公开(公告)号：US20060113697A1

公开(公告)日：2006-06-01

申请号：US11292394

申请日：2005-11-30

申请人： Sidlgata Sreenivasan

发明人： Sidlgata Sreenivasan

IPC分类号： B29C43/02

CPC分类号： B29C43/021 ,  B29C43/003 ,  B29C2043/025 ,  B29C2043/3438 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： The present invention provides a method of forming a desired pattern in a layer positioned on a substrate with a mold, the method including, inter alia, contacting the layer with the mold forming a shape therein having a plurality of features extending in a first direction; and altering dimensions of the shape of the layer in a second direction, orthogonal to the first direction, to eliminate a subset of the plurality of features having a dimension less that a predetermined magnitude while obtaining the desired pattern in the layer.

摘要翻译： 本发明提供了一种在具有模具的位于基板上的层中形成所需图案的方法，所述方法尤其包括使层与模具接触形成其中具有沿第一方向延伸的多个特征的形状; 以及在与第一方向正交的第二方向上改变层的形状的尺寸，以消除具有小于预定大小的尺寸的多个特征的子集，同时在层中获得期望的图案。

公开(公告)号：US20060096949A1

公开(公告)日：2006-05-11

申请号：US11298244

申请日：2005-12-09

申请人： Michael Watts ,  Ronald Voisin ,  Sidlgata Sreenivasan

发明人： Michael Watts ,  Ronald Voisin ,  Sidlgata Sreenivasan

IPC分类号： C23F1/00 ,  B44C1/22 ,  G03C5/00

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

摘要： In an embodiment of the present invention, the template is formed by forming a masking layer on a substrate; forming a pattern in the masking layer such that a portion of the substrate is exposed; etching one or more of the exposed portions of the substrate such that a relief image is formed in the substrate; removing the masking layer; coating the relief image with a release agent; depositing a conformal layer upon the substrate such that a portion of the conformal layer is arranged within the relief image formed in the substrate; arranging an elastomer layer on the conformal layer; arranging a substrate such that the elastomer layer is bonded between the conformal layer and the rigid substrate; and removing from the substrate the lithography template, where the lithography template includes the elastomer layer bonded between the rigid substrate and the conformal layer. In an exemplary embodiment, the template is formed by sequentially forming at least one elastomer layer on a substrate; forming an imprinting layer on the elastomer layer; forming a sacrificial layer on the imprinting layer; forming a masking layer on the sacrificial layer such that a portion of the sacrificial layer is exposed through the masking layer; etching one or more of the exposed portions of the sacrificial layer such that a portion of the imprinting layer is exposed through the masking layer; etching one or more of the exposed portions of the imprinting layer such that a relief image is formed; and removing the entire masking and sacrificial layers.

摘要翻译： 在本发明的实施例中，通过在基板上形成掩模层来形成模板; 在所述掩蔽层中形成图案，使得所述基板的一部分露出; 蚀刻衬底的一个或多个暴露部分，使得在衬底中形成浮雕图像; 去除掩蔽层; 用脱模剂涂覆浮雕图像; 在所述基板上沉积共形层，使得所述共形层的一部分布置在形成在所述基板中的所述浮雕图像内; 在保形层上布置弹性体层; 布置基板，使得弹性体层结合在共形层和刚性基板之间; 以及从基板去除光刻模板，其中光刻模板包括结合在刚性基板和保形层之间的弹性体层。 在一个示例性实施例中，模板通过在衬底上顺序地形成至少一个弹性体层而形成; 在弹性体层上形成压印层; 在压印层上形成牺牲层; 在所述牺牲层上形成掩模层，使得所述牺牲层的一部分通过所述掩模层露出; 蚀刻牺牲层的一个或多个暴露部分，使得压印层的一部分通过掩模层曝光; 蚀刻压印层的一个或多个曝光部分，使得形成浮雕图像; 并去除整个掩蔽层和牺牲层。

公开(公告)号：US20050266587A1

公开(公告)日：2005-12-01

申请号：US11136886

申请日：2005-05-25

申请人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

发明人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

IPC分类号： C23F1/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/687

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/6875

摘要： The present invention includes a method for supporting a substrate that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. To that end, the method includes disposing the substrate upon two spaced-apart bodies; and moving one of the two spaced-apart bodies away from the substrate.

摘要翻译： 本发明包括一种用于支撑基板的方法，该基板具有带有主体表面的卡盘主体，其具有从其延伸的销具有位于平面中的接触表面，该销可移动地联接到卡盘主体相对于该平面运动 。 为此，该方法包括将基板设置在两个间隔开的主体上; 并将两个间隔开的物体中的一个远离衬底移动。

公开(公告)号：US20050264132A1

公开(公告)日：2005-12-01

申请号：US11118070

申请日：2005-04-29

申请人： Byung Choi ,  Sidlgata Sreenivasan ,  Stephen Johnson

发明人： Byung Choi ,  Sidlgata Sreenivasan ,  Stephen Johnson

IPC分类号： G03F7/20 ,  G03F7/00 ,  G03F9/00 ,  H01L21/027 ,  H02N2/00

CPC分类号： G03F9/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002

摘要： An apparatus to control displacement of a body spaced-apart from a surface includes a flexure system having a first flexure member defining a first axis of rotation and a second flexure member defining a second axis of rotation. A body is coupled to the flexure system to move about a plurality of axes. An actuation system is coupled to the flexure system to selectively constrain movement of the body along a subset of the plurality of axes.

摘要翻译： 用于控制与表面间隔开的物体的位移的装置包括具有限定第一旋转轴线的第一弯曲构件和限定第二旋转轴线的第二挠曲构件的挠曲系统。 身体联接到挠曲系统以围绕多个轴线移动。 致动系统联接到挠曲系统以选择性地限制身体沿着多个轴的子集的运动。

公开(公告)号：US20050263249A1

公开(公告)日：2005-12-01

申请号：US11136885

申请日：2005-05-25

申请人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

发明人： Pawan Nimmakayala ,  Sidlgata Sreenivasan

IPC分类号： C23F1/00 ,  G03F7/00 ,  G03F7/20 ,  H01L21/00 ,  H01L21/687

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/707 ,  G03F7/70783 ,  H01L21/6875

摘要： The present invention includes a substrate support system that features a chuck body having a body surface with a pin extending therefrom having a contact surface lying in a plane, with the pin being movably coupled to the chuck body to move with respect to the plane. As a result the substrate support system attenuates if not avoids generating non-planarity in a substrate that results from a presence of particulate contaminants. This is achieved by fabricating the pin to be compliant, allowing the same to move to accommodate the presence of the particle while maintaining sufficient planarity in the substrate.

摘要翻译： 本发明包括基板支撑系统，其特征在于具有主体表面的卡盘体，所述主体表面具有从其延伸的销，所述销具有位于平面中的接触表面，所述销可移动地联接到所述卡盘主体以相对于所述平面移动。 因此，如果不避免由于颗粒污染物的存在而在衬底中产生非平面性，则衬底支撑系统衰减。 这通过将引脚制造成柔性来实现，使其能够移动以适应颗粒的存在，同时在基板中保持足够的平面性。

公开(公告)号：US20050260848A1

公开(公告)日：2005-11-24

申请号：US10946570

申请日：2004-09-21

申请人： Sidlgata Sreenivasan

发明人： Sidlgata Sreenivasan

IPC分类号： H01L21/461 ,  H01L21/4763 ,  H01L21/768

CPC分类号： H01L21/0337 ,  H01L21/3086 ,  H01L21/76816 ,  H01L21/76817

摘要： The present invention provides a method of forming recesses on a substrate, the method including forming on the substrate a patterning layer having first features; trim etching the first features to define trimmed features having a shape; and transferring an inverse of the shape into the substrate.

摘要翻译： 本发明提供了在基板上形成凹部的方法，该方法包括在基板上形成具有第一特征的图案化层; 修剪蚀刻第一特征以限定具有形状的修剪特征; 并将形状的倒数转移到衬底中。

公开(公告)号：US20050236360A1

公开(公告)日：2005-10-27

申请号：US10833240

申请日：2004-04-27

申请人： Michael Watts ,  Ronald Voisin ,  Sidlgata Sreenivasan

发明人： Michael Watts ,  Ronald Voisin ,  Sidlgata Sreenivasan

IPC分类号： B44C1/22

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0017

摘要： A compliant UV imprint lithography template, which may also act as a thermal implant template, and methods for manufacturing it. The template essentially comprises a relief image and an elastomer adapted to adjust the relief image. In an embodiment, the relief image is arranged in a compliant imprinting layer where the elastomer is arranged between the imprinting layer and a rigid transparent substrate. In an embodiment, the template is compliant to a wafer surface. In an embodiment, layering an elastomer and an imprinting layer on a substrate and patterning a relief image into the imprinting layer, form the template.

摘要翻译： 还可以充当热植入模板的兼容UV压印光刻模板及其制造方法。 模板基本上包括浮雕图像和适于调整浮雕图像的弹性体。 在一个实施例中，浮雕图像被布置在柔性压印层中，其中弹性体布置在压印层和刚性透明衬底之间。 在一个实施例中，模板符合晶片表面。 在一个实施例中，在基底上层叠弹性体和压印层并将浮雕图案图案化成压印层，形成模板。

公开(公告)号：US20050028618A1

公开(公告)日：2005-02-10

申请号：US10923628

申请日：2004-08-20

申请人： Byung Chol ,  Sidlgata Sreenivasan

发明人： Byung Chol ,  Sidlgata Sreenivasan

IPC分类号： B29C41/52 ,  B81C99/00 ,  G01M99/00 ,  G01N19/00 ,  G01N21/00 ,  G03F20060101 ,  G03F7/00 ,  H01L21/027

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00

摘要： The present invention provides a technique for determining characteristics of substrates, such as the presence of contaminants, shape, as well as the spatial relationships between spaced-apart substrates. The spatial relationships include distance and angular orientation, between first and second spaced apart substrates. The technique includes forming a volume of fluid on the second substrate, with the volume of fluid having an area associated therewith. The volume of fluid is compressed between the first and second substrates to effectuate a change in properties of the area, defining changed properties. The changed properties are sensed, and the characteristics of the first and second substrates are determined as a function of the changed properties.

摘要翻译： 本发明提供了一种用于确定衬底的特性的技术，例如污染物的存在，形状以及间隔开的衬底之间的空间关系。 空间关系包括第一和第二间隔开的基底之间的距离和角度取向。 该技术包括在第二基板上形成一定体积的流体，其中流体的体积具有与其相关的区域。 流体的体积在第一和第二基底之间被压缩，以实现该区域的性质的变化，从而限定改变的特性。 检测到改变的特性，并且确定第一和第二基板的特性作为改变的特性的函数。

公开(公告)号：US20070212494A1

公开(公告)日：2007-09-13

申请号：US11734542

申请日：2007-04-12

申请人： Frank Xu ,  Sidlgata Sreenivasan ,  Edward Fletcher

发明人： Frank Xu ,  Sidlgata Sreenivasan ,  Edward Fletcher

IPC分类号： B05D1/00

CPC分类号： C08L59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G11B5/855 ,  Y10T428/31663 ,  Y10T428/31678 ,  Y10T428/31692

摘要： The invention provides a method of applying an adhesion primer layer for an imprint lithography process that includes contacting a fluid with a surface of a substrate in a coating process and initiating a chemical reaction that forms a covalent bond between a component in the fluid and the surface of the substrate such that an adhesion primer layer is adhered to the surface of the substrate. A polymeric layer may be adhered to the surface of the substrate coated with the adhesion primer layer. The method allows adhesion primer coating for double-sided imprinting applications including patterned magnetic media.

摘要翻译： 本发明提供了一种施加用于压印光刻工艺的粘合底漆层的方法，该方法包括在涂布过程中使流体与基材的表面接触并引发在流体和表面之间形成共价键的化学反应 的基底，使得粘合底漆层粘附到基底的表面。 聚合物层可以粘附到涂覆有粘合底漆层的基材的表面上。 该方法允许用于包括图案化磁性介质的双面印刷应用的粘合底漆涂层。

公开(公告)号：US20060068120A1

公开(公告)日：2006-03-30

申请号：US10951014

申请日：2004-09-27

申请人： Sidlgata Sreenivasan ,  Frank Xu

发明人： Sidlgata Sreenivasan ,  Frank Xu

IPC分类号： B05D3/00

CPC分类号： G03F7/0002 ,  B29C43/003 ,  B29C2043/025 ,  H01L21/31051 ,  H01L21/312

摘要： The present invention provides a method of planarizing a substrate with a template spaced-apart from the substrate having a liquid disposed therebetween, the method including: contacting the liquid with the template forming a first shape therein; and impinging radiation upon the liquid causing a reduction in volume of the liquid, with the first shape compensating for the reduction in volume such that upon impinging the actinic radiation upon the liquid, the liquid forms a contoured layer having a substantially planar shape.

摘要翻译： 本发明提供了一种使衬底平面化的方法，该衬底具有与衬底间隔开的具有设置在其间的液体的模板，该方法包括：使液体与在其中形成第一形状的模板接触; 并且将液体的辐射照射在液体上，导致液体的体积减小，第一形状补偿了体积的减小，使得在将光化辐射照射在液体上时，液体形成具有基本上平面形状的轮廓层。