公开(公告)号：US08450045B2

公开(公告)日：2013-05-28

申请号：US13352384

申请日：2012-01-18

申请人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

发明人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/20 ,  G03F7/40

CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

摘要： A pattern forming method includes providing and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate. The under-layer film is irradiated with radiation through a mask to cause an acid to be selectively generated in an exposed area of the under-layer film. An upper-layer film which does not contain a radiation-sensitive acid generator and which contains a composition capable of polymerizing or crosslinking by an action of an acid is provided. A cured film is provided by polymerization or crosslinking selectively in an area of the upper-layer film corresponding to the exposed area of the under-layer film in which the acid has been generated. An area of the upper-layer film corresponding to an area of the under-layer film in which the acid has not been generated is removed.

摘要翻译： 图案形成方法包括提供和固化含有辐射敏感性酸产生剂的底层膜，其在暴露于基底上的辐射时产生酸。 底层膜通过掩模用辐射照射，以在底层膜的暴露区域中选择性地产生酸。 提供了不含有辐射敏感性酸产生剂并且含有能够通过酸的作用聚​​合或交联的组合物的上层膜。 通过在与产生酸的底层膜的暴露区域相对应的上层膜的区域中选择性地聚合或交联固化膜。 除去与未生成酸的下层膜的区域对应的上层膜的区域。

公开(公告)号：US20100233635A1

公开(公告)日：2010-09-16

申请号：US12305893

申请日：2007-06-21

申请人： Daisuke Shimizu ,  Hikaru Sugita ,  Nobuji Matsumura ,  Toshiyuki Kai ,  Tsutomu Shimokawa

发明人： Daisuke Shimizu ,  Hikaru Sugita ,  Nobuji Matsumura ,  Toshiyuki Kai ,  Tsutomu Shimokawa

IPC分类号： G03F7/20 ,  C09K3/00

CPC分类号： C07D333/18 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

摘要： A method for forming a pattern contains (1) a step of forming an underlayer film containing (A) a radiation-sensitive acid generator capable of generating an acid upon exposure to radiation rays or (B) a radiation-sensitive base generator capable of generating a base upon exposure to radiation rays on a substrate; (2) a step of irradiating the underlayer film with radiation rays through a mask with a predetermined pattern to obtain an exposed underlayer film portion having been selectively exposed through the predetermined pattern; (3) a step of forming (C) an organic thin film on the underlayer film so as to attain chemical bonding of the exposed underlayer film portion with the organic thin-film formed on the exposed underlayer film portion; and (4) a step of removing the organic thin film formed on areas of the underlayer film other than the exposed underlayer film portion.

摘要翻译： 形成图案的方法包括（1）形成下层膜的步骤，其含有（A）在暴露于辐射线时能够产生酸的辐射敏感性酸产生剂，或（B）能够产生 基底上暴露于辐射线; （2）通过具有预定图案的掩模的辐射线照射下层膜以获得通过预定图案选择性曝光的曝光的下层膜部分的步骤; （3）在下层膜上形成（C）有机薄膜以使曝光的下层膜与形成在曝光的下层膜部上的有机薄膜化学接合的工序; 以及（4）除去在下层膜以外的形成在有机薄膜上的除了曝光的下层膜部分以外的部分的工序。

公开(公告)号：US20090311622A1

公开(公告)日：2009-12-17

申请号：US12375915

申请日：2007-07-27

申请人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

发明人： Hikaru Sugita ,  Nobuji Matsumura ,  Daisuke Shimizu ,  Toshiyuki Kai ,  Tsutomu Shimokawa

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/11 ,  G03F7/0045 ,  G03F7/0757 ,  G03F7/265

摘要： A pattern formation method suitable for forming micro-patterns using electron beams (EB), X-rays, or extreme ultraviolet radiation (EUV) is provided. The method includes the following steps in the following order: (1) a step of forming and curing a under-layer film containing a radiation-sensitive acid generator which generates an acid upon exposure to radiation on a substrate, (2) a step of irradiating the under-layer film with radiation through a mask to cause an acid to be selectively generated in the exposed area of the under-layer film, (3) a step of forming an upper-layer film which does not contain a radiation-sensitive acid generator, but contains a composition capable of polymerization or crosslinking by the action of an acid, (4) a step of forming a cured film by polymerization or crosslinking selectively in the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has been generated, and (5) a step of removing the area of the upper-layer film corresponding to the area of the under-layer film in which the acid has not been generated.

摘要翻译： 提供了适用于使用电子束（EB），X射线或极紫外线（EUV）形成微图案的图形形成方法。 该方法按以下顺序包括以下步骤：（1）形成和固化含有辐射敏感性酸产生剂的底层膜的步骤，所述辐射敏感酸产生剂在暴露于基材上时产生酸，（2）步骤 通过掩模用辐射照射底层膜以在底层膜的暴露区域中选择性地产生酸，（3）形成不含辐射敏感性的上层膜的步骤 酸产生剂，但含有能够通过酸的作用聚​​合或交联的组合物，（4）通过聚合或选择性地在上层膜对应于下面的区域的区域中选择性地交联固化膜的步骤 产生酸的层 - 膜，以及（5）除去与未生成酸的下层膜的面积对应的上层膜的面积的工序。

公开(公告)号：US20080026314A1

公开(公告)日：2008-01-31

申请号：US10576075

申请日：2004-10-14

申请人： Isao Nishimura ,  Noboru Yamahara ,  Masato Tanaka ,  Tsutomu Shimokawa

发明人： Isao Nishimura ,  Noboru Yamahara ,  Masato Tanaka ,  Tsutomu Shimokawa

IPC分类号： G03C5/00

CPC分类号： G03F7/0757 ,  C07F7/0838 ,  C07F7/1804 ,  C08G77/14 ,  C08G77/24 ,  G03F7/0045

摘要： A novel polysiloxane suitable as a resin component of a chemically-amplified resist exhibiting particularly excellent I-D bias, depth of focus (DOF), and the like, a novel silane compound useful as a raw material for synthesizing the polysiloxane, and a radiation-sensitive resin composition comprising the polysiloxane are provided.The silane compound is shown by the following formula (I), and the polysiloxane has a structural unit shown by the following formula (1), wherein R is an alkyl group, R1 and R2 individually represent a fluorine atom, lower alkyl group, or lower fluoroalkyl group, n is 0 or 1, k is 1 or 2, and i is an integer of 0 to 10.The radiation-sensitive resin composition comprises the polysiloxane and a photoacid generator.

摘要翻译： 适用作为具有特别优异的ID偏压，深度聚焦（DOF）等的化学增幅抗蚀剂的树脂组分的新型聚硅氧烷，可用作合成聚硅氧烷的原料的新型硅烷化合物和辐射敏感性 提供了包含聚硅氧烷的树脂组合物。 硅烷化合物由下式（I）表示，聚硅氧烷具有下述式（1）所示的结构单元，式中，R为烷基，R 1，R 2， 2个独立地表示氟原子，低级烷基或低级氟代烷基，n为0或1，k为1或2，i为0至10的整数。该辐射敏感性树脂组合物包含 聚硅氧烷和光致酸发生剂。

公开(公告)号：US07108954B2

公开(公告)日：2006-09-19

申请号：US10415102

申请日：2001-12-06

申请人： Isao Nishimura ,  Nobuo Bessho ,  Atsushi Kumano ,  Tsutomu Shimokawa ,  Kenji Yamada

发明人： Isao Nishimura ,  Nobuo Bessho ,  Atsushi Kumano ,  Tsutomu Shimokawa ,  Kenji Yamada

IPC分类号： G03F7/004 ,  G03F7/20

CPC分类号： G03F7/0757 ,  G03F7/001 ,  G03F7/0045 ,  G03F7/039

摘要： A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

摘要翻译： 一种辐射敏感折射率变化组合物，其包含（A）可分解化合物，（B）具有比可分解化合物（A）更高的折射率的不可分解化合物，（C）辐射敏感分解剂和（D）稳定剂。 通过将该组合物暴露于图​​案掩模的辐射，暴露部分的上述组分（C）和（A）分解以产生曝光部分和未曝光部分之间的折射率差，从而形成具有不同折射率的图案。

公开(公告)号：US20050171226A1

公开(公告)日：2005-08-04

申请号：US10975052

申请日：2004-10-28

申请人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

发明人： Isao Nishimura ,  Tsutomu Shimokawa ,  Makoto Sugiura

IPC分类号： G03F7/039 ,  C08F22/20 ,  C08G2/00 ,  C08G77/14 ,  C08K5/00 ,  C08K5/42 ,  C08L83/06 ,  G03F7/075 ,  H01L21/027

CPC分类号： C08L83/06 ,  C08K5/0025 ,  C08K5/42 ,  C08L2666/04

摘要： A radiation-sensitive resin composition comprising (A) a resin containing a structural unit of the following formula (I), (B) a resin containing a recurring unit of the following formula (II), and (C) a photoacid generator, wherein R1 represents a substituted or unsubstituted divalent (alicyclic) hydrocarbon, R2 represents a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, or any two R2s form in combination a divalent (substituted) alicyclic hydrocarbon group, with the remaining R2 being a lower alkyl group or a monovalent (substituted) alicyclic hydrocarbon group, wherein R3 represents a hydrogen atom, fluorine atom, or trifluoromethyl group, R4 represents a (substituted) hydrocarbon group with a valence of (c+1), (substituted) alicyclic hydrocarbon with a valence of (c+1), or (substituted) aromatic group with a valence of (c+1), R5 represents a hydrogen atom or a monovalent acid-dissociable group, a and b individually represent an integer of 0-3, provided that (a+b)≧1 is satisfied, and c is an integer of 1-3. The radiation-sensitive resin composition has a high transparency at a wavelength of 193 nm or less and is particularly excellent in LER.

摘要翻译： 一种辐射敏感性树脂组合物，其包含（A）含有下式（I）的结构单元的树脂，（B）含有下式（II）的重复单元的树脂和（C）光酸产生剂，其中 R 1表示取代或未取代的二价（脂环族）烃，R 2表示低级烷基或一价（取代）脂环族烃基，或任意两个R 0 其中R 2为低级烷基或单价（取代）脂环族烃基，其中R为低级烷基 > 3表示氢原子，氟原子或三氟甲基，R 4表示具有（c + 1）价（（C + 1）），（取代的）脂环族烃的（取代的）烃基， （c + 1）价或（c + 1）价的（取代）芳基，R 5表示氢原子或一价酸-d 相关基团，a和b分别表示0-3的整数，条件是（a + b）> = 1，c为1-3的整数。 该辐射敏感性树脂组合物在波长193nm以下具有高透明性，在LER中特别优异。

公开(公告)号：US06800414B2

公开(公告)日：2004-10-05

申请号：US09879894

申请日：2001-06-14

申请人： Yukio Nishimura ,  Noboru Yamahara ,  Masafumi Yamamoto ,  Toru Kajita ,  Tsutomu Shimokawa ,  Hiroshi Ito

发明人： Yukio Nishimura ,  Noboru Yamahara ,  Masafumi Yamamoto ,  Toru Kajita ,  Tsutomu Shimokawa ,  Hiroshi Ito

IPC分类号： G03F7004

CPC分类号： G03F7/0046 ,  G03F7/0233 ,  G03F7/0395 ,  G03F7/0397 ,  Y10S430/106 ,  Y10S430/108 ,  Y10S430/111

摘要： A radiation-sensitive resin composition comprising an acid-labile group-containing resin and a photoacid generator is disclosed. The resin has a structure of the formula (1), wherein R1 represents a hydrogen atom, a monovalent acid-labile group, an alkyl group having 1-6 carbon atoms which does not have an acid-labile group, or an alkylcarbonyl group having 2-7 carbon atoms which does not have an acid-labile group, X1 represents a linear or branched fluorinated alkyl group having 1-4 carbon atoms, and R2 represents a hydrogen atom, a linear or branched alkyl group having 1-10 carbon atoms, or a linear or branched fluorinated alkyl group having 1-10 carbon atoms. The resin composition exhibits high transmittance of radiation, high sensitivity, resolution, and pattern shape, and is useful as a chemically amplified resist in producing semiconductors at a high yield.

摘要翻译： 公开了一种包含含酸不稳定基团的树脂和光致酸发生剂的辐射敏感性树脂组合物。 该树脂具有式（1）的结构，其中R 1表示氢原子，一价酸不稳定基团，不具有酸不稳定基团的具有1-6个碳原子的烷基，或 不具有酸不稳定基团的具有2-7个碳原子的烷基羰基，X 1表示具有1-4个碳原子的直链或支链氟代烷基，R 2表示氢原子，直链或 具有1-10个碳原子的支链烷基或具有1-10个碳原子的直链或支链氟代烷基。 树脂组合物表现出高的透射率，高灵敏度，分辨率和图案形状，并且可以以高产率制造半导体的化学放大抗蚀剂。

公开(公告)号：US06531260B2

公开(公告)日：2003-03-11

申请号：US09824224

申请日：2001-04-03

申请人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

发明人： Haruo Iwasawa ,  Tsutomu Shimokawa ,  Akihiro Hayashi ,  Satoru Nishiyama

IPC分类号： G03C172

CPC分类号： C08L83/08 ,  C07F7/0838 ,  C08G77/14 ,  C08G77/24 ,  C08L83/06 ,  G03F7/0045 ,  G03F7/0757

摘要： A novel polysiloxane having the following structural units (I) and/or (II) and the structural unit (III), wherein A1 and A2 are an acid-dissociable monovalent organic group, R1 is hydrogen, monovalent (halogenated) hydrocarbon, halogen, or amino, R2 is monovalent (halogenated) hydrocarbon group, or halogen. A method of preparing such a polysiloxane, a silicon-containing alicyclic compound providing this polysiloxane, and a radiation-sensitive resin composition comprising this polysiloxane are also provided. The polysiloxane is useful as a resin component for a resist material, effectively senses radiation with a short wavelength, exhibits high transparency to radiation and superior dry etching properties, and excels in basic resist properties required for resist materials such as high sensitivity, resolution, developability, etc.

摘要翻译： 一种具有以下结构单元（I）和/或（II）和结构单元（III）的新型聚硅氧烷，其中A1和A2是酸解离的一价有机基团，R 1是氢，一价（卤代）烃，卤素， 或氨基，R 2为单价（卤代）烃基或卤素。 还提供了制备这种聚硅氧烷的方法，提供该聚硅氧烷的含硅脂环族化合物和包含该聚硅氧烷的辐射敏感性树脂组合物。 聚硅氧烷可用作抗蚀剂材料的树脂组分，有效地感测短波长的辐射，对辐射具有高透明度和优异的干蚀刻性能，并且抗蚀剂材料如高灵敏度，分辨率，显影性所需的基本抗蚀剂性能优异 等等

公开(公告)号：US06517992B1

公开(公告)日：2003-02-11

申请号：US09707939

申请日：2000-11-08

申请人： Yong Wang ,  Eiichi Kobayashi ,  Masaaki Miyaji ,  Jun Numata ,  Tsutomu Shimokawa

发明人： Yong Wang ,  Eiichi Kobayashi ,  Masaaki Miyaji ,  Jun Numata ,  Tsutomu Shimokawa

IPC分类号： G03F7004

CPC分类号： C07D207/46 ,  C07D209/76 ,  G03F7/0045 ,  G03F7/038 ,  G03F7/039 ,  Y10S430/121

摘要： An N-sulfonyloxyimide compound having the formula (1): wherein X represents a single bond or a double bond, Y and Z represent a hydrogen atom or others and may combine to form a cyclic structure; and R is a group having the formula (2): wherein X1 represents an organic group having an ester linkage, R1 represents an alkyl group or an alkoxyl group; and m is an integer of 1 to 11 and n is an integer of 0 to 10, satisfying m+n≦11; and chemically amplified positive and negative radiation-sensitive resin compositions using the compound are provided. The N-sulfonyloxyimide compound is a good radiation-sensitive acid-generating agent, has no problem of volatilization or side reaction, can keep dark reaction from taking place during the storage. The compound is useful as a component of radiation-sensitive chemically amplified resists.

摘要翻译： 具有式（1）的N-磺酰氧基酰亚胺化合物：其中X表示单键或双键，Y和Z表示氢原子等，可以结合形成环状结构; 并且R是具有式（2）的基团：其中X1表示具有酯键的有机基团，R1表示烷基或烷氧基; m为1〜11的整数，n为0〜10的整数，满足m + n <11。 并提供使用该化合物的化学放大的正和负辐射敏感性树脂组合物。 N-磺酰氧基酰亚胺化合物是良好的辐射敏感性产酸剂，不存在挥发或副反应的问题，能够保持保存期间的黑色反应。 该化合物可用作辐射敏感的化学放大抗蚀剂的组分。

公开(公告)号：US5432039A

公开(公告)日：1995-07-11

申请号：US139825

申请日：1993-10-22

申请人： Tsutomu Shimokawa ,  Atsufumi Shimada ,  Masayuki Endo ,  Nobuo Bessho

发明人： Tsutomu Shimokawa ,  Atsufumi Shimada ,  Masayuki Endo ,  Nobuo Bessho

IPC分类号： C08G59/40 ,  C08K5/28 ,  C08K5/3492 ,  C08L63/00 ,  C08L101/06 ,  G02B1/04 ,  G03F7/022 ,  G03F7/023

CPC分类号： G03F7/0226

摘要： A radiation sensitive resin composition for microlens comprising (a) an alkali-soluble resin, (b) a 1,2-quinonediazide compound, (c) a compound having at least 2 epoxy groups in the molecule, (d) a melamine and (e) a trihalomethyltriazine or an onium salt, which composition exhibits high sensitivity, high resolution and high yield of residual film thickness in the formation of a lens pattern and is small in dependency on heating conditions in the preparation of a microlens.

摘要翻译： 一种用于微透镜的辐射敏感性树脂组合物，其包含（a）碱溶性树脂，（b）1,2-醌二叠氮化合物，（c）分子中具有至少2个环氧基的化合物，（d）三聚氰胺和（ e）三卤代甲基三嗪或鎓盐，该组合物在形成透镜图案时表现出高灵敏度，高分辨率和高产率的残留膜厚度，并且在制备微透镜的加热条件方面依赖性小。