Cerium oxide abrasives for chemical mechanical polishing
    9.
    发明申请
    Cerium oxide abrasives for chemical mechanical polishing 失效
    用于化学机械抛光的氧化铈磨料

    公开(公告)号:US20060234509A1

    公开(公告)日:2006-10-19

    申请号:US11106490

    申请日:2005-04-15

    摘要: The use of mixed cerium-containing synthetic solid abrasive materials in chemical mechanical polishing slurries can provide better selectivity, better substrate removal rates, or lower defect rates than conventional ceria slurries. The slurries have abrasive particles that include a plurality of solid cerium-containing phases selected from CeO2, Ce2O3, cerium-nitride material, cerium-fluoride material, and cerium-sulfide material, where different cerium-containing materials are present in different particles or on the same particles.

    摘要翻译: 在化学机械抛光浆料中使用混合的含铈合成固体研磨材料可以提供比常规二氧化铈浆料更好的选择性,更好的底物去除速率或更低的缺陷率。 浆料具有包含多个选自CeO 2,Ce 2 O 3 N的固体含铈相的磨料颗粒,氮化铈材料 ,氟化铈材料和铈 - 硫化物材料,其中不同的含铈材料以不同的颗粒或相同的颗粒存在。

    Particulate or particle-bound chelating agents
    10.
    发明申请
    Particulate or particle-bound chelating agents 失效
    颗粒或颗粒结合的螯合剂

    公开(公告)号:US20050076581A1

    公开(公告)日:2005-04-14

    申请号:US10690626

    申请日:2003-10-23

    摘要: The invention generally relates to compositions and methods for chemically mechanically polishing a substrate, including a polishing accelerator, which is normally one or more oxidizers, an abrasive material, and chelating particles and/or metal-absorbent clay material. In addition, the invention can also involve methods of forming chelator particles and methods of separating metal-containing ions from polishing and/or etching solutions after polishing and/or etching.

    摘要翻译: 本发明总体上涉及用于化学机械抛光基材的组合物和方法,包括抛光促进剂,其通常是一种或多种氧化剂,研磨材料和螯合颗粒和/或金属吸收性粘土材料。 此外,本发明还可以包括形成螯合剂颗粒的方法和在抛光和/或蚀刻之后将金属离子从抛光和/或蚀刻溶液中分离的方法。