公开(公告)号：US10353298B2

公开(公告)日：2019-07-16

申请号：US15830775

申请日：2017-12-04

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Zili Zhou

IPC: G03F7/20

Abstract: Methods of measuring a target formed by a lithographic process, a metrology apparatus and a polarizer assembly are disclosed. The target comprises a layered structure having a first periodic structure in a first layer and a second periodic structure in a second layer. The target is illuminated with polarized measurement radiation. Zeroth order scattered radiation from the target is detected. An asymmetry in the first periodic structure is derived using the detected zeroth order scattered radiation from the target. A separation between the first layer and the second layer is such that the detected zeroth order scattered radiation is independent of overlay error between the first periodic structure and the second periodic structure. The derived asymmetry in the first periodic structure is used to derive the correct overlay value between the first periodic structure and the second periodic structure.

公开(公告)号：US10234767B2

公开(公告)日：2019-03-19

申请号：US15660498

申请日：2017-07-26

Applicant: ASML Netherlands B.V.

Inventor： Sebastianus Adrianus Goorden ,  Nitesh Pandey ,  Duygu Akbulut ,  Teunis Willem Tukker ,  Johannes Matheus Marie De Wit

IPC: G03F7/20 ,  G01N21/88 ,  G01N21/95 ,  G02B6/26 ,  G02B6/42

Abstract: Devices and methods for processing a radiation beam with coherence are disclosed. In one arrangement, an optical system receives a radiation beam with coherence. The radiation beam comprises components distributed over one or more radiation beam spatial modes. A waveguide supports a plurality of waveguide spatial modes. The optical system directs a plurality of the components of the radiation beam belonging to a common radiation beam spatial mode and having different frequencies onto the waveguide in such a way that each of the plurality of components couples to a different set of the waveguide spatial modes, each set comprising one or more of the waveguide spatial modes.

公开(公告)号：US10191391B2

公开(公告)日：2019-01-29

申请号：US15279860

申请日：2016-09-29

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Gerbrand Van Der Zouw

IPC: G03B27/42 ,  G03F7/20 ,  G01B11/27 ,  G01N21/47

Abstract: Disclosed is a metrology apparatus for measuring a parameter of a lithographic process, and associated computer program and method. The metrology apparatus comprises an optical system for measuring a target on a substrate by illuminating the target with measurement radiation and detecting the measurement radiation scattered by the target; and an array of lenses. Each lens of the array is operable to focus the scattered measurement radiation onto a sensor, said array of lenses thereby forming an image on the sensor which comprises a plurality of sub-images, each sub-image being formed by a corresponding lens of the array of lenses. The resulting plenoptic image comprises image plane information from the sub-images, wavefront distortion information (from the relative positions of the sub-images) and pupil information from the relative intensities of the sub-images.

公开(公告)号：US20180348645A1

公开(公告)日：2018-12-06

申请号：US15988677

申请日：2018-05-24

Applicant: ASML Netherlands B.V.

Inventor： Janneke Ravensbergen ,  Nitesh Pandey ,  Zili Zhou ,  Armand Eugene Albert Koolen ,  Sebastianus Adrianus Goorden ,  Bastiaan Onne Fagginger Auer ,  Simon Gijsbert Josephus Mathijssen

IPC: G03F7/20 ,  G01B11/27

CPC classification number: G03F7/7055 ,  G01B11/272 ,  G01N21/4788 ,  G01N21/9501 ,  G01N21/95623 ,  G03F7/70625 ,  G03F7/70633

Abstract: A metrology apparatus is disclosed that measures a structure formed on a substrate to determine a parameter of interest. The apparatus comprises an optical system configured to focus radiation onto the structure and direct radiation after reflection from the structure onto a detector, wherein: the optical system is configured such that the detector detects a radiation intensity resulting from interference between radiation from at least two different points in a pupil plane field distribution, wherein the interference is such that a component of the detected radiation intensity containing information about the parameter of interest is enhanced relative to one or more other components of the detected radiation intensity.

公开(公告)号：US09632039B2

公开(公告)日：2017-04-25

申请号：US14838268

申请日：2015-08-27

Applicant: Vrije Universiteit Amsterdam ,  Universiteit van Amsterdam ,  Stichting voor Fundamenteel Onderzoek der Materie ,  ASML Netherlands B.V.

Inventor： Arie Jeffrey Den Boef ,  Simon Gijsbert Josephus Mathijssen ,  Nitesh Pandey ,  Stefan Michiel Witte ,  Kjeld Eikema

IPC: G03B27/54 ,  G01N21/956 ,  G03F7/20 ,  G01B11/00 ,  G03H1/04 ,  G03H1/00 ,  G03H1/02

CPC classification number: G01N21/956 ,  G01B11/00 ,  G01N2201/12 ,  G03F7/70141 ,  G03F7/70625 ,  G03F7/70633 ,  G03F7/70641 ,  G03H1/0443 ,  G03H2001/0033 ,  G03H2001/0204 ,  G03H2001/0458

Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814′) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.

公开(公告)号：US12164233B2

公开(公告)日：2024-12-10

申请号：US17619961

申请日：2020-05-14

Applicant: ASML Netherlands B.V.

Inventor： Alexander Prasetya Konijnenberg ,  Willem Marie Julia Marcel Coene ,  Nitesh Pandey

IPC: G03F7/00 ,  G01B9/02 ,  G01N21/95 ,  G06V10/42

Abstract: Disclosed is a method of determining a complex-valued field relating to a sample measured using an imaging system. The method comprises obtaining image data relating to a series of images of the sample, imaged at an image plane of the imaging system, and for which at least two different modulation functions are imposed in a Fourier plane of the imaging system; and determining the complex-valued field from the imaging data based on the imposed modulation functions.

公开(公告)号：US12007700B2

公开(公告)日：2024-06-11

申请号：US17856213

申请日：2022-07-01

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G01B11/02 ,  G01B11/06 ,  G01N21/47 ,  G01N21/95 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F7/7085 ,  G01B11/02 ,  G01B11/0625 ,  G01N21/4788 ,  G01N21/9501 ,  G03F7/70158 ,  G03F7/705 ,  G03F7/70625 ,  G03F7/70633 ,  G03F9/7088 ,  G01B2210/56

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US11927891B2

公开(公告)日：2024-03-12

申请号：US16963273

申请日：2018-12-20

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Duygu Akbulut ,  Alessandro Polo ,  Sebastianus Adrianus Goorden

IPC: G01N29/11 ,  G01B9/02015 ,  G01N29/06 ,  G03F7/00 ,  G03F9/00

CPC classification number: G03F9/7061 ,  G01B9/02015 ,  G01N29/0681 ,  G03F7/70625 ,  G03F7/70633 ,  G01B2290/25 ,  G01N2291/2697

Abstract: A sensor is disclosed, wherein a transducer generates acoustic waves, which are received by a lens assembly. The lens assembly transmits and directs at least a part of the acoustic waves to a target. The lens assembly then receives at least a part of acoustic waves, after interaction with the target. The sensor further comprises an optical detector that comprises at least one optically reflective member located at a surface of the lens assembly, which surface is arranged opposite to a surface of the lens assembly which faces a focal plane of the lens assembly, wherein the at least one optically reflective member is mechanically displaced in response to the acoustic waves, which are received and transmitted by the lens assembly.

公开(公告)号：US11415900B2

公开(公告)日：2022-08-16

申请号：US17022910

申请日：2020-09-16

Applicant: ASML Netherlands B.V.

Inventor： Patricius Aloysius Jacobus Tinnemans ,  Arie Jeffrey Den Boef ,  Armand Eugene Albert Koolen ,  Nitesh Pandey ,  Vasco Tomas Tenner ,  Willem Marie Julia Marcel Coene ,  Patrick Warnaar

IPC: G03F7/20 ,  G01B11/06 ,  G01B11/02 ,  G01N21/47 ,  G01N21/95 ,  G03F9/00

Abstract: Described is a metrology system for determining a characteristic of interest relating to at least one structure on a substrate, and associated method. The metrology system comprises a processor being configured to computationally determine phase and amplitude information from a detected characteristic of scattered radiation having been reflected or scattered by the at least one structure as a result of illumination of said at least one structure with illumination radiation in a measurement acquisition, and use the determined phase and amplitude to determine the characteristic of interest.

公开(公告)号：US10895812B2

公开(公告)日：2021-01-19

申请号：US15833130

申请日：2017-12-06

Applicant: ASML Netherlands B.V.

Inventor： Nitesh Pandey ,  Armand Eugene Albert Koolen

IPC: G03F7/20 ,  G03F9/00

Abstract: Metrology apparatus and methods for measuring a structure formed on a substrate by a lithographic process are disclosed. In one arrangement an optical system illuminates the structure with radiation and detects radiation scattered by the structure. The optical system comprises a first dispersive element. The first dispersive element spectrally disperses scattered radiation exclusively from a first portion of a pupil plane field distribution along a first dispersion direction. A second dispersive element, separated from the first dispersive element, spectrally disperses scattered radiation exclusively from a second portion of the pupil plane field distribution, different from the first portion of the pupil plane field distribution, along a second dispersion direction.