摘要:
A field oxide film 3 in a region where relief cells are formed is made wider than the field oxide film 3 in a region where normal memory cells are formed thereby to make a field relaxation layer 8r of the relief cells deeper than the field relaxation layer 8 of the normal cells, and the depletion layer of the sources and drains (n-type semiconductor regions) of the relief cells is widened to weaken the junction field.
摘要:
An image processing apparatus includes a region detection unit configured to detect from an image a region which is sandwiched between a pair of opposite lines and in which image formation is performed at a density lower than a predetermined density, a rendering unit configured to render a border of an inner portion inside the region sandwiched between the pair of opposite lines with a line having a density higher than the predetermined density, and an outputting unit configured to output an image in which the inner portion inside the region sandwiched between the pair of opposite lines is bordered by the border rendered by the rendering unit.
摘要:
An image processing apparatus includes a receiving unit configured to externally receive print data including information on an attribute of an image to print, a rasterizing unit configured to generate raster image data based on the print data received by the receiving unit, an attribute data generating unit configured to generate attribute data representing an attribute of an image included in the raster image data generated by the rasterizing unit based on the information on an attribute of an image to print included in the print data, and a vectorizing unit configured to vectorize at least a part of the raster image data. The vectorizing unit identifies the attribute of the image included in the raster image data based on the attribute data generated by the attribute data generating unit, and performs vectorization based on the identified attribute of the image.
摘要:
A document management system capable of reliably implementing disposal management of printed matter resulting from print output based on document data. A print history of images based on the document data printed by a printing device is managed. A deletion instruction for at least one set of document data stored in a document storage device is received. The document data targeted for deletion from the document storage device based on the deletion instruction is deleted. Management information of the document data targeted for deletion from the document storage device based on the print history managed by the management unit is deleted.
摘要:
A data storage device that performs a process of writing to a memory a plurality of measured data sets received in time series includes: a nonvolatile memory divided in a plurality of blocks to which the measured data is written; and a write control section that performs a processing including successively writing N sets of the measured data to a given block in the nonvolatile memory, and then successively writing next N sets of the measured data to another block, wherein the write control section judges whether or not the N sets of measured data lastly written to the given block of the nonvolatile memory and another N sets of measured data obtained after the N sets of measured data lastly written to the given block contain data with a value outside a predetermined range, writes new measured data to the given block such that the N sets of measured data lastly written to the given block are not overwritten when the data with a value outside the predetermined range is included, and writes new measured data to the given block such that at least one of the N sets of measured data lastly written to the given block is overwritten when the data with a value outside the predetermined range is not included.
摘要:
When an image including a specific image is created and stored, it is determined whether or not the height/width ratio of the specific image has been changed by a user in the image that includes the specific image. Whether or not to store the image including the specific image is controlled based on the results of the determination.
摘要:
A sputtering apparatus includes: a film forming chamber that houses a substrate hold so as to be capable of being carried in a horizontal direction; a sputtered particle ejecting section that includes an upper target and a lower target that are disposed so as to face each other and oblique to the substrate, and an opening, and in which sputtered particles are generated from a pair of the targets by plasma, and the sputtered particles are ejected from the opening to the substrate carried from a side adjacent to the upper target to another side adjacent to the lower target; and a slit member that has a slit through which the sputtered particles are selectively passed, and is disposed between the substrate and the sputtered particle ejecting section. The slit member is disposed so that a slit open end of the slit is positioned within 50 mm from an upstream open end of the opening of the sputtered particle ejecting section, and the slit open end is positioned at an upstream side in a carrying direction of the substrate.
摘要:
A manufacturing method for a ferroelectric memory device includes: forming a ferroelectric capacitor on a substrate, the ferroelectric capacitor including a lower electrode, a ferroelectric film, and an upper electrode; forming a first hydrogen barrier film that covers the ferroelectric capacitor by a chemical vapor deposition method; forming a dielectric film on the first hydrogen barrier film; forming a sidewall composed of the dielectric film on a side of the ferroelectric capacitor by etching back the dielectric film; forming a second hydrogen barrier film on the first hydrogen barrier film and the sidewall by a chemical vapor deposition method; and forming an interlayer dielectric film on the second hydrogen barrier film.
摘要:
A Co silicide layer having a low resistance and a small junction leakage current is formed on the surface of the gate electrode, source and drain of MOSFETS by silicidizing a Co film deposited on a main plane of a wafer by sputtering using a high purity Co target having a Co purity of at least 99.99% and Fe and Ni contents of not greater than 10 ppm, preferably having a Co purity of 99.999%.
摘要:
To securely prevent hydrogen from entering a ferroelectric layer of a ferroelectric memory. A first hydrogen barrier layer 5 is formed on the lower side of ferroelectric capacitors 7. Upper surfaces and side surfaces of the ferroelectric capacitors 7 are covered by a second hydrogen barrier layer. All upper electrodes 7c of the plural ferroelectric capacitors 7 to be connected to a common plate line P are connected to one another by an upper wiring layer 91. The upper wiring layer 91 is connected to the plate line P through a lower wiring 32 provided below the ferroelectric capacitors 7. A third hydrogen barrier layer 92 is formed on the upper wiring layer 91 such that all edge sections 92a of the third hydrogen barrier layer 92 come in contact with the first hydrogen barrier layer 5.