公开(公告)号：US5379348A

公开(公告)日：1995-01-03

申请号：US40852

申请日：1993-03-31

申请人： Toshiyuki Watanabe ,  Hideo Tsuchiya ,  Toru Tojo ,  Tomohide Watanabe

发明人： Toshiyuki Watanabe ,  Hideo Tsuchiya ,  Toru Tojo ,  Tomohide Watanabe

IPC分类号： G01B11/24 ,  G01N21/88 ,  G01N21/93 ,  G01N21/956 ,  G03F1/26 ,  G03F1/29 ,  G03F1/30 ,  G03F1/32 ,  G03F1/34 ,  G03F1/84 ,  G06T7/00 ,  H01L21/027 ,  H01L21/66 ,  G06K9/00 ,  G01N21/00 ,  H04N7/00

CPC分类号： G06T7/001 ,  G01N21/956 ,  G06T2207/10056 ,  G06T2207/30148 ,  H01L22/12 ,  H01L2924/0002

摘要： A pattern defects inspection system inspects the presence/absence of pattern defects in a photomask as an object to be inspected in which a chromium pattern and a phase shift pattern are formed together. Measurement data output from a sensor circuit for generating measurement pattern data by inspecting measurement patterns corresponding to two types of patterns formed on the object by radiating light on the object, and two identifiable design data stored in a magnetic disk unit in advance, i.e., chromium pattern design data used to form a chromium pattern and phase shift pattern design data used to form a phase shift pattern, are read out by a bit pattern generator for performing development processing. The two types of bit data obtained by the bit pattern generator are synthesized according to the same coordinate definition. The synthesized design data is compared with the measurement data by a comparator. As a result, the presence/absence of pattern defects in the object can be determined.

摘要翻译： 图案缺陷检查系统检查作为要检查的对象的光掩模中是否存在图案缺陷，其中形成铬图案和相移图案。 从传感器电路输出的测量数据，用于通过在物体上照射光来检查与形成在物体上的两种图案相对应的测量图案，以及预先存储在磁盘单元中的两个可识别的设计数据来产生测量图案数据，即铬 用于形成铬图案的图案设计数据和用于形成相移图案的相移图案设计数据由用于进行显影处理的位图发生器读出。 根据相同的坐标定义来合成由位图生成器获得的两种位数据。 将合成的设计数据与比较器的测量数据进行比较。 结果，可以确定对象中的图案缺陷的存在/不存在。

公开(公告)号：US4808002A

公开(公告)日：1989-02-28

申请号：US167233

申请日：1988-03-11

申请人： Toru Tojo ,  Mitsuo Tabata ,  Hisakazu Yoshino

发明人： Toru Tojo ,  Mitsuo Tabata ,  Hisakazu Yoshino

IPC分类号： G01B11/00 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/68

CPC分类号： G03F9/70

摘要： First and second objects are moved relative and parallel to each other, in order to be aligned. More specifically, a first mark formed on the first object has first and second light-passing sections. A second mark formed on the second object has first and second light-reflecting sections. A light beam from a light source is directed to and reflected by the first and second light-reflecting sections of said second mark and transferred onto said first mark. An image of said first light-reflecting section is projected onto the first mark, so that the first light-passing section has a first overlapping region which overlaps a part of the inner of said first light-reflecting section. An image of said second light-reflecting section is projected onto the first mark, so that said second light-passing section has a second overlapping region which overlaps a part of the image of said second light-reflecting section. A first light beam passed through the first overlapping region and a second light beam passed through the second overlapping region are detected independently. The difference in amount between these two light beams is proportional to the positional shift between the objects. The objects are adjusted relative to each other to make the first and second light beams equal in amount, so that the objects can be aligned relative to each other. The first object is a reticle and the second object is a wafer or wafer table in the projecting and exposing apparatus.

摘要翻译： 第一和第二物体相对移动并且彼此平行，以便对齐。 更具体地，形成在第一物体上的第一标记具有第一和第二光通过部分。 形成在第二物体上的第二标记具有第一和第二光反射部分。 来自光源的光束被引导到所述第二标记的第一和第二光反射部分并被其反射并被转移到所述第一标记上。 所述第一光反射部的图像被投影到第一标记上，使得第一透光部具有与所述第一光反射部的内部的一部分重叠的第一重叠区域。 所述第二光反射部的图像被投影到第一标记上，使得所述第二透光部具有与所述第二光反射部的图像的一部分重叠的第二重叠区域。 独立地检测通过第一重叠区域的第一光束和穿过第二重叠区域的第二光束。 这两个光束之间的量的差异与物体之间的位置偏移成比例。 物体相对于彼此调节以使第一和第二光束的量相等，使得物体可以相对于彼此对准。 第一个目的是掩模版，第二个目的是在投影和曝光装置中的晶片或晶圆台。

公开(公告)号：US4698513A

公开(公告)日：1987-10-06

申请号：US9628

申请日：1987-01-23

申请人： Toru Tojo ,  Mitsuo Tabata

发明人： Toru Tojo ,  Mitsuo Tabata

IPC分类号： G01B11/02 ,  G03F9/00 ,  G01N21/86

CPC分类号： G03F9/7023 ,  G01B11/026

摘要： A device for measuring the position of an object has a light radiation mechanism for causing light to be obliquely incident on a surface of the object, a vibrating mechanism for vibrating the light incident on the surface of the object at a predetermined frequency, and a detecting mechanism for detecting light reflected by the surface of the object, generating a detection signal, and obtaining the position of the object in accordance with the detection signal.

摘要翻译： 用于测量物体的位置的装置具有用于使光倾斜地入射到物体的表面上的光辐射机构，用于以预定频率振动入射在物体表面上的光的振动机构，以及检测 用于检测由物体的表面反射的光的机构，产生检测信号，并根据检测信号获得物体的位置。

公开(公告)号：US4469949A

公开(公告)日：1984-09-04

申请号：US374724

申请日：1982-05-04

申请人： Ichiro Mori ,  Kazuyoshi Sugihara ,  Toshiaki Shinozaki ,  Toru Tojo

发明人： Ichiro Mori ,  Kazuyoshi Sugihara ,  Toshiaki Shinozaki ,  Toru Tojo

IPC分类号： H01L21/027 ,  H01J37/304 ,  H01L21/30 ,  H01J37/00

CPC分类号： H01L21/30 ,  H01J37/3045

摘要： According to the invention an electron beam pattern transfer device with an improved alignment means is provided.A first and a second mark M.sub.1, M.sub.2 for alignment purposes are formed on the surface of the wafer and the wafer holder, respectively. The first mark M.sub.1 is formed on the wafer by conventional lithographic technique and the second mark M.sub.2 consists of a hole or a heavy metal, such as Ta or Ta.sub.2 O.sub.5. A third alignment mark M.sub.3 is provided on the photocathode mask having a position corresponding to M.sub.2 on the wafer holder and spaced a known distance L.sub.2 from an imaginary reference position M.sub.4 on the mask. The first step of the alignment process requires the detection of a relative distance L.sub.1 between the first and second marks M.sub.1, M.sub.2 by conventional detecting means, such as an optical measuring means. In the next step, the relative position of the photocathode mask and the wafer holder is adjusted so that the distance between the marks M.sub.2 and M.sub.3 is made substantially equal to the difference between the distance L.sub.1 and the known distance L.sub. 2.

摘要翻译： 根据本发明，提供了具有改进的对准装置的电子束图案转印装置。 分别在晶片和晶片保持器的表面上形成用于对准目的的第一和第二标记M1，M2。 第一标记M1通过常规平版印刷技术在晶片上形成，第二标记M2由孔或重金属如Ta或Ta2O5组成。 第三对准标记M3设置在光电阴极掩模上，其具有对应于晶片保持器上的M2的位置，并且与掩模上的假想参考位置M4隔开已知距离L2。 对准处理的第一步骤需要通过诸如光学测量装置的常规检测装置检测第一和第二标记M1，M2之间的相对距离L1。 在下一步骤中，调整光电阴极掩模和晶片保持器的相对位置，使得标记M2和M3之间的距离基本上等于距离L1和已知距离L 2之间的差。

公开(公告)号：US4262974A

公开(公告)日：1981-04-21

申请号：US82226

申请日：1979-10-04

申请人： Toru Tojo ,  Yoshinori Nishio

发明人： Toru Tojo ,  Yoshinori Nishio

IPC分类号： F16C29/00 ,  F16C29/04 ,  F16C29/12

CPC分类号： F16C29/04 ,  F16C29/043 ,  F16C33/306

摘要： A linear bearing apparatus embodying this invention comprises a pair of mutually facing guide rails provided between two physical bodies reciprocating in the prescribed direction relative to each other; a retainer assembly disposed between the paired guide rails and formed of a plurality of rolling elements and a retainer; a pair of racks fitted to the two physical bodies; a pinion engaged with both racks; and elastic coupling means for elastically connecting the pinion to the retainer assembly and causing the retainer assembly to be shifted for the distance through which the pinion is moved.

摘要翻译： 实施本发明的线性轴承装置包括一对相互相对的导轨，其设置在两个相对于彼此在规定方向上往复运动的物理体之间; 保持器组件，设置在成对的导轨之间并由多个滚动元件和保持器构成; 一对装在两个身体上的机架; 与两个齿条接合的小齿轮; 以及用于将小齿轮弹性地连接到保持器组件并且使保持器组件移动小齿轮通过其移动的距离的弹性联接装置。

公开(公告)号：US07526119B2

公开(公告)日：2009-04-28

申请号：US10720136

申请日：2003-11-25

申请人： Ikunao Isomura ,  Toru Tojo

发明人： Ikunao Isomura ,  Toru Tojo

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： With a pattern inspection apparatus, image data corresponding to all patterns on an inspection target plate can be generated on the basis of scanned pattern data obtained with low-magnification optics different from ordinary inspection optics, or design pattern data. A pattern repeated area can be automatically detected from the image data. Therefore, die-to-die comparative inspection can be performed if the operator does not specify which dies to inspect. Thus, the inspection throughput can be improved.

摘要翻译： 利用图案检查装置，可以基于与普通检查光学元件不同的低倍率光学器件或设计图案数据获得的扫描图案数据来生成对应于检查对象板上的所有图案的图像数据。 可以从图像数据自动检测图案重复区域。 因此，如果操作者没有指定要检查的模具，则可以进行模 - 模对比检查。 因此，可以提高检查吞吐量。

公开(公告)号：US07522276B2

公开(公告)日：2009-04-21

申请号：US12033599

申请日：2008-02-19

申请人： Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

发明人： Toru Tojo ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Akihiko Sekine

IPC分类号： G01N21/00

CPC分类号： G01N21/956

摘要： A pattern inspection apparatus comprises an illumination optics applying a first inspection light on a predetermined wavelength to a surface opposite to a pattern formed surface of the substrate, and a second inspection light whose wavelength is equal to the wavelength of the first inspection light to the pattern formed surface, a detector independently detecting a transmitted light from the substrate by irradiation of the first inspection light and a reflected light from the substrate by irradiation of the second inspection light, and a space separation mechanism provided in the vicinity of an optical focal plane toward the pattern formed surface, and spatially separates an irradiation area of the first and second inspection lights such that the transmitted and reflected lights from the substrate are imaged in two discrete areas separated on the optical focal plane.

摘要翻译： 图案检查装置包括将预定波长的第一检查光施加到与基板的图案形成表面相对的表面的照明光学器件以及其波长等于第一检查光的波长与图案的第二检查光 形成表面，检测器，通过照射第一检查光和通过照射第二检查光的来自基板的反射光独立地检测来自基板的透射光;以及空间分离机构，设置在光学焦平面附近，朝向 图案形成表面，并且在空间上分离第一和第二检查光的照射区域，使得来自基板的透射和反射光成像在在光学焦平面上分离的两个离散区域中。

公开(公告)号：US07508526B2

公开(公告)日：2009-03-24

申请号：US11249359

申请日：2005-10-14

申请人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

发明人： Riki Ogawa ,  Toru Tojo ,  Munehiro Ogasawara

IPC分类号： G01B9/02 ,  G01B11/02

CPC分类号： G01N21/95607 ,  G03F1/84

摘要： In a defect inspecting apparatus, a differential interference optical system forms a differential interference image which is produced from an optical interference of images in a predetermined direction, the images corresponding to inspecting parts of a pattern formed on a mask. A control part varies the predetermined direction so as to cause the differential interference optical system to produce another differential interference image. An image pickup sensor picks up the differential interference images in accordance with the variation of the predetermined direction. A defect detecting unit detects a defect in the pattern formed on the mask from comparing the differential interference images with reference images, respectively.

摘要翻译： 在缺陷检查装置中，差分干涉光学系统形成由预定方向的图像的光学干涉产生的差分干涉图像，图像对应于形成在掩模上的图案的检查部分。 控制部分改变预定方向，以使差分干涉光学系统产生另一个差分干涉图像。 图像拾取传感器根据预定方向的变化来拾取差分干涉图像。 缺陷检测单元分别通过将差分干涉图像与参考图像进行比较来检测形成在掩模上的图案中的缺陷。

公开(公告)号：US07415149B2

公开(公告)日：2008-08-19

申请号：US11674025

申请日：2007-02-12

申请人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

发明人： Hideo Tsuchiya ,  Kyoji Yamashita ,  Toshiyuki Watanabe ,  Ikunao Isomura ,  Toru Tojo ,  Yasushi Sanada

IPC分类号： G06K9/00

CPC分类号： G06T7/0004 ,  G06T2207/30148

摘要： A pattern inspection apparatus uses a die-to-database comparison method which compares detected pattern data obtained from an optical image of a pattern of a plate to be inspected with first reference pattern data obtained from designed pattern data in combination with a die-to-die comparison method which compares the detected pattern data with second reference pattern data obtained by detecting an area to be a basis for repetition. A computer detects presence of a plurality of repeated pattern areas from layout information contained in the designed pattern data, reads the arrangement, the number, the dimension and the repeated pitch of the repeated pattern areas, and automatically fetches an inspection area of the die-to-die comparison method.

摘要翻译： 图案检查装置使用芯片对数据库比较方法，将从被检查板的图案的光学图像获得的检测图案数据与从设计图案数据获得的第一参考图案数据结合， 芯片比较方法，其将检测到的图案数据与通过检测作为重复基础的区域获得的第二参考图案数据进行比较。 计算机从包含在设计图案数据中的布局信息中检测多个重复图案区域的存在，读取重复图案区域的布置，数量，尺寸和重复间距，并且自动取出模具数据的检查区域， 对比方法。

公开(公告)号：US20080121799A1

公开(公告)日：2008-05-29

申请号：US11932083

申请日：2007-10-31

申请人： Chohei Kanno ,  Hirotami Koike ,  Toru Tojo

发明人： Chohei Kanno ,  Hirotami Koike ,  Toru Tojo

IPC分类号： G21K5/00

CPC分类号： H01J37/28 ,  H01J37/228 ,  H01J2237/047 ,  H01J2237/21 ,  H01J2237/2808 ,  H01J2237/281

摘要： A sample analyzing apparatus includes: an irradiation system which irradiates a charged particle onto a sample having a concave portion partially on a surface thereof; a light condensing reflecting mirror which condenses luminescence obtained from the surface based on the irradiation of the charged particle; a light detector which detects the luminescence guided to the light condensing reflecting mirror; a charged particle detector which detects the charged particle reflected from the surface of the sample as a reflection charged particle; and a signal processor which controls the irradiation system to irradiate the charged particle intermittently, which obtains a shape of the sample on the basis of a detection signal outputted from the charged particle detector, and which identifies a material of the sample on the basis of an attenuation characteristic of a detection signal outputted from the light detector in a period from a time point in which the intermittent irradiation of the charged particle by the irradiation system is ended to a time point in which the intermittent irradiation of the charged particle by the irradiation system is started.

摘要翻译： 样品分析装置包括：照射系统，其将带电粒子照射到其表面上部分地具有凹部的样品上; 聚光反射镜，其基于带电粒子的照射而凝结从表面获得的发光; 光检测器，其检测被引导到聚光反射镜的发光; 检测从样品表面反射的带电粒子作为反射带电粒子的带电粒子检测器; 以及信号处理器，其控制照射系统间歇地照射带电粒子，其基于从带电粒子检测器输出的检测信号获得样本的形状，并且基于以下方式识别样品的材料 在从照射系统的带电粒子的间歇照射的时间点到达照射系统的带电粒子的间歇照射的时间点的期间，从光检测器输出的检测信号的衰减特性 开始了