公开(公告)号：US20070056008A1

公开(公告)日：2007-03-08

申请号：US10569541

申请日：2004-08-25

申请人： Satoru Nagamoto ,  Takao Yamaguchi ,  Ikuo Ohta ,  Naruhiko Nihira ,  Shoichi Izaki ,  Takahito Iida

发明人： Satoru Nagamoto ,  Takao Yamaguchi ,  Ikuo Ohta ,  Naruhiko Nihira ,  Shoichi Izaki ,  Takahito Iida

IPC分类号： H04N7/173 ,  H04N7/16

CPC分类号： H04H20/40 ,  H04H20/16 ,  H04H20/28 ,  H04H20/86 ,  H04H60/25 ,  H04H60/73

摘要： An updating system able to easily and cheaply update the content of a music database in a terminal having a music database, including (i) a transmission apparatus 20 including a transmission use music database 21 for storing music database information comprised of identification information and corresponding music information and a broadcast function unit 23 for broadcasting the music database information from the database 21 multiplexed on a broadcast wave and (ii) a terminal 30 including a reception function unit 33 for receiving the broadcast wave from the broadcast function unit 23, an extraction function unit 34 for extracting the music database information from the received broadcast wave, and an update function unit 32 for storing the extracted music database information in the reception side music database.

摘要翻译： 一种能够容易且便宜地更新具有音乐数据库的终端中的音乐数据库的内容的更新系统，包括：（i）包括用于存储由识别信息和相应音乐组成的音乐数据库信息的传输使用音乐数据库21的发送装置20 信息和广播功能单元23，用于从广播波上复用的数据库21广播音乐数据库信息;以及（ii）包括用于从广播功能单元23接收广播波的接收功能单元33的终端30，提取功能 用于从接收到的广播波提取音乐数据库信息的单元34，以及用于将所提取的音乐数据库信息存储在接收侧音乐数据库中的更新功能单元32。

公开(公告)号：US20060258117A1

公开(公告)日：2006-11-16

申请号：US11487968

申请日：2006-07-18

申请人： Takeshi Yamashita ,  Takao Yamaguchi ,  Hideo Niko

发明人： Takeshi Yamashita ,  Takao Yamaguchi ,  Hideo Niko

IPC分类号： H01L21/76

CPC分类号： H01L21/67069 ,  H01J37/32 ,  H01J37/32706 ,  H01J2237/334 ,  H01L21/02057 ,  H01L21/02071 ,  H01L21/02238 ,  H01L21/02252 ,  H01L21/02255 ,  H01L21/3065 ,  H01L21/31662 ,  H01L21/32137 ,  H01L21/76232

摘要： When etching is performed with respect to a silicon-containing material by using a dry etching apparatus having a dual power source, the application of bias power is initiated before oxidization proceeds at a surface of the silicon-containing material. Specifically, the application of the bias power is initiated before the application of source power is initiated. Alternatively, the source power and the bias power are applied such that the effective value of the source power reaches a second predetermined value after the effective value of the bias power reaches a first predetermined value.

摘要翻译： 当使用具有双电源的干蚀刻装置对含硅材料进行蚀刻时，在含硅材料的表面进行氧化之前开始施加偏压功率。 具体地说，在启动源功率的应用之前启动偏置功率的应用。 或者，施加源功率和偏置功率，使得在偏置功率的有效值达到第一预定值之后，源功率的有效值达到第二预定值。

公开(公告)号：US07119020B2

公开(公告)日：2006-10-10

申请号：US10720197

申请日：2003-11-25

申请人： Hideaki Okamura ,  Takao Yamaguchi ,  Tomoyuki Sasaki

发明人： Hideaki Okamura ,  Takao Yamaguchi ,  Tomoyuki Sasaki

IPC分类号： H01L21/302 ,  H01L21/461

CPC分类号： H01L21/0274 ,  H01L21/31144

摘要： A silicon oxide film is formed on a semiconductor substrate made of silicon. Subsequently, a resist film containing carbon is formed on the silicon oxide film, and thereafter the formed resist film is patterned, thereby forming a resist pattern. Subsequently, the resist pattern is exposed to a sulfur dioxide gas, and then dry etching is performed on the silicon oxide film by using the resist pattern exposed to the sulfur dioxide gas as a mask.

摘要翻译： 在由硅制成的半导体衬底上形成氧化硅膜。 随后，在氧化硅膜上形成含有碳的抗蚀剂膜，然后对所形成的抗蚀剂膜进行图案化，从而形成抗蚀剂图案。 随后，将抗蚀剂图案暴露于二氧化硫气体，然后通过使用暴露于二氧化硫气体的抗蚀剂图案作为掩模对氧化硅膜进行干法蚀刻。

公开(公告)号：US07019817B2

公开(公告)日：2006-03-28

申请号：US10884989

申请日：2004-07-07

申请人： Yasuhiko Hashimoto ,  Yasuo Hirooka ,  Takao Yamaguchi ,  Hiroshi Kanda

发明人： Yasuhiko Hashimoto ,  Yasuo Hirooka ,  Takao Yamaguchi ,  Hiroshi Kanda

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03B27/58

摘要： The angular position of a notch (17) is determined on the basis of data provided by second notch detectors (24a) and (24b) and an encoder (25). A controller (38) turns a rotational arm (22) for angular displacement such that holders (26) and (27) are displaced in a circumferential direction B from the notch (17), and then the holders (26) and (27) hold a wafer (19). Since the holders (26) and (27) are in touch with edges in which the notch (17) is not formed, the first notch detector (23) is able to detect the notch (17) without difficulty. Thus the position of the wafer (19) relative to the rotational arm (22) does not need to be changed several times depending on positions at which the holders (26) and (27) hold the wafer (19), which is necessary in the prior technology. The aligner (20) touches parts, not including the notch (17), of the wafer (19) and is capable of adjusting the position of the wafer (19) in a short time.

摘要翻译： 基于由第二陷波检测器（24a）和（24b）和编码器（25）提供的数据确定凹口（17）的角位置。 控制器（38）转动用于角位移的旋转臂（22），使得保持器（26）和（27）从凹口（17）沿圆周方向B移位，然后保持器（26）和（27） 握住晶片（19）。 由于保持器（26）和（27）与未形成切口（17）的边缘接触，所以第一切口检测器（23）能够毫无困难地检测凹口（17）。 因此，根据保持器（26）和（27）保持晶片（19）的位置，晶片（19）相对于旋转臂（22）的位置不需要改变几次，这是在 先前的技术。 对准器（20）接触不包括晶片（19）的凹口（17）的部分，并且能够在短时间内调节晶片（19）的位置。

公开(公告)号：US20050262347A1

公开(公告)日：2005-11-24

申请号：US10521789

申请日：2003-10-21

申请人： Yuji Sato ,  Takao Yamaguchi ,  Junichi Sato ,  Ichiro Takei ,  Tomoaki Itoh

发明人： Yuji Sato ,  Takao Yamaguchi ,  Junichi Sato ,  Ichiro Takei ,  Tomoaki Itoh

IPC分类号： G06F21/22 ,  G06F21/00 ,  G09C1/00 ,  G09C5/00 ,  H04L9/00

CPC分类号： G06F21/16 ,  G06F21/125

摘要： The present invention generates watermark from ID information that uniquely identifies a program distribution destination, inserts the generated watermark in a program, and prevents the program from operating correctly if the watermark is tampered with, and also inserts the same watermark verification code in a program regardless of the distribution destination. By this means, it is possible to prevent detection of watermark verification code constituting a watermark by means of collusion attack.

摘要翻译： 本发明从唯一地识别节目分发目的地的ID信息生成水印，将生成的水印插入到节目中，并且如果水印被篡改则防止程序正常地操作，并且在程序中插入相同的水印验证码不管 的分销目的地。 通过这种方式，可以通过串通攻击来防止构成水印的水印验证码的检测。

公开(公告)号：US06965604B1

公开(公告)日：2005-11-15

申请号：US09869664

申请日：2000-10-27

申请人： Junichi Sato ,  Takao Yamaguchi ,  Tomoaki Itoh ,  Hiroshi Arakawa

发明人： Junichi Sato ,  Takao Yamaguchi ,  Tomoaki Itoh ,  Hiroshi Arakawa

IPC分类号： H04L12/26 ,  H04L12/28 ,  H04L12/66 ,  H04L12/801 ,  H04L12/853 ,  H04L29/08

CPC分类号： H04L47/10 ,  H04L12/2898 ,  H04L12/66 ,  H04L43/0882 ,  H04L47/11 ,  H04L47/2416 ,  H04L47/29 ,  H04L67/2823 ,  H04L67/2828 ,  H04L67/2871 ,  H04L67/325 ,  H04L69/329

摘要： An improved information transmission method is provided for use in a communication network. The information transmission method combines a bandwidth control technique with a caching technique, thereby making it possible to use allocated bandwidth in an efficient manner.

摘要翻译： 提供了一种用于通信网络的改进的信息传输方法。 信息传输方法将带宽控制技术与缓存技术相结合，从而可以有效地使用分配的带宽。

公开(公告)号：US20050170848A1

公开(公告)日：2005-08-04

申请号：US10507365

申请日：2003-10-07

申请人： Junichi Sato ,  Takao Yamaguchi ,  Hiroyuki Tada ,  Koji Taniguchi ,  Ichiro Takei

发明人： Junichi Sato ,  Takao Yamaguchi ,  Hiroyuki Tada ,  Koji Taniguchi ,  Ichiro Takei

IPC分类号： H04M3/42 ,  H04L12/28 ,  H04M11/00 ,  H04W4/02 ,  H04W24/00 ,  H04Q7/20

CPC分类号： H04W4/02 ,  H04W24/00

摘要： In the present invention, with respect to content that is predicted to be referred to after moving based on a current position, moving direction and/or moving speed of a terminal apparatus, the terminal apparatus inquires of a communication information area managing section whether a position associated with the content is in a communication area, and when the position is outside the communication area, selects at least one communication section with communication-capable channel quality, and acquires and stores the content predicted to be referred to using the selected communication section. It is thereby possible to refer to the content when a position in response to the content predicted to be referred to is outside a communication-capable area.

摘要翻译： 在本发明中，对于根据终端装置的当前位置，移动方向和/或移动速度进行移动后的预测内容，终端装置向通信信息区域管理部查询是否位置 与该内容相关联的通信区域在通信区域中，当该位置在通信区域外时，选择具有通信质量的至少一个通信部，并且获取并存储使用所选择的通信部来预测的参照内容。 因此，当响应于预测要被引用的内容的位置在通信能力范围之外时，可以参考内容。

公开(公告)号：US20050054123A1

公开(公告)日：2005-03-10

申请号：US10858402

申请日：2004-06-02

申请人： Takeshi Yamashita ,  Takao Yamaguchi

发明人： Takeshi Yamashita ,  Takao Yamaguchi

IPC分类号： H01L21/3065 ,  C23F1/00 ,  G03F7/20 ,  H01J37/32 ,  H01L21/00 ,  H01L21/66

CPC分类号： G03F7/70608 ,  H01J37/32935

摘要： A mask layer and a to-be-processed layer are irradiated with light to measure interference light formed of reflected lights from the mask layer and reflected lights from the to-be-processed layer. Thereafter, an interference component brought by the mask layer is removed from the waveform of the measured interference light, thereby calculating the waveform of the interference light brought by the to-be-processed layer. The thickness of the remaining to-be-processed layer is determined on the basis of the calculated waveform of the interference light and the thickness of the remaining to-be-processed layer is compared with a desired thickness thereof. In this way, an end point of processing on the to-be-processed layer is detected.

摘要翻译： 用光照射掩模层和待处理层，以测量由掩模层反射的光和来自待处理层的反射光形成的干涉光。 然后，从测定的干涉光的波形中除去由掩模层带来的干涉成分，计算被处理层带来的干涉光的波形。 基于干涉光的计算波形确定剩余待处理层的厚度，并将剩余待处理层的厚度与其期望厚度进行比较。 以这种方式，检测待处理层的处理终点。

公开(公告)号：US06830341B2

公开(公告)日：2004-12-14

申请号：US10423442

申请日：2003-04-25

申请人： Koichi Ejiri ,  Takao Yamaguchi ,  Shin Aoki ,  Haike Guan

发明人： Koichi Ejiri ,  Takao Yamaguchi ,  Shin Aoki ,  Haike Guan

IPC分类号： G03B2100

CPC分类号： H04N9/317 ,  G03B21/14 ,  H04N5/74 ,  H04N9/3185 ,  H04N17/04

摘要： A projector is often positioned so that its optical axis is at an imperfect orthogonal angle with respect to a projection screen. This position causes a keystone distortion as well as imperfect focus in the projected image. To correct these undesirable problems, initially, a lens and/or an image-forming plate is independently repositioned to bring the projected image into focus based upon user input data. The keystone distortion is also corrected by redrawing the image on an image-forming surface based upon additional user input data.

摘要翻译： 投影仪通常被定位成使得其光轴相对于投影屏幕处于不正确的正交角度。 该位置会导致梯形失真以及投影图像中的不完全对焦。 为了纠正这些不期望的问题，首先，透镜和/或图像形成板被独立地重新定位，以基于用户输入数据使投影图像成为焦点。 梯形失真还通过基于附加用户输入数据重绘图像形成表面上的图像来校正。

公开(公告)号：US06767322B1

公开(公告)日：2004-07-27

申请号：US09588704

申请日：2000-06-06

申请人： Yasuyuki Futatsugi ,  Masakazu Higuma ,  Yosuke Yoshimoto ,  Ichiro Nakamura ,  Takao Yamaguchi ,  Takeaki Nakamura ,  Takahiro Kishi ,  Yasuhito Kura ,  Jun Hiroya

发明人： Yasuyuki Futatsugi ,  Masakazu Higuma ,  Yosuke Yoshimoto ,  Ichiro Nakamura ,  Takao Yamaguchi ,  Takeaki Nakamura ,  Takahiro Kishi ,  Yasuhito Kura ,  Jun Hiroya

IPC分类号： A61F105

CPC分类号： G02B7/008 ,  A61B1/00096 ,  A61B1/00188 ,  G02B23/243 ,  G02B23/2461

摘要： A cover glass frame as a second frame body mounting thereto a cover glass is fitted onto an objective lens frame, which is a first frame body mounting thereto a tip end lens and an objective lens as optical members, in a manner to be movable in a direction of optical axis, and is fixed after having been adjusted in position in the direction of optical axis. The objective lens frame and the cover glass frame thus fitted and fixed are fitted into and joined to a cylindrical member to constitute an imaging unit, which is then arranged in a tip end portion of an insertion part of an endoscope. Thereby, focus adjustment can be performed on the optical members, which are assembled into the imaging unit, and a tip end side portion of the insertion part of the endoscope can be made small in outer diameter to prevent entry of vapor into the imaging unit even when autoclave sterilization is carried out.

摘要翻译： 将作为安装在其上的玻璃罩的第二框体的玻璃框架安装在物镜框架上，该物镜框架以可移动的方式安装在作为光学构件的顶端透镜和物镜上的第一框架体 光轴的方向，并且在沿光轴方向调整位置之后被固定。 这样安装和固定的物镜框架和盖玻璃框架装配到圆柱形构件中并连接到圆柱形构件上，以构成成像单元，该成像单元然后被布置在内窥镜的插入部分的末端部分中。 由此，可以对组装到摄像单元中的光学构件进行聚焦调节，并且可以使内窥镜的插入部的前端侧部分的外径小，以防止蒸气进入成像单元甚至 当进行高压灭菌时。