利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

204 条记录 (耗时 0.021 秒)

    Method for producing perfluoroalkadiene compounds
    36.
    发明授权
    Method for producing perfluoroalkadiene compounds 有权

    公开(公告)号：US11225446B2

    公开(公告)日：2022-01-18

    申请号：US17225598

    申请日：2021-04-08

    申请人： DAIKIN INDUSTRIES, LTD.

    发明人： Yuusuke Etou ,  Atsushi Maruo ,  Katsuya Nakai ,  Kazuhiro Takahashi

    IPC分类号： C07C17/25 ,  C07C21/19 ,  C08F36/16 ,  C09K13/00

    摘要： According to a method for producing a perfluoroalkadiene compound represented by general formula (1): CF2═CF—(CF2)n-4—CF═CF2 (1), wherein n is an integer of 4 or more, the method comprising a reaction step of adding a nitrogen-containing compound to a solution of a compound represented by general formula (2): X1CF2—CFX2—(CF2)n-4—CF2—CF2X1 (2), wherein n is the same as above, X1 is the same or different and is a halogen atom other than fluorine, and X2 is a halogen atom, the perfluoroalkadiene compound can be obtained at a high yield.

    Fluoropolymer
    39.
    发明授权
    Fluoropolymer 失效
    含氟聚合物

    公开(公告)号：US07026416B2

    公开(公告)日：2006-04-11

    申请号：US11124133

    申请日：2005-05-09

    申请人： Yasuhide Kawaguchi ,  Shinji Okada ,  Yoko Takebe ,  Osamu Yokokoji ,  Isamu Kaneko

    发明人： Yasuhide Kawaguchi ,  Shinji Okada ,  Yoko Takebe ,  Osamu Yokokoji ,  Isamu Kaneko

    IPC分类号： C08F136/16 ,  C08F236/16 ,  C08F36/16 ,  G03F7/039

    CPC分类号： C08F214/18 ,  C08F36/20 ,  C08F2/60

    摘要： To provide a fluoropolymer suitable for use as a base polymer for resist materials for excimer lasers having a wavelength of 250 nm or shorter.A fluoropolymer having a monomer unit formed by cyclopolymerization of a fluorinated diene compound represented by the following formula (3), CF2═CFCF2—C(CF3)(R5)—CH2CH═CH2  (3) wherein R5 is either a hydroxyl group blocked by —CHR7—O—R8 or an organic group having the hydroxyl group, and R8 is a cyclic saturated hydrocarbon such as a cycloalkyl group which may have a substituent, or an organic group having the cyclic saturated hydrocarbon.

    摘要翻译： 提供适合作为波长为250nm以下的准分子激光的抗蚀剂材料的基础聚合物的氟聚合物。 具有由下式（3）表示的氟化二烯化合物的环化聚合形成的单体单元的含氟聚合物，<？in-line-formula description =“In-Line Formulas”end =“lead”→> CF 2 -CFCF 2 -C（CF 3）（R 5）CH 2 CH- （3）<？in-line-formula description =“In-line Formulas”end =“tail”？>其中R 5是羟基被封闭 或具有羟基的有机基团，R 8为环状饱和烃，例如环烷基 其可以具有取代基，或具有环状饱和烃的有机基团。

    Resist composition
    40.
    发明申请
    Resist composition 审中-公开
    抗蚀组成

    公开(公告)号：US20050202345A1

    公开(公告)日：2005-09-15

    申请号：US11124214

    申请日：2005-05-09

    申请人： Yasuhide Kawaguchi ,  Isamu Kaneko ,  Yoko Takebe ,  Shinji Okada ,  Osamu Yokokoji

    发明人： Yasuhide Kawaguchi ,  Isamu Kaneko ,  Yoko Takebe ,  Shinji Okada ,  Osamu Yokokoji

    IPC分类号： C08F8/00 ,  C08F8/02 ,  C08F14/18 ,  C08F16/02 ,  C08F16/24 ,  C08F36/16 ,  G03C1/492 ,  G03F7/004 ,  G03F7/039 ,  H01L21/027

    CPC分类号： G03F7/0397 ,  C08F14/18 ,  C08F36/16 ,  G03C1/492 ,  G03F7/0046 ,  G03F7/0392

    摘要： A resist composition which can easily form a resist pattern excellent in transparency for vacuum ultraviolet rays such as an F2 excimer laser or the like and dry etching characteristics and further excellent in sensitivity, resolution, flatness, thermal resistance and the like, is provided. The resist composition, characterized by comprising (A) a fluorine-containing polymer having an acidic group blocked with a blocking group containing a cycloalkyl group, an organic group having one or more of cycloalkyl groups, a bicycloalkyl group or the like, (B) an acid generating compound capable of generating an acid by irradiation with a light, and (C) an organic solvent.

    摘要翻译： 能容易地形成例如F 2激子等真空紫外线透明性优异的抗干蚀剂组合物和干蚀刻特性，并且灵敏度，分辨率，平坦度，耐热性更好 等等。 抗蚀剂组合物，其特征在于，包含（A）具有被含有环烷基的封端基封闭的酸性基团的含氟聚合物，具有一个或多个环烷基的有机基团，双环烷基等，（B） 能够通过光照射产生酸的酸产生化合物，和（C）有机溶剂。