Position adjusting method and substrate processing system
    41.
    发明申请
    Position adjusting method and substrate processing system 审中-公开
    位置调整方法和基板处理系统

    公开(公告)号:US20050150451A1

    公开(公告)日:2005-07-14

    申请号:US11029401

    申请日:2005-01-06

    摘要: According to the present invention, in a coating treatment apparatus comprising a rotary holding member and a coating solution discharge member, positional adjustment of the holding position of the substrate with respect to the rotary holding member and a discharge position of a coating solution discharge member is quickly and accurately performed, so that the time required for the positional adjustment can be shortened. Further, variations in accuracy of the positional adjustment depending on the degree of proficiency of operator can be eliminated, realizing positional adjustment with a high precision at all times.

    摘要翻译: 根据本发明,在包括旋转保持构件和涂布液排出构件的涂布处理装置中,基板相对于旋转保持构件的保持位置和涂布液排出构件的排出位置的位置调整是 快速且准确地执行,从而可以缩短位置调整所需的时间。 此外,可以消除根据操作者的熟练程度的位置调整的精度的变化,始终以高精度实现位置调整。

    Method of producing keto acids
    45.
    发明授权
    Method of producing keto acids 失效
    生产酮酸的方法

    公开(公告)号:US5371285A

    公开(公告)日:1994-12-06

    申请号:US38283

    申请日:1993-03-29

    IPC分类号: C07C227/02 C07C229/00

    CPC分类号: C07C227/02

    摘要: In a method of producing a keto acid having the general formula ##STR1## wherein R.sup.1 and R.sup.2 independently represent an alkyl of 1-6 carbons or a cycloalkyl of 4-8 carbons, by reacting an m-aminophenol having the general formula ##STR2## wherein R.sup.1 and R.sup.2 are the same as above, with phthalic anhydride, in an organic solvent, the improvement comprising effecting the reaction in an amount of the organic solvent which is insufficient to dissolve the keto acid produced in the reaction, so that at least a portion of the resultant keto acid crystallizes out of the solvent and allowing the reaction to proceed in a heterogeneous system.

    摘要翻译: 在制备具有通式“IMAGE”的酮酸的方法中,其中R1和R2独立地表示1-6个碳原子的烷基或4-8个碳的环烷基,通过使通式为“IMAGE”的间氨基苯酚, 其中R1和R2与上述相同,在邻苯二甲酸酐中,在有机溶剂中,其改进包括使一定量的有机溶剂的反应不足以溶解在反应中产生的酮酸,使得至少一种 所得酮酸的一部分从溶剂中结晶并使反应在异相体系中进行。

    Coated glass bottles
    48.
    发明授权
    Coated glass bottles 失效
    涂层玻璃瓶

    公开(公告)号:US4099638A

    公开(公告)日:1978-07-11

    申请号:US775642

    申请日:1977-03-07

    摘要: Glass bottles, suitable as containers for drinks, such as beer and fruit juice, are coated with a single layer of a thermally cured material formed of a powdery composition comprising a mixture of (i) a blocked organic polyisocyanate and (ii) a hydrolyzed ethylene-vinyl ester copolymer and/or a carboxyl-modified version of said hydrolyzed copolymer. The coated bottles are highly effective in the prevention of scattering of glass fragments in the event of breakage and excellent in clarity, alkali resistance, abrasion resistance, scratch resistance and weathering quality.

    摘要翻译: 适合作为饮料容器(例如啤酒和果汁)的玻璃瓶涂有单层热固化材料,其由粉末状组合物形成,该组合物包含(i)封闭的有机多异氰酸酯和(ii)水解乙烯 - 乙烯基酯共聚物和/或所述水解共聚物的羧基改性形式。 涂覆的瓶子在破裂的情况下防止玻璃碎片的散射非常有效,并且透明度,耐碱性,耐磨性,耐划伤性和耐候性优异。

    Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium
    50.
    发明授权
    Method of setting focus condition at time of exposure, apparatus for setting focus condition at time of exposure, program, and computer readable recording medium 失效
    在曝光时设定对焦条件的方法,曝光时设定对焦条件的设备,程序和计算机可读记录介质

    公开(公告)号:US07643126B2

    公开(公告)日:2010-01-05

    申请号:US11362126

    申请日:2006-02-27

    IPC分类号: G03B27/42

    CPC分类号: G03F7/70641 Y10S430/136

    摘要: In the present invention, in the photolithography process in which a certain focus condition has been already set, a film on a substrate is exposed to only zero-order light of a light source transmitted, and then developed to reduce a first portion of the film on the substrate. Further, the film on the substrate is exposed to zero-order light and higher order light of the light source transmitted, and then developed to reduce a second portion of the film on the substrate. Thereafter, the film thicknesses of the first portion and the second portion are measured, and the measured film thicknesses of the first portion and the second portion are converted into line widths of a resist pattern by previously obtained correlations between the film thicknesses and the line widths. The converted line width of the second portion is then subtracted from the converted line width of the first portion, whereby the line width depending only on the focus component is calculated. Based on the line width, a new focus condition is set.

    摘要翻译: 在本发明中,在已经设定了一定的聚焦条件的光刻工艺中,基板上的膜仅暴露于透过的光源的零级光,然后显影以减小膜的第一部分 在基板上。 此外,将基板上的膜暴露于光源的零级光和较高阶光,然后显影以减少基板上的膜的第二部分。 此后,测量第一部分和第二部分的膜厚度,并且通过预先获得的膜厚度和线宽度之间的相关性,将测量的第一部分和第二部分的膜厚度转换为抗蚀剂图案的线宽度 。 然后从第一部分的转换线宽中减去第二部分的转换线宽,由此计算仅依赖于聚焦分量的线宽。 根据线宽,设置新的对焦条件。