公开(公告)号：US09804101B2

公开(公告)日：2017-10-31

申请号：US14300227

申请日：2014-06-09

Applicant: KLA-Tencor Corporation

Inventor： Yujun Deng ,  Yung-Ho Chuang ,  John Fielden

IPC: G01J1/42 ,  G01N21/95 ,  H01S3/094 ,  G01N21/88 ,  G02F1/39 ,  H01S3/00 ,  G02F1/35

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G02F1/3534 ,  G02F1/39 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/094015

Abstract: A DUV laser includes an optical bandwidth filtering device, such as etalon, which is disposed outside of the laser oscillator cavity of the fundamental laser, and which directs one range of wavelengths into one portion of a frequency conversion chain and another range of wavelengths into another portion of the frequency conversion train, thereby reducing the bandwidth of the DUV laser output while maintaining high conversion efficiency in the frequency conversion chain.

公开(公告)号：US20170070025A1

公开(公告)日：2017-03-09

申请号：US15335266

申请日：2016-10-26

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Xiaoxu Lu ,  John Fielden

IPC: H01S3/109

CPC classification number: H01S3/109 ,  G02F1/353 ,  G02F1/3534 ,  G02F1/3558 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2201/17 ,  G02F2203/15 ,  H01S3/0092

Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and a fifth harmonic generator. The fifth harmonic generator module includes a cavity resonant at the fundamental frequency, and combines the fundamental frequency with the third harmonic in a first NLO crystal to generate a fourth harmonic, then combines the fourth harmonic with unconsumed fundamental frequency in a second NLO crystal to generate the fifth harmonic. One or more lenses are used to focus the third and fourth harmonics in the first and second NLO crystals, respectively.

Abstract translation: 深紫外（DUV）连续波（CW）激光器包括配置为产生具有约1μm和1.1μm之间的对应波长的基频的基本CW激光器，包括一个或多个非线性光学器件的三次谐波发生器模块 （NLO）晶体，其产生三次谐波和可选的二次谐波，以及五次谐波发生器。 第五谐波发生器模块包括在基频处谐振的腔，并且在第一NLO晶体中组合基频和三次谐波以产生第四谐波，然后在第二NLO晶体中组合第四谐波与未消耗的基频，以产生 五次谐波。 使用一个或多个透镜来分别在第一和第二NLO晶体中聚焦第三和第四谐波。

公开(公告)号：US20170063026A1

公开(公告)日：2017-03-02

申请号：US15344383

申请日：2016-11-04

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: H01S4/00

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract translation: 描述了用于产生亚200nm光的改进的固态激光器。 该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。 激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。 通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率，良好的稳定性和高可靠性。

公开(公告)号：US09529182B2

公开(公告)日：2016-12-27

申请号：US14170384

申请日：2014-01-31

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Yujun Deng ,  Justin Dianhuan Liou ,  Vladimir Dribinski ,  John Fielden

IPC: G01N21/95 ,  H01S3/00 ,  H01S3/23 ,  G02B17/08

CPC classification number: H01S3/302 ,  G01N21/9501 ,  G02B17/0892 ,  G02F1/353 ,  G02F1/395 ,  G02F2001/354 ,  H01S3/005 ,  H01S3/0092 ,  H01S3/067 ,  H01S3/06754 ,  H01S3/10053 ,  H01S3/11 ,  H01S3/16 ,  H01S3/1643 ,  H01S3/1666 ,  H01S3/23 ,  H01S3/2308

Abstract: An improved solid-state laser for generating sub-200 nm light is described. This laser uses a fundamental wavelength between about 1030 nm and 1065 nm to generate the sub-200 nm light. The final frequency conversion stage of the laser creates the sub-200 nm light by mixing a wavelength of approximately 1109 nm with a wavelength of approximately 234 nm. By proper selection of non-linear media, such mixing can be achieved by nearly non-critical phase matching. This mixing results in high conversion efficiency, good stability, and high reliability.

Abstract translation: 描述了用于产生亚200nm光的改进的固态激光器。 该激光器使用约1030nm和1065nm之间的基本波长来产生亚200nm的光。 激光的最终变频阶段通过将约1109nm的波长与约234nm的波长混合而产生亚200nm的光。 通过适当选择非线性介质，可以通过几乎非关键的相位匹配来实现这种混合。 这种混合导致高转换效率，良好的稳定性和高可靠性。

公开(公告)号：US20160197449A1

公开(公告)日：2016-07-07

申请号：US15017839

申请日：2016-02-08

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang

IPC: H01S3/00

CPC classification number: H01S3/0092 ,  G01N21/33 ,  G01N21/9501 ,  G01N2021/95676 ,  G01N2201/067 ,  G02F1/35 ,  G02F1/37 ,  G02F2201/16 ,  H01S3/0085

Abstract: A laser for generating deep ultra-violet (DUV) continuous wave (CW) light includes a second-harmonic generator and a fourth-harmonic generator. The fourth-harmonic generator includes a plurality of mirrors as well as a first non-linear optical (NLO) crystal and a pair of tilted plates. The first NLO crystal generates the light having the fourth harmonic wavelength and a first astigmatism, and is placed in operative relation to the plurality of mirrors. The pair of tilted plates is placed in operative relation to the first NLO crystal such that the light having the second harmonic wavelength passes through both of the tilted plates. Notably, the pair of tilted plates are disposed at substantially equal and opposite angles about respective parallel axes such that they introduce a second astigmatism that corrects for the first astigmatism while minimizing displacement of the circulated light.

Abstract translation: 用于产生深紫外（DUV）连续波（CW）光的激光器包括二次谐波发生器和四次谐波发生器。 第四谐波发生器包括多个反射镜以及第一非线性光学（NLO）晶体和一对倾斜板。 第一NLO晶体产生具有第四谐波波长和第一散光的光，并且与多个反射镜成为可操作的关系。 一对倾斜板被放置成与第一NLO晶体有效的关系，使得具有二次谐波波长的光通过两个倾斜板。 值得注意的是，该对倾斜板围绕各自的平行轴以大致相等且相反的角度设置，使得它们引入校正第一散光同时最小化循环光的位移的第二散光。

公开(公告)号：US09377414B2

公开(公告)日：2016-06-28

申请号：US14242802

申请日：2014-04-01

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Richard W. Solarz ,  David R. Shafer ,  Bin-Ming Benjamin Tsai ,  David L. Brown

IPC: G01N21/95 ,  G01N21/956 ,  G01N21/88

CPC classification number: G01N21/95 ,  G01N21/8806 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G01N2201/068 ,  G03F1/84 ,  G03F7/70616 ,  H05G2/008

Abstract: Inspection of EUV patterned masks, blank masks, and patterned wafers generated by EUV patterned masks requires high magnification and a large field of view at the image plane. An EUV inspection system can include a light source directed to an inspected surface, a detector for detecting light deflected from the inspected surface, and an optic configuration for directing the light from the inspected surface to the detector. In particular, the detector can include a plurality of sensor modules. Additionally, the optic configuration can include a plurality of mirrors that provide magnification of at least 100× within an optical path less than 5 meters long. In one embodiment, the optical path is approximately 2-3 meters long.

公开(公告)号：US09293882B2

公开(公告)日：2016-03-22

申请号：US14080746

申请日：2013-11-14

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang

IPC: H01S3/00 ,  G02F1/37 ,  G01N21/95 ,  G02F1/35

CPC classification number: H01S3/0092 ,  G01N21/33 ,  G01N21/9501 ,  G01N2021/95676 ,  G01N2201/067 ,  G02F1/35 ,  G02F1/37 ,  G02F2201/16 ,  H01S3/0085

Abstract: A laser for generating deep ultra-violet (DUV) continuous wave (CW) light includes a second-harmonic generator and a fourth-harmonic generator. The fourth-harmonic generator includes a plurality of mirrors as well as first and second non-linear optical (NLO) crystals. The first NLO crystal generates the light having the fourth harmonic wavelength, and is placed in operative relation to the plurality of mirrors. The second NLO crystal is placed in operative relation to the first NLO crystal such that the light having the second harmonic wavelength passes through both the first and the second NLO crystals. Notably, the second optical axes of the second NLO crystal are rotated about a direction of propagation of the light within the second NLO crystal approximately 90 degrees relative to the first optical axes of the first NLO crystal. The second NLO crystal provides no wavelength conversion.

Abstract translation: 用于产生深紫外（DUV）连续波（CW）光的激光器包括二次谐波发生器和四次谐波发生器。 第四谐波发生器包括多个反射镜以及第一和第二非线性光学（NLO）晶体。 第一NLO晶体产生具有第四谐波波长的光，并且与多个反射镜成为可操作的关系。 将第二NLO晶体置于与第一NLO晶体的操作关系中，使得具有二次谐波波长的光通过第一和第二NLO晶体。 值得注意的是，第二NLO晶体的第二光轴相对于第一NLO晶体的第一光轴围绕第二NLO晶体内的光的传播方向大约90度旋转。 第二个NLO晶体不提供波长转换。

公开(公告)号：US20150177159A1

公开(公告)日：2015-06-25

申请号：US14273424

申请日：2014-05-08

Applicant: KLA-Tencor Corporation

Inventor： David L. Brown ,  Yung-Ho Chuang ,  John Fielden

IPC: G01N21/88

CPC classification number: G01N21/8851 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  H01L27/14636 ,  H01L31/02 ,  H04N5/3577 ,  H04N5/3765

Abstract: A method of inspecting a sample at high speed includes directing and focusing radiation onto a sample, and receiving radiation from the sample and directing received radiation to an image sensor. Notably, the method includes driving the image sensor with predetermined signals. The predetermined signals minimize a settling time of an output signal of the image sensor. The predetermined signals are controlled by a phase accumulator, which is used to select look-up values. The driving can further include loading an initial phase value, selecting most significant bits of the phase accumulator, and converting the look-up values to an analog signal. In one embodiment, for each cycle of a phase clock, a phase increment can be added to the phase accumulator. The driving can be performed by a custom waveform generator.

Abstract translation: 高速检查样品的方法包括将辐射引导和聚焦到样品上，并且接收来自样品的辐射并将接收的辐射引导到图像传感器。 值得注意的是，该方法包括以预定信号驱动图像传感器。 预定信号最小化图像传感器的输出信号的建立时间。 预定信号由相位累加器控制，该相位累加器用于选择查找值。 驱动还可以包括加载初始相位值，选择相位累加器的最高有效位，以及将查找值转换为模拟信号。 在一个实施例中，对于相位时钟的每个周期，相位增量可以被加到相位累加器。 驱动可由自定义波形发生器执行。

公开(公告)号：US20150155680A1

公开(公告)日：2015-06-04

申请号：US14586646

申请日：2014-12-30

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

IPC: H01S3/108

CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

公开(公告)号：US20140362880A1

公开(公告)日：2014-12-11

申请号：US14294019

申请日：2014-06-02

Applicant: KLA-Tencor Corporation

Inventor： Yung-Ho Chuang ,  Xiaoxu Lu ,  John Fielden

IPC: H01S3/109

CPC classification number: H01S3/109 ,  G02F1/353 ,  G02F1/3534 ,  G02F1/3558 ,  G02F2001/3507 ,  G02F2001/354 ,  G02F2201/17 ,  G02F2203/15 ,  H01S3/0092

Abstract: A deep ultra-violet (DUV) continuous wave (CW) laser includes a fundamental CW laser configured to generate a fundamental frequency with a corresponding wavelength between about 1 μm and 1.1 μm, a third harmonic generator module including one or more periodically poled non-linear optical (NLO) crystals that generate a third harmonic and an optional second harmonic, and one of a fourth harmonic generator module and a fifth harmonic generator. The fourth harmonic generator module includes a cavity resonant at the fundamental frequency configured to combine the fundamental frequency with the third harmonic to generate a fourth harmonic. The fourth harmonic generator module includes either a cavity resonant at the fundamental frequency for combining the fundamental frequency with the third harmonic to generate a fifth harmonic, or a cavity resonant at the second harmonic frequency for combining the second harmonic and the third harmonic to generate the fifth harmonic.

Abstract translation: 深紫外（DUV）连续波（CW）激光器包括配置为产生具有在约1μm和1.1μm之间的相应波长的基频的基本CW激光器;三次谐波发生器模块，包括一个或多个周期性极化非线性 产生三次谐波和可选的二次谐波的线性光学（NLO）晶体，以及四次谐波发生器模块和五次谐波发生器之一。 第四谐波发生器模块包括在基频处谐振的腔体，其被配置为将基频与三次谐波组合以产生第四谐波。 第四谐波发生器模块包括在基频处共振的腔体，用于将基频与三次谐波组合以产生五次谐波，或者在二次谐波频率下共振谐振以组合二次谐波和三次谐波，以产生 五次谐波。