摘要:
According to the present invention, in a coating treatment apparatus comprising a rotary holding member and a coating solution discharge member, positional adjustment of the holding position of the substrate with respect to the rotary holding member and a discharge position of a coating solution discharge member is quickly and accurately performed, so that the time required for the positional adjustment can be shortened. Further, variations in accuracy of the positional adjustment depending on the degree of proficiency of operator can be eliminated, realizing positional adjustment with a high precision at all times.
摘要:
A dye composition for keratinous fibers which contains a coupler and a developer are disclosed. The present coupler component is a novel 2-alkoxy-3,5-diaminopyridine derivatives of the formula (1): ##STR1## wherein R1 and R2 are the same or different from each other and independently represent a hydrogen atom, a lower alkanoyl group or a lower alkyl group which may be substituted by at least one hydroxyl group, and R3 is a lower alkyl group which may be substituted by at least one hydroxyl group, or a salt thereof; provided that R1 and R2 are not both a hydrogen atom or an acetyl group at the same time. The present 2-alkoxy-3,5-diaminopyridine derivatives are useful as couplers in dye compositions, and are capable of dyeing keratinous fibers such as hair in a bright blue color with excellent dyeability. Dye compositions containing the present compounds as a coupler show excellent resistance to discoloration, excellent resistance to shampooing and excellent resistance to friction.
摘要:
In a method of producing a keto acid having the general formula ##STR1## wherein R.sup.1 and R.sup.2 independently represent an alkyl of 1-6 carbons or a cycloalkyl of 4-8 carbons, by reacting an m-aminophenol having the general formula ##STR2## wherein R.sup.1 and R.sup.2 are the same as above, with phthalic anhydride, in an organic solvent, the improvement comprising effecting the reaction in an amount of the organic solvent which is insufficient to dissolve the keto acid produced in the reaction, so that at least a portion of the resultant keto acid crystallizes out of the solvent and allowing the reaction to proceed in a heterogeneous system.
摘要:
Disclosed is a composition for polyurethane resins which is ordinarily of two-package type and curable at ambient temperature and which comprises an isocyanate component having oxadiazinetrione ring as a curing agent and a polyol component, having in the molecule, at least one of a tertiary amino group, a quaternary ammonium group and a salt-formed carboxyl group as a main component. The composition has excellent curability and provides cured products excellent in adhesiveness and physical properties.
摘要:
Glass bottles, suitable as containers for drinks, such as beer and fruit juice, are coated with a single layer of a thermally cured material formed of a powdery composition comprising a mixture of (i) a blocked organic polyisocyanate and (ii) a hydrolyzed ethylene-vinyl ester copolymer and/or a carboxyl-modified version of said hydrolyzed copolymer. The coated bottles are highly effective in the prevention of scattering of glass fragments in the event of breakage and excellent in clarity, alkali resistance, abrasion resistance, scratch resistance and weathering quality.
摘要:
A pattern forming system 1 includes a checking apparatus 400 and a control section 500. The checking apparatus 400 is configured to measure and check a sidewall angle SWA of a resist pattern formed on a substrate W after a developing process. The control section 500 is configured to use a difference between a target value of the sidewall angle SWA of the resist pattern after the developing process and a check result of the sidewall angle SWA obtained by the checking apparatus 400, to set a process condition for a first heat process 71 to 74 or a second heat process 84 to 89 so as to cause the sidewall angle SWA to approximate the target value thereof after the developing process.
摘要:
In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the film on the substrate is exposed to zero-order light and higher order light of the light source transmitted, and then developed to reduce a second portion of the film on the substrate. Thereafter, the film thicknesses of the first portion and the second portion are measured, and the measured film thicknesses of the first portion and the second portion are converted into line widths of a resist pattern by previously obtained correlations between the film thicknesses and the line widths. The converted line width of the second portion is then subtracted from the converted line width of the first portion, whereby the line width depending only on the focus component is calculated. Based on the line width, a new focus condition is set.