摘要:
The present invention relates to processes for the preparation of compounds of the formula (Ia) by reacting styrene with a secondary alkanol and the hydrogenation of the resulting phenyl-substituted tertiary alkanol. In addition, the invention relates to compounds of the formula (Ia) and to the use of such compounds as fragrances, and also to compositions which comprise compounds of the formulae (Ia) and (Ib).
摘要:
The present invention relates to processes for the preparation of compounds of the formula (Ia) by reacting styrene with a secondary alkanol and the hydrogenation of the resulting phenyl-substituted tertiary alkanol. In addition, the invention relates to compounds of the formula (Ia) and to the use of such compounds as fragrances, and also to compositions which comprise compounds of the formulae (Ia) and (Ib).
摘要:
A synergistic microbicidal composition containing: (a) at least one microbicide selected from the group consisting of isopropyl methyl phenols and monosubstituted phenols and (b) at least one microbicide selected from the group consisting of p-menthene alcohols, menthadiene alcohols and other antimicrobial alcohols of a specified structure.
摘要:
The present invention includes a process using environmentally friendly materials for the removal of adhesive residues from hard substrates, particularly vehicles, e.g., cars, trucks, buses, aerospace vehicles including airplanes, and the like. The process uses a novel adhesive remover composition comprising one or more non-halogenated organic solvents, a non-abrasive thickening agent, a surfactant, and a vapor-pressure modulating agent. The total Hansen Solubility Parameter (δt) at 25° C. for each of the non-halogenated organic solvents is from about 14 MPa1/2 to about 24 MPa1/2. The invention provides a cost effective, safe, environmentally friendly adhesive remover composition specifically formulated for removal of, e.g., pressure sensitive adhesive residues from large areas of aircraft composite and aluminum surfaces, as well as others.
摘要:
An encapsulated active substance for a manual detergent for hard surfaces comprises an essentially anhydrous active substance with at least one surfactant and at least one liquid polymer carrier encapsulated in a water-soluble or water-dispersible capsule, the active substance containing: less than 25 wt. % of carrier; at least one unbranched or branched, acryclic or cyclic, saturated or unsaturated alcohol with 1 to 10 carbon atoms and one or two primary, secondary or tertiary hydroxy groups and a carbon chain optionally having one or more —O— groups; or being free of glycerol. The encapsulated active substance can be used as a manual detergent for hard surfaces.
摘要:
Described are carbon-containing functional groups substituted 4,5,6,7-tetrahydro-polyalkylated-4-indanes, isomers thereof, process for processes for preparing same, and uses thereof. The 4,5,6,7-tetrahydro-polyalkylated-4-indanes have the generic structure: Wherein G and R1-5 are as defined in the specification. The aforementioned materials have fragrance properties or are intermediates for materials which have fragrance properties. Also described are processes for producing the aforementioned substances.
摘要:
Detergent compositions are disclosed which comprise about 0.05% to 50% of a surfactant and 0.5% to 50% of a tertiary alcohol having at least 5 carbon atoms per molecule. The described combination has utility in a wide variety of different cleaning compositions to improve their cleaning performance. Certain of the preferred compositions employ low odor tertiary alcohols, tertiary alcohols which are stable with respect to oxidizing bleaches, and tertiary alcohols which are useful in solid compositions.
摘要:
A photoresist and post etch cleaning solution for semiconductor wafers comprising: A. a polar aprotic solvent, B. an inorganic base; C. a co-solvent for said inorganic base; D. a unsaturated cycloaliphatic compound having a ring ether group and at least one substituent bearing a primary hydroxyl group; E. an organic base comprising an amine compound; and F. a nonionic surfactant bearing at least one ether group. The wafer containing photoresist residue or post etch residue can be cleaned by contacting the solution in a spray or immersion.
摘要:
A synergistic microbicidal composition containing: (a) at least one microbicide selected from the group consisting of isopropyl methyl phenols and monosubstituted phenols and (b) at least one microbicide selected from the group consisting of p-menthene alcohols, menthadiene alcohols and other antimicrobial alcohols of a specified structure.
摘要:
The present invention includes a process using environmentally friendly materials for the removal of adhesive residues from hard substrates, particularly vehicles, e.g., cars, trucks, buses, aerospace vehicles including airplanes, and the like. The process uses a novel adhesive remover composition comprising one or more non-halogenated organic solvents, a non-abrasive thickening agent, a surfactant, and a vapor-pressure modulating agent. The total Hansen Solubility Parameter (δt) at 25° C. for each of the non-halogenated organic solvents is from about 14 MPa1/2 to about 24 MPa1/2. The invention provides a cost effective, safe, environmentally friendly adhesive remover composition specifically formulated for removal of, e.g., pressure sensitive adhesive residues from large areas of aircraft composite and aluminum surfaces, as well as others.