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104 条记录 (耗时 0.042 秒)

    Mobile communication device containable in ad hoc network
    41.
    发明授权
    Mobile communication device containable in ad hoc network 失效
    移动通信设备可以在ad hoc网络中包含

    公开(公告)号：US07212514B2

    公开(公告)日：2007-05-01

    申请号：US10535101

    申请日：2004-05-21

    申请人： Kiyomi Sakamoto ,  Atsushi Iisaka ,  Atsushi Yamashita ,  Noboru Nomura

    发明人： Kiyomi Sakamoto ,  Atsushi Iisaka ,  Atsushi Yamashita ,  Noboru Nomura

    IPC分类号： H04Q7/24

    CPC分类号： H04W72/02 ,  H04W72/0406 ,  H04W84/18

    摘要： In a mobile communication device, when an inquiry packet sent from another mobile communication device for inquiring whether to accept or deny the participation in an ad hoc network is transferred to a work area, a transmission/reception control section determines whether or not a denial flag set in a storage device is 1. When the denial flag is 1, the transmission/reception control section generates a first response for denying the participation in the ad hoc network, and transmits the first response through a transmission/reception section to the other mobile communication device that transmitted the inquiry packet.

    摘要翻译： 在移动通信装置中，当从另一个移动通信装置发送的用于询问是否接受或拒绝参与自组织网络的查询分组被传送到工作区域时，发送/接收控制部分确定拒绝标志 设置在存储装置中是1.当拒绝标志为1时，发送/接收控制部分生成拒绝参与自组织网络的第一响应，并且通过发送/接收部分将第一响应发送到另一个移动 通信设备发送查询报文。

    Display device and method for manufacturing the same
    43.
    发明授权
    Display device and method for manufacturing the same 失效
    显示装置及其制造方法

    公开(公告)号：US06985132B2

    公开(公告)日：2006-01-10

    申请号：US09995511

    申请日：2001-11-27

    申请人： Noboru Nomura ,  Tohru Nakagawa ,  Masahiro Nagasawa ,  Tadashi Ootake

    发明人： Noboru Nomura ,  Tohru Nakagawa ,  Masahiro Nagasawa ,  Tadashi Ootake

    IPC分类号： G09G3/34

    CPC分类号： G09F9/372

    摘要： A display device using a cylinder-shaped pixel having a large dipole moment and high response speed and a method for manufacturing the same. In the display device, an organic film is bonded and fixed to a part of or an entire surface of a base material having a volume of less than 1 cm3 via —A—O— bond, where A denotes Si, Ge, Sn, Ti or Zr, or via —A—N— bond, where A denotes Si, Ge, Sn, Ti or Zr, in the former, the side of O is bonded to the substrate and in the latter, the side of N is bonded to the substrate; the surface region of the base material is divided into two regions in accordance with the kind of organic films or the presence or absence of the organic film, and each of the two regions accounting for 40% or more and 60% or less of the surface area of the base material, a plurality of charged substances in different charged states or with opposite polarities in the two regions. The plurality of charged substances are dipped in liquid between a pair of substrates each having an electrode, and voltage is applied to the electrode, thereby enabling the charged substances to be rotated.

    摘要翻译： 使用具有大偶极矩和高响应速度的圆柱形像素的显示装置及其制造方法。 在显示装置中，有机膜通过-AO键键合并固定在体积小于1cm 3的基材的一部分或整个表面上，其中A表示Si ，Ge，Sn，Ti或Zr，或通过-AN-键，其中A表示Si，Ge，Sn，Ti或Zr，在前者中，O的一面与基底结合，而在后者中， N结合到基底上; 基材的表面区域根据有机膜的种类或有机膜的有无分为两个区域，两个区域中的每一个占表面积的40％以上且60％以下 基底材料的面积，在两个区域中具有不同充电状态或具有相反极性的多个带电物质。 将多个带电物质浸渍在各自具有电极的一对基板之间的液体中，并且向电极施加电压，从而使带电物质能够旋转。

    Actuator having organic molecular layers
    44.
    发明授权
    Actuator having organic molecular layers 失效
    具有有机分子层的致动器

    公开(公告)号：US06891309B2

    公开(公告)日：2005-05-10

    申请号：US10445610

    申请日：2003-05-27

    申请人： Noboru Nomura ,  Ichiro Yamashita ,  Norihisa Mino ,  Tohru Nakagawa

    发明人： Noboru Nomura ,  Ichiro Yamashita ,  Norihisa Mino ,  Tohru Nakagawa

    IPC分类号： H02N1/00

    CPC分类号： H02N1/004 ,  Y10T29/49226

    摘要： A novel structure comprising two substrates disposed closely each other, in which an organic molecular layer is formed on the surface of at least one substrate wherein the gap between the surface of the organic molecular layer on one substrate and the surface of the other substrate or the surface of the organic molecular layer on the other substrate is maintained to be usually less than 100 μm, preferably less than 1 μm is provided. A motor, actuator, and vibration-absorbing table comprising such structure are also provided.

    摘要翻译： 一种新颖的结构，包括彼此紧密相邻的两个基板，其中在至少一个基板的表面上形成有机分子层，其中一个基板上的有机分子层的表面与另一个基板的表面之间的间隙或 将另一基板上的有机分子层的表面保持通常小于100μm，优选小于1μm。 还提供了包括这种结构的电动机，致动器和减振台。

    Plasma source for etching
    47.
    发明授权
    Plasma source for etching 失效
    用于蚀刻的等离子体源

    公开(公告)号：US5593539A

    公开(公告)日：1997-01-14

    申请号：US224960

    申请日：1994-04-08

    申请人： Masafumi Kubota ,  Noboru Nomura ,  Tokuhiko Tamaki

    发明人： Masafumi Kubota ,  Noboru Nomura ,  Tokuhiko Tamaki

    IPC分类号： H01J37/32 ,  B44C1/22

    CPC分类号： H01J37/32091 ,  H01J37/32155 ,  H01J37/32165

    摘要： An apparatus for generating plasma is disclosed. The apparatus comprises: a plasma chamber; pairs of parallel plate electrodes; and a power supply for applying high-frequency powers on the pairs of electrodes. The frequencies of the high-frequency powers and the phase difference between the high-frequency powers are adjusted so as to cause each of electrons in the plasma to move in a circular path. A dense and highly uniform plasma is generated at a low pressure level, by utilizing the phenomenon of the oscillation, revolution or cycloidal motion of electrons in a high-frequency electric field formed between the parallel plate electrodes. This plasma is suitable for etching in the LSI fabrication process.

    摘要翻译： 公开了一种用于产生等离子体的装置。 该装置包括：等离子体室; 成对平行板电极; 以及用于在所述电极对上施加高频功率的电源。 调整高频功率的频率和高频功率之间的相位差，使得等离子体中的每个电子以圆形路径移动。 通过利用形成在平行板电极之间的高频电场中的电子的振荡，旋转或摆线运动的现象，在低压水平下产生致密且高度均匀的等离子体。 该等离子体适用于LSI制造工艺中的蚀刻。

    Plasma source for etching
    48.
    发明授权
    Plasma source for etching 失效
    用于蚀刻的等离子体源

    公开(公告)号：US5330606A

    公开(公告)日：1994-07-19

    申请号：US805864

    申请日：1991-12-10

    申请人： Masafumi Kubota ,  Noboru Nomura ,  Tokuhiko Tamaki

    发明人： Masafumi Kubota ,  Noboru Nomura ,  Tokuhiko Tamaki

    IPC分类号： H01J37/32 ,  H01L21/00

    CPC分类号： H01J37/32091 ,  H01J37/32155 ,  H01J37/32165

    摘要： An apparatus for generating plasma is disclosed. The apparatus comprises: a plasma chamber; pairs of parallel plate electrodes; and a power supply for applying high-frequency powers on the pairs of electrodes. The frequencies of the high-frequency powers and the phase difference between the high-frequency powers are adjusted so as to cause each of electrons in the plasma to move in a circular path. A dense and highly uniform plasma is generated at a low pressure level, by utilizing the phenomenon of the oscillation, revolution or cycloidal motion of electrons in a high-frequency electric field formed between the parallel plate electrodes. This plasma is suitable for etching in the LSI fabrication process.

    摘要翻译： 公开了一种用于产生等离子体的装置。 该装置包括：等离子体室; 成对平行板电极; 以及用于在所述电极对上施加高频功率的电源。 调整高频功率的频率和高频功率之间的相位差，使得等离子体中的每个电子以圆形路径移动。 通过利用在平行板电极之间形成的高频电场中的电子的振荡，旋转或摆线运动的现象，在低压水平下产生致密且高度均匀的等离子体。 该等离子体适用于在LSI制造工艺中的蚀刻。

    Evaluation method of resist coating
    49.
    发明授权
    Evaluation method of resist coating 失效
    抗蚀剂涂层的评价方法

    公开(公告)号：US5252414A

    公开(公告)日：1993-10-12

    申请号：US747619

    申请日：1991-08-20

    申请人： Kazuhiro Yamashita ,  Hironao Iwai ,  Noboru Nomura

    发明人： Kazuhiro Yamashita ,  Hironao Iwai ,  Noboru Nomura

    IPC分类号： G03F7/16 ,  G03F7/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30 ,  H01L21/66 ,  G03F9/00

    CPC分类号： G03F7/70633 ,  G03F7/0035 ,  G03F7/20

    摘要： A method for evaluating a resist coating comprising the steps of: forming a first layer resist pattern including an alignment mark by applying a first resist on a semiconductor substrate and by exposing and developing said first resist, said first layer resist pattern having a ridge portion; irradiating said first layer resist pattern with a deep ultraviolet ray; applying, onto said irradiated first layer resist pattern, a second resist having substantially the same refractive index as said first resist to form a second resist coating; detecting said alignment mark formed in said first layer resist pattern, and relatively positioning a pattern for said second resist and said first layer resist pattern; and determining nonuniformity characteristics of said second resist coating by measuring an overlay accuracy between said first layer resist pattern and said pattern for said second resist. The present invention ensures a quantitative evaluation in a non-contact manner for non-uniformity of a resist coating, and enables a resist coating method to be optimized.

    摘要翻译： 一种抗蚀剂涂层评价方法，其特征在于，包括以下步骤：通过在半导体衬底上施加第一抗蚀剂，通过曝光和显影所述第一抗蚀剂，形成包括对准标记的第一层抗蚀剂图案，所述第一层抗蚀剂图案具有脊部; 用深紫外线照射所述第一层抗蚀剂图案; 在所述照射的第一层抗蚀剂图案上施加具有与所述第一抗蚀剂基本相同的折射率的第二抗蚀剂，以形成第二抗蚀剂涂层; 检测形成在所述第一层抗蚀剂图案中的所述对准标记，并且相对地定位所述第二抗蚀剂和所述第一层抗蚀剂图案的图案; 以及通过测量所述第一层抗蚀剂图案和所述第二抗蚀剂的所述图案之间的覆盖精度来确定所述第二抗蚀剂涂层的不均匀性。 本发明确保以非接触方式对抗蚀剂涂层的不均匀性进行定量评价，并且能够优化抗蚀剂涂布方法。