公开(公告)号：US07842452B2

公开(公告)日：2010-11-30

申请号：US12331136

申请日：2008-12-09

申请人： Shinichi Kanna ,  Haruki Inabe ,  Hiromi Kanda

发明人： Shinichi Kanna ,  Haruki Inabe ,  Hiromi Kanda

IPC分类号： G03F7/30

CPC分类号： G03F7/0758 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111

摘要： A pattern forming method which uses a positive resist composition comprises: (A) a silicon-free resin capable of increasing its solubility in an alkaline developer under action of an acid; (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; (C) a silicon-containing resin having at least one group selected from the group of consisting (X) an alkali-soluble group, (XI) a group capable of decomposing under action of an alkaline developer and increasing solubility of the resin (C) in an alkaline developer, and (XII) a group capable of decomposing under action of an acid and increasing solubility of the resin (C) in an alkaline developer, and (D) a solvent, the method comprising: (i) a step of applying the positive resist composition to a substrate to form a resist coating, (ii) a step of exposing the resist coating to light via an immersion liquid, (iii) a step of removing the immersion liquid remaining on the resist coating, (iv) a step of heating the resist coating, and (v) a step of developing the resist coating.

摘要翻译： 使用正性抗蚀剂组合物的图案形成方法包括：（A）能够在酸作用下增加其在碱性显影剂中的溶解度的无硅树脂; （B）能够在用光化射线或辐射照射时能产生酸的化合物; （C）具有选自（X）碱溶性基团中的至少一种的基团的含硅树脂（XI）能够在碱性显影剂的作用下分解的基团和增加树脂的溶解度（C ）和（XII）能够在酸的作用下分解并增加树脂（C）在碱性显影剂中的溶解度的基团，和（D）溶剂，该方法包括：（i）步骤 将正性抗蚀剂组合物施加到基材上以形成抗蚀剂涂层，（ii）通过浸渍液体将抗蚀剂涂层曝光于光的步骤，（iii）去除残留在抗蚀剂涂层上的浸渍液体的步骤，（iv ）加热抗蚀剂涂层的步骤，和（v）显影抗蚀涂层的步骤。

公开(公告)号：US07790351B2

公开(公告)日：2010-09-07

申请号：US12363303

申请日：2009-01-30

申请人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03F7/00 ,  G03F7/004

CPC分类号： G03F7/0758 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/146

摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.

摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。

公开(公告)号：US07771912B2

公开(公告)日：2010-08-10

申请号：US11636517

申请日：2006-12-11

申请人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03F7/039 ,  G03F7/20 ,  G03F7/30

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/122

摘要： A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (C) a resin having at least one repeating unit selected from fluorine atom-containing repeating units represented by the following formulae (1-1), (1-2) and (1-3), the resin being stable to an acid and insoluble in an alkali developer, and (D) a solvent: wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group, provided that at least one of R4 to R7 represents a fluorine atom, and R4 and R5, or R6 and R7 may combine to form a ring; R8 represents a hydrogen atom, a fluorine atom or a monovalent organic group; Rf represents a fluorine atom or a fluorine atom-containing monovalent organic group; L represents a single bond or a divalent linking group; Q represents an alicyclic structure; and k represents an integer of 0 to 3.

摘要翻译： 正型抗蚀剂组合物包括：（A）在酸性作用下在碱性显影剂中的溶解度增加的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有 选自由下式（1-1），（1-2）和（1-3）表示的含氟原子的重复单元中的至少一种重复单元，该树脂对酸稳定且不溶于碱性显影剂， 和（D）溶剂：其中R1表示氢原子或烷基; R2表示氟代烷基; R3表示氢原子或一价有机基团; R4至R7各自独立地表示氢原子，氟原子，烷基，氟烷基，烷氧基或氟烷氧基，条件是R4至R7中的至少一个表示氟原子，R4和R5，或 R6和R7可以结合形成环; R8表示氢原子，氟原子或一价有机基团; Rf表示氟原子或含氟原子的一价有机基团; L表示单键或二价连接基团; Q表示脂环结构; k表示0〜3的整数。

公开(公告)号：US07666574B2

公开(公告)日：2010-02-23

申请号：US12058327

申请日：2008-03-28

申请人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03F7/004 ,  G03F7/30

CPC分类号： G03F7/0397 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/111

摘要： A positive photosensitive composition comprises (A) a resin that has an acid decomposable repeating unit represented by formula (I) and increases its solubility in an alkali developer by action of an acid; (B) a compound generating an acid in irradiation with actinic light or radiation; (C) a resin that contains neither fluorine nor silicon and has a repeating unit having the predetermined structure; and (D) a solvent, wherein each symbol represents a predetermined group.

摘要翻译： 正型光敏组合物包含（A）具有由式（I）表示的可酸分解重复单元并通过酸作用增加其在碱性显影剂中的溶解度的树脂; （B）在光化或辐射照射下产生酸的化合物; （C）既不含氟也不含硅且具有预定结构的重复单元的树脂; 和（D）溶剂，其中每个符号表示预定的基团。

公开(公告)号：US20070178405A1

公开(公告)日：2007-08-02

申请号：US11492123

申请日：2006-07-25

申请人： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

发明人： Hiromi Kanda ,  Shinichi Kanna ,  Haruki Inabe

IPC分类号： G03C1/00

CPC分类号： G03F7/039 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/091 ,  G03F7/16 ,  G03F7/168 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40

摘要： A positive resist composition comprising: (A) a resin which comes to have an enhanced solubility in an alkaline developing solution by an action of an acid; (B) a compound which generates an acid upon irradiation with actinic rays or a radiation; (C) a fluorine-containing compound containing at least one group selected from the groups (x) to (z); and (F) a solvent, and a method of pattern formation with the composition: (x) an alkali-soluble group; (y) a group which decomposes by an action of an alkaline developing solution to enhance a solubility in an alkaline developing solution; and (z) a group which decomposes by an action of an acid.

摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用在碱性显影液中具有增强的溶解度的树脂; （B）在用光化射线或辐射照射时产生酸的化合物; （C）含有选自（x）〜（z）中的至少一种基团的含氟化合物; 和（F）溶剂，以及组合物的图案形成方法：（x）碱溶性基团; （y）通过碱性显影液的作用分解以提高在碱性显影液中的溶解度的基团; 和（z）通过酸的作用分解的基团。

公开(公告)号：US20070134590A1

公开(公告)日：2007-06-14

申请号：US11636633

申请日：2006-12-11

申请人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Toshiaki Fukuhara ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03C1/00

CPC分类号： G03F7/0758 ,  G03F7/0392 ,  G03F7/2041 ,  Y10S430/106 ,  Y10S430/114 ,  Y10S430/115 ,  Y10S430/146

摘要： A positive resist composition comprising: (A) a resin showing an increase in the solubility in an alkali developer by the action of an acid; (B) a compound being capable of generating an acid when irradiated with an actinic ray or a radiation; (C) a resin having a silicon-containing repeating unit of a specific structure and being stable to acids but insoluble in an alkali developer; and (D) a solvent; and a pattern making method using the same.

摘要翻译： 一种正型抗蚀剂组合物，其包含：（A）通过酸的作用显示在碱性显影剂中的溶解度增加的树脂; （B）当用光化射线或辐射照射时能够产生酸的化合物; （C）具有特定结构的含硅重复单元并且对酸稳定但不溶于碱显影剂的树脂; 和（D）溶剂; 和使用该图案的图案制作方法。

公开(公告)号：US20070134589A1

公开(公告)日：2007-06-14

申请号：US11636517

申请日：2006-12-11

申请人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Kei Yamamoto ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03C1/00

CPC分类号： G03F7/0395 ,  G03F7/0046 ,  G03F7/0397 ,  G03F7/2041 ,  Y10S430/108 ,  Y10S430/111 ,  Y10S430/122

摘要： A positive resist composition comprises: (A) a resin of which solubility in an alkali developer increases under the action of an acid, (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation, (C) a resin having at least one repeating unit selected from fluorine atom-containing repeating units represented by the following formulae (1-1), (1-2) and (1-3), the resin being stable to an acid and insoluble in an alkali developer, and (D) a solvent: wherein R1 represents a hydrogen atom or an alkyl group; R2 represents a fluoroalkyl group; R3 represents a hydrogen atom or a monovalent organic group; R4 to R7 each independently represents a hydrogen atom, a fluorine atom, an alkyl group, a fluoroalkyl group, an alkoxy group or a fluoroalkoxy group, provided that at least one of R4 to R7 represents a fluorine atom, and R4 and R5, or R6 and R7 may combine to form a ring; R8 represents a hydrogen atom, a fluorine atom or a monovalent organic group; Rf represents a fluorine atom or a fluorine atom-containing monovalent organic group; L represents a single bond or a divalent linking group; Q represents an alicyclic structure; and k represents an integer of 0 to 3.

摘要翻译： 正型抗蚀剂组合物包括：（A）在酸性作用下在碱性显影剂中的溶解度增加的树脂，（B）在用光化射线或辐射照射时能够产生酸的化合物，（C）具有 选自由下式（1-1），（1-2）和（1-3）表示的含氟原子的重复单元中的至少一种重复单元，该树脂对酸稳定且不溶于碱性显影剂， 和（D）溶剂：其中R 1表示氢原子或烷基; R 2表示氟代烷基; R 3表示氢原子或一价有机基团; R 4至R 7各自独立地表示氢原子，氟原子，烷基，氟烷基，烷氧基或氟烷氧基，条件是至少 R 4至R 7中的一个表示氟原子，R 4和R 5，或R 5， SUB> 6和R 7可以结合形成环; R 8表示氢原子，氟原子或一价有机基团; Rf表示氟原子或含氟原子的一价有机基团; L表示单键或二价连接基团; Q表示脂环结构; k表示0〜3的整数。

公开(公告)号：US20050208419A1

公开(公告)日：2005-09-22

申请号：US11077012

申请日：2005-03-11

申请人： Haruki Inabe ,  Shinichi Kanna ,  Hiromi Kanda

发明人： Haruki Inabe ,  Shinichi Kanna ,  Hiromi Kanda

IPC分类号： G03F7/004 ,  G03F7/039 ,  G03F7/20 ,  G03C1/492

CPC分类号： G03F7/0046 ,  G03F7/0045 ,  G03F7/0048 ,  G03F7/0392 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/2041 ,  G03F7/30 ,  Y10S430/108

摘要： A positive resist composition for immersion exposure comprises: (A) a resin containing at least one repeating unit having a fluorine atom and increasing a solubility of the resin in an alkali developer by an action of an acid; and (B) a compound capable of generating an acid upon irradiation with one of an actinic ray and radiation.

摘要翻译： 用于浸渍曝光的正型抗蚀剂组合物包括：（A）含有至少一个具有氟原子的重复单元的树脂，并通过酸的作用增加树脂在碱性显影剂中的溶解度; 和（B）能够在用光化射线和辐射之一照射时能够产生酸的化合物。

公开(公告)号：US06605409B2

公开(公告)日：2003-08-12

申请号：US09860440

申请日：2001-05-21

申请人： Kunihiko Kodama ,  Shinichi Kanna

发明人： Kunihiko Kodama ,  Shinichi Kanna

IPC分类号： G03F7004

CPC分类号： C07D275/06 ,  C07C381/12 ,  G03F7/0045 ,  G03F7/039 ,  Y10S430/115 ,  Y10S430/122 ,  Y10S430/123

摘要： A positive resist composition comprising (A) a compound generating a specific sulfonimide compound by irradiation with an actinic ray or a radiation and (B) a resin having a group, which is decomposed by the action of an acid to increase the solubility of the composition in an alkali developer. The resist composition has an improved resolving power and an improved process allowance such as exposure margin and the depth of focus in a lithographic technique using a light source of short wavelengths capable of super fine working and a positive chemically amplified resist.

公开(公告)号：US08968973B2

公开(公告)日：2015-03-03

申请号：US12533019

申请日：2009-07-31

申请人： Shinichi Kanna ,  Kazuya Oota ,  Yosuke Murakami

发明人： Shinichi Kanna ,  Kazuya Oota ,  Yosuke Murakami

IPC分类号： G02B5/20

CPC分类号： G03F7/0007 ,  G02B5/201 ,  G03F7/40

摘要： A method of producing a color filter includes (a) forming a colored pattern on a substrate by exposing and developing a colored curable composition containing a dye, a polymerizable monomer and an organic solvent, (b) forming a transparent protective film on the colored pattern, and (c) irradiating at least the transparent protective film with light after forming the transparent protective film on the colored pattern.

摘要翻译： 制造滤色器的方法包括：（a）通过曝光和显影含有染料，可聚合单体和有机溶剂的着色可固化组合物在基底上形成着色图案，（b）在着色图案上形成透明保护膜 ，（c）在着色图案上形成透明保护膜之后，至少用透明保护膜照射光。