Lithographic apparatus with multiple alignment arrangements and alignment measuring method

    公开(公告)号:US20060141374A1

    公开(公告)日:2006-06-29

    申请号:US11020644

    申请日:2004-12-27

    摘要: A lithographic apparatus has a plurality of different alignment arrangements that are used to perform an alignment measurement on the same mark(s) by: detecting a first alignment mark located on an object and producing a first alignment signal by a first detector; detecting the first mark and producing a second alignment signal by a second detector using a different alignment measurement than the first detector; receiving the first alignment signal from the first detector; calculating a first position of the at least first mark based on the first alignment signal; receiving the second alignment signal from the second detector; calculating a further first position of the at least first mark based on the second alignment signal.

    Lithographic apparatus and device manufacturing method
    33.
    发明申请
    Lithographic apparatus and device manufacturing method 有权
    平版印刷设备和器件制造方法

    公开(公告)号:US20060109435A1

    公开(公告)日:2006-05-25

    申请号:US11320405

    申请日:2005-12-29

    申请人: Arno Bleeker

    发明人: Arno Bleeker

    IPC分类号: G03B27/00 G03F9/00

    CPC分类号: G03F7/70291 G03F7/70283

    摘要: A lithographic apparatus includes a patterning device that patterns a projected beam. The patterning device includes an array of cells that contain a polar fluid, a non-polar fluid, and an electrode. A potential difference across the electrode and the polar fluid causes displacement of the non-polar fluid. Based on a difference in refractive index between the polar fluid and the non-polar fluid, a beam of light which passes through the cell will have its phase changed in dependence on the relative thickness on the polar and non-polar fluids and on their refractive indices.

    摘要翻译: 光刻设备包括图案化投影光束的图案形成装置。 图案形成装置包括包含极性流体,非极性流体和电极的单元阵列。 电极和极性液体之间的电位差导致非极性流体的位移。 基于极性流体和非极性流体之间的折射率差异,通过电池的光束将根据极性和非极性流体上的相对厚度及其折射率 指数。

    EUV lithography reticles fabricated without the use of a patterned absorber
    34.
    发明授权
    EUV lithography reticles fabricated without the use of a patterned absorber 有权
    在不使用图案化吸收体的情况下制造EUV光刻掩模版

    公开(公告)号:US07049033B2

    公开(公告)日:2006-05-23

    申请号:US10631359

    申请日:2003-07-31

    IPC分类号: G03F9/00 A61N5/00 G03B27/00

    摘要: Absorber material used in conventional EUVL reticles is eliminated by introducing a direct modulation in the complex-valued reflectance of the multilayer. A spatially localized energy source such as a focused electron or ion beam directly writes a reticle pattern onto the reflective multilayer coating. Interdiffusion is activated within the film by an energy source that causes the multilayer period to contract in the exposed regions. The contraction is accurately determined by the energy dose. A controllable variation in the phase and amplitude of the reflected field in the reticle plane is produced by the spatial modulation of the multilayer period. This method for patterning an EUVL reticle has the advantages (1) avoiding the process steps associated with depositing and patterning an absorber layer and (2) providing control of the phase and amplitude of the reflected field with high spatial resolution.

    摘要翻译: 通过在多层复数值的反射率中引入直接调制来消除用于常规EUVL标线的吸收材料。 诸如聚焦电子或离子束的空间局部化能源直接将掩模版图案写到反射多层涂层上。 相互扩散在膜内被能量源激活,导致多层周期在暴露区域中收缩。 收缩准确地由能量剂量确定。 通过多层周期的空间调制产生光罩平面中反射场的相位和幅度的可控变化。 用于图案化EUVL掩模版的方法具有以下优点:(1)避免与沉积和图案化吸收层相关的工艺步骤,以及(2)以高空间分辨率提供对反射场的相位和幅度的控制。

    Printing system for use with microencapsulated media
    35.
    发明申请
    Printing system for use with microencapsulated media 审中-公开
    用于微胶囊化介质的印刷系统

    公开(公告)号:US20060092400A1

    公开(公告)日:2006-05-04

    申请号:US10977847

    申请日:2004-10-29

    IPC分类号: G03B27/00

    CPC分类号: G03F7/0027

    摘要: A printing system having a printer that is adapted to develop images on microencapsulated media. The printing system includes a pressure applicator that includes micro-features that are adapted to contact the media to develop images on the media. The invention provides for improved image quality while enabling the use of a media that is made of inexpensive fiber based natural paper.

    摘要翻译: 一种具有适于在微胶囊化介质上显影图像的打印机的打印系统。 打印系统包括压力施加器,其包括适于接触介质以在介质上显影图像的微特征。 本发明提供了改进的图像质量,同时能够使用由廉价的基于光纤的天然纸制成的介质。

    Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
    36.
    发明申请
    Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices 审中-公开
    光学透镜元件,半导体平版印刷图案形成装置以及半导体器件的处理方法

    公开(公告)号:US20060087629A1

    公开(公告)日:2006-04-27

    申请号:US11255594

    申请日:2005-10-21

    IPC分类号: G03B27/00

    摘要: An optical lens element is disclosed, formed of single crystal spinel material, the optical element having an optical transmittance of not less than 75%. Also, a lithographic patterning apparatus is disclosed, including a radiation source and a mask having a pattern arranged downstream of the radiation source, the mask receiving radiation to provide a patterned beam. Further, a projection optic for projecting the patterned beam onto a substrate is provided, the projection optic having multiple optical lens elements, at least one of which is comprised of single crystal spinel material, and a substrate table for receiving the substrate is provided. In addition, methods for processing semiconductor devices are disclosed.

    摘要翻译: 公开了由单晶尖晶石材料形成的光学透镜元件,该光学元件具有不小于75%的光透射率。 此外,公开了一种平版印刷图案形成装置,其包括辐射源和具有布置在辐射源下游的图案的掩模,掩模接收辐射以提供图案化的光束。 此外,提供了用于将图案化的光束投影到基板上的投影光学元件,投影光学元件具有多个光学透镜元件,其中至少一个由单晶尖晶石材料构成,并且提供了用于接收基板的基板台。 此外,公开了半导体器件的处理方法。

    Original feeding device having original size indicator
    37.
    发明授权
    Original feeding device having original size indicator 有权
    原装进给装置具有原尺寸指示

    公开(公告)号:US07034925B2

    公开(公告)日:2006-04-25

    申请号:US10799594

    申请日:2004-03-15

    IPC分类号: G03B27/00 G03B27/62

    摘要: An original feeding device for feeding a sheet-shaped original comprises an original loading tray for loading the original, a width direction aligning plates and for aligning the width direction of the original loaded on the original loading tray, and an original size indicator. The original size indicator is the scale for indication of an original size, and is disposed so that the original size indicated by the width direction aligning plate can be checked by any of a first view point from above for the original feeding device and a second view point having an equal height to the feeding device and also sidelongly fronting the same device.

    摘要翻译: 用于馈送片状原件的原稿进给装置包括用于装载原稿的原稿装载盘,宽度方向对齐板,并用于对准装载在原始装载盘上的原稿的宽度方向和原稿尺寸指示器。 原尺寸指示器是用于指示原始尺寸的刻度,并且被布置为使得可以通过上述第一视点中的任何一个来检查由宽度方向对齐板所指示的原始尺寸,用于原始进给装置,并且第二视图 点具有与给送装置相同的高度,并且还相对于相同的装置前进。

    Image forming device having a brush type processing member
    38.
    发明授权
    Image forming device having a brush type processing member 失效
    具有刷型处理构件的图像形成装置

    公开(公告)号:US07008123B2

    公开(公告)日:2006-03-07

    申请号:US10722248

    申请日:2003-11-25

    IPC分类号: G03D9/02 G03B27/00

    CPC分类号: G03F7/0027

    摘要: The present invention relates to an image-forming device that comprises a roller that includes a plurality of micromembers. The micromembers are preferably hook or loop-like members made of a compliant material such as plastic or rubber. The micromembers on the roller essentially define a compliant surface, which is self-correcting for unintentional media thickness variations within a print area. The roller is rotational such that when the roller contacts the media the rotational or spinning force is converted to a compressional force, which is sufficient to rupture the microcapsules in the media.

    摘要翻译: 本发明涉及一种图像形成装置,其包括包括多个微组件的辊。 微组件优选为由诸如塑料或橡胶的柔顺材料制成的钩状或环状构件。 辊上的微组件基本上限定了柔顺表面,其对打印区域内无意的介质厚度变化进行自校正。 辊是旋转的,使得当辊接触介质时,旋转或旋转力被转换成足以破坏介质中的微胶囊的压缩力。

    Superresolution in microlithography and fluorescence microscopy
    40.
    发明申请
    Superresolution in microlithography and fluorescence microscopy 失效
    超微分光刻和荧光显微镜

    公开(公告)号:US20050264776A1

    公开(公告)日:2005-12-01

    申请号:US11147792

    申请日:2005-06-07

    申请人: Stephen Baer

    发明人: Stephen Baer

    IPC分类号: G01N21/64 G03B27/00 G03B27/70

    摘要: In scanned optical systems such as confocal laser microscopes wherein a beam of light is focused to a spot in a specimen to excite a fluorescent species or other excitable species in the spot, the effective size of the excitation is made smaller than the size of the spot by providing a beam of light of wavelength adapted to quench the excitation of the excitable species, shaping this second beam into a pattern with a central intensity minimum, and overlapping this central minimum with the central intensity maximum of the focused spot, so that within the spot the intensity of quenching light increases with distance from the center of the spot, thereby preferentially quenching excitation in the peripheral parts of the spot, and thereby reducing the effective size of the excitation and thus improving the resolution of the system. In the preferred et of the present invention, the central minimum of quenching light is narrowed further by creating the pattern of quenching radiation in the specimen by imaging onto the focal plane a plurality of pairs of sources of quenching light, arrayed at the vertices of a regular, even-sided polygon, the center of which is imaged in the specimen the central maximum of exciting radiation, and such that the two members of each pair are on opposite vertices of the polygon and emit light mutually coherent and out-of-phase, and the light emitted by different pairs is incoherent with respect to each other.

    摘要翻译: 在诸如共聚焦激光显微镜的扫描光学系统中,其中光束聚焦到样品中的点以激发荧光物质或其他可兴奋物质,激发的有效尺寸小于斑点的尺寸 通过提供适于淬灭可兴奋物质的激发的波长的光束,将该第二光束成形为具有中心强度最小值的图案,并将该中心最小值与聚焦光斑的中心光强度重叠,使得在 斑点的强度随着距离中心点的距离而增加,从而优先淬火点的外围部分的激发,从而降低激发的有效尺寸,从而提高系统的分辨率。 在本发明的优选实施例中,淬火光的中心最小值进一步缩小,通过在焦平面上形成多个淬火光源,通过在样品的顶点排列多个淬灭光源, 规则的,平面的多边形,其中心在样本中成像为激发辐射的中心最大值,并且使得每对的两个成员在多边形的相对顶点上发射相互相干和不相位的光 并且由不同对发射的光彼此不相干。