Substrate support
    1.
    发明授权
    Substrate support 有权
    基材支持

    公开(公告)号:US06824343B2

    公开(公告)日:2004-11-30

    申请号:US10084762

    申请日:2002-02-22

    IPC分类号: B65G4724

    摘要: A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译: 通常提供用于支撑衬底的方法和装置。 在一个方面,一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面,具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件,其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

    Substrate support
    2.
    发明授权
    Substrate support 失效
    基材支持

    公开(公告)号:US07735710B2

    公开(公告)日:2010-06-15

    申请号:US10990094

    申请日:2004-11-16

    IPC分类号: H01L21/68

    摘要: A method and apparatus for supporting a substrate is generally provided. In one aspect, an apparatus for supporting a substrate includes a support plate having a first body disposed proximate thereto. A first pushing member is radially coupled to the first body and adapted to urge the substrate in a first direction parallel to the support plate when the first body rotates. In another aspect, a load lock chamber having a substrate support that supports a substrate placed thereon includes a cooling plate that is moved to actuate at least one alignment mechanism. The alignment mechanism includes a pushing member that urges the substrate in a first direction towards a center of the support. The pushing member may additionally rotate about an axis perpendicular to the first direction.

    摘要翻译: 通常提供用于支撑衬底的方法和装置。 在一个方面,一种用于支撑衬底的装置包括具有靠近其设置的第一主体的支撑板。 第一推动构件径向耦合到第一主体并且适于在第一主体旋转时沿平行于支撑板的第一方向推动基板。 在另一方面,具有支撑其上放置的基板的基板支撑件的装载锁定室包括移动以致动至少一个对准机构的冷却板。 对准机构包括推动构件,其沿朝向支撑件的中心的第一方向推动基板。 推动构件可以另外围绕垂直于第一方向的轴旋转。

    Transfer chamber for vacuum processing system
    3.
    发明授权
    Transfer chamber for vacuum processing system 有权
    真空处理系统传送室

    公开(公告)号:US07018517B2

    公开(公告)日:2006-03-28

    申请号:US10601185

    申请日:2003-06-20

    IPC分类号: C23C14/34 C23C16/00

    摘要: A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

    摘要翻译: 用于基板处理工具的传送室包括具有适于耦合到至少一个处理室和至少一个装载锁定室的侧壁的主体。 主体容纳至少一部分适于在处理室和加载锁定室之间输送基板的机器人。 盖子连接到并密封传送室主体的顶部。 传送室还具有适于联接到传送室的主体的底部并且密封传送室的主体的底部的圆顶形底部。

    Transfer chamber for vacuum processing system
    4.
    发明授权
    Transfer chamber for vacuum processing system 有权
    真空处理系统传送室

    公开(公告)号:US08033772B2

    公开(公告)日:2011-10-11

    申请号:US11386257

    申请日:2006-03-21

    IPC分类号: C23C14/34 C23C16/00 B65H1/00

    摘要: A transfer chamber for a substrate processing tool includes a main body having side walls adapted to couple to at least one processing chamber and at least one load lock chamber. The main body houses at least a portion of a robot adapted to transport a substrate between the processing chamber and the load lock chamber. A lid couples to and seals a top of the main body of the transfer chamber. The transfer chamber also has a domed bottom adapted to couple to and to seal a bottom portion of the main body of the transfer chamber.

    摘要翻译: 用于基板处理工具的传送室包括具有适于耦合到至少一个处理室和至少一个装载锁定室的侧壁的主体。 主体容纳至少一部分适于在处理室和加载锁定室之间输送基板的机器人。 盖子连接到并密封传送室主体的顶部。 传送室还具有适于联接到传送室的主体的底部并且密封传送室的主体的底部的圆顶形底部。

    DUAL SUBSTRATE LOADLOCK PROCESS EQUIPMENT
    5.
    发明申请
    DUAL SUBSTRATE LOADLOCK PROCESS EQUIPMENT 有权
    双基板负载工艺设备

    公开(公告)号:US20100107672A1

    公开(公告)日:2010-05-06

    申请号:US12691612

    申请日:2010-01-21

    摘要: One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.

    摘要翻译: 一个实施例涉及一种其中具有第一支撑结构的负载锁,用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔,以允许将未处理的衬底插入到装载锁中并从加载锁中移除经处理的衬底,以及第二孔,以允许将未处理的衬底从负载锁上移除并将经处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。

    Dual substrate loadlock process equipment
    6.
    发明授权
    Dual substrate loadlock process equipment 有权
    双基板负载锁定工艺设备

    公开(公告)号:US06949143B1

    公开(公告)日:2005-09-27

    申请号:US09464362

    申请日:1999-12-15

    摘要: One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as wall as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.

    摘要翻译: 一个实施例涉及一种其中具有第一支撑结构的负载锁,用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔,以允许将未处理的衬底插入到装载锁中,并且将加工的衬底从负载锁上移除,作为壁作为第二孔,以允许将未加工的衬底从负载锁中移除并将处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。

    Large area substrate transferring method for aligning with horizontal actuation of lever arm
    7.
    发明授权
    Large area substrate transferring method for aligning with horizontal actuation of lever arm 有权
    大面积基板转印方法,用于与杆臂的水平致动对齐

    公开(公告)号:US07651315B2

    公开(公告)日:2010-01-26

    申请号:US11621039

    申请日:2007-01-08

    IPC分类号: B65G47/90 B21B39/22

    摘要: A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.

    摘要翻译: 提供了一种负载锁定室和用于传送大面积基板的方法。 在一个实施例中,适于传送大面积衬底的负载锁定室包括多个垂直堆叠的单个衬底传送室。 垂直堆叠的单个基板传送室的配置与现有技术的双槽双面基板设计相比,有助于减小尺寸和更大的通量。 此外,在减少的泵送和排气速率下已经实现了增加的产量,这对应于由于颗粒和冷凝引起的底物污染的可能性降低。

    Method for transferring substrates in a load lock chamber
    8.
    发明授权
    Method for transferring substrates in a load lock chamber 有权
    在负载锁定室中传送基板的方法

    公开(公告)号:US07316966B2

    公开(公告)日:2008-01-08

    申请号:US11278318

    申请日:2006-03-31

    IPC分类号: H01L21/20

    摘要: Provided herein is a substrate processing system, which comprises a cassette load station; a load lock chamber; a centrally located transfer chamber; and one or more process chambers located about the periphery of the transfer chamber. The load lock chamber comprises double dual slot load locks constructed at same location. Such system may be used for processing substrates for semiconductor manufacturing.

    摘要翻译: 本文提供了一种基板处理系统,其包括盒式装载台; 负载锁定室; 位于中心的传送室; 以及位于传送室的周边周围的一个或多个处理室。 负载锁定室包括在相同位置构造的双重双槽加载锁。 这种系统可用于处理用于半导体制造的衬底。

    Dual substrate loadlock process equipment
    9.
    发明授权
    Dual substrate loadlock process equipment 有权
    双基板负载锁定工艺设备

    公开(公告)号:US07976635B2

    公开(公告)日:2011-07-12

    申请号:US12691612

    申请日:2010-01-21

    摘要: One embodiment relates to a loadlock having a first support structure therein to support one unprocessed substrate and a second support structure therein to support one processed substrate. The first support structure is located above the second support structure. The loadlock includes an elevator to control the vertical position of the support structures. The loadlock also includes a first aperture to permit insertion of an unprocessed substrate into the loadlock and removal of a processed substrate from the loadlock, as well as a second aperture to permit removal of an unprocessed substrate from the loadlock and insertion of a processed substrate into the loadlock. A cooling plate is also located in the loadlock. The cooling plate includes a surface adapted to support a processed substrate thereon. A heating device may be located in the loadlock above the first support structure.

    摘要翻译: 一个实施例涉及一种其中具有第一支撑结构的负载锁,用于支撑一个未处理的基板和其中的第二支撑结构以支撑一个处理的基板。 第一支撑结构位于第二支撑结构的上方。 负载锁包括用于控制支撑结构的垂直位置的电梯。 负载锁还包括第一孔,以允许将未处理的衬底插入到装载锁中并从加载锁中移除经处理的衬底,以及第二孔,以允许将未处理的衬底从负载锁上移除并将经处理的衬底插入 负载锁。 一个冷却板也位于负载锁中。 冷却板包括适于在其上支撑经处理的基板的表面。 加热装置可以位于第一支撑结构上方的装载锁中。

    Load lock chamber for large area substrate processing system
    10.
    发明授权
    Load lock chamber for large area substrate processing system 有权
    负载锁定室用于大面积基板处理系统

    公开(公告)号:US07207766B2

    公开(公告)日:2007-04-24

    申请号:US10832795

    申请日:2004-04-26

    摘要: A load lock chamber and method for transferring large area substrates is provided. In one embodiment, a load lock chamber suitable for transferring large area substrates includes a plurality of vertically stacked single substrate transfer chambers. The configuration of vertically stacked single substrate transfer chambers contributes to reduced size and greater throughput as compared to conventional state of the art, dual slot dual substrate designs. Moreover, the increased throughput has been realized at reduced pumping and venting rates, which corresponds to reduced probability of substrate contamination due to particulates and condensation.

    摘要翻译: 提供了一种负载锁定室和用于传送大面积基板的方法。 在一个实施例中,适于传送大面积衬底的负载锁定室包括多个垂直堆叠的单个衬底传送室。 垂直堆叠的单个基板传送室的配置与现有技术的双槽双面基板设计相比,有助于减小尺寸和更大的通量。 此外,在减少的泵送和排气速率下已经实现了增加的产量,这对应于由于颗粒和冷凝引起的底物污染的可能性降低。