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    METHOD FOR GENERATING A CERAMIC LAYER ON A COMPONENT
    42.
    发明申请
    METHOD FOR GENERATING A CERAMIC LAYER ON A COMPONENT 审中-公开
    在组件上产生陶瓷层的方法

    公开(公告)号：US20100215869A1

    公开(公告)日：2010-08-26

    申请号：US12666823

    申请日：2008-06-13

    申请人： Jens Dahl Jensen ,  Ursus Krüger ,  Daniel Körtvelyessy ,  Ralph Reiche ,  Gabriele Winkler

    发明人： Jens Dahl Jensen ,  Ursus Krüger ,  Daniel Körtvelyessy ,  Ralph Reiche ,  Gabriele Winkler

    IPC分类号： B05D3/06 ,  B05C9/12

    CPC分类号： H05B6/80 ,  B82Y30/00 ,  C23C18/12 ,  C23C18/1208 ,  C23C18/127 ,  C23C18/1283 ,  C23C18/14 ,  F26B3/347

    摘要： In a process for producing a ceramic layer (14) on a component (15) in a microwave oven (11), it is provided that a microwave generator (12) generates microwaves (17) of a defined frequency which selectively heats only constituents of the coating material (14) applied for coating the component (15). It is thereby advantageously possible to produce a ceramic layer from the precursors present in the coating material with low energy consumption and with low thermal loading of the component (15). The frequency of the microwave excitation can be set, for example, to the solvent (acetic acid, propionic acid) present in the coating material or to the heating of particles of intermetallic compounds or ceramics present in the coating material for this purpose.

    摘要翻译： 在微波炉（11）中在部件（15）上制造陶瓷层（14）的方法中，微波发生器（12）产生一定频率的微波（17），该微波产生器仅选择性地仅加热 涂覆材料（14）用于涂覆组分（15）。 因此，有利的是，可以从存在于涂料中的前体以低能量消耗和组件（15）的低热负荷产生陶瓷层。 微波激发的频率可以设定为例如存在于涂料中的溶剂（乙酸，丙酸）或为了此目的而加热存在于涂料中的金属间化合物或陶瓷的颗粒。

    Process for the plasma cleaning of a component
    43.
    发明授权
    Process for the plasma cleaning of a component 有权
    用于等离子体清洗组件的方法

    公开(公告)号：US07513955B2

    公开(公告)日：2009-04-07

    申请号：US10591512

    申请日：2005-02-09

    申请人： Ursus Krüger ,  Ralph Reiche ,  Jan Steinbach

    发明人： Ursus Krüger ,  Ralph Reiche ,  Jan Steinbach

    IPC分类号： B08B3/12 ,  B08B6/00 ,  B08B7/00 ,  B08B7/02

    CPC分类号： B08B7/00 ,  C23G5/00

    摘要： Cracks are conventionally difficult to clean which often leads to damage to other regions of the component for cleaning. According to the invention, a plasma cleaning method is used, whereby a pressure and/or a separation of an electrode to the component are varied, in order to achieve a plasma cleaning in the crack.

    摘要翻译： 通常难以清理裂纹，这通常会导致对组件其他区域的损坏进行清洁。 根据本发明，使用等离子体清洗方法，从而改变电极对部件的压力和/或分离，以便在裂纹中实现等离子体清洁。

    Method for determining the position of an electrochemically machined channel
    49.
    发明申请
    Method for determining the position of an electrochemically machined channel 审中-公开
    用于确定电化学加工的通道的位置的方法

    公开(公告)号：US20060249396A1

    公开(公告)日：2006-11-09

    申请号：US11364735

    申请日：2006-02-28

    申请人： Rene Jabado ,  Ursus Kruger ,  Daniel Kortvelyessy ,  Ralph Reiche ,  Michael Rindler

    发明人： Rene Jabado ,  Ursus Kruger ,  Daniel Kortvelyessy ,  Ralph Reiche ,  Michael Rindler

    IPC分类号： B23H3/02

    CPC分类号： B23H9/16 ,  B23H3/00 ,  B23H3/02 ,  B23H7/265

    摘要： The invention provides a method for determining the position of a channel which has been electrochemically machined in a workpiece by an electrolyte and/or the wall thickness which is present between the electrochemically machined channel and the surface of the component, in which magnetic particles are added to the electrolyte used during the machining, the magnetic fields associated with the magnetic particles are detected, and the position of the electrochemically machined channel and/or the wall thickness which is present between the electrochemically machined channel and the surface of the component is determined on the basis of the detected magnetic fields.

    摘要翻译： 本发明提供一种用于确定通过电解质在工件中进行电化学加工的通道的位置和/或存在于电化学加工的通道与部件的表面之间的壁厚的方法，其中添加了磁性颗粒 对于在加工期间使用的电解质，检测与磁性颗粒相关联的磁场，并且在电化学加工的通道和部件的表面之间存在电化学加工的通道的位置和/或壁厚确定在 检测磁场的基础。