公开(公告)号：US5485272A

公开(公告)日：1996-01-16

申请号：US247933

申请日：1994-05-24

申请人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

发明人： Peter Dirksen ,  Manfred G. Tenner ,  Jan E. van der Werf

IPC分类号： G01B9/02 ,  G02F1/33 ,  G02F2/02 ,  G03F9/00 ,  G11B7/135 ,  H01S5/00

CPC分类号： G03F9/7049 ,  G02F1/33

摘要： A radiation-source unit is described which produces a radiation beam (30) with two components (9, 10) which are polarized perpendicularly relative to one another and which have different frequencies. The unit comprises a radiation source, a beam splitter (4), an acousto-optical modulation system (13, 18) for generating the frequency difference, and a beam combiner (25). Since the beam splitter and the beam combiner are transmission elements and their connecting line extends through the center of the modulation system the unit is compact and no alignment problems occur. Moreover, the frequency difference is adjustable over a wide range.

摘要翻译： 描述了辐射源单元，其产生具有彼此垂直偏振且具有不同频率的两个分量（9,10）的辐射束（30）。 该单元包括辐射源，分束器（4），用于产生频率差的声光调制系统（13,18）和光束组合器（25）。 由于分束器和光束组合器是传输元件，并且其连接线延伸穿过调制系统的中心，所以该单元是紧凑的，并且不会发生对准问题。 此外，频率差可在宽范围内调节。

公开(公告)号：US08401513B2

公开(公告)日：2013-03-19

申请号：US12828482

申请日：2010-07-01

申请人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

发明人： Geert Langereis ,  Twan van Lippen ,  Peter Dirksen ,  Frank Pasveer

IPC分类号： H04M9/00

CPC分类号： H04R19/005 ,  G01S15/06 ,  G01S15/876 ,  H03K17/94 ,  H03K2217/94005 ,  H04M1/6016 ,  H04M1/72569 ,  H04R19/04 ,  H04R2400/01

摘要： Proximity sensor, particularly for usage in an electronic mobile device, comprising at least one acoustic transducer adapted for receiving acoustic signals at least in parts of the frequency range of human audible sound and emitting and/or receiving ultrasonic signals for proximity estimation. The acoustic transducer preferably is a Micro-Electro-Mechanical-Systems (MEMS) microphone. Further, a method in an electronic device comprising an acoustic transducer is provided comprising the steps of generating at least one electric signal in the frequency range of ultrasonic sound, emitting at least one ultrasonic signal by means of the acoustic transducer; receiving at least one ultrasonic signal by means of the acoustic transducer; deducing from the at least one emitted ultrasonic signal and the at least one received ultrasonic signal at least the delay between emission of the emitted ultrasonic signal and reception of the corresponding ultrasonic signal.

摘要翻译： 特别是用于电子移动设备的接近传感器，包括至少一个声学传感器，适于在至少部分人类可听见的声音的频率范围内接收声学信号，并发射和/或接收用于邻近估计的超声波信号。 声换能器优选地是微机电系统（MEMS）麦克风。 此外，提供了一种包括声换能器的电子设备中的方法，包括以下步骤：在超声波的频率范围内产生至少一个电信号，借助于声换能器发射至少一个超声波信号; 通过声换能器接收至少一个超声波信号; 从所述至少一个发射的超声波信号和所述至少一个接收到的超声波信号中减去所发射的超声信号的发射与对应的超声波信号的接收之间的延迟。

公开(公告)号：USRE42849E1

公开(公告)日：2011-10-18

申请号：US12153717

申请日：2008-05-22

申请人： Paulus Cornelis Duineveld ,  Peter Dirksen ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

发明人： Paulus Cornelis Duineveld ,  Peter Dirksen ,  Aleksey Yurievich Kolesnychenko ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus includes a voltage generator or power source that applies a potential difference to an object in contact with the immersion liquid such that bubbles and/or particles in the immersion liquid are either attracted or repelled from that object due to the electrokinetic potential of the surface of the bubble in the immersion liquid.

摘要翻译： 浸没式光刻设备包括电压发生器或电源，该电压发生器或电源对与浸入液体接触的物体施加电位差，使得浸没液体中的气泡和/或颗粒被吸引或排斥于该物体，这是由于电动势 浸泡液中的气泡表面。

公开(公告)号：US20110156863A1

公开(公告)日：2011-06-30

申请号：US13059432

申请日：2009-08-14

申请人： Peter Dirksen ,  Willem Franke Pasveer

发明人： Peter Dirksen ,  Willem Franke Pasveer

IPC分类号： G06F7/04

CPC分类号： G08C23/02 ,  G07C1/10 ,  G07C9/00111 ,  G07C2009/00801 ,  G08C17/02 ,  G08C2201/20 ,  G08C2201/91 ,  G08C2201/93

摘要： First apparatuses (10) such as tags and batches comprise receivers (11) for receiving ultrasonic signals (1) comprising first codes from sources (27, 30), analyzers (12) for analyzing first codes, transmitters (13) for transmitting electromagnetic signals (2) comprising second codes to second apparatuses (20), and controllers (14) for, in response to analyses of first codes, controlling at least parts of the first apparatuses (10), such as modes, transmissions, and supplies of second codes. Second apparatuses (20) such as parts of interfaces and parts of stations comprise receivers (21) for receiving the electromagnetic signals (2) comprising second codes from the first apparatuses (10), analyzers (22) for analyzing second codes, and generators (23) for, in response to analyses of second codes, generating parameter signals (5) defining issues like registration issues and authorization issues and environmental issues, and analysis results. The first apparatuses (10) may form part of first devices (100) such as mobile phones and organizers, and the second apparatuses (20) may form part of second devices (200) such as interfaces and stations.

摘要翻译： 诸如标签和批次的第一设备（10）包括用于接收包括来自源（27,30）的第一代码的超声信号（1）的接收器（11），用于分析第一代码的分析器（12），用于发送电磁信号的发射器 （2）包括第二代码到第二设备（20），以及控制器（14），用于响应于第一代码的分析，控制第一设备（10）的至少一部分，诸如模式，传输和第二 代码。 诸如接口部分和站部分的第二装置（20）包括用于接收包括来自第一装置（10）的第二代码的电磁信号（2），用于分析第二代码的分析器（22）和发电机 23）为了响应第二代码的分析，产生定义诸如注册问题和授权问题以及环境问题之类的问题的参数信号（5）和分析结果。 第一设备（10）可以形成诸如移动电话和组织者的第一设备（100）的一部分，并且第二设备（20）可以形成诸如接口和站之类的第二设备（200）的一部分。

公开(公告)号：US20110101243A1

公开(公告)日：2011-05-05

申请号：US12999639

申请日：2009-06-23

申请人： Reinhold Wimberger-Friedl ,  Peter Dirksen ,  Marius Iosif Boamfa ,  Erik Martinus Hubertus Petrus Van Dijk

发明人： Reinhold Wimberger-Friedl ,  Peter Dirksen ,  Marius Iosif Boamfa ,  Erik Martinus Hubertus Petrus Van Dijk

IPC分类号： G01N21/64

CPC分类号： G01N21/6452 ,  B01L3/5027 ,  G02B21/0028

摘要： A system and method is described for detecting a plurality of analytes in a sample. The characterization system (100) comprises an aperture array (108) and a lens array (110) for generating and focusing a plurality of excitation sub-beams on different sub-regions of a substrate. These sub-regions can be provided with different binding sites for binding different analytes in the sample. By detecting the different luminescent responses in a detector, the presence or amount of different analytes can be determined simultaneously. Alternatively or in addition thereto collection of the luminescence radiation can be performed using the lens array for directly collecting the luminescence response and for guiding the collected luminescence response to corresponding apertures. In a preferred embodiment, the excitation sub-beams are focused at the side of the substrate opposite of the lens array and an immersion fluid is provided between the lens array and the substrate to increase the collection efficiency of the luminescence radiation.

摘要翻译： 描述了用于检测样品中多个分析物的系统和方法。 表征系统（100）包括孔径阵列（108）和透镜阵列（110），用于在衬底的不同子区域上产生和聚焦多个激励子束。 这些子区域可以具有不同的结合位点，用于结合样品中的不同分析物。 通过检测检测器中的不同发光响应，可以同时测定不同分析物的存在或量。 或者或另外，可以使用透镜阵列来进行发光辐射的收集，用于直接收集发光响应并且用于将所收集的发光响应引导到相应的孔。 在优选实施例中，激发子光束在与透镜阵列相对的一侧聚焦，并且在透镜阵列和基板之间提供浸没流体，以增加发光辐射的收集效率。

公开(公告)号：US20080226152A1

公开(公告)日：2008-09-18

申请号：US10598035

申请日：2005-02-08

申请人： Peter Dirksen ,  Augustus Josephus Elizabeth Maria Janssen ,  Josephus Johannes Maria Braat ,  Adriaan Leeuwestein

发明人： Peter Dirksen ,  Augustus Josephus Elizabeth Maria Janssen ,  Josephus Johannes Maria Braat ,  Adriaan Leeuwestein

IPC分类号： G06K9/00

CPC分类号： G03F7/70608 ,  G03F7/706

摘要： The invention relates to a method of determining a parameter relating to image blur in an imaging system (IS) comprising the step of illuminating an object having a test pattern (MTP) by means of the imaging system (IS), thereby forming an image of the test pattern. The test pattern (MTP) has a size smaller than the resolution of the imaging system (IS), which makes the image of the test pattern independent of illuminator aberrations. The test pattern (MTP) is an isolated pattern, which causes the image to be free of optical proximity effects. The image is blurred due to stochastic fluctuations in the imaging system and/or in the detector detecting the blurred image. The parameter relating to the image blur is determined from a parameter relating to the shape of the blurred image. According to the invention, resist diffusion and/or focus noise may be characterized. In the method of designing a mask, the parameter relating to the image blur due to diffusion in the resist is taken into account. The computer program according to the invention is able to execute the step of determining the parameter relating to the image blur from a parameter relating to a shape of the blurred image.

摘要翻译： 本发明涉及一种确定与成像系统（IS）中的图像模糊相关的参数的方法，包括通过成像系统（IS）照亮具有测试图案（MTP）的对象的步骤，从而形成图像 测试模式。 测试图案（MTP）的尺寸小于成像系统（IS）的分辨率，这使得测试图案的图像与照明器像差无关。 测试图案（MTP）是一种孤立的图案，使图像无光学邻近效应。 图像由于成像系统中的随机波动和/或检测模糊图像的检测器而模糊。 根据与模糊图像的形状相关的参数确定与图像模糊有关的参数。 根据本发明，可以表征抗蚀剂扩散和/或聚焦噪声。 在设计掩模的方法中，考虑与抗蚀剂中的扩散引起的图像模糊有关的参数。 根据本发明的计算机程序能够执行从与模糊图像的形状相关的参数确定与图像模糊有关的参数的步骤。

公开(公告)号：US07230674B2

公开(公告)日：2007-06-12

申请号：US11373503

申请日：2006-03-13

申请人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

发明人： Mark Kroon ,  Michael Cornelis Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra May Owen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/72

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a fluid cleaning system that cleans a fluid to be introduced into a region in between the optical element and the substrate. The fluid cleaning system includes a fluid inlet, a fluid outlet, and a cleaning zone disposed between the inlet and outlet. The cleaning zone includes a nucleated surface provided with a plurality of nucleation sites.

摘要翻译： 光刻设备包括提供辐射束的辐射系统和支撑图案化结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括光学元件，该光学元件具有通过图案化光束通过的每一个的光束出射区域。 该装置还包括清洁被引入到光学元件和基板之间的区域中的流体的流体清洁系统。 流体清洁系统包括流体入口，流体出口和布置在入口和出口之间的清洁区域。 清洁区包括具有多个成核位点的成核表面。

公开(公告)号：US20060215140A1

公开(公告)日：2006-09-28

申请号：US10540067

申请日：2003-12-18

申请人： Peter Dirksen ,  Casparus Antonius Juffermans

发明人： Peter Dirksen ,  Casparus Antonius Juffermans

IPC分类号： G03B27/72

CPC分类号： G03F7/706 ,  G03F7/7025 ,  G03F7/7085

摘要： The performance of an illumination system in, for example, a lithographic projection apparatus can be measured accurately and reliably by means of a test object (55) comprising at least one Fresnel zone lens (30) and an associated reference mark, preferably a ring (40). By superposed imaging of these and detecting and evaluating the composed image (56), telecentricity errors and aberrations of the illumination can be measured.

摘要翻译： 可以通过包括至少一个菲涅耳区透镜（30）和相关联的参考标记的测试对象（55）来精确和可靠地测量例如光刻投影设备中的照明系统的性能，优选为环（ 40）。 通过这些的叠加成像和检测和评估合成图像（56），可以测量照明的远心误差和像差。

公开(公告)号：US06960764B2

公开(公告)日：2005-11-01

申请号：US10482200

申请日：2002-07-19

申请人： Peter Dirksen ,  Rene Johan Gerrit Elfrink ,  Casparus Anthonius Henricus Juffermans

发明人： Peter Dirksen ,  Rene Johan Gerrit Elfrink ,  Casparus Anthonius Henricus Juffermans

IPC分类号： G01N23/225 ,  H01J37/04 ,  H01J37/21 ,  H01J37/22 ,  H01J37/26 ,  H01J37/28 ,  H01L21/027 ,  H01L21/66 ,  G01N23/00 ,  G21K7/00

CPC分类号： H01J37/28 ,  H01J37/263 ,  H01J2237/2823

摘要： The performance of a scanning electron microscope (SEM) (10) is determined by scanning, with this SEM, porous silicon surface areas (PSF, PSC) each having a different average pore size, calculating the Fourier transform spectra (Fc) of the images of the surface areas and extrapolating the resolution (R) at a zero signal-to-noise ratio (SNR) from the width (W(1/e)), the signal amplitude (Sa) and the noise offset (NL) of the spectra. A test sample provided with the different surface areas is obtained by anodizing a silicon substrate (Su) at a constant electric current, while continuously decreasing the substrate area exposed to the etching electrolyte (El).

摘要翻译： 通过扫描来确定扫描电子显微镜（SEM）（10）的性能，通过扫描，各SEM都具有多孔硅表面积（PS，PSC） 计算表面积的图像的傅立叶变换光谱（F ），并将分辨率（R）从宽度的零信噪比（SNR）外推出来， （W（1 / e）），信号振幅（Sa）和噪声偏移（NL）。 通过以恒定的电流阳极氧化硅衬底（Su），同时连续地减小暴露于蚀刻电解质（E1）的衬底区域，获得具有不同表面积的测试样品。

公开(公告)号：US20050140956A1

公开(公告)日：2005-06-30

申请号：US10748751

申请日：2003-12-31

申请人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

发明人： Mark Kroon ,  Michael Van Beek ,  Peter Dirksen ,  Ralph Kurt ,  Cassandra Owen

IPC分类号： G03F7/20 ,  G03B27/72

CPC分类号： G03F7/70983 ,  G03F7/70808 ,  G03F7/70916 ,  G03F7/70933

摘要： A lithographic apparatus is disclosed. The apparatus includes a radiation system that provides a beam of radiation, and a support structure that supports a patterning structure. The patterning structure is configured to pattern the beam of radiation according to a desired pattern. The apparatus also includes a substrate support that supports a substrate, and a projection system that projects the patterned beam onto a target portion of the substrate. The projection system includes an optical element that has a beam entry area and an optical element that has a beam exit area through each of which the patterned beam passes. The apparatus further includes a nucleated surface that is associated with the projection system on which a plurality of nucleation sites are provided. The surface is disposed away from at least one of the beam entry area and the beam exit area.

摘要翻译： 公开了一种光刻设备。 该装置包括提供辐射束的辐射系统和支撑图形结构的支撑结构。 图形结构被配置为根据期望的图案对辐射束进行图案化。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 投影系统包括具有光束入射区域的光学元件和具有通过图案化光束通过的每一个的光束出射区域的光学元件。 该装置还包括与投影系统相关联的成核表面，其上设置有多个成核位置。 表面远离光束入射区域和光束出射区域中的至少一个设置。