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    N'-phenyl-N-methylurea derivatives
    45.
    发明授权
    N'-phenyl-N-methylurea derivatives 失效
    N'-苯基-N-甲基脲衍生物

    公开(公告)号：US4260411A

    公开(公告)日：1981-04-07

    申请号：US19613

    申请日：1979-03-12

    申请人： Ryo Yoshida ,  Ichiki Takemoto ,  Seizo Sumida ,  Katsuzo Kamoshita

    发明人： Ryo Yoshida ,  Ichiki Takemoto ,  Seizo Sumida ,  Katsuzo Kamoshita

    IPC分类号： A01N47/30 ,  C07C67/00 ,  C07C239/00 ,  C07C275/32 ,  C07C275/64 ,  C07C313/00 ,  C07C319/20 ,  C07C323/29 ,  C07C323/44 ,  C07D317/64 ,  C07C127/19

    CPC分类号： A01N47/30 ,  C07C275/32 ,  C07C275/64 ,  C07C323/29 ,  C07D317/64

    摘要： A compound of the formula: ##STR1## wherein A is a hydrogen atom, a methyl group or a methoxy group, Rs are same or different and each a halogen atom, a lower alkyl group, a lower alkoxy group, a lower alkylthio group, a trifluoromethyl group, a cyano group or a methylenedioxy group, X is a hydrogen atom or a halogen atom, Y is an oxygen atom or a sulfur atom, Z is a lower alkylene group and n is an integer of 0 to 3, provided that the substituted ureido group being present at the m- or p-position to the substituent represented by the symbol X and at the same time at the m- or p-position to the substituent represented by the symbol Z, which shows herbicidal and/or fungicidal activities and can be prepared, for instance, by reacting the corresponding phenyl isocyanate with a reagent of the formula: ##STR2## wherein A is as defined above.

    摘要翻译： 下式的化合物，其中A是氢原子，甲基或甲氧基，R 5相同或不同，卤素原子，低级烷基，低级烷氧基，低级烷硫基， 三氟甲基，氰基或亚甲二氧基，X为氢原子或卤素原子，Y为氧原子或硫原子，Z为低级亚烷基，n为0〜3的整数，条件是 取代的脲基存在于由符号X表示的取代基的m-位或对位上，并且在与由符号Z表示的取代基表示的取代基的m-位或对位的位置同时存在，和/或 杀真菌活性，并且可以例如通过使相应的苯基异氰酸酯与下式的试剂反应来制备：其中A如上所定义。

    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION
    49.
    发明申请
    CHEMICALLY AMPLIFIED POSITIVE RESIST COMPOSITION 有权
    化学放大正电阻组合物

    公开(公告)号：US20090263742A1

    公开(公告)日：2009-10-22

    申请号：US12425759

    申请日：2009-04-17

    申请人： Yusuke FUJI ,  Junji SHIGEMATSU ,  Takayuki MIYAGAWA ,  Nobuo ANDO ,  Ichiki TAKEMOTO

    发明人： Yusuke FUJI ,  Junji SHIGEMATSU ,  Takayuki MIYAGAWA ,  Nobuo ANDO ,  Ichiki TAKEMOTO

    IPC分类号： G03F7/00

    CPC分类号： G03F7/0397 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111

    摘要： The present invention provides a chemically amplified resist composition comprising: a resin (A) which contains no fluorine atom and a structural unit (a1) having an acid-labile group in a side chain, a resin (B) which contains a structural unit (b2) having a fluorine-containing group in a side chain and at least one structural unit selected from the group consisting of a structural unit (b1) having an acid-labile group, a structural unit (b3) having a hydroxyl group and a structural unit (b4) having a lactone structure in a side chain, and an acid generator, wherein the content of the structural unit (b1) based on the total units of the resin (B) is less than 10 mol %.

    摘要翻译： 本发明提供了一种化学放大抗蚀剂组合物，其包含：不含氟原子的树脂（A）和侧链具有酸不稳定基团的结构单元（a1），含有结构单元的树脂（B） b2）和具有酸不稳定基团的结构单元（b1），具有羟基的结构单元（b3）和结构单元（b3）的至少一种结构单元，在侧链中具有含氟基团， 在侧链中具有内酯结构的单元（b4）和酸产生剂，其中基于树脂（B）的总单元的结构单元（b1）的含量小于10摩尔％。

    Salt suitable for an acid generator and a chemically amplified resist composition containing the same
    50.
    发明授权
    Salt suitable for an acid generator and a chemically amplified resist composition containing the same 有权
    适用于酸产生剂的盐和含有它的化学放大抗蚀剂组合物

    公开(公告)号：US07579497B2

    公开(公告)日：2009-08-25

    申请号：US11390365

    申请日：2006-03-28

    申请人： Yukako Harada ,  Ichiki Takemoto ,  Kouji Toishi

    发明人： Yukako Harada ,  Ichiki Takemoto ,  Kouji Toishi

    IPC分类号： C07C69/74 ,  C07C69/00 ,  G03C1/00

    CPC分类号： C07D307/33 ,  C07C381/12 ,  C07D307/77 ,  C08K5/42 ,  G03F7/0045

    摘要： The present invention provides a salt of the formula (I): wherein ring Y represents monocyclic or polycyclic hydrocarbon group having 3 to 30 carbon atoms, in which one —CH2— group is substituted with —COO— group, and at least one hydrogen atom in the monocyclic or polycyclic hydrocarbon group may optionally be substituted with alkyl group having 1 to 6 carbon atom, alkoxy group having 1 to 6 carbon atom, perfluoroalkyl group having 1 to 4 carbon atoms, hydroxyalkyl group having 1 to 6 carbon atoms, hydroxyl group or cyano group; Q1 and Q2 each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; A+ represents organic counter ion; and n shows an integer of 0 to 12. The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).

    摘要翻译： 本发明提供式（I）的盐：其中环Y表示具有3-30个碳原子的单环或多环烃基，其中一个-CH 2 - 基团被-COO-基团取代，并且至少一个氢原子 在单环或多环烃基中可以任选地被具有1-6个碳原子的烷基，具有1-6个碳原子的烷氧基，具有1至4个碳原子的全氟烷基，具有1至6个碳原子的羟基烷基，羟基 或氰基; Q1和Q2各自独立地表示氟原子或具有1至6个碳原子的全氟烷基; A +代表有机抗衡离子; 并且n表示0至12的整数。本发明还提供包含式（I）的盐的化学放大抗蚀剂组合物。