利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

47 条记录 (耗时 0.03 秒)

    Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture
    41.
    发明授权
    Negative-working radiation-sensitive mixture, and radiation-sensitive recording material produced with this mixture 失效
    负面工作的辐射敏感混合物和用该混合物生产的辐射敏感记录材料

    公开(公告)号：US6063545A

    公开(公告)日：2000-05-16

    申请号：US871032

    申请日：1992-04-20

    申请人： Horst Roeschert ,  Juergen Fuchs ,  Walter Spiess ,  Charlotte Eckes ,  Georg Pawlowski ,  Ralph Dammel

    发明人： Horst Roeschert ,  Juergen Fuchs ,  Walter Spiess ,  Charlotte Eckes ,  Georg Pawlowski ,  Ralph Dammel

    IPC分类号： G03F7/00 ,  C07C303/28 ,  C07C309/65 ,  C07C309/66 ,  C07C309/73 ,  G03F7/004 ,  G03F7/028 ,  G03F7/038 ,  H01L21/027 ,  G03C1/73

    CPC分类号： G03F7/038 ,  C07C303/28 ,  Y10S430/122

    摘要： A negative-working radiation-sensitive mixture containinga) a compound which generates a strong acid under the action of actinic radiation,b) a compound having at least two groups crosslinkable by means of acid andc) a polymeric binder which is insoluble in water and soluble or at least swellable in aqueous alkaline solutions,wherein the compound (a) comprises a di-, tri- or tetra-hydroxybenzene which may be further substituted, or a polymer containing a di-, tri-, or tetra- hydroxy phenyl radical, is esterified with respectively 2, 3 or 4 sulfonic acids of the formula R--SO.sub.3 H, and is distinguished by high resolution and high sensitivity over a wide spectral range. It also shows high thermal stability and does not form any corrosive photolysis products on exposure. A radiation-sensitive recording material produced with this mixture is suitable for the production of photoresists, electronic components, printing plates or for chemical milling.

    摘要翻译： 一种负性辐射敏感性混合物，其包含a）在光化辐射的作用下产生强酸的化合物，b）具有至少两个可通过酸交联的基团的化合物，和c）不溶于水的聚合物粘合剂 并且在碱性水溶液中可溶或至少可溶胀，其中化合物（a）包含可被进一步取代的二 - ，三 - 或四 - 羟基苯，或含有二 - ，三 - 或四 - 羟基苯基 分别用式R-SO 3 H的2,3或4个磺酸酯化，并且在宽光谱范围内被高分辨率和高灵敏度区分。 它还显示出高的热稳定性，并且在暴露时不会形成任何腐蚀性光解产物。 用该混合物生产的辐射敏感记录材料适用于制备光致抗蚀剂，电子部件，印版或用于化学研磨。

    Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom
    43.
    发明授权
    Negative-working radiation-sensitive mixture containing diazomethane acid generator and a radiation-sensitive recording material produced therfrom 失效
    含有重氮甲烷酸发生器和辐射敏感记录材料的负性辐射敏感混合物

    公开(公告)号：US5424166A

    公开(公告)日：1995-06-13

    申请号：US194307

    申请日：1994-02-04

    申请人： Georg Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Winfried Meier

    发明人： Georg Pawlowski ,  Ralph Dammel ,  Horst Roeschert ,  Walter Spiess ,  Winfried Meier

    IPC分类号： G03F7/004 ,  C07D233/84 ,  G03F7/016 ,  G03F7/038 ,  H01L21/027 ,  G03F7/021

    CPC分类号： G03F7/0163 ,  G03F7/038

    摘要： A negative-working radiation-sensitive mixture which comprisesa) a compound, which forms a strong acid on irradiation, of the general formula ##STR1## in which R.sup.1 is a radical R.sup.2 --SO.sub.2 -- or R.sup.3 --C(O)-- andR.sup.2 and R.sup.3 independently of one another are an optionally substituted alkyl, cycloalkyl, aryl or heteroaryl radical,b) a compound containing at least two reactive groups which can be crosslinked by an acid andc) a water-insoluble binder which is soluble or at least swellable in aqueous-alkaline solutions, is described.The radiation-sensitive mixture according to the invention is distinguished by a high sensitivity over a wide spectral range. It likewise exhibits a high heat stability and forms no corrosive photolysis products on exposure to light.

    摘要翻译： 一种负性辐射敏感性混合物，其包含a）在辐射下形成强酸的化合物，其中R 1是基团R 2 -SO 2 - 或R 3 -C（O） - ，并且 R 2和R 3彼此独立地是任选取代的烷基，环烷基，芳基或杂芳基，b）含有至少两个可被酸交联的反应性基团的化合物，和c）可溶于或在 描述了在碱性水溶液中的最小溶胀性。 根据本发明的辐射敏感混合物在宽光谱范围内被高灵敏度区分。 它同样表现出高热稳定性，并且在曝光时不形成腐蚀性光解产物。

    Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units
    45.
    发明授权
    Positive-working radiation-sensitive mixture and recording material for exposure to UV radiation containing polyfunctional compound having .alpha.-.beta.-keto ester units and sulfonate units 失效
    用于暴露于UV辐射的正性辐射敏感混合物和记录材料，其含有具有α-重氮基 - β-酮酯单元和磺酸酯单元的多官能化合物

    公开(公告)号：US5256517A

    公开(公告)日：1993-10-26

    申请号：US694353

    申请日：1991-05-01

    申请人： Horst Roeschert ,  Georg Pawlowski ,  Hans-Joachim Merrem ,  Ralph Dammel ,  Walter Spiess

    发明人： Horst Roeschert ,  Georg Pawlowski ,  Hans-Joachim Merrem ,  Ralph Dammel ,  Walter Spiess

    IPC分类号： G03F7/016 ,  G03F7/039 ,  H01L21/027 ,  G03F7/022 ,  G03F7/023

    CPC分类号： G03F7/0163

    摘要： A positive-working radiation-sensitive mixture is described which essentially contains a photoactive component and a water-insoluble binder which is soluble, or at least swellable, in aqueous alkaline solution, wherein a compound is used, as photoactive component, which contains .alpha.-diazo-.beta.-keto ester units and sulfonate units of the formula I ##STR1## in which R.sup.1 and R.sup.2, independently of one another, are an unsubstituted or substituted aliphatic, cycloaliphatic, araliphatic or aromatic radical having 4 to 20 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by N or NH groups and/or contain keto groups,X is an unsubstituted or substituted aliphatic, cycloaliphatic, carbocyclic, heterocyclic or araliphatic radical having 2 to 22 carbon atoms, it being possible for individual CH.sub.2 groups to be replaced by oxygen or sulfur atoms or by the groups --NR.sup.3 --, --C(O)--0--, --C(O)--NR.sup.3 --, ##STR2## --NR.sup.3 --C(O)--NR.sup.4 --, --O--C(O)--NR.sup.3 --, ##STR3## or --O--C(O)--O--, or CH groups to be replaced by ##STR4## in which R.sup.3 and R.sup.4, independently of one another, are hydrogen or an unsubstituted or substituted aliphatic, carbocyclic or araliphatic radical,m is an integer from 3 to 8,n is an integer from 1 to 3, and m>n.The radiation-sensitive mixture is especially suitable for exposure to radiation having a wavelength of about 190 to 300 nm.

    摘要翻译： 描述了一种正性辐射敏感性混合物，其基本上含有光活性组分和在碱性水溶液中可溶或至少可溶胀的水不溶性粘合剂，其中使用化合物作为光敏组分，其含有α- 其中R 1和R 2彼此独立地是具有4至20个碳原子的未取代或取代的脂族，脂环族，芳脂族或芳族基团的重氮基 - β-酮酯单元和磺酸酯单元 各个CH 2基团可以被氧或硫原子或N或NH基团和/或含有酮基取代，X是未取代或取代的具有2至22个碳原子的脂族，脂环族，碳环，杂环或芳脂族基团 各个CH 2基团可以被氧或硫原子或基团-NR 3 - ， - C（O）-O-，-C（O）-NR 3 - ， - NR 3 -C （O）-NR 4 - ， - OC（O）-NR 3 - ， - 或 - OC （O）-O-或CH基团，其中R 3和R 4彼此独立地为氢或未取代或取代的脂族，碳环或芳脂族基团，m为3至8的整数 ，n为1〜3的整数，m> n。 辐射敏感混合物特别适用于暴露于波长为约190至300nm的辐射。

    Process for preparing N-tert-butoxycarbonylmaleimide
    46.
    发明授权
    Process for preparing N-tert-butoxycarbonylmaleimide 失效
    制备N-叔丁基羧基甲酰亚胺的方法

    公开(公告)号：US5247096A

    公开(公告)日：1993-09-21

    申请号：US914453

    申请日：1992-07-17

    申请人： Horst Roeschert ,  Ralph Dammel ,  Georg Pawlowski ,  Klaus-Juergen Przybilla

    发明人： Horst Roeschert ,  Ralph Dammel ,  Georg Pawlowski ,  Klaus-Juergen Przybilla

    IPC分类号： C07D207/452 ,  C07D207/44 ,  C07D207/444

    CPC分类号： C07D207/452

    摘要： A process is described for preparing N-tert-butoxycarbonylmaleimide from maleimide and di-tert-butyl dicarbonate which comprises reacting maleimide with di-tert-butyl dicarbonate in the presence of a basic compound of the general formula I ##STR1## in which A represents the ring members required to complete a five- or six-membered saturated ring and R is (C.sub.1 -C.sub.4)alkyl, in one stage to give the end product.In a preferred embodiment, the compound of the general formula I is N-methylmorpholine.The product is useful as a monomer for polymerization, with the styrene copolymers being particularly suitable for chemically reinforced radiation-sensitive mixtures.

    摘要翻译： 描述了从马来酰亚胺和二碳酸二叔丁酯制备N-叔丁氧基羰基马来酰亚胺的方法，该方法包括使马来酰亚胺与二碳酸二叔丁酯在通式Ⅰ的碱性化合物（I）的存在下反应， 其中A表示完成五元或六元饱和环所需的环成员，R是（C 1 -C 4）烷基，在一个阶段中得到最终产物。 在优选的实施方案中，通式I的化合物是N-甲基吗啉。 该产品可用作聚合单体，苯乙烯共聚物特别适用于化学增强的辐射敏感混合物。