公开(公告)号：US20230095108A1

公开(公告)日：2023-03-30

申请号：US17911498

申请日：2021-03-03

Applicant: ASML NETHERLANDS B.V.

Inventor： Dennis Dominic VAN DER VOORT ,  Nicolaas TEN KATE

IPC: G03F7/20

Abstract: A method for preparing a substrate for an exposure process of a lithographic manufacturing method, the method including imposing different local temperatures across the substrate so as to induce different thermal expansion across the substrate before the exposure process. This method is for compensating for deformation of the substrate induced when the substrate is positioned on a substrate table of a lithographic apparatus. There is also provided a local temperature applicator to implement this technique and to a lithographic apparatus including such a local temperature applicator.

公开(公告)号：US20230075771A1

公开(公告)日：2023-03-09

申请号：US17798354

申请日：2021-01-25

Applicant: ASML NETHERLANDS B.V.

Inventor： Coen Hubertus Matheus BALTIS ,  Nicolaas TEN KATE ,  Marcus Martinus Petrus Adrianus Petrus Adrianus VERMEULEN ,  Siegfried Alexander TROMP ,  Frank Pieter Albert VAN DEN BERKMORTEL ,  Niek Jacobus Johannes ROSET ,  Gijs KRAMER ,  Nicolaas Petrus Marcus BRANTJES ,  Michiel Theodorus Jacobus FONTEYN

IPC: G03F7/20

Abstract: A substrate support for supporting a substrate in a lithographic apparatus, the substrate support including: a support body configured to support the substrate; a main body separate from the support body and configured to support the support body, the main body including a thermal conditioner configured to thermally condition the main body and/or support body and/or substrate; and an extractor body surrounding the main body and the support body, the extractor body having an extraction channel configured to extract fluid from near a peripheral part of the substrate.

公开(公告)号：US20230004092A1

公开(公告)日：2023-01-05

申请号：US17778054

申请日：2020-11-20

Applicant: ASML NETHERLANDS B.V.

Inventor： Michael Marinus Anna STEUR ,  Nicolaas TEN KATE ,  Siegfried Alexander TROMP ,  Koen Gerhardus WINKELS ,  Antonius Franciscus Johanne DE GROOT

IPC: G03F7/20 ,  H01L21/687

Abstract: Substrate tables and methods of manufacturing substrate supports for substrate tables. In one arrangement, a plurality of holes are formed through a base member. A burl formation member is joined to the base member. A plurality of burl structures are formed in the burl formation member. Each burl structure includes a distal surface that contacts, in use, a substrate being supported. Each burl structure has an opening to at least one of the holes formed through the base member.

公开(公告)号：US20210278772A1

公开(公告)日：2021-09-09

申请号：US17313054

申请日：2021-05-06

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE

IPC: G03F7/20 ,  H01L21/687 ,  C23C16/44

Abstract: A substrate holder for a lithographic apparatus has a planarization layer provided on a surface thereof. The planarization layer provides a smooth surface for the formation of an electronic component such as a thin film electronic component. The planarization layer may be provided in multiple sub layers. The planarization layer may smooth over roughness caused by removal of material from a blank to form burls on the substrate holder.

公开(公告)号：US20210114101A1

公开(公告)日：2021-04-22

申请号：US17138480

申请日：2020-12-30

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B23K26/354 ,  B23K26/342 ,  G03F7/20 ,  B22F10/00 ,  B23Q3/18 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00

Abstract: A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US20210063898A1

公开(公告)日：2021-03-04

申请号：US17098073

申请日：2020-11-13

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20190235397A1

公开(公告)日：2019-08-01

申请号：US16376535

申请日：2019-04-05

Applicant: ASML NETHERLANDS B.V.

Inventor： Theodorus Petrus Maria CADEE ,  Johannes Henricus Wilhelmus JACOBS ,  Nicolaas TEN KATE ,  Erik Roelof LOOPSTRA ,  Aschwin Lodewijk Hendricus Johannes VAN MEER ,  Jeroen Johannes Sophia Maria MERTENS ,  Christianus Gerardus Maria DE MOL ,  Marcel Johannus Elisabeth Hubertus MUITJENS ,  Antonius Johannus VAN DER NET ,  Joost Jeroen OTTENS ,  Johannes Anna QUAEDACKERS ,  Maria Elisabeth REUHMAN-HUISKEN ,  Marco Koert STAVENGA ,  Patricius Aloysius Jacobus TINNEMANS ,  Martinus Cornelis Maria VERHAGEN ,  Jacobus Johannus Leonardus Hendricus VERSPAY ,  Frederik Eduard DE JONG ,  Koen GOORMAN ,  Boris MENCHTCHIKOV ,  Herman BOOM ,  Stoyan NIHTIANOV ,  Richard MOERMAN ,  Martin Frans Pierre SMEETS ,  Bart Leonard Peter SCHOONDERMARK ,  Franciscus Johannes Joseph JANSSEN ,  Michel RIEPEN

IPC: G03F7/20

CPC classification number: G03F7/70808 ,  G03F7/70341 ,  G03F7/70841 ,  G03F7/70875

Abstract: A lithographic apparatus is described having a liquid supply system configured to at least partly fill a space between a projection system of the lithographic apparatus and a substrate with liquid, a barrier member arranged to substantially contain the liquid within the space, and a heater.

公开(公告)号：US20170312826A1

公开(公告)日：2017-11-02

申请号：US15654413

申请日：2017-07-19

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y10/00 ,  G03F7/20 ,  B23Q3/18 ,  B23K26/00 ,  B22F3/105 ,  B05D5/00 ,  B05D3/06 ,  B23K26/342 ,  B33Y80/00

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

公开(公告)号：US20170075232A1

公开(公告)日：2017-03-16

申请号：US15273416

申请日：2016-09-22

Applicant: ASML NETHERLANDS B.V.

Inventor： Nicolaas TEN KATE ,  Raymond Wilhelmus Louis LAFARRE

IPC: G03F7/20

CPC classification number: G03F7/70716 ,  G03F7/70341

Abstract: A table for a lithographic apparatus, the table having a catchment opening formed in an upper surface of the table, the catchment opening in fluid communication through the table with the environment of the table at a drain opening in a surface of the table other than the upper surface.

Abstract translation: 一种用于光刻设备的工作台，该工作台具有形成在工作台的上表面中的集水开口，该容器开口通过工作台与桌子的环境流体连通，在桌子的表面的排水开口处，除了 上表面。

公开(公告)号：US20170036272A1

公开(公告)日：2017-02-09

申请号：US15296968

申请日：2016-10-18

Applicant: ASML NETHERLANDS B.V.

Inventor： Raymond Wilhelmus Louis LAFARRE ,  Sjoerd Nicolaas Lambertus DONDERS ,  Nicolaas TEN KATE ,  Nina Vladimirovna DZIOMKINA ,  Yogesh Pramod KARADE ,  Elisabeth Corinne RODENBURG

IPC: B22F7/06 ,  B33Y80/00 ,  B33Y10/00 ,  G03F7/20 ,  B22F3/105

CPC classification number: B22F7/062 ,  B05D3/06 ,  B05D5/00 ,  B22F3/1055 ,  B23K26/342 ,  B23K26/354 ,  B23Q3/18 ,  B33Y10/00 ,  B33Y80/00 ,  G03F7/20 ,  G03F7/70341 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  G03F7/70716 ,  G03F7/70733 ,  G03F7/708

Abstract: An object holder for a lithographic apparatus has a main body having a surface. A plurality of burls to support an object is formed on the surface or in apertures of a thin-film stack. At least one of the burls is formed by laser-sintering. At least one of the burls formed by laser-sintering may be a repair of a damaged burl previously formed by laser-sintering or another method.

Abstract translation: 用于光刻设备的物体保持器具有具有表面的主体。 在薄膜堆叠的表面上或孔中形成有用于支撑物体的多个毛刺。 通过激光烧结形成至少一个毛刺。 通过激光烧结形成的毛刺中的至少一个可以是先前通过激光烧结形成的损坏的隆起的修复或其他方法。