/70741 ,  G03F7/70916

    摘要： In a projection aligner for illuminating a pattern on a mask with a luminous flux from a light source through an illumination system and projecting the pattern onto a wafer with a projection optical system, a titanium oxide (TiO2) film is provided on the surface of at least one optical unit in the projection aligner. Thus, contamination of the projection aligner can be reduced.

    摘要翻译： 在用于通过照明系统从光源照射掩模上的图案并将图案投射到晶片上的投影对准器中，在投影光学系统的表面上设置氧化钛（TiO 2）膜 投影对准器中的至少一个光学单元。 因此，可以减少投影对准器的污染。

    Decomposable resin composition and method for producing the same
    40.
    发明授权
    Decomposable resin composition and method for producing the same 失效
    可分解树脂组合物及其制备方法

    公开(公告)号：US06653364B2

    公开(公告)日：2003-11-25

    申请号：US09987790

    申请日：2001-11-16

    申请人： Hiroshi Maehara

    发明人： Hiroshi Maehara

    IPC分类号： C08J300

    CPC分类号： C08J11/12 ,  C08G63/672 ,  C08G63/916 ,  C08J2367/04 ,  C08K5/0033 ,  Y02W30/703 ,  C08L67/00

    摘要： The invention provides a decomposable resin composition, which is stable at the time of use and which quickly decomposes when discarded. According to the present invention, there is provided a resin composition comprising an agent generating an acid or a base upon response to light or heat together with a hydrolyzable and biodegradable resin. The decomposable resin composition can promote decomposition of the polymer by generating an acid or a base in the resin by carrying out light irradiation and/or a heat treatment at a desired time and can control the decomposition speed of the polymer by controlling the generation amount of an acid or a base.

    摘要翻译： 本发明提供一种可分解​​树脂组合物，其在使用时是稳定的，并且在丢弃时迅速分解。 根据本发明，提供了一种树脂组合物，其包含与可水解和可生物降解的树脂一起响应于光或热产生酸或碱的试剂。 可分解树脂组合物可以通过在所需时间进行光照射和/或热处理在树脂中产生酸或碱而促进聚合物的分解，并且可以通过控制聚合物的发生量来控制聚合物的分解速度 酸或碱。