公开(公告)号：US10746983B2

公开(公告)日：2020-08-18

申请号：US16008772

申请日：2018-06-14

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Alexander Payne ,  James Hunter ,  Lars Eng

IPC: G02B26/08 ,  G01S7/481 ,  G02B27/00

Abstract: A capacitive micro-electromechanical system (MEMS) structure or device and methods of making and operating the same are described. Generally, the MEMS device provides a large stroke while maintaining good damping, enabling fast beam steering and large scan angles. In one embodiment, the capacitive MEMS device includes a bottom electrode formed over a substrate; an electrically permeable damping structure formed over the bottom electrode, the electrically permeable damping structure including a first air-gap and a dielectric layer suspended above and separated from the bottom electrode by the first air-gap; and a plurality of movable members suspended above the damping structure and separated therefrom by a second air-gap, each of the plurality of movable members including a top electrode and being configured to deflect towards the bottom electrode by electrostatic force. Other embodiments are also described.

公开(公告)号：US20170269350A1

公开(公告)日：2017-09-21

申请号：US15071096

申请日：2016-03-15

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Hyung KYU Lee ,  Alexander Payne ,  Michael Yeung

IPC: G02B26/00 ,  H02N1/00

CPC classification number: G02B26/001 ,  G02B26/0841 ,  G09G3/346 ,  G09G2310/0275

Abstract: A circuit and method for driving electrostatic microelectomechanical systems (MEMS) are provided. In one embodiment, the circuit includes a first electrode in a movable element of the MEMS and a second electrode on a surface of a substrate of the MEMS over which the movable element is suspended, and a driver electrically coupled to the first and the second electrodes. The driver supplies a voltage differential between the first and second electrodes to vary an electrostatic force between the electrodes thereby moving the movable element. The driver is configured to supply a voltage pulse having a leading edge in which a first voltage intermediate between an initial, minimum voltage and a maximum voltage is maintained for a first time before rising to the maximum voltage timed to dampen oscillations of the movable element. Other embodiments are also described.

公开(公告)号：US20130034958A1

公开(公告)日：2013-02-07

申请号：US13648932

申请日：2012-10-10

Applicant: Silicon Light Machines Corporation

Inventor： Joshua LU ,  Gregory BEACH ,  Alexander PAYNE ,  James HUNTER

IPC: H01L21/768

CPC classification number: G02B26/0808 ,  B81B2201/047 ,  B81C1/00238 ,  B81C1/00246 ,  G02B26/0833

Abstract: A method of fabricating an integrated device including a MicroElectroMechanical system (MEMS) and an associated microcircuit is provided. In one embodiment, the method comprises: forming a high temperature contact through a dielectric layer to an underlying element of a microcircuit formed adjacent to a MicroElectroMechanical System (MEMS) structure on a substrate; and depositing a layer of conducting material over the dielectric layer, and patterning the layer of conducting material to form a local interconnect (LI) for the microcircuit overlying and electrically coupled to the contact and a bottom electrode for the adjacent MEMS structure. Other embodiments are also provided.

Abstract translation: 提供了一种制造包括微电子机械系统（MEMS）和相关微电路的集成装置的方法。 在一个实施例中，该方法包括：通过电介质层形成高温接触到邻近微电子机械系统（MEMS）结构的衬底上形成的微电路的下层元件; 以及在所述电介质层上沉积导电材料层，以及图案化所述导电材料层以形成用于所述微电路的局部互连（L1），所述微电路覆盖并电耦合到所述触点和所述相邻MEMS结构的底部电极。 还提供了其他实施例。

公开(公告)号：US20030235932A1

公开(公告)日：2003-12-25

申请号：US10161191

申请日：2002-05-28

Applicant: Silicon Light Machines

Inventor： James A. Hunter

IPC: H01L021/00

CPC classification number: G02B26/0808 ,  B81B2201/045 ,  B81B2207/015 ,  B81B2207/07 ,  B81C1/00246 ,  B81C2201/016 ,  B81C2203/0735 ,  B81C2203/0778 ,  H01L27/0611

Abstract: An integrated device including one or more device drivers and a diffractive light modulator monolithically coupled to the one or more driver circuits. The one or more driver circuits are configured to process received control signals and to transmit the processed control signals to the diffractive light modulator. A method of fabricating the integrated device preferably comprises fabricating a front-end portion for each of a plurality of transistors, isolating the front-end portions of the plurality of transistors, fabricating a front-end portion of a diffractive light modulator, isolating the front end portion of the diffractive light modulator, fabricating interconnects for the plurality of transistors, applying an open array mask and wet etch to access the diffractive light modulator, and fabricating a back-end portion of the diffractive light modulator, thereby monolithically coupling the diffractive light modulator and the plurality of transistors.

Abstract translation: 包括一个或多个器件驱动器和单片耦合到所述一个或多个驱动器电路的衍射光调制器的集成器件。 一个或多个驱动器电路被配置为处理接收到的控制信号并将经处理的控制信号传送到衍射光调制器。 一种制造集成器件的方法优选包括制造用于多个晶体管中的每一个晶体管的前端部分，隔离多个晶体管的前端部分，制造衍射光调制器的前端部分，将前部 衍射光调制器的端部，制造用于多个晶体管的互连，施加开放阵列掩模和湿蚀刻以访问衍射光调制器，以及制造衍射光调制器的后端部分，从而将衍射光 调制器和多个晶体管。

公开(公告)号：US20030035215A1

公开(公告)日：2003-02-20

申请号：US09930838

申请日：2001-08-15

Applicant: Silicon Light Machines

Inventor： David T. Amm ,  Jahja Trisnadi ,  James Hunter ,  Christopher Gudeman ,  Dinesh Maheshwari

IPC: G02F001/03 ,  G02F001/07 ,  G02B005/18

CPC classification number: G02B26/0808

Abstract: A light modulator includes elongated elements arranged parallel to each other. In a first diffraction mode, the light modulator operates to diffract an incident light into at least two diffraction orders. In a second diffraction mode, the light modulator operates to diffract the incident light into a single diffraction order. Each of the elongated elements comprises a blaze profile, which preferably comprises a reflective stepped profile across a width of each of the elongated elements and which produces an effective blaze at a blaze angle. Alternatively, the blaze profile comprises a reflective surface angled at the blaze angle. Each of selected ones of the elongated elements comprise a first conductive element. The elongated elements produce the first diffraction when a first electrical bias is applied between the first conductive elements and a substrate. A relative height of the blazed portions are adjusted to produce the second diffraction when a second electrical bias is applied between the first conductive elements and the substrate. In an alternative embodiment, each of the elongated elements includes the first conductive element and multiple elongated elements are arranged in groupings, where each of the groupings includes at least three of the elongated elements. When the multiple elongated elements are at a first height, the incident light reflects from the elongated elements. When relative heights of the multiple elongated elements are adjusted by applying individual electrical biases between the first conductive elements and the substrate, the incident light diffracts into the single diffraction order.

公开(公告)号：US20020110320A1

公开(公告)日：2002-08-15

申请号：US09782387

申请日：2001-02-12

Applicant: Silicon Light Machines

Inventor： Clinton Carlisle ,  Jahja Trisnadi

IPC: G02B006/32

CPC classification number: G02B6/4298 ,  G02B6/4206 ,  H04N5/74 ,  H04N5/7416

Abstract: The present invention is directed to illuminating a one-dimensional spatial light modulator using an illumination system employing multiple light sources. The illumination system comprises a parallel array of light sources which provides a plurality of light outputs to an optical train. The optical train effectively combines the light sources into a single light source. The single light source provides a single light output for uniformly illuminating the spatial light modulator. The optical train includes a first optical train for receiving the light outputs from each light source, magnifying each light output, and overlaying each of the light outputs to form a single real magnified image. A mode conversion lens receives the single real magnified image, converts a mode profile of the single real magnified image into a top hat mode profile, and outputs a diverging light beam with a top hat mode profile. A second optical train shapes the light beam into an appropriate spatial geometry in such a manner that the light beam effectively illuminates the entire spatial light modulator, and directs the light beam onto the spatial light modulator.

Abstract translation: 本发明涉及使用采用多个光源的照明系统来照射一维空间光调制器。 该照明系统包括一个平行的光源阵列，它向光学列车提供多个光输出。 光学列车将光源有效地组合成单个光源。 单个光源提供用于均匀照明空间光调制器的单个光输出。 光学列车包括用于接收来自每个光源的光输出的第一光学列，放大每个光输出，并覆盖每个光输出以形成单个实际放大图像。 模式转换镜头接收单个实际放大图像，将单个实际放大图像的模式轮廓转换为顶帽模式轮廓，并输出具有顶帽模式轮廓的发散光束。 第二光学系列将光束形成适当的空间几何形状，使得光束有效地照射整个空间光调制器，并将光束引导到空间光调制器上。

公开(公告)号：US12181657B2

公开(公告)日：2024-12-31

申请号：US17591858

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Alexander Payne ,  James Hunter ,  Tianbo Liu

IPC: G02B26/00 ,  G02B26/02 ,  G02B26/08 ,  G03F7/00

Abstract: A high-contrast two-dimensional Micro-Electromechanical System light modulator and methods of fabricating and operating the same in various applications is provided. Generally, the light modulator includes a single, deformable membrane suspended over a surface of a substrate by posts at corners thereof, the deformable membrane including an electrostatically deflectable patterned central portion (CP) and a number of flexures through which the CP is coupled to the posts. A membrane reflector is formed on a surface of the CP, and a substrate reflector over a surface of the substrate, and the substrate reflector exposed through void spaces between the posts, flexures and CP. The light modulator is operable so that when the membrane reflector is deformed into a non-planar surface by electrostatic deflection of the CP, and light reflected from the membrane reflector is brought into phase interference with light reflected from the substrate reflector.

公开(公告)号：US20240369824A1

公开(公告)日：2024-11-07

申请号：US18441275

申请日：2024-02-14

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Gregory Jacob

IPC: G02B26/00 ,  G02B26/02 ,  G02B26/08 ,  G03F7/00

Abstract: Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.

公开(公告)号：US20240069171A1

公开(公告)日：2024-02-29

申请号：US18453160

申请日：2023-08-21

Applicant: Silicon Light Machines Corporation ,  SCREEN Holdings Co., Ltd.

Inventor： Yuki ASHIDA ,  Stephen Sanborn HAMANN

IPC: G01S7/481 ,  G01S17/931

CPC classification number: G01S7/4817 ,  G01S7/4816 ,  G01S17/931

Abstract: A light detection and ranging (LIDAR) system incorporates a scanning system with random access pointing. The scanning system has a light source that generates a coherent light, a micro-electro-mechanical system (MEMS) phased-array that steers the coherent light in a vertical direction, and a resonant scanner that scans the coherent light in a horizontal direction. The coherent light is projected onto a far field scene. The MEMS phased-array steers the coherent light to point the projected light on selected spots on the far field scene in random access fashion.

公开(公告)号：US20220252862A1

公开(公告)日：2022-08-11

申请号：US17591898

申请日：2022-02-03

Applicant: SILICON LIGHT MACHINES CORPORATION

Inventor： Stephen Hamann ,  Alexander Payne ,  Lars Eng ,  James Hunter ,  Tianbo Liu ,  Gregory Jacob

IPC: G02B26/02 ,  G03F7/20

Abstract: Spatial light modulators (SLMs) and systems using same are described. Generally, the system includes a laser, a fixture holding a workpiece to be processed using the laser, illumination optics to illuminate the SLM with laser light, imaging optics to focus modulated light from the SLM onto the workpiece, and a controller to control the laser, the SLM, imaging optics and the fixture to scan the modulated light across a workpiece surface. The SLM includes an array of microelectromechanical system based diffractors, each including an electrostatically deflectable member coupled to a first light reflective surface and to bring light reflected from the first light reflective surface into interference with light reflected from a second light reflective surface in the SLM. The controller is operable to provide analog gray-scale control of an intensity of modulated light reflected from each diffractor by controlling an electrostatic force generated by a driver coupled thereto.