公开(公告)号：US07664608B2

公开(公告)日：2010-02-16

申请号：US11776572

申请日：2007-07-12

Applicant: Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

Inventor： Yuta Urano ,  Akira Hamamatsu ,  Shunji Maeda ,  Kaoru Sakai

IPC: G01B9/00 ,  G06F19/00

CPC classification number: G01N21/9501 ,  G01N21/4738 ,  G01N21/956

Abstract: A pattern inspection apparatus which compares images of regions, corresponding to each other, of patterns that are formed so as to be identical and judges that non-coincident portions in the images are defects. The pattern inspection apparatus is equipped with an image comparing section which plots individual pixels of an inspection subject image in a feature space and detects excessively deviated points in the feature space as defects. Defects can be detected correctly even when the same patterns in images have a brightness difference due to a difference in the thickness of a film formed on a wafer.

Abstract translation: 一种模式检查装置，其将彼此对应的区域的图像进行比较，形成为相同的图案，并判断图像中的非重合部分是缺陷。 图案检查装置配备有图像比较部，其在特征空间中绘制检查对象图像的各个像素，并且将特征空间中的过度偏离的点作为缺陷进行检测。 即使图像中的相同图案由于晶片上形成的膜的厚度差而具有亮度差，因此也可以正确检测缺陷。

公开(公告)号：US20070177136A1

公开(公告)日：2007-08-02

申请号：US11653322

申请日：2007-01-16

Applicant: Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

Inventor： Hiroyuki Nakano ,  Akira Hamamatsu ,  Sachio Uto ,  Yoshimasa Oshima ,  Hidetoshi Nishiyama ,  Yuta Urano ,  Shunji Maeda

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/9501 ,  G01N21/95607 ,  G01N21/95623 ,  G01N2021/9513 ,  G01N2021/95638 ,  H01L22/12

Abstract: A defect inspection apparatus includes an irradiation optical system 20, a detection optical system 30, and an image processor 40. In the irradiation optical system, a mirror 2603 is disposed to reflect downward a beam flux that has been guided to a first or second optical path, and a cylindrical lens 251 and an inclined mirror 2604 are disposed to focus the beam flux that has been directed downward by the mirror, at an inclination angle from a required oblique direction extending horizontally, onto a substrate 1 to be inspected, as a slit-shaped beam 90.

Abstract translation: 缺陷检查装置包括照射光学系统20，检测光学系统30和图像处理器40。 在照射光学系统中，设置反射镜2603以向下反射已经被引导到第一或第二光路的光束，并且设置柱面透镜251和倾斜镜2604以聚焦已导向的光束 作为狭缝状光束90，通过反射镜向下倾斜，从与水平方向延伸的所需倾斜方向倾斜的角度，到被检查的基板1上。

公开(公告)号：US20060163503A1

公开(公告)日：2006-07-27

申请号：US11325550

申请日：2006-01-05

Applicant: Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

Inventor： Yuta Urano ,  Hiroyuki Nakano ,  Shunji Maeda ,  Sachio Uto

IPC: G01N21/86

CPC classification number: G01N21/9501 ,  G01N21/47 ,  G01N21/4788 ,  G01N21/94 ,  G01N21/956

Abstract: When using a CCD sensor as a photo-detector in a device for inspecting foreign matters and defects, it has a problem of causing electric noise while converting the signal charge, produced inside by photoelectric conversion, into voltage and reading it. Therefore, the weak detected signal obtained by detecting reflected and scattered light from small foreign matters and defects is buried in the electric noise, which has been an obstacle in detecting small foreign matters and defects. In order to solve the above problem, according to the present invention, an electron multiplying CCD sensor is used as a photo-detector. The electron multiplying CCD sensor is capable of enlarging signals brought about by inputted light relatively to the electric noise by multiplying the electrons produced through photoelectric conversion and reading them. Accordingly, compared to a conventional CCD sensor, it can detect weaker light and, therefore, smaller foreign matters and defects.

Abstract translation: 当在用于检查异物和缺陷的装置中使用CCD传感器作为光检测器时，存在在将由光电转换产生的信号电荷转换成电压并读取的同时将电噪声引起的问题。 因此，通过检测来自小异物和缺陷的反射和散射光获得的弱检测信号被埋在电噪声中，这是检测小异物和缺陷的障碍。 为了解决上述问题，根据本发明，使用电子倍增CCD传感器作为光检测器。 电子倍增CCD传感器能够通过将通过光电转换产生的电子与其进行读取而相对于电噪声放大由输入光产生的信号。 因此，与常规CCD传感器相比，它可以检测较弱的光，因此可以检测较小的异物和缺陷。

公开(公告)号：US08922764B2

公开(公告)日：2014-12-30

申请号：US13976178

申请日：2011-10-21

Applicant: Yuta Urano ,  Toshifumi Honda ,  Yukihiro Shibata

Inventor： Yuta Urano ,  Toshifumi Honda ,  Yukihiro Shibata

IPC: G01N21/956 ,  G01N21/95 ,  G01B11/06 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01B11/0608 ,  G01N21/9501 ,  G01N21/95623 ,  G01N2021/8854 ,  G01N2201/1045

Abstract: A defect inspection method includes: illuminating an area on surface of a specimen as a test object under a specified illumination condition; scanning a specimen to translate and rotate the specimen; detecting scattering lights to separate each of scattering lights scattered in different directions from the illuminated area on the specimen into pixels to be detected according to a scan direction at the scanning a specimen and a direction approximately orthogonal to the scan direction; and processing to perform an addition process on each of scattering lights that are detected at the step and scatter approximately in the same direction from approximately the same area of the specimen, determine presence or absence of a defect based on scattering light treated by the addition process, and compute a size of the determined defect using at least one of the scattering lights corresponding to the determined defect.

Abstract translation: 缺陷检查方法包括：在规定的照明条件下照射作为被检体的试样表面的面积; 扫描样品以平移和旋转样品; 检测散射光，根据扫描样本的扫描方向和与扫描方向大致正交的方向，将从样本上的照射区域向不同方向散射的散射光分离成要检测的像素; 对在步骤中检测到的每个散射光进行加法处理，并且从与样本的大致相同的区域大致相同的方向散射，基于通过加法处理的散射光确定缺陷的存在或不存在 并且使用与所确定的缺陷相对应的散射光中的至少一个来计算确定的缺陷的大小。

公开(公告)号：US20140268122A1

公开(公告)日：2014-09-18

申请号：US14232929

申请日：2012-06-28

Applicant: Shunichi Matsumoto ,  Atsushi Taniguchi ,  Toshifumi Honda ,  Yukihiro Shibata ,  Yuta Urano

Inventor： Shunichi Matsumoto ,  Atsushi Taniguchi ,  Toshifumi Honda ,  Yukihiro Shibata ,  Yuta Urano

IPC: G01N21/95

CPC classification number: G01N21/9501 ,  G01N21/956 ,  G01N2201/126 ,  G01N2201/127 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

Abstract: A defect inspection method and device for irradiating a linear region on a surface-patterned sample mounted on a planarly movable table, with illumination light from an inclined direction relative to a direction of a line normal to the sample, next detecting in each of a plurality of directions an image of the light scattered from the sample irradiated with the illumination light, then processing signals obtained by the detection of the images of the scattered light, and thereby detecting a defect present on the sample; wherein the step of detecting the scattered light image in the plural directions is performed through elliptical lenses in which elevation angles of the optical axes thereof are different from each other, within one plane perpendicular to a plane formed by the normal to the surface of the table on which to mount the sample and the longitudinal direction of the linear region irradiated with the irradiation light, the elliptical lenses being formed of circular lenses having left and right portions thereof cut.

Abstract translation: 一种用于照射安装在平面可移动台上的表面图案样品上的线性区域的缺陷检查方法和装置，其具有相对于垂直于样品的线的方向的倾斜方向的照明光，接下来在多个 指示从照射光照射的样品散射的光的图像，然后处理通过检测散射光的图像而获得的信号，从而检测样品上存在的缺陷; 其特征在于，所述检测多个方向的散射光图像的步骤是通过椭圆形透镜进行的，所述椭圆透镜在光学轴的仰角彼此不同的垂直于与所述表的表面法线形成的平面的一个平面内 在其上安装样品和用照射光照射的线性区域的纵向方向，椭圆形透镜由其左侧和右侧部分切割的圆形透镜形成。

公开(公告)号：US08599369B2

公开(公告)日：2013-12-03

申请号：US13378418

申请日：2010-06-09

Applicant: Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda

Inventor： Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda

IPC: G01N21/47 ,  G01N21/55

CPC classification number: G01N21/9501 ,  G01N2021/8861 ,  G01N2021/8874

Abstract: A defect inspection method wherein illumination light having a substantially uniform illumination intensity distribution in a certain direction on the surface of a specimen is radiated onto the surface of the specimen; wherein multiple components of those scattered light beams from the surface of the specimen which are emitted mutually different directions are detected, thereby obtaining corresponding multiple scattered light beam detection signals; wherein the multiple scattered light beam detection signals is subjected to processing, thereby determining the presence of defects; wherein the corresponding multiple scattered light detecting signals is processed with respect to all of the spots determined to be defective by the processing, thereby determining the sizes of defects; and wherein the defect locations on the specimen and the defect sizes are displayed with respect to all of the spots determined to be defective by the processing.

Abstract translation: 一种缺陷检查方法，其中将在试样表面上沿某一方向具有基本均匀的照明强度分布的照明光辐射到样品的表面上; 其中检测出来自样本表面的这些散射光束相互不同方向发射的多个分量，从而获得相应的多个散射光束检测信号; 其中对所述多个散射光束检测信号进行处理，由此确定缺陷的存在; 其中相应的多个散射光检测信号相对于通过处理确定为有缺陷的所有点进行处理，从而确定缺陷的尺寸; 并且其中相对于通过处理确定为有缺陷的所有点显示样本上的缺陷位置和缺陷尺寸。

公开(公告)号：US20130141715A1

公开(公告)日：2013-06-06

申请号：US13703414

申请日：2011-05-20

Applicant: Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda ,  Yukihiro Shibata

Inventor： Yuta Urano ,  Shigenobu Maruyama ,  Toshiyuki Nakao ,  Toshifumi Honda ,  Yukihiro Shibata

IPC: G01N21/88

CPC classification number: G01N21/94 ,  G01N21/47 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/4711 ,  G01N2021/8867 ,  G01N2021/8874 ,  G01N2201/0806 ,  G01N2201/10

Abstract: Proposed is a defect inspection method whereby: illuminating light having a substantially uniform illumination intensity distribution in one direction of a sample surface irradiated on the sample surface; multiple scattered light components, which are output in multiple independent directions, are detected among the scattered light from the sample surface and multiple corresponding scattered light detection signals are obtained; at least one of the multiple scattered light detection signals is processed and the presence of defects is determined; at least one of the multiple scattered light detection signals that correspond to each of the points determined by the processing as a defect is processed and the dimensions of the defect are determined; and the position and dimensions of the defect on the sample surface, at each of the points determined as a defect, are displayed.

Abstract translation: 提出了一种缺陷检查方法，其中：照射在样品表面上的样品表面的一个方向具有基本上均匀的照明强度分布的光; 在来自样品表面的散射光中检测多个独立方向输出的多个散射光分量，并获得多个相应的散射光检测信号; 处理多个散射光检测信号中的至少一个并确定缺陷的存在; 处理与通过处理确定的每个点对应的多个散射光检测信号中的至少一个作为缺陷，并确定缺陷的尺寸; 并且显示在被确定为缺陷的每个点处的样品表面上的缺陷的位置和尺寸。

公开(公告)号：US20130114078A1

公开(公告)日：2013-05-09

申请号：US13701030

申请日：2011-05-25

Applicant: Toshifumi Honda ,  Yuta Urano ,  Yukihiro Shibata ,  Toshiyuki Nakao

Inventor： Toshifumi Honda ,  Yuta Urano ,  Yukihiro Shibata ,  Toshiyuki Nakao

IPC: G01N21/88

CPC classification number: G01N21/8806 ,  G01N21/9501 ,  G01N2021/8874

Abstract: Disclosed is a defect inspection method which makes it possible to scan the entire surface of a sample and detect minute defects without causing thermal damage to the sample. A defect inspection method in which a pulse laser emitted from a light source is subjected to pulse division and irradiated on the surface of a sample which moves in one direction while the divided-pulse pulse laser is rotated, reflection light from the sample irradiated by the divided-pulse pulse laser is detected, the signal of the detected reflection light is processed to detect defects on the sample, and information regarding a detected defect is output to a display screen, wherein the barycentric position of the light intensity of the divided-pulse pulse laser is monitored and adjusted.

Abstract translation: 公开了一种缺陷检查方法，其可以扫描样品的整个表面并检测微小缺陷而不会对样品造成热损伤。 对从光源射出的脉冲激光进行脉冲分割并照射在分割脉冲激光器旋转时在一个方向上移动的样品的表面的缺陷检查方法中， 检测出分割脉冲脉冲激光，检测出反射光的信号，以检测样本上的缺陷，将与检测到的缺陷有关的信息输出到显示画面，其中分割脉冲的光强度的重心位置 脉冲激光被监测和调整。

公开(公告)号：US20120194809A1

公开(公告)日：2012-08-02

申请号：US13362808

申请日：2012-01-31

Applicant: Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

Inventor： Hiroyuki Nakano ,  Toshihiko Nakata ,  Sachio Uto ,  Akira Hamamatsu ,  Shunji Maeda ,  Yuta Urano

IPC: G01N21/956

CPC classification number: G01N21/956 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501 ,  G01N2021/8822

Abstract: A method and apparatus for detecting defects are provided for detecting defects or foreign matter on an object to be inspected. The apparatus includes a movable stage for mounting a specimen, an illumination system for irradiating a circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. A spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip.

Abstract translation: 提供一种用于检测缺陷的方法和装置，用于检测被检测物体上的缺陷或异物。 该装置包括用于安装样本的可移动台，用于从倾斜方向的光照射电路图案的照明系统和用于从上方和倾斜形成检测器上的照射检测区域的图像的图像形成光学系统 方向。 利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。 在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。 由检测器接收的散射和反射光被转换成电信号。 将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。

公开(公告)号：US20120162665A1

公开(公告)日：2012-06-28

申请号：US13404749

申请日：2012-02-24

Applicant: Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

Inventor： Akira Hamamatsu ,  Yoshimasa Oshima ,  Shunji Maeda ,  Hisae Shibuya ,  Yuta Urano ,  Toshiyuki Nakao ,  Shigenobu Maruyama

IPC: G01B11/30

CPC classification number: G01B11/303 ,  G01N21/47 ,  G01N21/94 ,  G01N21/9501

Abstract: An inspecting method and apparatus for inspecting a substrate surface includes application of a light to the substrate surface, detection of scattered light or reflected light from the substrate surface due to the applied light at a plurality of positions to obtain a plurality of electrical signals, extraction of a signal in a mutually different frequency band from each of the plurality of electrical signals, and calculation of a value regarding a state of film of the substrate through an arithmetical operation process of a plurality of extracted signals in the frequency bands.

Abstract translation: 用于检查基板表面的检查方法和装置包括：由于在多个位置处施加的光，向基板表面施加光，检测散射光或来自基板表面的反射光，以获得多个电信号，提取 在与所述多个电信号中的每一个相互不同的频带中的信号的信号，以及通过所述频带中的多个提取的信号的算术运算处理来计算关于所述衬底的膜的状态的值。