Analysis of semiconductor surfaces by secondary ion mass spectrometry
    31.
    发明授权
    Analysis of semiconductor surfaces by secondary ion mass spectrometry 失效
    通过二次离子质谱分析半导体表面

    公开(公告)号:US06232600B1

    公开(公告)日:2001-05-15

    申请号:US09309208

    申请日:1999-05-10

    Inventor: Eugene P. Marsh

    CPC classification number: G01N23/2258 H01J37/252 H01J2237/2527

    Abstract: An apparatus and method for mass spectrometric determination of contaminant components of a thin oxide surface layer of a semiconductor wafer use a movable mechanical stage to scan and raster a large area of the wafer in a continuous scanning motion. The mass of analyte is greatly increased, resulting in improved sensitivity to trace components in the surface layer by a factor of 10-100 or more. A light beam interferometer is used to determine non-planarity from e.g. warping of the wafer and provide a correction by maintaining a constant separation between the wafer and the extraction plate or adjusting the electrical bias of the wafer relative to the extraction bias.

    Abstract translation: 用于质量测定半导体晶片的薄氧化物表面层的污染物组分的装置和方法使用可移动机械平台以连续的扫描运动扫描和光栅化晶片的大面积。 分析物的质量大大增加,导致对表面层中的痕量组分的改善的灵敏度提高10-100倍。 光束干涉仪用于确定例如非平面性的非平面性。 晶片翘曲并通过保持晶片和提取板之间的恒定间隔或调整晶片相对于提取偏压的电偏压来提供校正。

    Three-dimensional structure verification supporting apparatus, three-dimensional structure verification method, recording medium, and program therefor
    32.
    发明授权
    Three-dimensional structure verification supporting apparatus, three-dimensional structure verification method, recording medium, and program therefor 有权
    三维结构验证支持装置,三维结构验证方法,记录介质及其程序

    公开(公告)号:US06828555B2

    公开(公告)日:2004-12-07

    申请号:US10612820

    申请日:2003-07-02

    Abstract: Verification of properness of a modeling theory of an uncrystallized substance or an image processing method is made easy. There includes: a first displaying unit 120 for rotationally displaying an simulated three-dimensionally shaded model image, which is a shaded image of the three-dimensional reconstruction image; and a second displaying unit 140 for displaying the three-dimensional image of the substance acquired by experimental structural analysis, which synchronously rotates with the simulated three-dimensionally shaded model image.

    Abstract translation: 验证未结晶物质的建模理论的正确性或图像处理方法是容易的。 包括:第一显示单元120,用于旋转地显示作为三维重建图像的阴影图像的模拟三维阴影模型图像; 以及第二显示单元140,用于显示通过实验结构分析获得的物质的三维图像,其与模拟的三维阴影模型图像同步旋转。

    Nano-manipulation by gyration
    33.
    发明授权
    Nano-manipulation by gyration 失效
    通过回转的纳米操纵

    公开(公告)号:US06812460B1

    公开(公告)日:2004-11-02

    申请号:US10680339

    申请日:2003-10-07

    CPC classification number: B82B3/00 G01Q80/00 Y10S977/851 Y10S977/858

    Abstract: A method of nano-manipulation, including providing a nano-scale object movably positioned over a substrate and positioning a probe of a scanning probe microscope proximate the nano-scale object. The probe is then moved across the substrate along a gyrating path proximate the nano-scale object to reposition the nano-scale object.

    Abstract translation: 一种纳米操作的方法,包括提供可移动地定位在衬底上的纳米级物体,并将扫描探针显微镜的探针定位在纳米尺度物体附近。 然后将探针沿着靠近纳米尺度物体的旋转路径跨越衬底移动,以重新定位纳米尺度物体。

    Method and apparatus for dual-energy e-beam inspector
    34.
    发明授权
    Method and apparatus for dual-energy e-beam inspector 有权
    双能量电子束检测仪的方法和装置

    公开(公告)号:US06803571B1

    公开(公告)日:2004-10-12

    申请号:US10607226

    申请日:2003-06-26

    Abstract: In accordance with one embodiment, the disclosure pertains to an apparatus for inspection of substrates. The apparatus includes at least a dual-energy e-beam source, an energy-dependent dispersive device, a beam separator, and an objective lens. The dual-energy e-beam source is configured to generate both a higher-energy e-beam component and a lower-energy e-beam component. Said two components exit the dual-energy e-source co-axially. The energy-dispersive device is configured to introduce dispersion between the two components. The components exit the dispersive device at different angles of trajectory. The beam separator is configured to receive the two dispersed components and substantially cancel the dispersion previously introduced by the dispersive device. As a result, the two components are rejoined in trajectory. Finally, the objective lens configured to focus said two rejoined components onto an area of the substrate.

    Abstract translation: 根据一个实施例,本公开涉及用于检查基板的装置。 该装置至少包括双能量电子束源,能量依赖色散装置,光束分离器和物镜。 双能量电子束源被配置为产生较高能量的电子束分量和较低能量的电子束分量。 所述两个部件同轴地离开双能源电子源。 能量分散装置被配置为在两个部件之间引入分散体。 组件以不同的轨迹角度离开色散装置。 束分离器被配置为接收两个分散的组分并且基本上消除先前由分散装置引入的分散体。 结果,两个组件在轨迹上重新加入。 最后,物镜被配置为将所述两个重新连接的组件聚焦到衬底的一个区域上。

    Electron microscope with annular illuminating aperture
    35.
    发明授权
    Electron microscope with annular illuminating aperture 有权
    具有环形照明孔的电子显微镜

    公开(公告)号:US06797956B2

    公开(公告)日:2004-09-28

    申请号:US10339276

    申请日:2003-01-09

    Applicant: Gerd Benner

    Inventor: Gerd Benner

    CPC classification number: H01J37/265 H01J37/26 H01J2237/2614

    Abstract: In a transmission electron microscope with phase contrast imaging, the illumination of the object to be imaged takes place with an annular illuminating aperture. An annular phase-shifting element with a central aperture is arranged in a plane Fourier transformed with respect to the object plane. The annular phase-shifting element confers a phase shift of &pgr;/2 on a null beam, while the radiation of higher diffraction orders diffracted at the object in the direction of the optical axis passes through the central aperture of the annular phase-shifting element and consequently is not affected, or only slightly affected, by the phase-shifting element. The annular illuminating aperture is preferably produced sequentially in time by a deflecting system, which produces a beam tilt in a plane conjugate to the object plane.

    Abstract translation: 在具有相位对比成像的透射电子显微镜中,待成像对象的照明是用环形照明孔进行的。 具有中心孔的环形相移元件布置在相对于物平面进行傅里叶变换的平面中。 环形移相元件在零光束上赋予π/ 2的相移,而在物体处沿光轴方向衍射的较高衍射级的辐射通过环形移相元件的中心孔,并且 因此不受相移元件的影响或仅受轻微的影响。 环形照明孔优选地通过偏转系统在时间上顺序地产生,该偏转系统在与物平面共轭的平面中产生光束倾斜。

    Electron-optical lens arrangement with an axis that can be largely displaced
    36.
    发明授权
    Electron-optical lens arrangement with an axis that can be largely displaced 失效
    具有可大幅偏移的轴的电子 - 光学透镜装置

    公开(公告)号:US06774372B1

    公开(公告)日:2004-08-10

    申请号:US10018904

    申请日:2002-01-15

    CPC classification number: B82Y10/00 B82Y40/00 H01J37/3007 H01J37/3174

    Abstract: An electron-optical lens arrangement with an axis that can be substantially displaced, and useful for electron lithography, includes a cylinder lens and a quadrupole field. The plane of symmetry of the quadrupole field extends in the mid-plane of the gap pertaining to the cylinder lens. The focussing level of the quadrupole is oriented in the direction of the gap. The amount of the focussing refractive power belonging to the cylinder lens is twice as high as the amount of the quadrupole. A deflection system for the charged particles is connected upstream in the level of the gap pertaining to the cylinder lens and several electrodes or pole shoes, which generate a quadrupole field are provided in the direction of the gap pertaining to the cylinder lens. The electrodes or pole shoes can be individually and, preferably, successively excited and the quadrupole field can be displaced according to the deflection of the particle beam, so that the particle beam impinges upon the area of the quadrupole field. A holding device is provided for an object, such as a wafer, and is arranged vertically in relation to the optical axis and can be displaced in relation to the direction of the gap pertaining to the cylinder lens.

    Abstract translation: 可以基本上位移并且可用于电子光刻的电子 - 光学透镜装置包括柱面透镜和四极场。 四极场的对称平面在与柱面透镜相关的间隙的中间平面内延伸。 四极杆的聚焦位置取向于间隙的方向。 属于圆柱透镜的聚焦屈光力的量是四极的量的两倍。 带电粒子的偏转系统在与气缸透镜相关的间隙的水平面上游连接,并且产生四极场的几个电极或极靴在与气缸透镜相关的间隙的方向上设置。 电极或极靴可以单独地,优选地被连续地激发,并且四极场可以根据粒子束的偏转而移位,使得粒子束撞击四极场的区域。 为诸如晶片的物体提供保持装置,并且相对于光轴垂直地布置,并且可以相对于与柱面透镜相关的间隙的方向移位。

    Method and apparatus for observing specimen image on scanning charged-particle beam instrument
    37.
    发明授权
    Method and apparatus for observing specimen image on scanning charged-particle beam instrument 有权
    扫描带电粒子束仪器观察标本图像的方法和装置

    公开(公告)号:US06727911B1

    公开(公告)日:2004-04-27

    申请号:US09563080

    申请日:2000-04-24

    Abstract: Method and apparatus for observing a specimen image on a scanning charged-particle beam instrument in such a way that the original observational position can be automatically resumed after movement of a specimen or its image. When an image is observed at the original position after a specimen or its image is rotated or moved, a keyboard or a pointing device is operated to command reconstruction of the image. In response to this, the CPU of the instrument reads data from a memory that indicates the history of rotations and movements of the specimen and image. For example, if the specimen has been mechanically rotated, the CPU controls a rotational drive circuit according to the data read from the memory, the data indicating amounts and directions of rotations. The specimen stage is rotated through a given angle in a direction opposite to the previous direction. As a result, the specimen can be returned to the position assumed prior to the rotation.

    Abstract translation: 用于在扫描带电粒子束仪器上观察样本图像的方法和装置,使得可以在样本或其图像移动之后自动恢复原始观察位置。 当在样本或其图像被旋转或移动之后在原始位置观察到图像时,操作键盘或指示设备来命令重建图像。 响应于此,仪器的CPU从存储器中读取指示样品和图像的旋转历史和运动的数据。 例如,如果样本被机械旋转,则CPU根据从存储器读取的数据来控制旋转驱动电路,该数据指示数量和旋转方向。 样品台沿与上一个方向相反的方向旋转给定的角度。 结果,样品可以返回到在旋转之前假定的位置。

    Chemical analysis of defects using electron appearance spectroscopy
    38.
    发明授权
    Chemical analysis of defects using electron appearance spectroscopy 有权
    使用电子外观光谱分析缺陷的化学分析

    公开(公告)号:US06690010B1

    公开(公告)日:2004-02-10

    申请号:US09396548

    申请日:1999-09-02

    Applicant: David L. Adler

    Inventor: David L. Adler

    CPC classification number: G01N23/2251 H01J37/252 H01J2237/2561

    Abstract: A technique for measuring the chemical composition of surface particles or other small features which may be present on semiconductor wafers or other substrates. A particle is irradiated with a variable energy, focused incident electron beam. X-ray or electron emissions from the particle are monitored to detect an increase in output indicating the ionization threshold of the materials in the particle. The incident beam energy is correlated with the thresholds detected to determine the species present in the particle.

    Abstract translation: 用于测量可能存在于半导体晶片或其它基底上的表面颗粒或其它小特征的化学组成的技术。 用可变能量聚焦的入射电子束照射颗粒。 监测来自颗粒的X射线或电子发射,以检测指示颗粒中材料的电离阈值的输出增加。 入射光束能量与检测到的阈值相关,以确定颗粒中存在的物质。

    Method of precision calibration of magnification of a scanning microscope with the use of test diffraction grating
    39.
    发明授权
    Method of precision calibration of magnification of a scanning microscope with the use of test diffraction grating 失效
    使用测试衍射光栅精确校准扫描显微镜放大倍数的方法

    公开(公告)号:US06573500B2

    公开(公告)日:2003-06-03

    申请号:US09924423

    申请日:2001-08-08

    CPC classification number: G02B21/34 G02B21/002

    Abstract: A method of precision calibration of magnification of a scanning microscope with the use of a test diffraction grating has the steps of positioning and orienting of a test object on a stage of microscopes so that strips of a test diffraction grating are perpendicular to a direction along which a calibration is performed, scanning a selected portion of the test object along axes X and Y, measuring values of a signal S versus coordinates x and y in a plane of scanning and storing the values S (x,y) in a digital form as a two-dimensional digital array, transforming the two-dimensional array of signals (x, y) into a two-dimensional array S(u, v) by turning of the axes so that a direction of a new axis U is perpendicular to the strips of grating and a direction of a new axis V coincides with the strips of the grating, line-by-line mathematical processing of the array S(u, v) in a new manner.

    Abstract translation: 使用测试衍射光栅对扫描显微镜的放大率进行精密校准的方法具有将测试对象定位和定向在显微镜的台上的步骤,使得测试衍射光栅的条带垂直于其上的方向 执行校准,沿着X轴和Y轴扫描测试对象的选定部分,测量扫描平面中信号S与坐标x和y之间的值,并以数字形式存储值S(x,y)作为 二维数字阵列,通过转动轴将信号(x,y)的二维阵列变换为二维阵列S(u,v),使得新轴U的方向垂直于 光栅条和新轴V的方向与光栅的条带重合,以新的方式逐行数学处理阵列S(u,v)。

    Charged particle beam system and pattern slant observing method
    40.
    发明授权
    Charged particle beam system and pattern slant observing method 失效
    带电粒子束系统和模式倾斜观测方法

    公开(公告)号:US06534766B2

    公开(公告)日:2003-03-18

    申请号:US09816468

    申请日:2001-03-26

    CPC classification number: G01N23/20 H01J37/28 H01J2237/1506 H01J2237/2813

    Abstract: A charged particle beam system comprising a charged beam source, a condenser lens, a scanning deflecting device, an objective lens and a secondary electron detector further comprises a slant observing deflecting device arranged between the objective lens and a sample. The slant observing deflecting device deflects charged particle beams immediately before the surface of the sample, to cause the charged particle beams to be slantingly incident on the sample. The deflection angle of the charged particle beams is controlled by a DC current component which is inputted to the slant observing deflecting device. The irradiation position shift of the charged particle beams due to the slant deflection is corrected and controlled by feeding an input value of the slant observing deflecting device and the slant angle of the charged particle beams back to the input value of the scanning deflecting device.

    Abstract translation: 包括充电束源,聚光透镜,扫描偏转装置,物镜和二次电子检测器的带电粒子束系统还包括布置在物镜和样品之间的倾斜观察偏转装置。 倾斜的观察偏转装置在样品表面之前使带电粒子束偏转,使带电粒子束倾斜入射到样品上。 带电粒子束的偏转角由输入到倾斜观测偏转装置的直流电流分量控制。 通过将倾斜观察偏转装置的输入值和带电粒子束的倾斜角反馈回到扫描偏转装置的输入值来校正和控制由于倾斜偏转引起的带电粒子束的照射位置偏移。

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