摘要:
A low resistance light emitting device with an ultraviolet light-emitting structure having a first layer with a first conductivity, a second layer with a second conductivity; and a light emitting quantum well region between the first layer and second layer. A first electrical contact is in electrical connection with the first layer and a second electrical contact is in electrical connection with the second layer. A template serves as a platform for the light-emitting structure. The ultraviolet light-emitting structure has a first layer having a first portion and a second portion of AlXInYGa(1-X-Y)N with an amount of elemental indium, the first portion surface being treated with silicon and indium containing precursor sources, and a second layer. When an electrical potential is applied to the first layer and the second layer the device emits ultraviolet light.
摘要:
In a communication system comprising a link layer device connectable to one or more physical layer devices, at least a given one of a plurality of ports of the one or more physical layer devices is designated as a port for which status information is to be requested by the link layer device on a more frequent basis than such information is to be requested for one or more other ports of the plurality of ports. The ports are then polled by the link layer device in accordance with a non-linear polling sequence such that the at least one designated port is polled more frequently than the one or more other ports. The designated port may comprise a port to which the link layer device transmits data in conjunction with a current data transfer. The non-linear polling sequence may thus be altered dynamically based on particular data transfers that are occurring between a link layer device and a physical layer device in a communication system.
摘要:
Techniques are disclosed for flexible allocation of address pins of an interface bus to particular sub-buses of the interface bus. The interface bus is between at least one physical layer device and a link layer device in a communication system. Each of the sub-buses has an interface block of the link layer device associated therewith, the interface bus being configurable to carry a composite address signal having a plurality of portions each associated with one of the address pins of the interface bus. The interface blocks of the link layer device are controlled such that each of at least a subset of the interface blocks utilizes only particular ones of the address pins that are controllably allocated to the associated sub-bus in accordance with configuration information stored in the link layer device. The composite address signal is generated as a combination of address outputs of the interface blocks.
摘要:
A system and method for performing event stream processing is described. A plurality of event streams are received from a plurality of input adapters, at least a first input adapter of the plurality of input adapters being located on a separate and distinct virtual machine than a second input adapter of the plurality of input adapters. Event stream data from the first input adapter and event stream data from the second input adapter are transformed into data of a single data type. The transformed data is stored in an in-memory database. Then real-time analysis is performed on the transformed data by accessing windows of the transformed data from the in-memory database based on rules defined in the event stream processing engine.
摘要:
Methods for forming a HEMT device are provided. The method includes forming an ultra-thin barrier layer on the plurality of thin film layers. A dielectric thin film layer is formed over a portion of the ultra-thin barrier layer to leave exposed areas of the ultra-thin barrier layer. A SAG S-D thin film layer is formed over the exposed areas of the ultra-thin barrier layer while leaving the dielectric thin film layer exposed. The dielectric thin film layer is then removed to expose the underlying ultra-thin barrier layer. The underlying ultra-thin barrier layer is treating with fluorine to form a treated area. A source and drain is added on the SAG S-D thin film layer, and a dielectric coating is deposited over the ultra-thin barrier layer treated with fluorine such that the dielectric coating is positioned between the source and the drain.
摘要:
Novel silicon dioxide and silicon nitride deposition methods are generally disclosed. In one embodiment, the method includes depositing silicon on the surface of a substrate having a temperature of between about 65° C. and about 350° C. The heated substrate is exposed to a silicon source that is substantially free from an oxidizing agent. The silicon on the surface is then oxidized with an oxygen source that is substantially free from a silicon source. As a result of oxidizing the silicon, a silicon oxide layer forms on the surface of the substrate. Alternatively, or in additionally, a nitrogen source can be provided to produce silicon nitride on the surface of the substrate.
摘要:
The invention is a vertical geometry light emitting diode capable of emitting light in the electromagnetic spectrum having a substrate, a lift-off layer, a strain relieved superlattice layer, a first doped layer, a multilayer quantum wells comprising alternating layers quantum wells and barrier layers, a second doped layer, a third doped layer and a metallic contact that is in a vertical geometry orientation. The different layers consist of a compound with the formula AlxlnyGa(1-x-y)N, wherein x is more than 0 and less than or equal to 1, y is from 0 to 1 and x+y is greater than 0 and less than or equal to 1. The barrier layer on each surface of the quantum well has a band gap larger than a quantum well bandgap. The first and second doped layers have different conductivities. The contact layer has a different conductivity than the third doped layer.
摘要:
A computer system includes a shared I/O device including functions providing access to device local memory space, and a plurality of roots coupled to the shared I/O device via a switch fabric. A first root assigns a first address in a first root memory space to a first function. A second root assigns a second address in a second root memory space to a second function. The switch fabric maps the first root memory space to a first portion of device local memory space and the second root memory space to a second portion of device local memory space. Subsequently, the switch receives a data transaction request from the first root targeted to the first address, translates the first address to a corresponding location in the first portion of the device local memory space based on the mapping, and routes the data transaction request to the I/O device.
摘要:
An improved high breakdown voltage semiconductor device and method for manufacturing is provided. The device has a substrate and a AlaGa1-aN layer on the substrate wherein 0.1≦a≦1.00. A GaN layer is on the AlaGa1-aN layer. An In1-bGabN/GaN channel layer is on the GaN layer wherein 0.1≦b≦1.00. A AlcIndGa1-c-dN spacer layer is on the In1-bGabN/GaN layer wherein 0.1≦c≦1.00 and 0.0≦d≦0.99. A AleIn1-eN nested superlattice barrier layer is on the AlcIndGa1-c-dN spacer layer wherein 0.10≦e≦0.99. A AlfIngGa1-f-gN leakage suppression layer is on the AleIn1-eN barrier layer wherein 0.1≦f≦0.99 and 0.1≦g≦0.99 wherein the leakage suppression layer decreases leakage current and increases breakdown voltage during high voltage operation. A superstructure, preferably with metallic electrodes, is on the AlfIngGa1-f-gN leakage suppression layer.
摘要:
An ultra-violet light-emitting diode (LED) array, 12, and method for fabricating same with an AlInGaN multiple-quantum-well active region, 500, exhibiting stable cw-powers. The LED includes a template, 10, with an ultraviolet light-emitting array structure on it. The template includes a first buffer layer, 321, then a second buffer layer, 421, on the first preferably with a strain-relieving layer in both buffer layers. Next there is a semiconductor layer having a first type of conductivity, 500, followed by a layer providing a quantum-well region, 600, with an emission spectrum ranging from 190 nm to 369 nm. Another semiconductor layer having a second type of conductivity is applied next, 800. A first metal contact, 980, is a charge spreading layer in electrical contact with the first layer and between the array of LED's. A second contact, 990, is applied to the semiconductor layer having the second type of conductivity, to complete the LED.