公开(公告)号：US20150297150A1

公开(公告)日：2015-10-22

申请号：US14788208

申请日：2015-06-30

Applicant: Academisch Medisch Centrum bij de Universiteit van Amsterdam

Inventor： Cornelis Antonius Grimbergen ,  Gerardus Johannes Den Heeten

IPC: A61B6/04 ,  A61B6/00

CPC classification number: A61B6/0414 ,  A61B6/0435 ,  A61B6/44 ,  A61B6/502 ,  A61B6/586

Abstract: Method and apparatus for monitoring and/or adjusting the settings of a mammography apparatus comprising a mainframe, a subframe mounted in the mainframe, wherein the subframe supports an x-ray source, a paddle and a detector with a detector cover, including providing of a suspension for connecting the paddle with the subframe, wherein the suspension of the paddle is provided with force sensors for obtaining a measurement signal that is indicative of an amount of compression applied with the paddle to a breast.

Abstract translation: 用于监测和/或调整乳房摄影装置的设置的方法和装置包括主机，安装在主机中的子框架，其中所述子框架支撑x射线源，桨和具有检测器盖的检测器，包括提供 用于将桨叶与子车架连接的悬架，其中桨的悬架设置有力传感器，用于获得指示施加到乳房的桨叶的压缩量的测量信号。

公开(公告)号：US20240004312A1

公开(公告)日：2024-01-04

申请号：US18253734

申请日：2021-10-28

Applicant: ASML Netherlands B.V. ,  STICHTING NEDERLANDSE WETENSCHAPPELIJK ONDERZOEK INSTITUTEN ,  STICHTING VU ,  UNIVERSITEIT VAN AMSTERDAM

Inventor： Peter Michael KRAUS ,  Sylvianne Dorothea Christina ROSCAM ABBING ,  Filippo CAMPI ,  ZhuangYan ZHANG ,  Petrus Wilhelmus SMORENBURG ,  Nan LIN ,  Stefan Michiel WITTE ,  Arie Jeffrey DEN BOEF

IPC: G03F7/00 ,  G02F1/35 ,  H05G2/00

CPC classification number: G03F7/70641 ,  G03F7/706849 ,  G02F1/353 ,  G02F1/3505 ,  G02F1/3507 ,  H05G2/00

Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.

公开(公告)号：US20210115330A1

公开(公告)日：2021-04-22

申请号：US17052031

申请日：2019-05-01

Applicant: UNIVERSITEIT VAN AMSTERDAM ,  UNIVERSITEIT TWENTE

Inventor： Hui NIE ,  Katerina NEWELL ,  Jos Marie Johannes PAULUSSE

IPC: C09K11/66 ,  C09K11/59 ,  C09K11/02 ,  C01B33/06 ,  C01G17/00

Abstract: Method for manufacturing fluoro(hydro)carbon-substituted silicon or germanium quantum dots which comprises the steps of:—reacting a Zintl salt or intermetallic compound of post-transition metals or metalloids of silicon or germanium with a halogen-containing oxidizing agent to form halide-terminated silicon or germanium quantum dots,—reacting the halide-terminated silicon or germanium quantum dots with a fluoro(hydro)carbon agent selected from the group of metal-fluoro (hydro)carbon compounds of the formula MRq, wherein M is a metal selected from Group 1, 2, 4, 11, 12, 13, or 14 of the periodic table of elements, q is an integer which corresponds to the valence of the metal, and R is CFnHm-fluoro/hydro-carbon, wherein n is 1 or 2, m is 0 or 1, and the total of n and m is 2, wherein each R may be the same or different, metal-fluoro (hydro)carbon halide compounds of the formula NQaRp wherein N is a metal selected from Group 1, 2, 4, 11, 12, 13, or 14 of the periodic table of elements, Q is a halogen selected from F, Cl, Br, or I, wherein each Q may be the same or different, a and p are integers in the range of 1-3, and the total of a and p corresponds to the valence of the metal, and R is as defined above, and metal-fluoro (hydro)carbon compounds of the formula CuR2Li, wherein R is as defined above, to form fluoro(hydro)carbon-substituted silicon or germanium quantum dots. The method makes it possible to obtain quantum dots with a tailored emission spectrum with high quality in a stable process. The particles obtained by this process are also claimed.

公开(公告)号：US20200000356A1

公开(公告)日：2020-01-02

申请号：US16489333

申请日：2018-02-22

Applicant: Universiteit van Amsterdam ,  Okazolab Ltd

Inventor： Lucia Maddalena TALAMINI ,  Ilia Korjoukov

IPC: A61B5/048 ,  A61B5/0484 ,  A61B5/00

Abstract: The invention provides an assembly comprising: a recording assembly for recording a time-based brain-related signal; a stimulus generator for providing a stimulus, and a computer assembly, functionally coupled to said recording assembly and to said stimulus generator, said computer assembly comprising: a memory for storing at least a data segment of said time-based brain-related signal during recording of said time-based brain-related signal, and a computer program which, when running on said computer assembly, functionally real-time performs: retrieving a most-recent data segment of said stored data segment of said time-based brain-related signal; fitting at least one curve to said retrieved most-recent data segment; predicting a future continuation of said most-recent data segment using said at least one curve fitted to said most-recent data segment; detecting a predefined pattern in said predicted future continuation for predicting occurrence of said predefined pattern, and defining a predicted event time of said predefined pattern, said predicted event time being in the future with respect to said most-recent data segment, and actuating said stimulus generator for providing a stimulus within a predefined event time window of said predicted event time.

公开(公告)号：US20190310559A1

公开(公告)日：2019-10-10

申请号：US16376639

申请日：2019-04-05

Applicant: Stichting VU ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Universiteit van Amsterdam ,  ASML Netherlands B.V.

Inventor： Johannes Fitzgerald DE BOER ,  Vasco Tomas TENNER ,  Arie Jeffrey DEN BOEF ,  Christos MESSINIS

IPC: G03F7/20 ,  G01N21/88

Abstract: Methods and apparatus are disclosed for determining a characteristic of a structure. In one arrangement, the structure is illuminated with first illumination radiation to generate first scattered radiation. A first interference pattern is formed by interference between a portion of the first scattered radiation reaching a sensor and first reference radiation. The structure is also illuminated with second illumination radiation from a different direction. A second interference pattern is formed using second reference radiation. The first and second interference patterns are used to determine the characteristic of the structure. Azimuthal angles of the first and second reference radiations onto the sensor are different.

公开(公告)号：US10421066B2

公开(公告)日：2019-09-24

申请号：US14901495

申请日：2014-06-26

Applicant: IFP Energies nouvelles ,  Universiteit Van Amsterdam

Inventor： Pierre-Alain Breuil ,  Pierre Boulens ,  Joost Reek ,  Helene Olivier-Bourbigou

IPC: B01J31/24 ,  B01J31/02 ,  B01J31/18 ,  B01J31/14 ,  C07C2/36

Abstract: The invention describes a novel catalytic composition comprising at least one nickel precursor A with at least one diphosphinamine ligand B1 of formula (R1)(R′1)P—N(R3)—P(R2)(R′2) or an iminobisphosphine ligand B2 of formula (R3)N═P(R1)(R′1)—P(R2)(R′2) or an iminobisphosphine ligand B′2 of formula (R3)N═P(R2)(R′2)—P(R1)(R′1). The invention also describes the use of said catalytic composition in a method for the oligomerisation of olefins.

公开(公告)号：US20190249079A1

公开(公告)日：2019-08-15

申请号：US16331704

申请日：2017-09-08

Applicant: UNIVERSITEIT VAN AMSTERDAM

Inventor： Katerina Dohnalova ,  Benjamin Bruhn ,  Benjamin Brenny

IPC: C09K11/59 ,  C09K11/02

CPC classification number: C09K11/59 ,  B82Y20/00 ,  B82Y40/00 ,  C09K11/02

Abstract: Multi-chromatic photoluminescent, oxide-capped semiconductor nanocrystals and methods for forming such semiconductor nanocrystals. The method includes exposing one or more oxide-capped semiconductors, preferably type IV semiconductor nanocrystals, to electron beam radiation, wherein the radiation has an energy between 1 and 30 keV, the radiation introducing color centers in the oxide that exhibit photoluminescence in at least the green band of the visible spectrum.

公开(公告)号：US10273454B2

公开(公告)日：2019-04-30

申请号：US15612096

申请日：2017-06-02

Applicant: ACADEMISCH MEDISCH CENTRUM BIJ DE UNIVERSITEIT VAN AMSTERDAM ,  AIMM THERAPEUTICS B.V.

Inventor： Hergen Spits ,  Ferenc A. Scheeren ,  Tim Beaumont ,  Sean A. Diehl

IPC: C12N5/10 ,  C12N5/0781 ,  C07K16/00

Abstract: The invention provides a method for influencing the stability of an antibody producing cell, comprising directly or indirectly influencing the amount of BCL6 and/or Blimp 1 expression product within said antibody producing cell. Stable antibody producing cells and cell lines are also provided, as well as methods for producing antibodies using such cells and/or cell lines.

公开(公告)号：US20180348145A1

公开(公告)日：2018-12-06

申请号：US15979990

申请日：2018-05-15

Applicant: ASML Netherlands B.V. ,  Stichting Nederlandse Wetenschappelijk Onderzoek Instituten ,  Stichting VU ,  Universiteit van Amsterdam

Inventor： Stefan Michiel WITTE ,  Gijsbert Simon Matthijs Jansen ,  Lars Christian Freisem ,  Kjeld Sijbrand Eduard Eikema ,  Simon Gijsbert Josephus Mathijssen

IPC: G01N21/88 ,  G01N21/95 ,  G01J1/42

CPC classification number: G03F7/706 ,  G01J9/00 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/70191

Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.

公开(公告)号：US09632039B2

公开(公告)日：2017-04-25

申请号：US14838268

申请日：2015-08-27

Applicant: Vrije Universiteit Amsterdam ,  Universiteit van Amsterdam ,  Stichting voor Fundamenteel Onderzoek der Materie ,  ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Gijsbert Josephus Mathijssen ,  Nitesh Pandey ,  Stefan Michiel Witte ,  Kjeld Eikema

IPC: G03B27/54 ,  G01N21/956 ,  G03F7/20 ,  G01B11/00 ,  G03H1/04 ,  G03H1/00 ,  G03H1/02

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2201/12 ,  G03F7/70141 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03H1/0443 ,  G03H2001/0033 ,  G03H2001/0204 ,  G03H2001/0458

Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.