公开(公告)号：US20070172233A1

公开(公告)日：2007-07-26

申请号：US11623231

申请日：2007-01-15

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G03D5/00

CPC分类号： G03D3/00 ,  H01L21/67028 ,  H01L21/67034 ,  H01L21/67051 ,  H01L21/67225

摘要： A substrate processing apparatus comprises an indexer block, an anti-reflection film processing block, a resist film processing block, a development processing block, a resist cover film processing block, a resist cover film removal block, and an interface block. An exposure device is arranged adjacent to the interface block. The interface block includes a substrate replacement group. The substrate replacement group has a stack of three cleaning/drying processing units. The cleaning/drying processing unit subjects the substrate after exposure processing to cleaning and drying processing.

摘要翻译： 基板处理装置包括分度器块，抗反射膜处理块，抗蚀剂膜处理块，显影处理块，抗蚀剂覆盖膜处理块，抗蚀剂覆盖膜去除块和界面块。 曝光装置设置在接口块附近。 接口块包括基板更换组。 基板更换组具有三个清洁/干燥处理单元的堆叠。 清洁/干燥处理单元在曝光处理之后对基板进行清洁和干燥处理。

公开(公告)号：US07163331B2

公开(公告)日：2007-01-16

申请号：US10641720

申请日：2003-08-15

申请人： Toshihiro Suzuki ,  Tetsuya Hamada ,  Mari Sugawara ,  Tetsuya Kobayashi ,  Keiji Hayashi

发明人： Toshihiro Suzuki ,  Tetsuya Hamada ,  Mari Sugawara ,  Tetsuya Kobayashi ,  Keiji Hayashi

IPC分类号： F21V7/04 ,  F21V8/00

CPC分类号： G02B6/0028 ,  G02B6/00 ,  G02B6/003 ,  G02B6/0038 ,  G02B6/0056 ,  G02F1/133615

摘要： A lighting unit and a liquid crystal display device which can improve the efficiency of usable light. The lighting unit includes a light source, a light guide plate, and a truncated pyramid located between the light guide plate and the light source. The truncated pyramid has a base, a top smaller than the base, and a slope linking the base and the top. The light source is placed in close contact with the top of the truncated pyramid, and the light guide plate is placed in close contact with the base of the truncated pyramid. Light is propagated from a light emitting part of the light source to the light guide plate without passing through any air layer. Also, an unnecessary light removing structure is provided in the light guide plate near the incidence surface thereof.

摘要翻译： 照明单元和能够提高可用光效率的液晶显示装置。 照明单元包括光源，导光板和位于导光板和光源之间的截头棱锥。 截头棱锥具有基部，顶部小于基部，以及连接基部和顶部的斜面。 光源被放置成与截顶的金字塔的顶部紧密接触，并且导光板被放置成与截顶金字塔的基部紧密接触。 光从光源的发光部分传播到导光板，而不通过任何空气层。 而且，在导光板的入射面附近设有不必要的光去除结构。

公开(公告)号：US20060120716A1

公开(公告)日：2006-06-08

申请号：US11294268

申请日：2005-12-05

申请人： Tetsuya Hamada

发明人： Tetsuya Hamada

IPC分类号： G03D5/00

CPC分类号： H01L21/67225 ,  G03F7/168 ,  G03F7/2006 ,  H01L21/67748

摘要： When a first substrate transferred outwardly from an indexer cell is the last substrate prior to reticle change in an exposure apparatus, the outward transfer of a second substrate to be processed subsequently to the first substrate from the indexer cell is temporarily stopped. After a lapse of time corresponding to reticle replacement time, the outward substrate transfer is restarted, and the second substrate is transferred outwardly from the indexer cell. For the exposure apparatus, the second substrate subjected to a resist coating process is received at the instant when the reticle replacement is completed after the completion of the exposure process of the first substrate. This provides a constant time interval between the completion of the resist coating process of substrates and the execution of the exposure process thereof without the decrease in processing efficiency. As a result, a uniform processing history for the substrates is achieved to further improve the line width uniformity of a pattern.

公开(公告)号：US06882388B2

公开(公告)日：2005-04-19

申请号：US10051709

申请日：2002-01-18

申请人： Norio Sugiura ,  Katsufumi Ohmuro ,  Yoshio Koike ,  Kunihiro Tashiro ,  Takeshi Gotoh ,  Tetsuya Hamada ,  Keiji Hayashi ,  Toshihiro Suzuki ,  Tetsuya Kobayashi ,  Kimiaki Nakamura ,  Mari Sugawara

发明人： Norio Sugiura ,  Katsufumi Ohmuro ,  Yoshio Koike ,  Kunihiro Tashiro ,  Takeshi Gotoh ,  Tetsuya Hamada ,  Keiji Hayashi ,  Toshihiro Suzuki ,  Tetsuya Kobayashi ,  Kimiaki Nakamura ,  Mari Sugawara

IPC分类号： G02F1/1335 ,  G02F1/13357

CPC分类号： G02F1/133553 ,  G02F1/133504 ,  G02F2001/133507 ,  G02F2001/133541 ,  G02F2001/133616 ,  G02F2001/133626

摘要： The present invention is a method of manufacturing a liquid crystal display device, wherein light having an exposure energy is irradiated on the surface of a photo-sensitive resin layer having a predetermined film thickness, and a distribution of thermal deformation characteristics in the thickness direction (or the plane direction) of the photo-sensitive resin layer is formed, then heat treatment is performed to form random undulation (micro-grooves or micro-wrinkles) on the surface of the photo-sensitive resin layer.

公开(公告)号：US06807455B2

公开(公告)日：2004-10-19

申请号：US10459833

申请日：2003-06-11

申请人： Takushi Yoshida ,  Tetsuya Hamada

发明人： Takushi Yoshida ,  Tetsuya Hamada

IPC分类号： G06F1900

CPC分类号： H01L21/6715 ,  G05B2219/32192 ,  G05B2219/33284 ,  G05B2219/45031 ,  H01L21/67253 ,  Y02P90/22

摘要： A reference command value is transmitted from an apparatus server (90) through a network (96d) to spin processing units (SR1-SR4) of a substrate processing apparatus (1). Next, a plurality of correction amounts for making processing states in the respective spin processing units (SR1-SR4) substantially the same are computed from a plurality of measured values corresponding to the respective spin processing units (SR1-SR4) and the reference command value, and are additionally stored in a correction amount database (90a). For execution of substrate processing, a plurality of correction amounts corresponding to the reference command value are extracted from the database, and corresponding ones of the correction amounts plus the reference command value are transmitted to the respective spin processing units (SR1-SR4).

公开(公告)号：US06655810B2

公开(公告)日：2003-12-02

申请号：US09821976

申请日：2001-03-30

申请人： Keiji Hayashi ,  Takeshi Gotoh ,  Toshihiro Suzuki ,  Hisashi Yamaguchi ,  Tetsuya Kobayashi ,  Tetsuya Hamada ,  Mari Sugawara

发明人： Keiji Hayashi ,  Takeshi Gotoh ,  Toshihiro Suzuki ,  Hisashi Yamaguchi ,  Tetsuya Kobayashi ,  Tetsuya Hamada ,  Mari Sugawara

IPC分类号： F21V704

CPC分类号： G02B6/0031 ,  G01D11/28 ,  G02B6/0036 ,  G02B6/0061 ,  G02B6/0071 ,  G02F1/133604 ,  G02F1/133606 ,  G02F2202/28

摘要： The invention relates to a backlight unit for liquid crystal displays, etc.; and its object is to provide a backlight unit not involving the problem that the emitted light leaks out of the optical waveguide, even when the space around the cold-cathode tubes in the light source unit for it is filled with a liquid of which the refractive index is nearly the same as that of the glass material that forms the outer wall of the cold-cathode tubes. The backlight unit comprises a housing 6 which houses cold-cathode tubes 2, 4 therein and of which the inner surface is coated with a light reflector 10; a transparent liquid filled in the housing 6; and an optical waveguide 1 made of a transparent substance and having a light-emitting surface S. The reflective surface of the light reflector 10 has a cross-section profile of X-T-U-V-W-Y, on which the light emitted by the cold-cathode tubes 2, 4 is reflected, and the thus-reflected light is led to the light-emitting surface S of the optical waveguide 1 at an incident angle not smaller than the critical angle to the surface S.

公开(公告)号：US6111700A

公开(公告)日：2000-08-29

申请号：US266614

申请日：1999-03-11

申请人： Tetsuya Kobayashi ,  Mari Sugawara ,  Tetsuya Hamada ,  Toshihiro Suzuki ,  Noriyuki Ohashi ,  Takeshi Gotoh ,  Hisashi Yamaguchi

发明人： Tetsuya Kobayashi ,  Mari Sugawara ,  Tetsuya Hamada ,  Toshihiro Suzuki ,  Noriyuki Ohashi ,  Takeshi Gotoh ,  Hisashi Yamaguchi

IPC分类号： G02B5/30 ,  G02F1/13357 ,  H04N9/31 ,  G02B27/10 ,  G02B27/28 ,  G02F1/13 ,  G03B21/14

CPC分类号： G02F1/13362 ,  G02B5/3025 ,  H04N9/3105 ,  H04N9/3167

摘要： A polarization device includes a reflection-type polarization element disposed at a side to which an optical beam comes in and an absorption-type polarization element disposed behind the reflection-type polarization element, wherein the reflection-type polarization element and the absorption-type polarization element are disposed such that a transmission axis of the reflection-type polarization element coincides with the transmission axis of the absorption-type polarization element. Further, an optical projector using such a polarization device is disclosed.

摘要翻译： 偏振装置包括设置在光束入射侧的反射型偏振元件和设置在反射型偏振元件后面的吸收型偏振元件，其中反射型偏振元件和吸收型偏振 元件被布置成使得反射型偏振元件的透射轴与吸收型偏振元件的透射轴一致。 此外，公开了使用这种偏振装置的光投影仪。

公开(公告)号：US5867389A

公开(公告)日：1999-02-02

申请号：US757069

申请日：1996-11-26

申请人： Tetsuya Hamada ,  Hidekazu Inoue

发明人： Tetsuya Hamada ,  Hidekazu Inoue

IPC分类号： G11B7/26 ,  G05B19/418 ,  H01L21/02 ,  H01L21/66 ,  H01L21/677 ,  G06F19/00

CPC分类号： H01L22/20 ,  G05B19/41865 ,  G05B2219/31151 ,  G05B2219/31206 ,  G05B2219/32129 ,  G05B2219/45031 ,  Y02P90/18 ,  Y02P90/20

摘要： A substrate processing system includes a plurality of processing stations for processing substrates, and a management station connected with the plurality of processing stations to constitute a computer network. Each processing station includes a plurality of processing units for treating the substrates, first storage device for storing processing recipes, and inter-station recipe copy unit for copying a desired processing recipe from another processing station and storing the copied processing recipe into the first storage device. Each processing recipe defines an order of conveyance of each substrate among the plurality of processing units and processing conditions in each processing unit. The management station includes second storage means for storing processing recipes for the plurality of processing stations, and specification upload/download means for transferring a desired processing recipe between the second storage means and the first storage means included in each of the plurality of processing stations and for storing the transferred processing recipe therein.

摘要翻译： 基板处理系统包括用于处理基板的多个处理站，以及与多个处理站连接以构成计算机网络的管理站。 每个处理站包括用于处理基板的多个处理单元，用于存储处理配方的第一存储装置和用于从另一个处理站复制所需处理配方的站间配方复制单元，并将复制的处理配方存储到第一存储装置 。 每个处理配方确定多个处理单元中的每个基板的输送顺序和每个处理单元中的处理条件。 管理站包括用于存储多个处理站的处理配方的第二存储装置和用于在第二存储装置和包括在多个处理站中的每个处理站中的第一存储装置之间传送所需处理配方的规范上载/下载装置，以及 用于存储转移的处理配方。

公开(公告)号：US5515072A

公开(公告)日：1996-05-07

申请号：US455726

申请日：1995-05-31

申请人： Kenichi Yanai ,  Kenichi Oki ,  Tetsuya Hamada ,  Kazuhiro Takahara ,  Yasuyoshi Mishima ,  Tsutomu Tanaka

发明人： Kenichi Yanai ,  Kenichi Oki ,  Tetsuya Hamada ,  Kazuhiro Takahara ,  Yasuyoshi Mishima ,  Tsutomu Tanaka

IPC分类号： G02F1/1362 ,  G09G3/36

CPC分类号： G09G3/3659 ,  G09G3/3648 ,  G02F2001/136245 ,  G02F2201/122 ,  G09G2300/0809 ,  G09G2300/0823 ,  G09G2310/0224 ,  G09G2310/0281 ,  G09G2320/0204 ,  G09G2320/0209 ,  G09G2320/0219 ,  G09G2320/0247 ,  G09G2330/08 ,  G09G3/3614

摘要： In an active matrix-type display device where scan bus lines (S.sub.i) and data bus lines (D.sub.j) are formed on different substrates, two kinds of scan bus lines (SP.sub.i, SN.sub.i) are provided. A first switching element (TFTN.sub.ij) is connected between a reference voltage supply line (V.sub.R) and a display electrode (E.sub.ij), and is controlled by a first scan bus line (SN.sub.i), and a second switching element (TFTP.sub.ij) is connected between the reference voltage supply bus line (V.sub.R) and the display electrode, and is controlled by a second scan bus line (SP.sub.i). The first switching element (TFTN.sub.ij) is turned ON by a positive or negative potential at the first scan bus line.

公开(公告)号：US08865939B2

公开(公告)日：2014-10-21

申请号：US13878090

申请日：2011-10-05

申请人： Naritoshi Yoshimura ,  Shinji Kiyono ,  Tetsuya Hamada ,  Eiji Watanabe ,  Saiko Sawada

发明人： Naritoshi Yoshimura ,  Shinji Kiyono ,  Tetsuya Hamada ,  Eiji Watanabe ,  Saiko Sawada

IPC分类号： C07C209/00 ,  C07C253/34 ,  C07C209/48 ,  C07C253/22 ,  B01J23/44 ,  B01J25/00 ,  B01J25/02

CPC分类号： C07C209/48 ,  B01J23/44 ,  B01J25/00 ,  B01J25/02 ,  C07B2200/09 ,  C07C253/22 ,  C07C253/34 ,  C07C2601/14 ,  C07C255/46 ,  C07C211/18

摘要： A method for producing trans-1,4-bis(aminomethyl)cyclohexane includes a nuclear hydrogenation step of producing a hydrogenated terephthalic acid or terephthalic acid derivative by nuclear hydrogenation of a terephthalic acid or terephthalic acid derivative, the terephthalic acid or terephthalic acid derivative being at least one selected from the group consisting of terephthalic acid, terephthalic acid ester, and terephthalic acid amide; a cyanation step of treating the hydrogenated terephthalic acid or terephthalic acid derivative with ammonia, thereby producing 1,4-dicyanocyclohexane, and producing trans-1,4-dicyanocyclohexane from the obtained 1,4-dicyanocyclohexane; and an aminomethylation step of treating the trans-1,4-dicyanocyclohexane with hydrogen, thereby producing trans-1,4-bis(aminomethyl)cyclohexane. Metal oxide is used as a catalyst in the cyanation step, and the obtained trans-1,4-dicyanocyclohexane has a metal content of 3000 ppm or less.

摘要翻译： 反式-1,4-双（氨基甲基）环己烷的制造方法包括通过对苯二甲酸或对苯二甲酸衍生物的核氢化制造氢化对苯二甲酸或对苯二甲酸衍生物的核氢化工序，对苯二甲酸或对苯二甲酸衍生物为 选自对苯二甲酸，对苯二甲酸酯和对苯二甲酸酰胺中的至少一种; 用氨处理氢化对苯二甲酸或对苯二甲酸衍生物的氰化步骤，从而得到1,4-二氰基环己烷，由所得1,4-二氰基环己烷生产反式-1,4-二氰基环己烷; 和用氢处理反式-1,4-二氰基环己烷的氨基甲基化步骤，从而产生反式-1,4-双（氨基甲基）环己烷。 在氰化步骤中使用金属氧化物作为催化剂，得到的反式-1,4-二氰基环己烷的金属含量为3000ppm以下。