Light emitting device using nitride semiconductor and fabrication method of the same
    42.
    发明申请
    Light emitting device using nitride semiconductor and fabrication method of the same 有权
    使用氮化物半导体的发光器件及其制造方法

    公开(公告)号:US20050236631A1

    公开(公告)日:2005-10-27

    申请号:US10517819

    申请日:2004-06-21

    申请人: Suk Lee

    发明人: Suk Lee

    CPC分类号: H01L33/32 H01L33/04 H01L33/12

    摘要: A nitride based 3-5 group compound semiconductor light emitting device comprising: a substrate; a buffer layer formed above the substrate; a first In-doped GaN layer formed above the buffer layer; an InxGa1-xN/InyGa1-yN super lattice structure layer formed above the first In-doped GaN layer; a first electrode contact layer formed above the InxGa1-xN/InyGa1-yN super lattice structure layer; an active layer formed above the first electrode contact layer and functioning to emit light; a second In-doped GaN layer; a GaN layer formed above the second In-doped GaN layer; and a second electrode contact layer formed above the GaN layer. The present invention can reduce crystal defects of the nitride based 3-5 group compound semiconductor light emitting device and improve the crystallinity of a GaN GaN based single crystal layer in order to improve the performance of the light emitting device and ensure the reliability thereof.

    摘要翻译: 一种基于氮化物的3-5组化合物半导体发光器件,包括:衬底; 形成在所述衬底上的缓冲层; 在缓冲层上形成的第一In掺杂GaN层; 在一个实施方案中,在一个或多个第二实施方案中, N超晶格结构层,形成在第一In掺杂GaN层之上; 形成在第一电极接触层之上的第一电极接触层,其中,第一电极接触层形成在第一和第二 1-y N超晶格结构层; 形成在所述第一电极接触层之上并用于发光的有源层; 第二In掺杂GaN层; 在第二In掺杂GaN层上形成的GaN层; 以及形成在GaN层上方的第二电极接触层。 本发明可以减少氮化物基3-5族化合物半导体发光器件的晶体缺陷,并提高GaN GaN单晶层的结晶度,以提高发光器件的性能并确保其可靠性。

    Nitride semiconductor led and fabrication method thereof
    43.
    发明申请
    Nitride semiconductor led and fabrication method thereof 失效
    氮化物半导体LED及其制造方法

    公开(公告)号:US20050230688A1

    公开(公告)日:2005-10-20

    申请号:US10517818

    申请日:2003-08-19

    申请人: Suk Lee

    发明人: Suk Lee

    摘要: Disclosed a nitride semiconductor LED including: a substrate; a GaN-based buffer layer formed on the substrate; AlyGa1-yN/GaN short period superlattice (SPS) layers formed on the GaN-based buffer layer in a sandwich structure of upper and lower parts having an undoped GaN layer or an indium-doped GaN layer interposed therebetween (Here, 0≦y≦1); a first electrode layer of an n-GaN layer formed on the upper AlyGa1-yN/GaN SPS layer; an active layer formed on the first electrode layer; and a second electrode layer of a p-GaN layer formed on the active layer.

    摘要翻译: 公开了一种氮化物半导体LED,包括:基板; 形成在所述基板上的GaN系缓冲层; 在具有未掺杂的上部和下部的夹层结构的GaN基缓冲层上形成的Al x Ga 1-y N / GaN短周期超晶格(SPS)层 GaN层或铟掺杂的GaN层(这里,0 <= y <= 1); 形成在上部Al y Ga 1-y N / GaN SPS层上的n-GaN层的第一电极层; 形成在所述第一电极层上的有源层; 以及形成在有源层上的p-GaN层的第二电极层。