利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

77 条记录 (耗时 0.024 秒)

    COMPOSITE WITH THERMO-FORMABILITY, METHOD FOR MAKING THE SAME AND METHOD FOR MAKING A CASING WITH TEXTURE ON SURFACE THEREOF
    42.
    发明申请
    COMPOSITE WITH THERMO-FORMABILITY, METHOD FOR MAKING THE SAME AND METHOD FOR MAKING A CASING WITH TEXTURE ON SURFACE THEREOF 失效
    具有热可塑性的复合材料，其制备方法和在其表面上制备带有纹理的壳体的方法

    公开(公告)号：US20090288761A1

    公开(公告)日：2009-11-26

    申请号：US12418529

    申请日：2009-04-03

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Ko-Feng Wang ,  Kai-Feng Kang ,  Chun-Yi Kuo

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Ko-Feng Wang ,  Kai-Feng Kang ,  Chun-Yi Kuo

    IPC分类号： B32B37/12 ,  B05D1/36 ,  B05D3/00 ,  B32B27/40 ,  B29C45/14 ,  B32B7/00

    CPC分类号： B29C45/14811 ,  B29C45/1418 ,  Y10T428/24967 ,  Y10T428/31507 ,  Y10T428/31551

    摘要： The present invention relates to a composite with thermo-formability, a method for making the same and a method for making a casing with a texture on the surface thereof. The composite includes a PU medium layer, a thermo-formable resin layer, a base layer and a surface layer. The thermo-formable resin layer is disposed on the PU medium layer, and includes polyol. The base layer is disposed on the thermo-formable resin layer. The surface layer is disposed on the base layer. As a result, the composite has good stability after thermoforming, and plastic can be injected into the composite, so a PC film is unnecessary. Moreover, the composite may be adhered to a substrate directly or after thermoforming.

    摘要翻译： 本发明涉及具有可热成形性的复合材料，其制造方法以及在其表面上制造具有纹理的外壳的方法。 复合材料包括PU介质层，可热成型树脂层，基层和表面层。 可热成型树脂层设置在PU介质层上，包括多元醇。 基层设置在可热成型树脂层上。 表面层设置在基层上。 结果，复合材料在热成型后具有良好的稳定性，并且可以将塑料注入到复合材料中，因此不需要PC膜。 此外，复合材料可以直接地或在热成型之后粘附到基底上。

    POLISHING PAD AND METHOD FOR MAKING THE SAME
    43.
    发明申请
    POLISHING PAD AND METHOD FOR MAKING THE SAME 审中-公开
    抛光垫及其制造方法

    公开(公告)号：US20090258578A1

    公开(公告)日：2009-10-15

    申请号：US12208520

    申请日：2008-09-11

    申请人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    发明人： Chung-Chih Feng ,  Chun-Ta Wang ,  Yung-Chang Hung ,  I-Peng Yao

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24B37/22 ,  B24D18/00

    摘要： The present invention relates to a polishing pad and method for making the same. In the invention, a liquid-state polymer material is directly formed on the surface of a base material, and then the liquid-state polymer material is solidified to form a flat grinding layer. Whereby, the polishing pad has high unity and flatness. The grinding layer has attenuated structures and a plurality of holes, thus increasing the storage ability of polishing particles distributed in a polishing liquid. In addition, the polishing pad has high compression ratio, so the polishing pad can compactly contact a polishing workpiece, and will not scratch the surface of the polishing workpiece scratched. Therefore, the polishing effect and quality will be improved.

    摘要翻译： 抛光垫及其制造方法技术领域本发明涉及抛光垫及其制造方法。 在本发明中，在基材的表面上直接形成液态聚合物材料，然后使液态聚合物材料固化，形成平坦的研磨层。 因此，抛光垫具有高的一体性和平坦度。 研磨层具有衰减结构和多个孔，从而增加了分布在抛光液中的抛光颗粒的储存能力。 此外，抛光垫具有高压缩比，因此抛光垫可以紧密接触抛光工件，并且不会刮擦抛光工件的表面划伤。 因此，抛光效果和质量将得到提高。

    Polishing pad having hollow fibers and the method for making the same
    44.
    发明申请
    Polishing pad having hollow fibers and the method for making the same 审中-公开
    具有中空纤维的抛光垫及其制造方法

    公开(公告)号：US20080064310A1

    公开(公告)日：2008-03-13

    申请号：US11517255

    申请日：2006-09-08

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Chao-Yuan Tsai

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Chao-Yuan Tsai

    IPC分类号： B24D11/00

    CPC分类号： B24B37/24 ,  B24D11/02

    摘要： The invention relates to a polishing pad having hollow fibers and a method for making the same. The polishing pad comprises a body and a plurality of hollow fibers. The body has a polishing surface. The hollow fibers are located within the body and have an opening on the polishing surface, wherein the hollow area of the section of each hollow fiber is larger than the sectional area of polishing particles in a polishing slurry. Therefore, the polishing slurry and polishing particles achieve a thorough circulation on the polishing pad via the hollow fibers.

    摘要翻译： 本发明涉及一种具有中空纤维的抛光垫及其制造方法。 抛光垫包括主体和多个中空纤维。 身体有一个抛光表面。 中空纤维位于主体内并且在抛光表面上具有开口，其中每个中空纤维的截面的中空区域大于抛光浆料中抛光颗粒的截面面积。 因此，抛光浆料和抛光颗粒通过中空纤维在抛光垫上实现彻底的循环。

    Carrier film for mounting polishing workpiece and method for making the same
    45.
    发明授权
    Carrier film for mounting polishing workpiece and method for making the same 有权
    用于安装抛光工件的载体膜及其制造方法

    公开(公告)号：US08765259B2

    公开(公告)日：2014-07-01

    申请号：US12907382

    申请日：2010-10-19

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24B41/06 ,  B32B37/12 ,  B29C65/00 ,  B24B19/00 ,  C09J5/06

    CPC分类号： B24B9/146 ,  B24B37/30 ,  B24B41/068 ,  C08J5/128 ,  C08J2323/06 ,  C08J2323/12 ,  C08J2327/06 ,  C08J2375/04 ,  C09J5/06 ,  C09J2423/046 ,  C09J2423/106 ,  C09J2427/006 ,  C09J2475/006

    摘要： The present invention relates to a carrier film for mounting a polishing workpiece. The carrier film comprises a surface substrate and a buffer substrate. The surface substrate consists of first elastomer, the first elastomer comprising a plurality of first holes; wherein the first holes have a drop shape, and each of the first holes has an opening. The buffer substrate consists of second elastomer, the second elastomer comprising a plurality of second holes. The surface substrate and the buffer substrate are adhered with adhesive comprising the first or the second elastomer. A method for making the carrier film is also provided. When polishing, the carrier film provides a good buffer property to conduct and release down force applied on the polishing workpiece.

    摘要翻译： 本发明涉及一种用于安装抛光工件的载体膜。 载体膜包括表面基板和缓冲基板。 所述表面基板由第一弹性体构成，所述第一弹性体包括多个第一孔; 其中所述第一孔具有液滴形状，并且每个所述第一孔具有开口。 缓冲衬底由第二弹性体组成，第二弹性体包括多个第二孔。 表面基材和缓冲基材用包含第一或第二弹性体的粘合剂粘合。 还提供了制造载体膜的方法。 当抛光时，载体膜提供良好的缓冲性能以传导和释放施加在抛光工件上的下压力。

    Polishing Pad, the Use Thereof and the Method for Manufacturing the Same
    46.
    发明申请
    Polishing Pad, the Use Thereof and the Method for Manufacturing the Same 有权
    抛光垫，其使用方法及其制造方法

    公开(公告)号：US20110000141A1

    公开(公告)日：2011-01-06

    申请号：US12883446

    申请日：2010-09-16

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24D11/00 ,  B24D3/00

    CPC分类号： B24D18/00 ,  B24B37/22 ,  B24B37/24 ,  B24D3/26

    摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a first membrane with low permeability; a two-component paste formed on the upper surface of the first membrane with low permeability for adhering the base material to the first membrane with low permeability; and a polyurethane paste formed on the lower surface of the first membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.

    摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 具有低渗透性的第一膜; 在所述第一膜的上表面上形成低渗透性的双组分糊料，用于将所述基材粘附到所述第一膜，所述第一膜具有低渗透性; 以及形成在第一膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在研磨台板或头部上留下残留物。

    Polishing material having polishing particles and method for making the same
    47.
    发明授权
    Polishing material having polishing particles and method for making the same 有权
    具有抛光颗粒的抛光材料及其制造方法

    公开(公告)号：US07824249B2

    公开(公告)日：2010-11-02

    申请号：US11702217

    申请日：2007-02-05

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung ,  Chao-Yuan Tsai

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung ,  Chao-Yuan Tsai

    IPC分类号： B24D15/00 ,  B24D11/00 ,  B24B1/00

    CPC分类号： B24B37/26 ,  B24D11/001

    摘要： The present invention relates to a polishing material having polishing particles and a method for making the same. The polishing material having polishing particles includes a base material, a plurality of polishing particles and a polymer elastic body. The base material has a plurality of fibers for defining a plurality of grid-spaces. The polishing particles are distributed in the grid-spaces. The polymer elastic body covers the base material and the polishing particles, whereby, the polishing particles are uniformly distributed on a surface of a polishing workpiece during the polishing process. Furthermore, the base material prevents the polishing particles from contacting the polishing workpiece so as to avoid scratching of the polishing workpiece. Also, the base material provides effects for sweeping the small grinded pieces.

    摘要翻译： 本发明涉及具有抛光颗粒的抛光材料及其制造方法。 具有抛光颗粒的抛光材料包括基材，多个抛光颗粒和聚合物弹性体。 基材具有用于限定多个网格空间的多根纤维。 抛光颗粒分布在网格空间中。 聚合物弹性体覆盖基材和抛光颗粒，由此在抛光过程中抛光颗粒均匀地分布在抛光工件的表面上。 此外，基材防止抛光颗粒接触抛光工件，以避免抛光工件的刮擦。 此外，基材提供了用于扫掠小磨碎片的效果。

    Polishing pad, the use thereof and the method for manufacturing the same
    48.
    发明授权
    Polishing pad, the use thereof and the method for manufacturing the same 有权
    抛光垫及其制造方法

    公开(公告)号：US07815491B2

    公开(公告)日：2010-10-19

    申请号：US11754418

    申请日：2007-05-29

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24B1/00 ,  B24D11/00

    CPC分类号： B24B37/24 ,  B24B45/00

    摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; a two-component paste formed on the upper surface of the membrane with low permeability for adhering the base material to the membrane with low permeability; and a polyurethane paste formed on the lower surface of the membrane with low permeability. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided. The polishing pad as mentioned above prevents the polishing pad from detaching from the polishing platen or head. The polishing pad is easy to be replaced without leaving residues on the polishing platen or head.

    摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 在膜的上表面形成低渗透性的双组分糊料，用于将基底材料以低渗透性粘附到膜上; 以及形成在膜的下表面上的低渗透性的聚氨酯浆料。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。 如上所述的抛光垫防止抛光垫从抛光台板或头部分离。 抛光垫易于更换，而不会在抛光台板或头部上留下残留物。

    Polishing pad, use thereof and method for manufacturing the same
    50.
    发明授权
    Polishing pad, use thereof and method for manufacturing the same 有权
    抛光垫及其制造方法及其制造方法

    公开(公告)号：US07556555B2

    公开(公告)日：2009-07-07

    申请号：US11706189

    申请日：2007-02-15

    申请人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    发明人： Chung-Chih Feng ,  I-Peng Yao ,  Lyang-Gung Wang ,  Yung-Chang Hung

    IPC分类号： B24B7/22 ,  B24D3/28

    CPC分类号： B24B37/24 ,  B24D3/22 ,  B24D11/00

    摘要： The present invention mainly relates to a polishing pad comprising a base material comprising fibers; a membrane with low permeability; and a buffer layer formed between the base material and an upper surface of the membrane with low permeability and embedded into the fibers of the base material. A method of polishing a substrate comprising using the polishing pad and a method for manufacturing the polishing pad as described above are also provided.

    摘要翻译： 本发明主要涉及一种包括由纤维构成的基材的抛光垫; 低渗透膜; 以及在所述基材和所述膜的上表面之间形成的低渗透性并嵌入所述基材的纤维中的缓冲层。 还提供了一种抛光包括使用抛光垫的基板的方法和如上所述的用于制造抛光垫的方法。