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    Process for preparing N-tert-butoxycarbonylmaleimide
    2.
    发明授权
    Process for preparing N-tert-butoxycarbonylmaleimide 失效
    制备N-叔丁基羧基甲酰亚胺的方法

    公开(公告)号：US5247096A

    公开(公告)日：1993-09-21

    申请号：US914453

    申请日：1992-07-17

    申请人： Horst Roeschert ,  Ralph Dammel ,  Georg Pawlowski ,  Klaus-Juergen Przybilla

    发明人： Horst Roeschert ,  Ralph Dammel ,  Georg Pawlowski ,  Klaus-Juergen Przybilla

    IPC分类号： C07D207/452 ,  C07D207/44 ,  C07D207/444

    CPC分类号： C07D207/452

    摘要： A process is described for preparing N-tert-butoxycarbonylmaleimide from maleimide and di-tert-butyl dicarbonate which comprises reacting maleimide with di-tert-butyl dicarbonate in the presence of a basic compound of the general formula I ##STR1## in which A represents the ring members required to complete a five- or six-membered saturated ring and R is (C.sub.1 -C.sub.4)alkyl, in one stage to give the end product.In a preferred embodiment, the compound of the general formula I is N-methylmorpholine.The product is useful as a monomer for polymerization, with the styrene copolymers being particularly suitable for chemically reinforced radiation-sensitive mixtures.

    摘要翻译： 描述了从马来酰亚胺和二碳酸二叔丁酯制备N-叔丁氧基羰基马来酰亚胺的方法，该方法包括使马来酰亚胺与二碳酸二叔丁酯在通式Ⅰ的碱性化合物（I）的存在下反应， 其中A表示完成五元或六元饱和环所需的环成员，R是（C 1 -C 4）烷基，在一个阶段中得到最终产物。 在优选的实施方案中，通式I的化合物是N-甲基吗啉。 该产品可用作聚合单体，苯乙烯共聚物特别适用于化学增强的辐射敏感混合物。

    Radiation-sensitive sulfonic acid esters and their use
    3.
    发明授权
    Radiation-sensitive sulfonic acid esters and their use 失效
    辐射敏感磺酸酯及其用途

    公开(公告)号：US5442061A

    公开(公告)日：1995-08-15

    申请号：US139017

    申请日：1993-10-21

    申请人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    发明人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    IPC分类号： G03F7/004 ,  C07D251/24 ,  C08L61/06 ,  C08L61/28 ,  C09D161/06 ,  G03F7/00 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027

    CPC分类号： G03F7/038 ,  C07D251/24 ,  C09D161/06 ,  C08L61/06 ,  C08L61/28 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/123

    摘要： Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.

    摘要翻译： 公开了2,4-双三氯甲基-6-（单 - 或二羟基苯基）-1,3,5-三嗪的磺酸酯。 还公开了含有这种化合物与含有至少两个酸可交联基团的化合物的负性辐射敏感性混合物，以及在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。 酯是式R-SO 3 H或R'（-SO 3 H）2的磺酸或磺酸与2,4-二三氯甲基-6-（单或二羟苯基）-1,3,5-三嗪的酯 （C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 1 -C 10） C3-C9）杂芳基，R'是任选取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n可以是1或2.根据 本发明对于在宽光谱范围内的高分辨率和高灵敏度是显着的，并且可用于生产适用于生产光刻胶，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

    Radiation-sensitive sulfonic acid esters and their use
    5.
    发明授权
    Radiation-sensitive sulfonic acid esters and their use 失效
    辐射敏感磺酸酯及其用途

    公开(公告)号：US5298364A

    公开(公告)日：1994-03-29

    申请号：US895679

    申请日：1992-06-09

    申请人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    发明人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    IPC分类号： G03F7/004 ,  C07D251/24 ,  C08L61/06 ,  C08L61/28 ,  C09D161/06 ,  G03F7/00 ,  G03F7/029 ,  G03F7/038 ,  H01L21/027 ,  G03C1/71 ,  G03C1/76

    CPC分类号： G03F7/038 ,  C07D251/24 ,  C09D161/06 ,  C08L61/06 ,  C08L61/28 ,  Y10S430/111 ,  Y10S430/12 ,  Y10S430/123

    摘要： Sulfonic acid esters of 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine are disclosed. Also disclosed is a negative-working radiation-sensitive mixture containing such a compound in combination with a compound containing at least two acid-crosslinkable groups, and a water-insoluble polymeric binder which is soluble or at least swellable in aqueous alkaline solutions. The esters are esters of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10)-alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl-(C.sub.1 -C.sub.10)alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n may be 1 or 2. The radiation-sensitive mixture according to the invention is remarkable for a high resolution and a high sensitivity over a wide spectral range and can be used to produce a radiation-sensitive recording material suitable for producing photoresists, electronic components, or printing plates, or for chemical milling.

    摘要翻译： 公开了2,4-双三氯甲基-6-（单 - 或二羟基苯基）-1,3,5-三嗪的磺酸酯。 还公开了含有这种化合物与含有至少两个酸可交联基团的化合物的负性辐射敏感性混合物，以及在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。 酯是式R-SO 3 H或R'（-SO 3 H）2的磺酸或磺酸与2,4-二三氯甲基-6-（单或二羟苯基）-1,3,5-三嗪的酯 式（I）和（或）II（*化学结构*）（I）（*化学结构*）（II）其中R是任选进一步取代的（C 1 -C 10） - 烷基，（C 5 -C 10）环烷基，（C 6 -C 10 （C 1 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 3 -C 9）杂芳基，R'是任选取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9） 亚杂芳基，n可以是1或2.根据本发明的辐射敏感性混合物在宽光谱范围内对于高分辨率和高灵敏度是显着的，并且可以用于产生适于生产的辐射敏感记录材料 光刻胶，电子元件或印版，或用于化学研磨。

    Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith
    7.
    发明授权
    Postive-working radiation-sensitive mixture and radiation-sensitive recording material produced therewith 失效
    后处理辐射敏感性混合物和辐射敏感记录材料

    公开(公告)号：US5364734A

    公开(公告)日：1994-11-15

    申请号：US895649

    申请日：1992-06-09

    申请人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    发明人： Georg Pawlowski ,  Horst Roeschert ,  Walter Spiess ,  Klaus-Juergen Przybilla

    IPC分类号： G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/033 ,  G03F7/039 ,  G03F7/075 ,  H01L21/027 ,  G03C1/52 ,  G03C3/00

    CPC分类号： G03F7/075 ,  G03F7/0045 ,  Y10S430/121

    摘要： A positive-working radiation-sensitive mixture is disclosed that contains(a) a compound that forms strong acid on exposure to actinic radiation that is an ester of a sulfonic acid or sulfonic acids of the formula R--SO.sub.3 H or R'(--SO.sub.3 H).sub.2 with 2,4-bistrichloromethyl-6-(mono- or dihydroxyphenyl)-1,3,5-triazine of the formulae I and/or II: ##STR1## where R is an optionally further substituted (C.sub.1 -C.sub.10) alkyl, (C.sub.5 -C.sub.10)cycloalkyl, (C.sub.6 -C.sub.10)aryl, (C.sub.6 -C.sub.10)aryl- (C.sub.1 -C.sub.10) alkyl or (C.sub.3 -C.sub.9)heteroaryl radical, R' is an optionally substituted (C.sub.1 -C.sub.10)alkylene, (C.sub.6 -C.sub.10)arylene or (C.sub.3 -C.sub.9)heteroarylene radical, and n is 1 or 2,(b) a compound that contains at least one acid-cleavable C--O--C or C--O--Si bond, and(c) a water-insoluble polymeric binder that is soluble or at least swellable in aqueous alkaline solutions.The radiation-sensitive mixture is remarkable for its high resolution and high sensitivity over a wide spectral range. A radiation-sensitive recording material suitable for producing photoresists, electronic components or printing plates, or for chemical milling is also disclosed.

    摘要翻译： 公开了一种正性辐射敏感性混合物，其包含（a）暴露于光化辐射下形成强酸的化合物，其为磺酸或式R-SO 3 H或R'（ - SO 3 H）的磺酸的酯， 2与式I和/或II的2,4-双三氯甲基-6-（单或二羟基苯基）-1,3,5-三嗪：其中R是任选的 进一步取代的（C 1 -C 10）烷基，（C 5 -C 10）环烷基，（C 6 -C 10）芳基，（C 6 -C 10）芳基 - （C 1 -C 10）烷基或（C 3 -C 9）杂芳基， 取代的（C 1 -C 10）亚烷基，（C 6 -C 10）亚芳基或（C 3 -C 9）亚杂芳基，n为1或2，（b）含有至少一个可酸切割的COC或CO-Si键的化合物， 和（c）在碱性水溶液中可溶或至少可溶胀的水不溶性聚合物粘合剂。 辐射敏感的混合物在宽光谱范围内的高分辨率和高灵敏度是显着的。 还公开了适用于生产光致抗蚀剂，电子部件或印刷版或用于化学研磨的辐射敏感记录材料。

    Silicone-compatible photoinitiators, and photosensitive mixtures comprising them
    8.
    发明授权
    Silicone-compatible photoinitiators, and photosensitive mixtures comprising them 失效
    与硅酮相容的光引发剂和包含它们的光敏混合物

    公开(公告)号：US5776658A

    公开(公告)日：1998-07-07

    申请号：US536738

    申请日：1995-09-29

    申请人： Claus-Peter Niesert ,  Georg Pawlowski ,  Willi-Kurt Gries ,  Klaus-Juergen Przybilla

    发明人： Claus-Peter Niesert ,  Georg Pawlowski ,  Willi-Kurt Gries ,  Klaus-Juergen Przybilla

    IPC分类号： C07F7/08 ,  C07F7/18 ,  C08F2/50 ,  C08G77/04 ,  C08G77/382 ,  G03F7/075 ,  C08J3/28 ,  C08G77/06 ,  C08G77/18

    CPC分类号： C07F7/0854 ,  C07F7/1836 ,  C08F2/50 ,  C08G77/382 ,  G03F7/075 ,  Y10S522/904 ,  Y10S522/905

    摘要： Compounds of the general formula I: (SIL--X--).sub.m IN (I), in which SIL is a radical of the formula Si(R.sup.1)(R.sup.2)(R.sup.3), where R.sup.1 is an alkyl, haloalkyl or alkoxy radical of 1 to 8 carbon atoms, an alkenyl radical, an alkenyloxy or acyloxy radical of 2 to 8 carbon atoms, an aryl or aryloxy radical of 6 to 10 carbon atoms, or a dialkyl-, diaryl- or alkylaryl-methyleneaminooxy radical having C.sub.1 -C.sub.4 -alkyl or C.sub.6 -aryl groups; and R.sup.2 and R.sup.3 are identical or different radicals with the meaning of R.sup.1 or X--IN; X is a group C.sub.n H.sub.2n ; IN is the radical of a compound which is active as a photoinitiator or photosensitizer and which has at least one carbonyl group located on an aromatic nucleus; m is a number from 1 to 4; and n is a number from 2 to 12, or of the formula II: Si.sub.o O.sub.o-1 (--X--IN).sub.p R.sup.4.sub.2o+2-p (II), in which R.sup.4 is a radical with the meaning of R.sup.1, and two or more radicals R.sup.4 may be the same as or different from one another; o is a number from 2 to 20,000; and p is a number from 1 to o, and the symbols X and IN are as defined above, the group X being attached to an aromatic carbon atom which is positioned ortho to the carbonyl group of IN. The compounds are prepared by reacting a compound IN--H with a compound SIL--X' or a compound Si.sub.o O.sub.o-1 (--X').sub.p R.sup.4.sub.2o+2-p in the presence of a ruthenium compound. They are suitable as radical-forming photoinitiators or as photosensitizers in silicone-containing photopolymerizable mixtures, in particular for the production of waterless-printing planographic printing plates.

    摘要翻译： 通式I：（SIL-X-）mIN（I）的化合物，其中SIL是式Si（R1）（R2）（R3）的基团，其中R1是烷基，卤代烷基或烷氧基 2至8个碳原子的烯基，烯氧基或酰氧基，6至10个碳原子的芳基或芳氧基，或具有C 1 -C 4烷基的二烷基 - ，二芳基 - 或烷基芳基 - 亚甲基氨基氧基， 烷基或C6-芳基; R2和R3是相同或不同的具有R1或X-IN含义的基团; X是CnH2n基团; IN是作为光引发剂或光敏剂具有活性的化合物的基团，其具有位于芳香核上的至少一个羰基; m是从1到4的数字; 并且n是2至12的数，或式II：SioOo-1（-X-IN）pR42o + 2-p（II）的数，其中R 4是具有R 1的含义的基团，以及两个或更多个 基团R 4可以彼此相同或不同; o是从2到20,000的数字; 并且p是1至o的数，符号X和IN如上所定义，基团X连接到位于与IN的羰基邻位的芳族碳原子上。 化合物通过化合物IN-H与化合物SIL-X'或化合物SioOo-1（-X'）pR42o + 2-p在钌化合物的存在下反应制备。 它们适用于含硅酮的光聚合混合物中的自由基形成光引发剂或光敏剂，特别是用于生产无水印刷平版印刷版。