HERBICIDAL COMPOSITION COMPRISING FLAZASULFURON AND METRIBUZIN
    31.
    发明申请
    HERBICIDAL COMPOSITION COMPRISING FLAZASULFURON AND METRIBUZIN 有权
    包含FLAZASULFURON和METRIBUZIN的除草组合物

    公开(公告)号:US20140128263A1

    公开(公告)日:2014-05-08

    申请号:US14110289

    申请日:2012-04-06

    IPC分类号: A01N43/707 A01N43/54

    摘要: Many herbicidal compositions have been developed and are presently used. However, weeds to be controlled are various in types and their emergence extends over a long period. Accordingly, it is desired to develop a herbicidal composition which has a broader herbicidal spectrum, a high activity and a long-lasting effect.The present invention provides a herbicidal composition comprising, as active ingredients, (a) flazasulfuron or its salt and (b) metribuzin or its salt.

    摘要翻译: 已经开发了许多除草组合物并且目前被使用。 然而,要控制的杂草是各种类型的,并且它们的出现延长了很长时间。 因此,需要开发具有更宽的除草频谱,高活性和持久效果的除草组合物。 本发明提供一种除草组合物,其包含作为活性成分的(a)氟磺佐隆或其盐和(b)格列嗪或其盐。

    METHOD FOR REDUCING UNDESIRABLE EFFECTS ON TURFGRASS
    32.
    发明申请
    METHOD FOR REDUCING UNDESIRABLE EFFECTS ON TURFGRASS 有权
    减少不利效果的方法

    公开(公告)号:US20120322656A1

    公开(公告)日:2012-12-20

    申请号:US13582321

    申请日:2011-03-02

    IPC分类号: A01N25/32 A01P13/00

    摘要: To provide a method for managing a lawn at a site, such as a golf course, where turfgrass less sensitive to herbicides and turfgrass highly sensitive to herbicides are used in combination, without causing undesirable effects on the highly sensitive turfgrass. A herbicidal compound and a silicone surfactant are applied to a site where turfgrass less sensitive to the herbicidal compound is planted, thereby to reduce undesirable effects on nearby turfgrass highly sensitive to the herbicidal compound.

    摘要翻译: 提供一种用于管理诸如高尔夫球场的草坪的方法,其中对除草剂敏感的草坪草和对除草剂非常敏感的草坪草组合使用,而不会对高度敏感的草坪草产生不期望的影响。 将除草化合物和有机硅表面活性剂施用于植物对除草化合物敏感性较低的草坪草的地点,从而减少对除草化合物高度敏感的附近草坪草的不良影响。

    Rinse treatment method and development process method
    33.
    发明授权
    Rinse treatment method and development process method 有权
    冲洗处理方法和开发工艺方法

    公开(公告)号:US07968278B2

    公开(公告)日:2011-06-28

    申请号:US11578055

    申请日:2005-03-02

    IPC分类号: G03F7/26 G03F7/30

    CPC分类号: H01L21/67051 G03F7/3021

    摘要: A rinsing method for performing a rinsing process on a substrate, after a developing process is performed on a light-exposed pattern disposed thereon, includes a step (STEP 5) of throwing off a developing solution from the substrate after development; a step (STEP 6) of supplying a water-based cleaning liquid onto the substrate; a step (STEP 7) of supplying a surfactant-containing rinsing liquid onto the substrate to replace liquid remaining on the substrate with the surfactant-containing rinsing liquid; and a step (STEP 8) of rotating the substrate to expand and throw off the surfactant-containing rinsing liquid on the substrate. STEP 8 is arranged to supply the surfactant-containing rinsing liquid for a supply time of 5 seconds or less. STEP 9 is arranged to include a first period with a lower rotation number and a second period with a higher rotation number, and to set the rotation number of the substrate in the first period to be more than 300 rpm and less than 1,000 rpm.

    摘要翻译: 在对其上设置的曝光图案进行显影处理之后,在基板上进行漂洗处理的漂洗方法包括在显影后从显影基板抛出显影液的工序(步骤5) 向基板供给水性清洗液的工序(工序6) 将含表面活性剂的冲洗液供给到基板上以用含表面活性剂的冲洗液取代残留在基板上的液体的步骤(STEP7) 以及使基板旋转以使基板上含表面活性剂的冲洗液体膨胀和脱落的工序(步骤8)。 步骤8被布置成供给含有表面活性剂的冲洗液,供给时间为5秒以下。 步骤9被布置成包括具有较低转数的第一周期和具有较高转数的第二周期,并且将第一周期中的基板的转数设定为大于300rpm且小于1,000rpm。

    Semiconductor device and method of manufacturing the same
    34.
    发明授权
    Semiconductor device and method of manufacturing the same 失效
    半导体装置及其制造方法

    公开(公告)号:US07038281B2

    公开(公告)日:2006-05-02

    申请号:US10619431

    申请日:2003-07-16

    IPC分类号: H01L29/72

    摘要: A semiconductor device including plural CMOS transistors with first and second transistors sharing a common first gate electrode and third and fourth transistors sharing a common second gate electrode that is adjacent and parallel to the first gate electrode. The first and third transistors share a common n-type channel MOS region and the second and fourth transistors share a common p-type channel MOS region. The semiconductor device has a wire connecting the n-type channel MOS region and the p-type channel MOS region. The wire has a width greater than a distance between the first and second adjacent gate electrodes, and a portion of the wire is disposed right above a portion of at least one of the first and second gate electrodes with an insulating film interposed therebetween.

    摘要翻译: 一种包括多个CMOS晶体管的半导体器件,其中第一和第二晶体管共享共同的第一栅电极,第三和第四晶体管共享与第一栅电极相邻并平行的公共第二栅电极。 第一和第三晶体管共享共同的n型沟道MOS区,第二和第四晶体管共享公共p型沟道MOS区。 半导体器件具有连接n型沟道MOS区和p型沟道MOS区的导线。 所述导线的宽度大于所述第一和第二相邻栅电极之间的距离,并且所述导线的一部分设置在所述第一和第二栅电极中的至少一个的一部分的正上方,其间插入绝缘膜。

    Key switch and keyboard
    37.
    发明授权
    Key switch and keyboard 有权
    钥匙开关和键盘

    公开(公告)号:US06376789B2

    公开(公告)日:2002-04-23

    申请号:US09833709

    申请日:2001-04-13

    IPC分类号: H01H1370

    摘要: A key switch includes a base, a key top arranged above the base, a pair of link members interlocked to each other to support the key top above the base and direct the key top in a vertical direction, and a switching mechanism capable of opening and closing an electric circuit in connection with a vertical movement of the key top. Each of the link members includes an engagable end region engaged with the key top. The base includes an inner peripheral surface defining an opening capable of receiving the link members. The base is provided on the inner peripheral surface with protruding wall parts located at positions respectively facing oppositely to the engagable end regions of the link members. Each protruding wall part serves to locally reduce a clearance defined between the inner peripheral surface and the engagable region of each link member when the link member is received in the opening.

    摘要翻译: 钥匙开关包括基座,布置在基座上方的键顶,一对互锁的支撑构件,以支撑基座上方的键顶部并在顶部方向上引导键顶;以及切换机构,其能够打开和 关闭与键顶的垂直运动有关的电路。 每个链接构件包括与键顶接合的可接合的端部区域。 底座包括限定能够接收连杆构件的开口的内周面。 基部设置在内周面上,突出壁部位于分别面对连接构件的可接合端部区域的相对的位置。 当连接构件被容纳在开口中时,每个突出壁部分用于局部地减小限定在每个连杆构件的内周表面和可接合区域之间的间隙。

    Image-forming machine
    39.
    发明授权
    Image-forming machine 失效
    成像机

    公开(公告)号:US5826153A

    公开(公告)日:1998-10-20

    申请号:US962773

    申请日:1997-11-03

    IPC分类号: G03G21/10 G03G21/00 A47L13/40

    CPC分类号: G03G21/0035

    摘要: An image-forming machine including a photosensitive drum which is rotatably disposed and successively passes through a charging zone, a developing zone and a transfer zone; a charger for charging the peripheral surface of the photosensitive drum into a predetermined polarity; a developing device for developing an electrostatic latent image formed on the peripheral surface of the photosensitive drum into a toner image; a transfer means for transferring the toner image formed on the peripheral surface of the photosensitive drum onto a transfer paper; and a foreign matter-recovering means which is disposed between the transfer zone and the charging zone and comes into contact with the peripheral surface of the photosensitive drum, and removes foreign matter adhered onto the peripheral surface of the photosensitive drum, the foreign matter-recovering means having a foreign matter-recovering brush brought into contact with the peripheral surface of the photosensitive drum, an elastic holding member made of an elastic material mounting said foreign matter-recovering brush, and a brush-support member for supporting said elastic holding member, and the foreign matter-recovering brush being press-contacted to the peripheral surface of the photosensitive drum by the compressive elastic force of the elastic holding member.

    摘要翻译: 一种图像形成机,包括可旋转地设置并依次通过充电区,显影区和转印区的感光鼓; 用于将感光鼓的外围表面充电成预定极性的充电器; 用于将形成在感光鼓的周面上的静电潜像显影成调色剂图像的显影装置; 用于将形成在感光鼓的周面上的调色剂图像转印到转印纸上的转印装置; 以及异物回收装置,其设置在转印区域和充电区域之间并与感光鼓的周面接触,并且去除附着在感光鼓的外周表面上的异物,异物回收 具有与感光鼓的周面接触的异物回收刷的装置,由安装所述异物回收刷的弹性材料制成的弹性保持构件和用于支撑所述弹性保持构件的刷支撑构件, 并且异物回收刷通过弹性保持构件的压缩弹性力被压接到感光鼓的周面。

    Pharmaceutical use of forskolin derivatives
    40.
    发明授权
    Pharmaceutical use of forskolin derivatives 失效
    福斯高林衍生物的药用

    公开(公告)号:US5789439A

    公开(公告)日:1998-08-04

    申请号:US861262

    申请日:1997-05-21

    IPC分类号: A61K31/35 A61K31/352

    CPC分类号: A61K31/352 A61K31/35

    摘要: The present invention relates to novel pharmaceutical use of forskolin derivatives represented by the general formula: ##STR1## wherein R.sup.1, R.sup.2 and Ac are as defined later ##STR2## (wherein R.sup.3 and R.sup.4 are each hydrogen or lower alkyl group, or R.sup.3 and R.sup.4 may be combined to represent lower alkylene group which may have oxygen or nitrogen atom in the linking chain, and n is an integer of 1 to 5); R.sup.2 represents hydrocarbon group having 2 to 3 carbon atoms; and Ac represents acetyl group. The above-mentioned forskolin derivative or a physiologically acceptable salt thereof can be used as a platelet aggregation inhibiting or controlling agent, spasmolytic agent, therapeutic agent for skin ulcer, peripheral circulation improving agent for limbs and differentiation inducing and promoting agent.

    摘要翻译: 本发明涉及由以下通式表示的毛喉素衍生物的新型药物用途:其中R1,R2和Ac如下文定义(其中R3和R4各自为氢或低级烷基,或R3和R4 可以结合表示在连接链中可以具有氧或氮原子的低级亚烷基,n是1〜5的整数); R2表示碳原子数2〜3的烃基, Ac表示乙酰基。 上述的毛喉素衍生物或其生理上可接受的盐可以用作血小板聚集抑制剂,解痉药,皮肤溃疡治疗剂,肢体周边循环改善剂和分化诱导促进剂。