Abstract:
There is disclosed a cleaning composition comprising (i) 0.1 to 10 percent by weight of the cleaning composition of a biofilm removing detergent solution comprising a combination of an alkyl (C 8-18) polysaccharide, a non-ionic surfactant and a nitrogen containing surfactant-biocide (ii) 2 to 80 percent by weight of the cleaning composition of one or more polar solvent (iii) 0.5 to 15 percent by weight of the cleaning composition of one or more primary amine (iv) two or more chelating agents (v) 0.1 to 5.0 percent by weight of the cleaning composition of an alkaline buffer system providing a pH of about 11.5 to 13.3 in aqueous solution (vi) 0.005 to 5.0 percent by weight of the cleaning composition of an alkoxyaminosilane. Also disclosed is a process of cleaning, decontaminating and/or passivating metallic surgical instruments and/or equipment using the composition of the invention.
Abstract:
The invention relates to a cleaning composition characterized in that it can be used to clean graffiti from, inter alia, flexible, elastic and solid surfaces and synthetic fabrics printed with a selection of colors, silk-screen printed, painted with oil, vinyl or latex paint, automotive paint, as well as surfaces decorated with artistic patinas, metal surfaces with electrostatic paint, baked-on paint. One main advantage of the cleaning composition is that it cleans graffiti without removing paint from the printed matter or damaging the original underlying paint.
Abstract:
A cleaning composition with a limited number of natural ingredients contains an anionic surfactant, a hydrophobic syndetic, a hydrophilic syndetic and a solvent. The cleaning composition can be used to clean laundry, soft surfaces, and hard surfaces and cleans as well or better than commercial compositions containing synthetically derived cleaning agents.
Abstract:
A cleaning composition for cleaning particulate contamination from small dimensions on microelectronic device substrates. The cleaning composition contains dense CO2 (preferably supercritical CO2 (SCCO2)), alcohol, fluoride source, anionic surfactant source, non-ionic surfactant source, and optionally, hydroxyl additive. The cleaning composition enables damage-free, residue-free cleaning of substrates having particulate contamination on Si/SiO2 substrates.
Abstract:
The invention relates to an aqueous base formulation for cleaning rugs, fabrics, carpets, and the like. The formulation is composed of seventy-eight point five percent water, to which is added tetrapotassium pyrophosphate at ten percent of the formulation. A nonionic surfactant, ethoxylated glycery) ricinoleate, is then added at three percent. An isopropyl alcohol is then added at three percent. A fifth product, propylene carbonate, is introduced at five percent. Finally, sodium cumene sulphonate is added at zero point five percent. All these products are inserted with mechanized stirring so as to allow complete homogenization. There are no side effects for the user and the environment.
Abstract:
The present invention is a substantially nonabrasive, liquid car cleaner composition which cleans car surfaces without an external source of water to wash or rinse. The liquid cleaner is a composition of up to toxaphene 15%, sodium lauryl sulfate 10%, paraffin 10%, isopropyl alcohol 15%, and water 50%.
Abstract:
A cleaning composition with a limited number of natural ingredients contains alkyl polyglucoside, ethanol and colloidal silica. The cleaning composition optionally has a small amount of glycerol. The cleaning composition optionally has a small amount of fragrance. The cleaning composition can be used to clean hard surfaces and cleans as well or better than commercial compositions containing synthetically derived cleaning agents.
Abstract:
The invention relates to a method of cleaning the surface of a substrate to remove post-etch residue or post chemical mechanical polishing residues from the surface of a substrate. Specifically, the present invention relates to a method of post-CMP or post-etch cleaning. The method involves contacting the surface of a substrate with a CMP composition or an etching composition, that contains free radicals, and subsequently contacting the surface of the substrate with a composition that comprises a free radical quencher.
Abstract:
A composition comprising at least one alcohol, at least one long-chain alkyl polyamine, and at least one halogen which is suitably for application to a surface and substantially microbial contamination.
Abstract:
A composition and method is provided capable of removing contaminants from the surface of a gelatin capsule, such as a paint ball, to allow the gelatin capsules to be used for their intended use. The composition comprising, by weight, about 70 to 99.9 percent of a water-soluble alcohol, about 0.1 to 30 percent water, about 0.1 to 10 percent of a volatile silicone, and about 0.1 to 1 percent of a non-volatile silicone. Furthermore, the composition prevents excessive swelling of the gelatin outer shell of the gelatin encapsulated product. A method is also provided for cleaning a gelatin encapsulated product comprising the steps of contacting the gelatin encapsulated product with a cleaning composition, separating the gelatin encapsulated product from the cleaner, and drying the gelatin encapsulated product. The gelatin capsule may be a paintball. The composition may include additives to improve the performance of the gelatin capsules.