Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit
    1.
    发明申请
    Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit 有权
    线宽测量方法,基板处理方法,基板处理装置和基板冷却处理单元

    公开(公告)号:US20050141891A1

    公开(公告)日:2005-06-30

    申请号:US11013784

    申请日:2004-12-17

    CPC分类号: G03F7/705 G03F7/70625

    摘要: In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the resist film are measured. Based on the measured values, calculation is performed to obtain calculated light intensity distributions of reflected light reflected from a plurality of virtual patterns. The calculated light intensity distributions are stored, and their library is created. The substrate for which the refractive index and so on are measured is irradiated with light, and the light intensity distribution of its reflected light is measured. The light intensity distribution is collated with the calculated light intensity distributions in the library, so that the line width of the virtual pattern having a matching light intensity distribution is regarded as the line width of the real pattern. Since the library of the light intensity distributions of the virtual pattern is created based on the actually measured refractive index and so on after the formation of the pattern, an accurate line width matching the pattern state at the time of measuring the line width is measured.

    摘要翻译: 在使用散射测量技术进行的光线宽度测量中,本发明比现有技术更准确地测量在衬底上形成的线宽。 在基板上的抗蚀剂膜中形成预定图案之后,测量抗蚀剂膜的折射率和消光系数。 基于测量值,执行计算以获得从多个虚拟图案反射的反射光的计算的光强度分布。 存储计算的光强度分布,并创建它们的库。 用光照射测定折射率等的基板,测定其反射光的光强度分布。 将光强度分布与库中计算的光强度分布进行比较,使得具有匹配的光强度分布的虚拟图案的线宽被视为实曲线的线宽。 由于在形成图案之后,基于实际测量的折射率等创建虚拟图案的光强度分布的库,因此测量与测量线宽度时的图案状态匹配的精确线宽。

    Position adjusting method and substrate processing system
    2.
    发明申请
    Position adjusting method and substrate processing system 审中-公开
    位置调整方法和基板处理系统

    公开(公告)号:US20050150451A1

    公开(公告)日:2005-07-14

    申请号:US11029401

    申请日:2005-01-06

    摘要: According to the present invention, in a coating treatment apparatus comprising a rotary holding member and a coating solution discharge member, positional adjustment of the holding position of the substrate with respect to the rotary holding member and a discharge position of a coating solution discharge member is quickly and accurately performed, so that the time required for the positional adjustment can be shortened. Further, variations in accuracy of the positional adjustment depending on the degree of proficiency of operator can be eliminated, realizing positional adjustment with a high precision at all times.

    摘要翻译: 根据本发明,在包括旋转保持构件和涂布液排出构件的涂布处理装置中,基板相对于旋转保持构件的保持位置和涂布液排出构件的排出位置的位置调整是 快速且准确地执行,从而可以缩短位置调整所需的时间。 此外,可以消除根据操作者的熟练程度的位置调整的精度的变化,始终以高精度实现位置调整。

    Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit
    3.
    发明授权
    Line width measuring method, substrate processing method, substrate processing apparatus and substrate cooling processing unit 有权
    线宽测量方法,基板处理方法,基板处理装置和基板冷却处理单元

    公开(公告)号:US07375831B2

    公开(公告)日:2008-05-20

    申请号:US11013784

    申请日:2004-12-17

    IPC分类号: G01B11/02

    CPC分类号: G03F7/705 G03F7/70625

    摘要: In optical line width measurement performed using the scatterometry technique, the present invention measures the line width formed on a substrate more accurately than in the prior art. After a predetermined pattern is formed in a resist film on a substrate, the refractive index and the extinction coefficient of the resist film are measured. Based on the measured values, calculation is performed to obtain calculated light intensity distributions of reflected light reflected from a plurality of virtual patterns. The calculated light intensity distributions are stored, and their library is created. The substrate for which the refractive index and so on are measured is irradiated with light, and the light intensity distribution of its reflected light is measured. The light intensity distribution is collated with the calculated light intensity distributions in the library, so that the line width of the virtual pattern having a matching light intensity distribution is regarded as the line width of the real pattern. Since the library of the light intensity distributions of the virtual pattern is created based on the actually measured refractive index and so on after the formation of the pattern, an accurate line width matching the pattern state at the time of measuring the line width is measured.

    摘要翻译: 在使用散射测量技术进行的光线宽度测量中,本发明比现有技术更准确地测量在衬底上形成的线宽。 在基板上的抗蚀剂膜中形成预定图案之后,测量抗蚀剂膜的折射率和消光系数。 基于测量值,执行计算以获得从多个虚拟图案反射的反射光的计算的光强度分布。 存储计算的光强度分布,并创建它们的库。 用光照射测定折射率等的基板,测定其反射光的光强度分布。 将光强度分布与库中计算的光强度分布进行比较,使得具有匹配的光强度分布的虚拟图案的线宽被视为实曲线的线宽。 由于在形成图案之后,基于实际测量的折射率等创建虚拟图案的光强度分布的库,因此测量与测量线宽度时的图案状态匹配的精确线宽。

    Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same
    4.
    发明授权
    Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same 有权
    热处理装置,热处理方法和存储执行其的计算机程序的记录介质

    公开(公告)号:US07947215B2

    公开(公告)日:2011-05-24

    申请号:US12788981

    申请日:2010-05-27

    IPC分类号: B05C11/00

    CPC分类号: C21D9/00 C21D9/0056 C21D11/00

    摘要: An experiment is conducted in advance, for finding a temperature of a cooling plate attained as a result of balancing between a temperature of a substrate after heat treatment and a temperature of the cooling plate at the time of cooling of the substrate. Then, before heat treatment of a first substrate, the cooling plate is moved to a position above a hot plate, the cooling plate is heated to that temperature, and thereafter heat treatment of the substrate is started.

    摘要翻译: 预先进行实验,以获得由于热处理后的基板的温度与冷却基板之间的冷却板的温度之间的平衡而获得的冷却板的温度。 然后,在热处理第一基板之前,将冷却板移动到加热板上方的位置,将冷却板加热至该温度,然后开始对基板进行热处理。

    Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same
    5.
    发明授权
    Heat treatment apparatus, heat treatment method, and recording medium storing computer program carrying out the same 有权
    热处理装置,热处理方法和存储执行其的计算机程序的记录介质

    公开(公告)号:US07745347B2

    公开(公告)日:2010-06-29

    申请号:US11734424

    申请日:2007-04-12

    IPC分类号: C21D11/00

    CPC分类号: C21D9/00 C21D9/0056 C21D11/00

    摘要: An experiment is conducted in advance, for finding a temperature of a cooling plate attained as a result of balancing between a temperature of a substrate after heat treatment and a temperature of the cooling plate at the time of cooling of the substrate. Then, before heat treatment of a first substrate, the cooling plate is moved to a position above a hot plate, the cooling plate is heated to that temperature, and thereafter heat treatment of the substrate is started.

    摘要翻译: 预先进行实验,以获得由于热处理后的基板的温度与冷却基板之间的冷却板的温度之间的平衡而获得的冷却板的温度。 然后,在热处理第一基板之前,将冷却板移动到加热板上方的位置,将冷却板加热至该温度,然后开始对基板进行热处理。

    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same
    8.
    发明授权
    Mask for light exposure and method for manufacturing liquid crystal display apparatus employing same 有权
    用于曝光的掩模和用于制造使用该液晶显示装置的方法

    公开(公告)号:US07067764B2

    公开(公告)日:2006-06-27

    申请号:US10676132

    申请日:2003-10-02

    摘要: Light exposure areas 103 and light masking areas 104 in a sole reticle are arrayed in alternation to one another in both the longitudinal and transverse directions. Substrate is exposed to light by multi-domain light exposure using this reticle so that the respective areas of the reticle exposed to light with respective shots A to B, B to C . . . , N to M are not adjacent to one another in the boundary portions of the reticle shifted for executing the respective shots, thus relaxing the difference in illuminance between the respective shots and the difference in finish of the boundary portions of the shots, such differences becoming imperceptible to human eyes upon displaying liquid crystal display apparatus.

    摘要翻译: 单个光罩中的曝光区域103和遮光区域104在纵向和横向方向彼此交替地排列。 通过使用该掩模版的多畴光曝光将基板曝光,使得光掩模的各个区域暴露于相应的照射A至B,B至C。 。 。 在分隔板的边界部分中,N到M彼此不相邻,用于执行各个镜头,从而缓和各镜头之间的照度差和镜头边界部分的完成差异,这些差异变成 在显示液晶显示装置时人眼难以察觉。

    Digital multiplex transmission system
    10.
    发明授权
    Digital multiplex transmission system 失效
    数字多路传输系统

    公开(公告)号:US5506903A

    公开(公告)日:1996-04-09

    申请号:US223217

    申请日:1994-04-05

    申请人: Masami Yamashita

    发明人: Masami Yamashita

    摘要: A digital multiplex transmission system wherein the rate of convolution codes can be changed over in accordance with an object of a user without changing the transmission rate. A frame for transmitting system data, first preliminary data, second preliminary data, scramble control data, audio data, video data and Reed-Solomon codes is constructed by allocation of them such that a boundary between each adjacent region may make a vertical straight line. Data of such a frame are coded by convolution coding and then transmitted. When the transmission line is in a deteriorated condition, the rate of the convolution codes is reduced to increase the correcting faculty for the convolution codes. In contrast, when the transmission line is in a good condition, the rate of the convolution codes is increased to transmit a large amount of data.

    摘要翻译: 一种数字多路复用传输系统,其中可以根据用户的对象在不改变传输速率的情况下改变卷积码的速率。 通过分配它们来构建用于发送系统数据,第一初步数据,第二初步数据,加扰控制数据,音频数据,视频数据和里德 - 所罗门码的帧,使得每个相邻区域之间的边界可以形成垂直的直线。 这样的帧的数据通过卷积编码进行编码,然后发送。 当传输线处于恶化状态时,卷积码的速率减小,以增加卷积码的校正系统。 相反,当传输线处于良好状态时,卷积码的速率增加以传送大量的数据。