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公开(公告)号：US07105463B2
公开(公告)日：2006-09-12
申请号：US09957784
申请日：2001-09-21
IPC分类号： H01L21/31
CPC分类号： H01L21/67748 , H01L21/67098 , H01L21/67167 , H01L21/67201
摘要： Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.
摘要翻译： 本文提供了一种基板处理系统，其包括盒式装载台; 负载锁定室; 位于中心的传送室; 以及位于传送室的周边周围的一个或多个处理室。 负载锁定室包括在相同位置构造的双重双槽加载锁。 这种系统可用于处理用于半导体制造的衬底。
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公开(公告)号：US07075323B2
公开(公告)日：2006-07-11
申请号：US10901936
申请日：2004-07-29
IPC分类号： G01R31/26
CPC分类号： H01J37/185 , G01R31/2886 , H01J2237/204
摘要： A method and system for testing one or more large substrates are provided. In one or more embodiments, the system includes a testing chamber having a substrate table disposed therein. The substrate table is adapted to move a substrate within the testing chamber in various directions. More particularly, the substrate table includes a first stage movable in a first direction, and a second stage movable in a second direction, wherein each of the stages moves in an X-direction, Y-direction or both X and Y directions. The system further includes a load lock chamber at least partially disposed below the testing chamber, and a transfer chamber coupled to the load lock chamber and the testing chamber. In one or more embodiments, the transfer chamber includes a robot disposed therein which is adapted to transfer substrates between the load lock chamber and the testing chamber.
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公开(公告)号：US07017269B2
公开(公告)日：2006-03-28
申请号：US10729565
申请日：2003-12-05
申请人： John M. White , Ernst Keller , Wendell T. Blonigan
发明人： John M. White , Ernst Keller , Wendell T. Blonigan
IPC分类号： B23P15/00 , C23C16/455 , H01L21/00
CPC分类号： C23C16/45565 , C23C16/455 , C23C16/5096 , H01J37/3244 , Y10T29/49428 , Y10T29/49826
摘要： A gas inlet manifold for a plasma chamber having a perforated gas distribution plate suspended by flexible side walls. The flexible suspension minimizes mechanical stress due to thermal expansion of the gas distribution plate. In another aspect, the suspension provides thermal isolation between the gas distribution plate and other components of the chamber.
摘要翻译： 一种用于等离子体室的气体入口歧管，其具有由柔性侧壁悬挂的穿孔气体分配板。 柔性悬架使气体分配板的热膨胀的机械应力最小化。 在另一方面，悬架提供气体分配板和腔室的其它部件之间的热隔离。
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公开(公告)号：US06881276B2
公开(公告)日：2005-04-19
申请号：US10393311
申请日：2003-03-18
IPC分类号： H01L21/205 , C23C14/56 , C23C16/44 , H01J37/32 , B08B7/04
CPC分类号： C23C14/564 , C23C16/4405 , H01J37/32862 , H01J37/32963 , Y10S438/905
摘要： A method and apparatus for cleaning a CVD chamber including optoelectronic detection of the completion or endpoint of the cleaning procedure once a ratio of emission lines reaches a threshold value. The method comprises the steps of: providing a plasma of a cleaning gas into the chamber and creating a plasma from the cleaning gas. The intensity of emission lines of the cleaning gas and of at least one background gas in the chamber are monitored. A ratio of the intensity of the cleaning gas emission line to the intensity of the background gas emission line is determined and monitored as a function of time. The determined ratio is compared to a preset threshold calibration value. The flow of gas is controlled based on the comparing step. The apparatus includes a cleaning gas supply with a valved inlet providing an entrance to the interior of the chamber for passing cleaning gas to the interior of the chamber. A detector having an optical input is disposed for sensing the electromagnetic radiation. The detector has a first channel for detecting a relative intensity of an emission line corresponding to the cleaning gas and a second channel for detecting a relative intensity of the emission line corresponding to the background gases. Software or circuitry is employed to determine a normalized signal using a signal from the first channel and a signal from the second channel. The value of the normalized signal is substantially invariant with respect to simultaneous corresponding changes in the intensity of the signal measured by the first channel and the intensity of the signal measured by the second channel.
摘要翻译： 一旦发射线的比率达到阈值，清洁CVD室的方法和装置包括清洁程序的完成或终点的光电检测。 该方法包括以下步骤：将清洁气体的等离子体提供到室中并从清洁气体产生等离子体。 监测清洁气体和室中的至少一种背景气体的排放线的强度。 根据时间的函数确定和监测清洁气体排放管线的强度与背景气体排放管线的强度的比率。 将确定的比率与预设的阈值校准值进行比较。 基于比较步骤控制气体流量。 该设备包括具有阀门入口的清洁气体供应器，该入口提供到室的内部的入口，用于将清洁气体传送到室的内部。 设置具有光学输入的检测器用于感测电磁辐射。 检测器具有用于检测对应于清洁气体的发射线的相对强度的第一通道和用于检测对应于背景气体的发射线的相对强度的第二通道。 使用软件或电路来使用来自第一信道的信号和来自第二信道的信号来确定归一化信号。 归一化信号的值相对于由第一通道测量的信号的强度的同时相应变化和由第二通道测量的信号的强度基本上是不变的。
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公开(公告)号：US06824343B2
公开(公告)日：2004-11-30
申请号：US10084762
申请日：2002-02-22
IPC分类号： B65G4724
CPC分类号： H01L21/68 , H01L21/68728 , H01L21/68778 , H01L21/68792 , Y10S414/136 , Y10S414/139 , Y10S414/141
摘要： A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.
摘要翻译： 通常提供用于支撑衬底的方法和装置。 在一个方面，一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面，具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件，其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。
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公开(公告)号：US06585828B1
公开(公告)日：2003-07-01
申请号：US09670481
申请日：2000-09-26
IPC分类号： B08B900
CPC分类号： H01L21/687 , C23C16/4407 , Y10S414/14
摘要： Provided herein is a process chamber lid service system comprising a process chamber lid service cart and a process chamber lid service frame. The lid service frame holds the process chamber lid. The cart and the lid service frame are aligned with guide pin and alignment capture, meanwhile, the cart is aligned at the process chamber with guide frame, which is installed at the base frame of the process chamber. This lid service system may be used for opening/closing a process chamber as well as wet-cleaning the process chamber for semiconductor manufacturing.
摘要翻译： 本文提供的处理室盖服务系统包括处理室盖服务车和处理室盖服务框架。 盖服务框架保持处理室盖。 推车和盖子服务框架与引导销和对准捕获对齐，同时，推车在处理室处与引导框架对齐，该引导框架安装在处理室的基架上。 这种盖子服务系统可用于打开/关闭处理室以及湿式清洁用于半导体制造的处理室。
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公开(公告)号：US06552297B2
公开(公告)日：2003-04-22
申请号：US10003129
申请日：2001-11-01
IPC分类号： B23K1000
CPC分类号： H01J37/32174 , H01J37/32082
摘要： An apparatus for distributing RF power outputs to a first electrode in a parallel plate electrode system for generating plasma in depositing films on a substrate. A RF power output is applied to a distributed RF matching network to excite a plasma from a process gas stream to deposit a uniform film onto the substrate. The distributed matching network includes a load capacitor for receiving a radio frequency power input and an inductor having first and second ends with the first end coupled to the load capacitor. The matching network also includes multiple drive capacitors each of which couples the second end of the inductor to a different one of multiple points distributed on the first electrode. The capacitance of each drive capacitor is user-selectable, and the points on the backing plate to which the drive capacitors are coupled are user-selectable.
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公开(公告)号：US06517303B1
公开(公告)日：2003-02-11
申请号：US09082484
申请日：1998-05-20
申请人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
发明人： John M. White , Norman L. Turner , Robin L. Tiner , Ernst Keller , Shinichi Kurita , Wendell T. Blonigan , David E. Berkstresser
IPC分类号： B65G133
CPC分类号： H01L21/67748 , C03B25/08 , C03B29/08 , C03B35/142 , C03B35/202 , C03B2225/02 , C03C17/002 , F27D3/00 , F27D5/00 , H01L21/67173 , H01L21/67236 , Y02P40/57 , Y10S414/135 , Y10S414/139
摘要： The present invention provides an apparatus and method for substrate transport. In systems according to the invention, at least a first and second chamber are provided. The first chamber may be a load lock and the second chamber a processing chamber. A substrate transfer shuttle is provided and is moveable along a linear path defined by guide rollers between one position in the first chamber and another position in the second chamber. In this way, the substrate may be transferred, in both a forward and a reverse direction, between the first chamber and the second chamber. The substrate transfer shuttle is structured so that a substrate may be removed therefrom by moving a support in one of the chambers from a lowered position to an intermediate position, after which the substrate transfer shuttle may be removed from the chamber.
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公开(公告)号：US06471459B2
公开(公告)日：2002-10-29
申请号：US09447930
申请日：1999-11-23
申请人： Wendell T. Blonigan , John M. White
发明人： Wendell T. Blonigan , John M. White
IPC分类号： B65G4907
CPC分类号： H01L21/67742 , H01L21/67709 , H01L21/6776 , Y10S414/139
摘要： A magnetic drive system for moving a substrate transfer shuttle along a linear path between chambers in a semiconductor fabrication apparatus. A rack with rack magnets is secured to the shuttle, and a rotatable pinion with pinion magnets is positioned adjacent the rack so that the pinion magnets can magnetically engage the rack magnets. Thus, rotation of the pinion will cause the shuttle to move along the linear path. The magnets may be oriented with a helix angle between their primary axis and the axis of rotation of the pinion. One rack and one pinion are located on each side of the shuttle. A set of lower guide rollers supports the shuttle, and a set of upper guide rollers prevents the shuttle from lifting off the lower guide rollers.
摘要翻译： 一种磁性驱动系统，用于在半导体制造装置中沿着室之间的线性路径移动基板传送梭。 具有齿条磁体的机架固定到梭子上，并且具有小齿轮磁体的可旋转小齿轮定位成邻近齿条，使得小齿轮磁体可以磁性地接合齿条磁体。 因此，小齿轮的旋转将使梭子沿线性路径移动。 磁体可以在其主轴线和小齿轮的旋转轴线之间具有螺旋角度定向。 一个机架和一个小齿轮位于梭子的每一侧。 一组下导辊支撑梭子，一组上导辊防止梭子从下导辊上脱落。
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公开(公告)号：US06286230B1
公开(公告)日：2001-09-11
申请号：US09391012
申请日：1999-09-07
IPC分类号： F26B504
CPC分类号： H01L21/67173 , H01L21/67017 , Y10S414/139
摘要： A method of transferring and processing a substrate in an evacuable chamber which is located adjacent a process chamber and back-to-back process chambers, and other combinations of evacuable chambers and process chambers. The method includes the use of various isolation valves disposed between adjacent chambers, as well as gas flow valves and vacuum valves. By controlling the positions of the valves, the flow of gas to and from the different chambers can be controlled.
摘要翻译： 一种在位于邻近处理室和背靠背处理室的可抽空室中以及可抽空室和处理室的其它组合之间传送和处理衬底的方法。 该方法包括使用设置在相邻室之间的各种隔离阀以及气体流量阀和真空阀。 通过控制阀的位置，可以控制进出不同室的气体流量。
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