公开(公告)号：US5751403A

公开(公告)日：1998-05-12

申请号：US471928

申请日：1995-06-06

申请人： Hideo Mizutani ,  Tohru Kawaguchi

发明人： Hideo Mizutani ,  Tohru Kawaguchi

IPC分类号： G03F7/20 ,  G03F9/00 ,  G03B27/42 ,  G01B11/26

CPC分类号： G03F7/70358 ,  G03F9/70

摘要： In the projection exposure apparatus, the alignment mechanism comprises first and second light-sending systems for sending first and second light beams through a projection optical system to the wafer and sending third and fourth light beams to the reticle, a first scanning system for scanning the first and second light beams along first and second scan straight lines included in the surface of wafer, respectively, and setting the first and second scan straight lines in axis symmetry with respect to a reference straight line passing an intersecting point between the first and second scan lines and an intersecting point between the surface of wafer and the optical axis of projection optical system, a second scanning system for scanning the third and fourth light beams along third and fourth scan straight lines included in the surface of reticle, respectively, and first and second light-receiving systems for detecting reflected light of the first and third light beams emergent from the respective surfaces of wafer and reticle, respectively, and detecting reflected light of the second and fourth light beams emergent from the respective surfaces of wafer and reticle, respectively.

摘要翻译： 在投影曝光装置中，对准机构包括用于将第一和第二光束通过投影光学系统发送到晶片并将第三和第四光束发送到光罩的第一和第二发光系统，用于扫描 分别包括在晶片表面中的第一和第二扫描直线的第一和第二光束，并且相对于通过第一和第二扫描之间的相交点的参考直线将第一和第二扫描直线设置为轴对称的第一和第二扫描直线 线和晶片表面与投影光学系统的光轴之间的相交点，第二扫描系统，用于分别沿着包括在掩模版表面中的第三和第四扫描直线扫描第三和第四光束，以及第一和第 用于检测从r出射的第一和第三光束的反射光的第二光接收系统 并且分别检测晶片和掩模版的各个表面，并分别检测第二和第四光束的反射光从晶片和掩模版的各个表面射出。

公开(公告)号：US5587794A

公开(公告)日：1996-12-24

申请号：US239847

申请日：1994-05-09

申请人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

发明人： Hideo Mizutani ,  Naoyuki Kobayashi ,  Nobutaka Magome

IPC分类号： G01B11/26 ,  G01B11/00 ,  G01B11/02 ,  G01C3/06 ,  G03F7/20 ,  G03F7/207 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30

CPC分类号： G03F9/7026 ,  G01B11/026 ,  G03F7/70358

摘要： A surface position detection apparatus includes a projection optical system for projecting pattern light having a predetermined pattern on a detection surface from an oblique direction to the detection surface, an imaging optical system for forming an image of the pattern light reflected by the detection surface, a light-receiving-side light-shield arranged at a position substantially conjugate with the detection surface in the imaging optical system, and having an opening portion with a predetermined shape, a scanner for scanning the pattern image formed by the imaging optical system relative to the light-receiving-side light-shield, and a detection device for the pattern light into a plurality of portions, and selectively detecting at least one such portion of the pattern light.

摘要翻译： 表面位置检测装置包括：投影光学系统，用于将检测表面上具有预定图案的图案光从倾斜方向投射到检测表面;成像光学系统，用于形成由检测表面反射的图案光的图像; 光接收侧光屏配置在与成像光学系统中的检测面基本共轭的位置，具有规定形状的开口部的扫描器，用于扫描由摄像光学系统形成的图案图像相对于 光接收侧光屏蔽和用于将图案光分解为多个部分的检测装置，并且选择性地检测图案光的至少一个部分。

公开(公告)号：US5204535A

公开(公告)日：1993-04-20

申请号：US888828

申请日：1992-05-27

申请人： Hideo Mizutani

发明人： Hideo Mizutani

IPC分类号： G03F9/00

CPC分类号： G03F9/7049

摘要： The device is of the type used for semiconductor exposure apparatus equipped with a projection lens for transferring a pattern, formed on a reticle, onto a substrate with an exposure light. The device is adapted for detecting the position of an alignment mark formed on the substrate. The device includes light irradiation means, detector, an irradiation light correcting optical element and a detection light correcting optical element. The light irradiation means irradiates the alignment mark, through the projection lens, with alignment light having a wavelength different from that of the exposure light. The detector detects, through the projection optical system, light from the alignment mark. The irradiation light correcting optical element is provided between the reticle and the substrate and adapted for deflecting the irradiation optical path so as to correct, by predetermined amount, the longitudinal chromatic aberration and the chromatic aberration of magnification of the projection optical system for the irradiation light. The detection light correcting optical element is provided between said reticle and said substrate and adapted for deflecting the detection optical path toward the peripheral part of an exposure area of said reticle, so as to correct, by a predetermined amount, the chromatic aberration of magnification of the projection optical system for the detection light.

公开(公告)号：US4730900A

公开(公告)日：1988-03-15

申请号：US696085

申请日：1985-01-29

申请人： Makoto Uehara ,  Hideo Mizutani ,  Kiyoyuki Muramatsu ,  Takeshi Asami ,  Akikazu Tanimoto

发明人： Makoto Uehara ,  Hideo Mizutani ,  Kiyoyuki Muramatsu ,  Takeshi Asami ,  Akikazu Tanimoto

IPC分类号： G03B27/34 ,  G02B7/02 ,  G02B7/09 ,  G02B7/28 ,  G02B21/24 ,  G03F7/20 ,  G03F7/207 ,  H01L21/027 ,  H01L21/30 ,  G01J5/00 ,  G02B27/52

CPC分类号： G03F7/70241 ,  G02B21/241 ,  G02B7/028 ,  G03F7/70825 ,  G03F7/70883 ,  G03F7/70891

摘要： A projection optical apparatus comprises illuminating means providing for an illuminating light beam, a projection optical system including optical elements disposed across the illuminating light beam and having an imaging plane, and detecting mean including temperature sensor means provided on at least one of the optical elements and producing an output corresponding to the temperature of the one optical element.

摘要翻译： 投影光学装置包括提供照明光束的照明装置，包括设置在照明光束两侧并具有成像平面的光学元件的投影光学系统，以及包括设置在至少一个光学元件上的温度传感器装置的检测装置， 产生对应于一个光学元件的温度的输出。

公开(公告)号：US4723845A

公开(公告)日：1988-02-09

申请号：US911464

申请日：1986-09-25

申请人： Hideo Mizutani ,  Yutaka Suenaga

发明人： Hideo Mizutani ,  Yutaka Suenaga

IPC分类号： G02B27/18 ,  G02B27/00 ,  G03F9/00 ,  G01B11/27

CPC分类号： G03F9/7023

摘要： An optical apparatus for detecting the position of an object by projecting a light image onto the object through a transparent plate and detecting the reflected light from the object through the transparent plate is disclosed. The projection optical system includes a first objective lens for forming the light image. The optical axis of the projection is disposed inclined to the above-said transparent plate. The detection optical system includes a second objective lens for refocusing the light reflected from the object. The optical axis of the reflection light detection between the second object lens and the object is disposed inclined to the transparent plate. The apparatus further comprises plane parallel optical members mounted obliquely so as to cancel the asymmetric aberrations generated by the above-said transparent plate. One of the aberration-correcting plane parallel optical members is interposed in the projection optical path on the side opposite to the transparent plate relative to the first objective lens. The other one is interposed in the detection optical path on the side opposite to the transparent plate relative to the second objective lens.

摘要翻译： 公开了一种用于通过透明板将光图像投影到物体上并通过透明板检测来自物体的反射光来检测物体的位置的光学装置。 投影光学系统包括用于形成光图像的第一物镜。 突起的光轴与上述透明板倾斜地配置。 检测光学系统包括用于将从物体反射的光重新聚焦的第二物镜。 第二物镜与物体之间的反射光检测的光轴被设置成与透明板倾斜。 该装置还包括倾斜安装的平面平行光学构件，以抵消由上述透明板产生的不对称像差。 像差校正平面平行光学构件中的一个相对于第一物镜插入到与透明板相对的一侧的投影光路中。 另一个相对于第二物镜插入到与透明板相对的一侧的检测光路中。

公开(公告)号：US09152062B2

公开(公告)日：2015-10-06

申请号：US13526428

申请日：2012-06-18

申请人： Tohru Kiuchi ,  Hideo Mizutani

发明人： Tohru Kiuchi ,  Hideo Mizutani

IPC分类号： B29C35/02 ,  G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70791 ,  G03F9/7003

摘要： Presented are methods for forming a predetermined pattern in a predetermined area of an elongated sheet material. The methods include applying a two-dimensional tension to a portion including the predetermined area of the sheet material, and allowing a flat reference surface to adsorb a rear surface portion corresponding to the predetermined area of the sheet material applied with the two-dimensional tension. The methods then illuminate an energy beam corresponding to the pattern to the predetermined area of the sheet material adsorbed to the reference surface.

摘要翻译： 提出了在细长片材的预定区域中形成预定图案的方法。 所述方法包括将二维张力施加到包括片材的预定区域的部分，并且允许平坦的参考表面吸附与施加二维张力的片材的预定区域相对应的后表面部分。 然后，该方法将对应于图案的能量束照射到吸附到参考表面的片材的预定区域。

公开(公告)号：US09113562B2

公开(公告)日：2015-08-18

申请号：US13427330

申请日：2012-03-22

申请人： Hideo Mizutani ,  Toshiyuki Matsui ,  Atsushi Deguchi

发明人： Hideo Mizutani ,  Toshiyuki Matsui ,  Atsushi Deguchi

IPC分类号： H05K3/02 ,  H05K3/10 ,  H05K3/06 ,  H05K3/46

CPC分类号： H05K3/108 ,  H05K3/067 ,  H05K3/4661 ,  H05K2203/0369 ,  H05K2203/0597 ,  H05K2203/122 ,  H05K2203/124 ,  H05K2203/1476 ,  Y10T29/49126 ,  Y10T29/49144 ,  Y10T29/49156 ,  Y10T29/49165

摘要： A manufacturing method for a printed wiring board includes forming an electroless plated film on an interlayer resin insulation layer, forming on the electroless plated film a plating resist with an opening to expose a portion of the electroless plated film, forming an electrolytic plated film on the portion of the electroless plated film exposed through the opening, removing the plating resist using a resist-removing solution containing an amine, reducing a thickness of a portion of the electroless plated film existing between adjacent portions of the electrolytic plated film by using the resist-removing solution, and forming a conductive pattern by removing the portion of the electroless plated film existing between the adjacent portions of the electrolytic plated film by using an etchant.

摘要翻译： 一种印刷电路板的制造方法，包括在层间树脂绝缘层上形成无电解电镀膜，在所述无电解电镀膜上形成具有开口的电镀抗蚀剂，露出所述无电镀膜的一部分，在所述电镀膜上形成电解电镀膜 通过开口露出的无电解电镀膜的一部分，使用含有胺的抗蚀剂去除溶液除去电镀抗蚀剂，通过使用抗蚀剂层，减少存在于电解电镀膜的相邻部分之间的部分无电解电镀膜的厚度， 通过使用蚀刻剂除去存在于电解电镀膜的相邻部分之间的无电解电镀膜的部分，形成导电图案。

公开(公告)号：US08399263B2

公开(公告)日：2013-03-19

申请号：US12551057

申请日：2009-08-31

申请人： Tohru Kiuchi ,  Hideo Mizutani

发明人： Tohru Kiuchi ,  Hideo Mizutani

IPC分类号： H01L21/66

CPC分类号： B41J3/407 ,  B41J11/008 ,  B41J11/42

摘要： An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately.

摘要翻译： 膨胀/收缩测量装置包括：输送部，其沿着基板的表面输送柔性基板; 检测部，其检测形成在所述基板上的第一和第二标记，同时沿着所述基板的输送方向彼此分离预定的间隔距离，并且根据所述基板的输送而移动到所述基板的第一和第二 分别设置在基板的输送路径上的检测区域; 基板长度设定部，其将沿着第一和第二检测区域之间的输送路径的基板的长度设定为基准长度; 以及导出部，其基于第一和第二标记的检测结果，得出关于基板相对于输送方向的伸缩的信息。 因此，可高精度地测量可膨胀/收缩基材的膨胀/收缩状态。

公开(公告)号：US20100105153A1

公开(公告)日：2010-04-29

申请号：US12551057

申请日：2009-08-31

申请人： Tohru Kiuchi ,  Hideo Mizutani

发明人： Tohru Kiuchi ,  Hideo Mizutani

IPC分类号： H01L21/66 ,  G01B11/14

CPC分类号： B41J3/407 ,  B41J11/008 ,  B41J11/42

摘要： An expansion/contraction measuring apparatus includes a transport section which transports a flexible substrate along a surface of the substrate; a detecting section detecting first and second marks which are formed on the substrate while being separated from each other by a predetermined spacing distance in a transport direction of the substrate and which are moved, in accordance with the transport of the substrate, to first and second detection areas disposed on a transport route for the substrate respectively; a substrate length setting section which sets a length of the substrate along the transport route between the first and second detection areas to a reference length; and a deriving section which derives information about expansion/contraction of the substrate in relation to the transport direction based on a detection result of the first and second marks. Accordingly, the expansion/contraction state of an expandable/contractible substrate is measured highly accurately.

摘要翻译： 膨胀/收缩测量装置包括：输送部，其沿着基板的表面输送柔性基板; 检测部，其检测形成在所述基板上的第一和第二标记，同时沿着所述基板的输送方向彼此分离预定的间隔距离，并且根据所述基板的输送而移动到所述基板的第一和第二 分别设置在基板的输送路径上的检测区域; 基板长度设定部，其将沿着第一和第二检测区域之间的输送路径的基板的长度设定为基准长度; 以及导出部，其基于第一和第二标记的检测结果，得出关于基板相对于输送方向的伸缩的信息。 因此，可高精度地测量可膨胀/收缩基材的膨胀/收缩状态。

公开(公告)号：US06321583B1

公开(公告)日：2001-11-27

申请号：US09445846

申请日：1999-12-14

申请人： Toru Ikezaki ,  Takashi Suzuki ,  Takashi Haji ,  Hideo Mizutani

发明人： Toru Ikezaki ,  Takashi Suzuki ,  Takashi Haji ,  Hideo Mizutani

IPC分类号： B21B1310

CPC分类号： B21B1/088 ,  B21B1/0886 ,  B21B13/10 ,  B21B27/028 ,  B21B31/26 ,  B21B2013/106

摘要： There is provided a multifunction rolling mill for rolling an H-beam including: a pair of right and left vertical rollers composed of flange thickness reduction rollers; web thickness reduction horizontal rollers; and a pair of upper and lower horizontal rollers arranged on both sides of the web thickness reduction rollers, having flange width reduction rollers freely moved in the vertical direction by retracting mechanisms. In the case of reduction of flange thickness and web thickness rolling, the flange width reduction rollers of the above horizontal rollers are moved upward and downward so that the flange width reduction rollers of the horizontal rollers do not interfere with the vertical rollers.

摘要翻译： 提供了一种用于滚动H型梁的多功能轧机，包括：一对由法兰厚度减小辊组成的左右垂直辊; 腹板厚度减薄卧式滚筒; 以及一对布置在卷材厚度减小辊的两侧的上下水平辊，具有通过缩回机构在竖直方向上自由移动的凸缘宽度减小辊。 在减小法兰厚度和卷材厚度轧制的情况下，上述水平辊的凸缘宽度减小辊向上和向下移动，使得水平辊的凸缘宽度减小辊不会干扰垂直辊。