公开(公告)号：US11791166B2

公开(公告)日：2023-10-17

申请号：US17532143

申请日：2021-11-22

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology, Co., LTD

发明人： Qi Zhang ,  Haichun Yang ,  Hua Chung ,  Ting Xie ,  Michael X. Yang

IPC分类号： H01L21/3213 ,  H01L21/311 ,  H01L21/3065

CPC分类号： H01L21/32136 ,  H01L21/3065 ,  H01L21/31116 ,  H01L21/32135

摘要： Systems and methods for etching titanium containing layers on a workpiece are provided. In one example, a method includes placing the workpiece on a workpiece support in a processing chamber. The workpiece includes a first layer and a second layer. The first layer is a titanium containing layer. The method includes admitting a process gas into the processing chamber. The process gas includes an ozone gas and a fluorine containing gas. The method includes exposing the first layer and the second layer on the workpiece to the process gas to at least partially etch the first layer at a greater etch rate relative to the second layer.

公开(公告)号：US11749509B2

公开(公告)日：2023-09-05

申请号：US15896124

申请日：2018-02-14

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology, Co., LTD

发明人： Yorkman Ma ,  Dixit V. Desai

IPC分类号： H01J37/32 ,  H01L21/67

CPC分类号： H01J37/32522 ,  H01J37/321 ,  H01J37/3299 ,  H01J37/32651 ,  H01J37/3211 ,  H01J37/32119 ,  H01L21/67069

摘要： Plasma processing apparatus and methods are disclosed. In one example implementation, a plasma processing apparatus can include a processing chamber. The apparatus can include a pedestal located in the processing chamber configured to support a workpiece during processing. The apparatus can include a dielectric window forming at least a portion of the processing chamber. The apparatus can include an inductive coupling element located proximate the dielectric window. The inductive coupling element can be configured to generate a plasma in the processing chamber when energized with RF energy. The apparatus can include a Faraday shield located between the inductive coupling element and the processing chamber. The apparatus can include at least one temperature control element in thermal communication with the Faraday shield.

公开(公告)号：US11626269B2

公开(公告)日：2023-04-11

申请号：US17201081

申请日：2021-03-15

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology, Co., LTD

发明人： Qi Zhang ,  Xinliang Lu ,  Hua Chung

IPC分类号： H01J37/32 ,  H01L21/67 ,  H01L21/311

摘要： Processes for surface treatment of a workpiece are provided. In one example implementation, a method can include conducting a pre-treatment process on a processing chamber to generate a hydrogen radical affecting layer on a surface of the processing chamber prior to performing a hydrogen radical based surface treatment process on a workpiece in the processing chamber. In this manner, a pretreatment process can be conducted to condition a processing chamber to increase uniformity of hydrogen radical exposure to a workpiece.

公开(公告)号：US20230099054A1

公开(公告)日：2023-03-30

申请号：US18074734

申请日：2022-12-05

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology Co., Ltd.

发明人： Michael X. Yang ,  Christian Pfahler ,  Alexandr Cosceev

IPC分类号： H01L21/02 ,  H01L21/67

摘要： Apparatus, systems, and methods for processing workpieces are provided. In one example implementation, a hydrogen gas mixed with an inert gas can be reacted with an oxygen gas to oxidize a workpiece at atmospheric pressure. A chemical reaction of a hydrogen gas with an oxygen gas facilitated by a hot workpiece surface can positively affect an oxidation process. A reaction speed of the chemical reaction can be slowed down by mixing the hydrogen gas with an inert gas. Such mixture can effectively reduce a partial pressure of the hydrogen gas. As such, the oxidation process can be carried out at atmospheric pressure, thereby, in an atmospheric thermal processing chamber.

公开(公告)号：US20230071494A1

公开(公告)日：2023-03-09

申请号：US17563560

申请日：2021-12-28

申请人： Beijing E-Town Semiconductor Technology Co., Ltd. ,  Mattson Technology, Inc.

发明人： Maolin Long ,  Changle Guan

IPC分类号： H01L21/683 ,  H01J37/32 ,  H01L21/687

摘要： A pedestal assembly is provided. The pedestal assembly includes an electrostatic chuck configured to support a workpiece. The pedestal assembly includes a focus ring have a top surface and a bottom surface. The focus ring can be configured to surround a periphery of the workpiece when the workpiece is positioned on the electrostatic chuck. The pedestal assembly includes a plurality of insulators. The pedestal assembly further includes a conductive member positioned between at least a portion of the bottom surface of the focus ring and at least a portion of one of the plurality of insulators.

公开(公告)号：US20230010075A1

公开(公告)日：2023-01-12

申请号：US17411493

申请日：2021-08-25

申请人： Beijing E-Town Semiconductor Technology Co., Ltd. ,  Mattson Technology, Inc.

发明人： Changle Guan ,  Maolin Long

IPC分类号： H01J37/32 ,  H01L21/683

摘要： A lift pin assembly for a lift pin of a plasma processing apparatus is provided. The lift pin assembly includes a pin housing defining an opening into which a lift pin extends. The pin housing is positioned such that the opening is aligned with an opening defined by an electrostatic chuck. The assembly includes a pin height adjustment member partially positioned within the opening defined by the pin housing. The pin height adjustment member is movable along an axis in a first direction and a second direction to move the lift pin into and out of the opening defined by the electrostatic chuck. The assembly includes a pin holder assembly at least partially positioned within an opening defined by the pin height adjustment member. The pin holder assembly is configured to hold the lift pin such that the lift pin is aligned with the opening defined by the electrostatic chuck.

公开(公告)号：US11508560B2

公开(公告)日：2022-11-22

申请号：US15930910

申请日：2020-05-13

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology Co., Ltd.

发明人： Martin L. Zucker ,  Peter J. Lembesis ,  Ryan M. Pakulski ,  Shawming Ma

IPC分类号： H01L21/20 ,  H01J37/32 ,  H01L21/203 ,  H01L21/677 ,  H01L21/68 ,  B25J11/00 ,  B25J15/00 ,  H01L21/67 ,  H01L21/683 ,  H01L21/687

摘要： A focus ring adjustment assembly of a system for processing workpieces under vacuum, where the focus ring may include a lower side having a first surface portion and a second surface portion, the first surface portion being vertically above the second surface portion. The adjustment assembly may include a pin configured to selectively contact the first surface portion of the focus ring, and an actuator operable to move the pin along the vertical direction between an extended position and a retracted position. The extended position of the pin may be associated with the distal end of the pin contacting the first surface of the focus ring and the focus ring being accessible for removal by a workpiece handling robot from the vacuum process chamber.

公开(公告)号：US11462413B2

公开(公告)日：2022-10-04

申请号：US16930392

申请日：2020-07-16

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology Co., Ltd.

发明人： Shanyu Wang ,  Chun Yan ,  Hua Chung ,  Michael X. Yang ,  Tsai Wen Sung ,  Qi Zhang

IPC分类号： H01L21/3065 ,  H01L21/02 ,  H01L21/311

摘要： Apparatus, systems, and methods for conducting an etch removal process on a workpiece are provided. The method can include generating a plasma from a deposition process gas in a plasma chamber using a plasma source to deposit a passivation layer on certain layers of a high aspect ratio structure. The method can include generating a plasma from an etch process gas in a plasma chamber using a plasma source to remove certain layers from the high aspect ratio structure. The method can include removing silicon nitride layers at a faster etch rate than silicon dioxide layers on the high aspect ratio structure.

公开(公告)号：US20220310359A1

公开(公告)日：2022-09-29

申请号：US17827198

申请日：2022-05-27

申请人： Beijing E-Town Semiconductor Technology Co., Ltd. ,  Mattson Technology, Inc.

发明人： Stephen E. Savas ,  Shawming Ma

IPC分类号： H01J37/32

摘要： Plasma processing apparatus and associated methods are provided. In one example, a plasma processing apparatus includes a plasma chamber. The plasma processing apparatus includes a dielectric wall forming at least a portion of the plasma chamber. The plasma processing apparatus includes an inductive coupling element located proximate the dielectric wall. The plasma processing apparatus includes an ultraviolet light source configured to emit an ultraviolet light beam onto a metal surface that faces an interior volume of the plasma chamber. The plasma processing apparatus includes a controller configured to control the ultraviolet light source.

公开(公告)号：US11387111B2

公开(公告)日：2022-07-12

申请号：US16379912

申请日：2019-04-10

申请人： Mattson Technology, Inc. ,  Beijing E-Town Semiconductor Technology, Co., LTD

发明人： Michael X. Yang ,  Hua Chung ,  Xinliang Lu

IPC分类号： H01L21/67 ,  H01L21/311 ,  H01L21/3213 ,  H01L21/02 ,  H01L21/3065 ,  H01J37/32 ,  C23C14/34

摘要： Methods for material removal of a film, such as a metal nitride film, from a workpiece are provided. One example implementation is directed to a method for processing a workpiece. The workpiece can include a film (e.g., a metal nitride film). The method can include generating one or more species (e.g., hydrogen radicals, excited inert gas molecules, etc.). The method can include mixing alkyl halide with the one or more species to generate one or more alkyl radicals. The method can include exposing the film to the one or more alkyl radicals.