公开(公告)号：US4052581A

公开(公告)日：1977-10-04

申请号：US626557

申请日：1975-10-28

申请人： Shigeru Matsui

发明人： Shigeru Matsui

IPC分类号： H01H1/26 ,  H01H1/28 ,  H01H50/56

CPC分类号： H01H50/56

摘要： A switch is comprised of at least one leaf-like springy fixed contact, a movable contact, a supporting member for supporting the fixed contact and a positioning member for positioning the free end of the fixed contact. The leaf-like fixed contact is fixed by the supporting member at a position close to one end of the fixed contact, and is biased by the positioning member at a position close to the other end. Thus, the free end of the leaf-like springy fixed contact is placed at a position by its function of urging the positioning member.

公开(公告)号：US09390934B2

公开(公告)日：2016-07-12

申请号：US14350314

申请日：2012-09-13

申请人： Kazuyuki Kakuta ,  Toshihiko Onozuka ,  Shigeru Matsui ,  Yoshisada Ebata ,  Norio Hasegawa

发明人： Kazuyuki Kakuta ,  Toshihiko Onozuka ,  Shigeru Matsui ,  Yoshisada Ebata ,  Norio Hasegawa

IPC分类号： G03F1/26 ,  H01L21/3065 ,  G03F1/30 ,  H01L21/308 ,  G03F1/00

CPC分类号： H01L21/3065 ,  G03F1/0046 ,  G03F1/26 ,  G03F1/28 ,  G03F1/30 ,  H01L21/3085

摘要： A technique of forming an asymmetric pattern by using a phase shift mask, and further, techniques of manufacturing a diffraction grating and a semiconductor device, capable of improving accuracy of a product and capable of shortening manufacturing time. In a method of manufacturing a diffraction grating by using a phase shift mask (in which a light shield part and a light transmission part are periodically arranged), light emitted from an illumination light source is transmitted through the phase shift mask, and a photoresist on a surface of a Si wafer is exposed by providing interference between zero diffraction order light and positive first diffraction order light which are generated by the transmission through this phase shift mask onto the surface of the Si wafer, and a diffraction grating which has a blazed cross-sectional shape is formed on the Si wafer.

摘要翻译： 通过使用相移掩模形成非对称图案的技术，以及制造衍射光栅和半导体器件的技术，能够提高产品的精度并能缩短制造时间。 在通过使用相移掩模（其中周期性地布置有遮光部分和透光部分）制造衍射光栅的方法中，从照明光源发射的光透射穿过相移掩模，并且光致抗蚀剂在 通过提供由通过该相移掩模的透射产生的零衍射级光和正的第一衍射级光之间的干涉而暴露于Si晶片的表面到Si晶片的表面上的衍射光栅和具有闪耀十字 在Si晶片上形成截面形状。

公开(公告)号：US08934092B2

公开(公告)日：2015-01-13

申请号：US13838460

申请日：2013-03-15

申请人： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

发明人： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC分类号： G01N21/00 ,  G01N21/88

CPC分类号： G01N21/9501 ,  G01N2021/4716

摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

摘要翻译： 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US08160352B2

公开(公告)日：2012-04-17

申请号：US12964833

申请日：2010-12-10

申请人： Shigeru Matsui

发明人： Shigeru Matsui

IPC分类号： G06K9/00

CPC分类号： G01N21/8806 ,  G01N21/9501 ,  G01N21/9505

摘要： A surface inspection apparatus capable of acquiring scattered light intensity distribution information for each scattering azimuth angle, and detecting foreign matters and defects with high sensitivity. A concave mirror for condensation and another concave mirror for image formation are used to cope with a broad cubic angle. Since mirrors for condensation and image formation are used, a support for clamping the periphery of a lens is unnecessary, and an effective aperture area does not decrease. A plurality of azimuth-wise detection optical systems is disposed and reflected light at all azimuths can be detected by burying the entire periphery without calling for specific lens polishing. A light signal unification unit sums digital data from a particular system corresponding to a scattering azimuth designated in advance in the systems for improving an S/N ratio.

摘要翻译： 能够获取各散射方位角的散射光强度分布信息，高灵敏度地检测异物和缺陷的表面检查装置。 用于冷凝的凹面镜和用于成像的另一凹面镜用于处理宽的立方角。 由于使用用于冷凝和图像形成的反射镜，所以不需要用于夹持透镜周边的支撑件，并且有效开口面积不会降低。 设置多个方位检测光学系统，并且可以通过掩埋整个周边来检测所有方位角处的反射光，而不需要特定的透镜抛光。 光信号统一单元将来自与用于提高S / N比的系统中预先指定的散射方位相对应的特定系统的数字数据相加。

公开(公告)号：US07973922B2

公开(公告)日：2011-07-05

申请号：US12556144

申请日：2009-09-09

申请人： Shigeru Matsui

发明人： Shigeru Matsui

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/47 ,  G01N2021/8861

摘要： An optical inspection apparatus irradiates a light beam onto the outer surface of an object to be inspected, in the form of an illumination spot having an illumination intensity which is higher in the outer peripheral part of the object to be inspected than in the inner peripheral part thereof while uniformly maintains a temperature rise caused by the irradiation of the light beam, over the outer surface of the object to be inspected, in order to prevent the effective entire signal value of a scattered light signal from lowering, without lowering the linear speed of a movable stage for the object to be inspected in the outer peripheral part of the object to be inspected, thereby it is possible to prevent lowering of the detectability for a foreign matter or a defect, for preventing lowering of inspection throughput.

摘要翻译： 光学检查装置将光束照射到被检查物体的外周部的照明强度比要检查对象的外周部的照明强度高于内周部的照明光斑的形状 同时在被检查物体的外表面上均匀地保持由光束照射引起的温度升高，以防止散射光信号的有效整体信号值降低，而不会降低线性速度 在待检查物体的外周部分中可检测物体的可移动台，从而可以防止异物或缺陷的可检测性的降低，以防止检查吞吐量的降低。

公开(公告)号：US07952701B2

公开(公告)日：2011-05-31

申请号：US12367673

申请日：2009-02-09

申请人： Shigeru Matsui

发明人： Shigeru Matsui

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/8806

摘要： If an illuminance of a measurement spot is limited in order to prevent heat damage on an article to be inspected, since detection sensitivity and a detection speed are in a relation of trade-off, it is difficult to improve one of them without sacrificing the other or to improve both of them. Also, there is a problem that the detection sensitivity is lowered on an outer circumference portion than on an inner circumference portion of the article to be inspected.A plurality of measurement units comprising an illumination optics, a measurement spot, a collection optics, and a light detection optics are provided, inspection results obtained from the plurality of measurement spots are integrated, and light-amount distribution to each measurement spot is controlled according to a scan radial position.

摘要翻译： 如果测量点的照度受到限制，以防止被检查物品的热损伤，由于检测灵敏度和检测速度处于权衡关系，难以改进其中之一而不牺牲其他 或改善两者。 此外，存在检测灵敏度在外周部比被检查物品的内周部低的问题。 提供包括照明光学元件，测量点，收集光学元件和光检测光学元件的多个测量单元，从多个测量点获得的检查结果被整合，并且根据以下测量点控制对每个测量点的光量分布 到扫描径向位置。

公开(公告)号：US20100265494A1

公开(公告)日：2010-10-21

申请号：US12727752

申请日：2010-03-19

申请人： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

发明人： Yoshimasa Oshima ,  Toshiyuki Nakao ,  Shigeru Matsui

IPC分类号： G01N21/88 ,  G01N21/00 ,  G01J3/00

CPC分类号： G01N21/9501 ,  G01N2021/4716

摘要： A surface defect inspection apparatus and method for irradiating a beam multiple times to a same region on a surface of an inspection sample, detecting each scattered light from the same region by detection optical systems individually to produce plural signals, and wherein irradiating the beam includes performing a line illumination of the beam on a line illumination region of the sample surface. The line illumination region is moved in a longitudinal direction at a pitch shorter than a length of the line illumination region in the longitudinal direction.

摘要翻译： 一种表面缺陷检查装置和方法，用于将多个光束照射到检查样品的表面上的相同区域，分别通过检测光学系统检测来自相同区域的每个散射光以产生多个信号，并且其中照射光束包括执行 在样品表面的线照射区域上的光束的线照明。 线照明区域沿纵向方向以比线照明区域的长度方向的长度短的间距移动。

公开(公告)号：US20100253938A1

公开(公告)日：2010-10-07

申请号：US12819528

申请日：2010-06-21

申请人： Shigeru Matsui

发明人： Shigeru Matsui

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/94

摘要： In the conventional contaminant particle/defect inspection method, if the illuminance of the illumination beam is held at not more than a predetermined upper limit value not to give thermal damage to the sample, the detection sensitivity and the inspection speed being in the tradeoff relation with each other, it is very difficult to improve one of the detection sensitivity and the inspection speed without sacrificing the other or improve both at the same time. The invention provides an improved optical inspection method and an improved optical inspection apparatus, in which a pulse laser is used as a light source, and a laser beam flux is split into a plurality of laser beam fluxes which are given different time delay to form a plurality of illumination spots. The scattered light signal from each illumination spot is isolated and detected by using a light emission start timing signal for each illumination spot.

摘要翻译： 在常规污染物颗粒/缺陷检查方法中，如果照明光束的照度被保持在不对样品造成热损伤的预定上限值以下，则检测灵敏度和检查速度与 彼此难以提高检测灵敏度和检测速度之一而不牺牲另一方或同时改善两者。 本发明提供了一种改进的光学检查方法和改进的光学检查装置，其中使用脉冲激光器作为光源，并且激光束通量被分割成多个激光束，其被给予不同的时间延迟以形成 多个照明点。 通过使用每个照明点的发光开始定时信号来隔离并检测来自每个照明点的散射光信号。

公开(公告)号：US07719669B2

公开(公告)日：2010-05-18

申请号：US11776912

申请日：2007-07-12

申请人： Shigeru Matsui ,  Masayuki Hachiya

发明人： Shigeru Matsui ,  Masayuki Hachiya

IPC分类号： G01N21/88

CPC分类号： G01N21/9501 ,  H01L22/12 ,  H01L2924/0002 ,  H01L2924/00

摘要： Light from a light source becomes two illumination beams by a beam splitter. The beams are irradiated onto a semiconductor wafer from two mutually substantially orthogonal azimuthal angles having substantially equal elevation angles to form illumination spots. When the sum of scattered, diffracted, and reflected lights due to the illumination beams is detected, influence of the anisotropy which a contaminant particle and a defect existing in the wafer itself or thereon have with respect to an illumination direction, can be eliminated.

摘要翻译： 来自光源的光由分束器变成两个照明光束。 光束从具有基本相等的仰角的两个相互基本正交的方位角照射到半导体晶片上，以形成照明点。 当检测到由于照明光束引起的散射，衍射和反射光的总和时，可以消除晶片本身或其上存在的污染颗粒和缺陷相对于照明方向的各向异性的影响。

公开(公告)号：US20100020315A1

公开(公告)日：2010-01-28

申请号：US12574185

申请日：2009-10-06

申请人： Takahiro Togashi ,  Shigeru Matsui

发明人： Takahiro Togashi ,  Shigeru Matsui

IPC分类号： G01N21/00

CPC分类号： G01N21/9501 ,  G01N21/94 ,  G01N2021/8861 ,  G01N2021/8874 ,  G01N2021/95676

摘要： A method and equipment which includes an illustrated-spot illumination-distribution data table for storing an illumination distribution within an illustrated spot and which calculates a coordinate position for a particle or a defect and the diameter of the particle on the basis of detection light intensity data about the particle or defect and the illustrated-spot illumination-distribution data table. Thus, even when the illumination distribution within the illustrated spot based on an actual illumination optical system is not a Gaussian distribution, the calculation of the particle diameter of the detected particle or defect and the calculation of a coordinate position on the surface of an object to be inspected can be attained with an increased accuracy.

摘要翻译： 一种方法和设备，其包括用于存储所示斑点内的照明分布的示出点照度分布数据表，并且基于检测光强度数据计算颗粒或缺陷的坐标位置和颗粒的直径 关于颗粒或缺陷以及所示的点光照度分布数据表。 因此，即使在基于实际的照明光学系统的所示光点内的照明分布不是高斯分布的情况下，检测出的粒子或缺陷的粒径的计算以及物体表面上的坐标位置的计算 被检查可以提高准确度。